Year |
Citation |
Score |
2023 |
Zhang S, Ma X, Zhang J. Fast inverse lithography approach based on a model-driven graph convolutional network. Optics Express. 31: 36451-36467. PMID 38017798 DOI: 10.1364/OE.493178 |
0.408 |
|
2023 |
Li Z, Jing X, Dong L, Ma X, Wei Y. Fast diffraction model of an EUV mask based on asymmetric patch data fitting. Applied Optics. 62: 6561-6570. PMID 37706786 DOI: 10.1364/AO.499361 |
0.308 |
|
2023 |
Qiu Y, Zhao S, Ma X, Zhang T, Arce GR. Hyperspectral image reconstruction via patch attention driven network. Optics Express. 31: 20221-20236. PMID 37381421 DOI: 10.1364/OE.479549 |
0.557 |
|
2022 |
Pan Y, Ma X. Informatics-based computational lithography for phase-shifting mask optimization. Optics Express. 30: 21282-21294. PMID 36224851 DOI: 10.1364/OE.459095 |
0.381 |
|
2022 |
Li Z, Dong L, Jing X, Ma X, Wei Y. High-precision lithography thick-mask model based on a decomposition machine learning method. Optics Express. 30: 17680-17697. PMID 36221585 DOI: 10.1364/OE.454513 |
0.305 |
|
2022 |
Lin J, Dong L, Fan T, Ma X, Wei Y. Fast aerial image model for EUV lithography using the adjoint fully convolutional network. Optics Express. 30: 11944-11958. PMID 35473126 DOI: 10.1364/OE.452420 |
0.367 |
|
2022 |
Mao T, Ma X, Cuadros AP, Dai X, Wang Z, Zhang X, Zhu S, Zhu J, Arce GR. Static coded aperture in robotic X-ray tomography systems. Optics Express. 30: 7677-7693. PMID 35299524 DOI: 10.1364/OE.449505 |
0.545 |
|
2022 |
Zhao X, Ma X. Off-axis aberration correction for a reflective coded aperture snapshot spectral imager. Optics Letters. 47: 1202-1205. PMID 35230327 DOI: 10.1364/OL.439022 |
0.356 |
|
2022 |
Cuadros AP, Liu X, Parsons PE, Ma X, Arce GR. Experimental demonstration and optimization of X-ray StaticCodeCT. Applied Optics. 60: 9543-9552. PMID 34807098 DOI: 10.1364/AO.438727 |
0.537 |
|
2021 |
Zhang H, Ma X, Zhao X, Arce GR. Compressive hyperspectral image classification using a 3D coded convolutional neural network. Optics Express. 29: 32875-32891. PMID 34809110 DOI: 10.1364/OE.437717 |
0.565 |
|
2021 |
Wu R, Dong L, Ma X, Wei Y. Compensation of EUV lithography mask blank defect based on an advanced genetic algorithm. Optics Express. 29: 28872-28885. PMID 34615008 DOI: 10.1364/OE.434787 |
0.408 |
|
2021 |
Zhao Q, Ma X, Arce GR, Wang Z. Compressive X-ray tomosynthesis using model-driven deep learning. Optics Express. 29: 24576-24591. PMID 34614699 DOI: 10.1364/OE.433888 |
0.602 |
|
2021 |
Ma X, Xu H, Restrepo CM, Arce GR. Multi-objective optimization for structured illumination in dynamic x-ray tomosynthesis. Applied Optics. 60: 6177-6188. PMID 34613284 DOI: 10.1364/AO.428871 |
0.572 |
|
2021 |
Pan Y, Ma X, Zhang S, Garcia-Frias J, Arce GR. Efficient informatics-based source and mask optimization for optical lithography. Applied Optics. 60: 8307-8315. PMID 34612927 DOI: 10.1364/AO.433962 |
0.676 |
|
2021 |
Cuadros AP, Ma X, Restrepo CM, Arce GR. StaticCodeCT: single coded aperture tensorial X-ray CT. Optics Express. 29: 20558-20576. PMID 34266143 DOI: 10.1364/OE.427382 |
0.575 |
|
2021 |
Cuadros AP, Ma X, Restrepo CM, Arce GR. StaticCodeCT: single coded aperture tensorial X-ray CT. Optics Express. 29: 20558-20576. PMID 34266143 DOI: 10.1364/OE.427382 |
0.575 |
|
2021 |
Zhang T, Zhao S, Ma X, Cuadros AP, Zhao Q, Arce GR. Nonlinear reconstruction of coded spectral X-ray CT based on material decomposition. Optics Express. 29: 19319-19339. PMID 34266043 DOI: 10.1364/OE.426732 |
0.579 |
|
2021 |
Zhang T, Zhao S, Ma X, Cuadros AP, Zhao Q, Arce GR. Nonlinear reconstruction of coded spectral X-ray CT based on material decomposition. Optics Express. 29: 19319-19339. PMID 34266043 DOI: 10.1364/OE.426732 |
0.579 |
