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Yinbo Li, Ph.D. - Publications

Affiliations: 
2005 University of Delaware, Newark, DE, United States 
Area:
Electronics and Electrical Engineering
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34 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Li T, Liu Y, Sun Y, Yan X, Wei P, Li Y. Vectorial pupil optimization to compensate polarization distortion in immersion lithography system. Optics Express. 28: 4412-4425. PMID 32121678 DOI: 10.1364/OE.382051  0.402
2019 Sun Y, Li Y, Li T, Yan X, Li E, Wei P. Fast lithographic source optimization method of certain contour sampling-Bayesian compressive sensing for high fidelity patterning. Optics Express. 27: 32733-32745. PMID 31684480 DOI: 10.1364/OE.27.032733  0.405
2019 Li T, Liu Y, Sun Y, Li E, Wei P, Li Y. Multiple-field-point pupil wavefront optimization in computational lithography. Applied Optics. 58: 8331-8338. PMID 31674509 DOI: 10.1364/AO.58.008331  0.35
2019 Li T, Sun Y, Li E, Sheng N, Li Y, Wei P, Liu Y. Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field. Optics Express. 27: 15604-15616. PMID 31163755 DOI: 10.1364/OE.27.015604  0.353
2019 Sun Y, Sheng N, Li T, Li Y, Li E, Wei P. Fast nonlinear compressive sensing lithographic source and mask optimization method using Newton-IHTs algorithm. Optics Express. 27: 2754-2770. PMID 30732308 DOI: 10.1364/OE.27.002754  0.461
2019 Wei P, Li Y, Li T, Sheng N, Li E, Sun Y. Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty Applied Sciences. 9: 2151. DOI: 10.3390/APP9102151  0.447
2019 Sheng N, Li E, Sun Y, Li T, Li Y, Wei P, Liu L. Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization Applied Sciences. 9: 1275. DOI: 10.3390/APP9071275  0.315
2019 Ma X, Wang Z, Chen X, Li Y, Arce GR. Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography Ieee Transactions On Computational Imaging. 5: 120-135. DOI: 10.1109/Tci.2018.2880342  0.715
2018 Li E, Li Y, Sheng N, Li T, Sun Y, Wei P. A nonlinear measurement method of polarization aberration in immersion projection optics by spectrum analysis of aerial image. Optics Express. 26: 32743-32756. PMID 30645437 DOI: 10.1364/OE.26.032743  0.323
2018 Ma X, Wang Z, Li Y, Arce GR, Dong L, Garcia-Frias J. Fast optical proximity correction method based on nonlinear compressive sensing. Optics Express. 26: 14479-14498. PMID 29877485 DOI: 10.1364/Oe.26.014479  0.656
2018 Ma X, Wang Z, Lin H, Li Y, Arce GR, Zhang L. Optimization of lithography source illumination arrays using diffraction subspaces. Optics Express. 26: 3738-3755. PMID 29475354 DOI: 10.1364/Oe.26.003738  0.705
2017 Ma X, Zhao X, Wang Z, Li Y, Zhao S, Zhang L. Fast lithography aerial image calculation method based on machine learning. Applied Optics. 56: 6485-6495. PMID 29047938 DOI: 10.1364/Ao.56.006485  0.501
2017 Ma X, Lin H, Jiao G, Li Y, Arce GR. Fast lithographic source optimization using a batch-processing sequential least square estimator. Applied Optics. 56: 5903-5913. PMID 29047910 DOI: 10.1364/Ao.56.005903  0.691
2017 Ma X, Shi D, Wang Z, Li Y, Arce GR. Lithographic source optimization based on adaptive projection compressive sensing. Optics Express. 25: 7131-7149. PMID 28381053 DOI: 10.1364/Oe.25.007131  0.64
2017 Li T, Li Y. Lithographic Source and Mask Optimization With Low Aberration Sensitivity Ieee Transactions On Nanotechnology. 16: 1099-1105. DOI: 10.1109/TNANO.2017.2763169  0.309
2017 Ma X, Jiang S, Wang J, Wu B, Song Z, Li Y. A fast and manufacture-friendly optical proximity correction based on machine learning Microelectronic Engineering. 168: 15-26. DOI: 10.1016/J.Mee.2016.10.006  0.528
