Yunfei Deng, Ph.D. - Publications
Affiliations: | 2005 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Integrated Circuits (INC); Solid-State DevicesYear | Citation | Score | |||
---|---|---|---|---|---|
2004 | Deng Y, Neureuther AR. Characterization of material contrast and effective wavelength effects in immersion inspection Journal of Vacuum Science & Technology B. 22: 1006-1011. DOI: 10.1116/1.1735820 | 0.435 | |||
2004 | Mateus CFR, Huang MCY, Deng Y, Neureuther AR, Chang-Hasnain CJ. Ultrabroadband Mirror Using Low-Index Cladded Subwavelength Grating Ieee Photonics Technology Letters. 16: 518-520. DOI: 10.1109/Lpt.2003.821258 | 0.473 | |||
2003 | Deng Y, Neureuther AR. Electromagnetic characterization of nanoimprint mold inspection Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 130-134. DOI: 10.1116/1.1531648 | 0.531 | |||
2002 | Deng Y, Pistor T, Neureuther AR. Effects of multilayer mask roughness on extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 344-349. DOI: 10.1116/1.1447252 | 0.557 | |||
2000 | Pistor T, Deng Y, Neureuther A. Extreme ultraviolet mask defect simulation: Low-profile defects Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 2926-2929. DOI: 10.1116/1.1324616 | 0.556 | |||
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