|
2021 |
Fang Z, Ma X, Restrepo C, Arce GR. Blue noise coding for a coherent x-ray diffraction imaging system. Applied Optics. 60: 2751-2760. PMID 33798148 DOI: 10.1364/AO.416226 |
0.585 |
|
2020 |
Zheng X, Ma X, Zhao Q, Pan Y, Arce GR. Model-informed deep learning for computational lithography with partially coherent illumination. Optics Express. 28: 39475-39491. PMID 33379496 DOI: 10.1364/OE.413721 |
0.596 |
|
2020 |
Zhao Q, Ma X, Cuadros A, Mao T, Arce GR. Single-snapshot X-ray imaging for nonlinear compressive tomosynthesis. Optics Express. 28: 29390-29407. PMID 33114840 DOI: 10.1364/Oe.392054 |
0.639 |
|
2020 |
Ma X, Zheng X, Arce GR. Fast inverse lithography based on dual-channel model-driven deep learning. Optics Express. 28: 20404-20421. PMID 32680101 DOI: 10.1364/Oe.396661 |
0.643 |
|
2020 |
Lin J, Dong L, Fan T, Ma X, Chen R, Wei Y. Fast extreme ultraviolet lithography mask near-field calculation method based on machine learning. Applied Optics. 59: 2829-2838. PMID 32225832 DOI: 10.1364/Ao.384407 |
0.376 |
|
2020 |
Zhang H, Ma X, Arce GR. Compressive spectral imaging approach using adaptive coded apertures. Applied Optics. 59: 1924-1938. PMID 32225709 DOI: 10.1364/Ao.382854 |
0.622 |
|
2020 |
Xu C, Xu T, Yan G, Ma X, Zhang Y, Wang X, Zhao F, Arce GR. Super-resolution compressive spectral imaging via two-tone adaptive coding: publisher’s note Photonics Research. 8: 892. DOI: 10.1364/Prj.395178 |
0.585 |
|
2020 |
Xu C, Xu T, Yan G, Ma X, Zhang Y, Wang X, Zhao F, Arce GR. Super-resolution compressive spectral imaging via two-tone adaptive coding Photonics Research. 8: 395. DOI: 10.1364/Prj.377665 |
0.643 |
|
2020 |
Wang Z, Ma X, Chen R, Zhang S, Arce GR. Fast Pixelated Lithographic Source and Mask Joint Optimization Based on Compressive Sensing Ieee Transactions On Computational Imaging. 6: 981-992. DOI: 10.1109/Tci.2020.3000010 |
0.594 |
|
2020 |
Zhang H, Ma X, Lau DL, Zhu J, Arce GR. Compressive Spectral Imaging Based on Hexagonal Blue Noise Coded Apertures Ieee Transactions On Computational Imaging. 6: 749-763. DOI: 10.1109/Tci.2020.2979373 |
0.631 |
|
2020 |
Mao T, Cuadros AP, Ma X, He W, Chen Q, Arce GR. Coded Aperture Optimization in X-Ray Tomography via Sparse Principal Component Analysis Ieee Transactions On Computational Imaging. 6: 73-86. DOI: 10.1109/Tci.2019.2919228 |
0.653 |
|
2019 |
Ma X, Wang Z, Zhu J, Zhang S, Arce GR, Zhao S. Nonlinear compressive inverse lithography aided by low-rank regularization. Optics Express. 27: 29992-30008. PMID 31684254 DOI: 10.1364/Oe.27.029992 |
0.673 |
|
2019 |
Lin J, Dong L, Fan T, Ma X, Wei Y, Ye T. Learning-based compressive sensing method for EUV lithographic source optimization. Optics Express. 27: 22563-22581. PMID 31510546 DOI: 10.1364/Oe.27.022563 |
0.547 |
|
2019 |
Cuadros A, Ma X, Arce GR. Compressive spectral X-ray tomography based on spatial and spectral coded illumination. Optics Express. 27: 10745-10764. PMID 31052928 DOI: 10.1364/Oe.27.010745 |
0.636 |
|
2019 |
Ma X, Deng X, Qi L, Jiang Y, Li H, Wang Y, Xing X. Fully convolutional network for rice seedling and weed image segmentation at the seedling stage in paddy fields. Plos One. 14: e0215676. PMID 30998770 DOI: 10.1371/journal.pone.0215676 |
0.308 |
|
2019 |
Ma X, Zhao Q, Cuadros A, Mao T, Arce GR. Source and coded aperture joint optimization for compressive X-ray tomosynthesis. Optics Express. 27: 6640-6659. PMID 30876245 DOI: 10.1364/Oe.27.006640 |
0.655 |
|
2019 |
Zhang Y, Wang X, Tan H, Xu C, Ma X, Xu T. Region Merging Method for Remote Sensing Spectral Image Aided by Inter-Segment and Boundary Homogeneities Remote Sensing. 11: 1414. DOI: 10.3390/Rs11121414 |
0.357 |
|
2019 |
