Ming-Shu Kuo, Ph.D. - Publications

Affiliations: 
2010 Material Science and Engineering University of Maryland, College Park, College Park, MD 

5 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2010 Kuo MS, Oehrlein GS. Surface and near-surface modifications of ultralow dielectric constant materials exposed to plasmas under sidewall-like conditions Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 1104-1110. DOI: 10.1116/1.3499271  0.605
2010 Kuo MS, Pal AR, Oehrlein GS, Hua X. Mechanistic study of ultralow k-compatible carbon dioxide in situ photoresist ashing processes. II. Interaction with preceding fluorocarbon plasma ultralow k etching processes Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 961-967. DOI: 10.1116/1.3482353  0.65
2010 Kuo MS, Pal AR, Oehrlein GS, Lazzeri P, Anderle M. Mechanistic study of ultralow k-compatible carbon dioxide in situ photoresist ashing processes. I. Process performance and influence on ULK material modification Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 952-960. DOI: 10.1116/1.3482343  0.611
2010 Kuo MS, Hua X, Oehrlein GS, Ali A, Jiang P, Lazzeri P, Anderle M. Influence of C4 F8 /Ar -based etching and H 2 -based remote plasma ashing processes on ultralow k materials modifications Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 284-294. DOI: 10.1116/1.3308623  0.649
2006 Hua X, Kuo MS, Oehrlein GS, Lazzeri P, Iacob E, Anderle M, Inoki CK, Kuan TS, Jiang P, Wu WL. Damage of ultralow k materials during photoresist mask stripping process Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1238-1247. DOI: 10.1116/1.2194947  0.641
Show low-probability matches.