2015 Ma X, Wang J, Chen X, Li Y, Arce GR. Gradient-based inverse extreme ultraviolet lithography. Applied Optics. 54: 7284-300. PMID 26368764 DOI: 10.1364/Ao.54.007284  0.685
2015 Han C, Li Y, Ma X, Liu L. Robust hybrid source and mask optimization to lithography source blur and flare. Applied Optics. 54: 5291-302. PMID 26192826 DOI: 10.1364/Ao.54.005291  0.562
2015 Ma X, Dong L, Han C, Gao J, Li Y, Arce GR. Gradient-based joint source polarization mask optimization for optical lithography Journal of Micro/Nanolithography, Mems, and Moems. 14: 023504. DOI: 10.1117/1.Jmm.14.2.023504  0.693
2014 Han C, Li Y, Dong L, Ma X, Guo X. Inverse pupil wavefront optimization for immersion lithography. Applied Optics. 53: 6861-71. PMID 25322394 DOI: 10.1364/Ao.53.006861  0.617
2014 Song Z, Ma X, Gao J, Wang J, Li Y, Arce GR. Inverse lithography source optimization via compressive sensing. Optics Express. 22: 14180-98. PMID 24977516 DOI: 10.1364/Oe.22.014180  0.709
2014 Guo X, Li Y, Dong L, Liu L, Ma X, Han C. Parametric source-mask-numerical aperture co-optimization for immersion lithography Journal of Micro/Nanolithography, Mems, and Moems. 13: 043013. DOI: 10.1117/1.Jmm.13.4.043013  0.588
2014 Ma X, Wu B, Song Z, Jiang S, Li Y. Fast pixel-based optical proximity correction based on nonparametric kernel regression Journal of Micro/Nanolithography, Mems, and Moems. 13: 043007. DOI: 10.1117/1.Jmm.13.4.043007  0.522
2013 Li G, Li Y, Liu K, Ma X, Wang H. Improving wavefront reconstruction accuracy by using integration equations with higher-order truncation errors in the Southwell geometry. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 30: 1448-59. PMID 24323162 DOI: 10.1364/Josaa.30.001448  0.469
2013 Ma X, Han C, Li Y, Wu B, Song Z, Dong L, Arce GR. Hybrid source mask optimization for robust immersion lithography. Applied Optics. 52: 4200-11. PMID 23842161 DOI: 10.1364/Ao.52.004200  0.71
2013 Ma X, Song Z, Li Y, Arce GR. Block-based mask optimization for optical lithography. Applied Optics. 52: 3351-63. PMID 23669851 DOI: 10.1364/Ao.52.003351  0.719
2013 Ma X, Han C, Li Y, Dong L, Arce GR. Pixelated source and mask optimization for immersion lithography. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 30: 112-23. PMID 23456007 DOI: 10.1364/Josaa.30.000112  0.708
2012 Ma X, Li Y, Dong L. Mask optimization approaches in optical lithography based on a vector imaging model. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 29: 1300-12. PMID 22751396 DOI: 10.1364/Josaa.29.001300  0.626
2012 Ma X, Li Y, Guo X, Dong L, Arce GR. Vectorial mask optimization methods for robust optical lithography Journal of Micro/Nanolithography, Mems, and Moems. 11: 043008. DOI: 10.1117/1.Jmm.11.4.043008  0.698
2011 Ma X, Arce GR, Li Y. Optimal 3D phase-shifting masks in partially coherent illumination. Applied Optics. 50: 5567-76. PMID 22016227 DOI: 10.1364/Ao.50.005567  0.659
2006 Li Y, Arce G, Bacca J. Weighted Median Filters for Multichannel Signals Ieee Transactions On Signal Processing. 54: 4271-4281. DOI: 10.1109/Tsp.2006.881208  0.554
2004 Li Y, Arce GR. A maximum likelihood approach to least absolute deviation regression Eurasip Journal On Applied Signal Processing. 2004: 1762-1769. DOI: 10.1155/S1110865704401139  0.618
2004 Hoyos S, Li Y, Bacca J, Arce G. Weighted Median Filters Admitting Complex-Valued Weights and Their Optimization Ieee Transactions On Signal Processing. 52: 2776-2787. DOI: 10.1109/Tsp.2004.834342  0.681
2002 Arce GR, Li Y. Median power and median correlation theory Ieee Transactions On Signal Processing. 50: 2768-2776. DOI: 10.1109/Tsp.2002.804092  0.543
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