Ma X, Wang Z, Chen X, Li Y, Arce GR. Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography Ieee Transactions On Computational Imaging. 5: 120-135. DOI: 10.1109/Tci.2018.2880342 |
0.785 |
|
2018 |
Ma X, Zhao Q, Zhang H, Wang Z, Arce GR. Model-driven convolution neural network for inverse lithography. Optics Express. 26: 32565-32584. PMID 30645421 DOI: 10.1364/Oe.26.032565 |
0.661 |
|
2018 |
Wang X, Zhang Y, Ma X, Xu T, Arce GR. Compressive spectral imaging system based on liquid crystal tunable filter. Optics Express. 26: 25226-25243. PMID 30469627 DOI: 10.1364/Oe.26.025226 |
0.631 |
|
2018 |
Mao T, Cuadros AP, Ma X, He W, Chen Q, Arce GR. Fast optimization of coded apertures in X-ray computed tomography. Optics Express. 26: 24461-24478. PMID 30469563 DOI: 10.1364/Oe.26.024461 |
0.66 |
|
2018 |
Wang Z, Ma X, Arce GR, Garcia-Frias J. Information theoretical approaches in computational lithography. Optics Express. 26: 16736-16751. PMID 30119496 DOI: 10.1364/Oe.26.016736 |
0.639 |
|
2018 |
Ma X, Wang Z, Li Y, Arce GR, Dong L, Garcia-Frias J. Fast optical proximity correction method based on nonlinear compressive sensing. Optics Express. 26: 14479-14498. PMID 29877485 DOI: 10.1364/Oe.26.014479 |
0.759 |
|
2018 |
Ma X, Wang Z, Lin H, Li Y, Arce GR, Zhang L. Optimization of lithography source illumination arrays using diffraction subspaces. Optics Express. 26: 3738-3755. PMID 29475354 DOI: 10.1364/Oe.26.003738 |
0.781 |
|
2017 |
Ma X, Zhao X, Wang Z, Li Y, Zhao S, Zhang L. Fast lithography aerial image calculation method based on machine learning. Applied Optics. 56: 6485-6495. PMID 29047938 DOI: 10.1364/Ao.56.006485 |
0.687 |
|
2017 |
Ma X, Lin H, Jiao G, Li Y, Arce GR. Fast lithographic source optimization using a batch-processing sequential least square estimator. Applied Optics. 56: 5903-5913. PMID 29047910 DOI: 10.1364/Ao.56.005903 |
0.772 |
|
2017 |
Galvis L, Lau D, Ma X, Arguello H, Arce GR. Coded aperture design in compressive spectral imaging based on side information. Applied Optics. 56: 6332-6340. PMID 29047832 DOI: 10.1364/Ao.56.006332 |
0.634 |
|
2017 |
Ma X, Shi D, Wang Z, Li Y, Arce GR. Lithographic source optimization based on adaptive projection compressive sensing. Optics Express. 25: 7131-7149. PMID 28381053 DOI: 10.1364/Oe.25.007131 |
0.744 |
|
2017 |
Ma X, Arce GR, Wang Z, Li Y, Zhao S, Zhang L. Compressive Position and Attitude Estimation Using Ground-Based Beacon Journal of Guidance, Control, and Dynamics. 40: 2630-2645. DOI: 10.2514/1.G002292 |
0.527 |
|
2017 |
Ma X, Zhang H, Wang Z, Li Y, Arce GR, Garcia-Frias J, Zhang L. Information theoretical aspects in coherent optical lithography systems Optics Express. 25: 29043. DOI: 10.1364/Oe.25.029043 |
0.601 |
|
2017 |
Ma X, Jiang S, Wang J, Wu B, Song Z, Li Y. A fast and manufacture-friendly optical proximity correction based on machine learning Microelectronic Engineering. 168: 15-26. DOI: 10.1016/J.Mee.2016.10.006 |
0.684 |
|
2015 |
Ma X, Wang J, Chen X, Li Y, Arce GR. Gradient-based inverse extreme ultraviolet lithography. Applied Optics. 54: 7284-300. PMID 26368764 DOI: 10.1364/Ao.54.007284 |
0.779 |
|
2015 |
Han C, Li Y, Ma X, Liu L. Robust hybrid source and mask optimization to lithography source blur and flare. Applied Optics. 54: 5291-302. PMID 26192826 DOI: 10.1364/Ao.54.005291 |
0.709 |
|
2015 |
Ma X, Gao J, Chen X, Dong L, Li Y. A fast and flexible library-based thick-mask near-field calculation method Proceedings of Spie. 9426. DOI: 10.1117/12.2085010 |
0.396 |
|
2015 |
Ma X, Dong L, Han C, Gao J, Li Y, Arce GR. Gradient-based joint source polarization mask optimization for optical lithography Journal of Micro/Nanolithography, Mems, and Moems. 14: 023504. DOI: 10.1117/1.Jmm.14.2.023504 |
0.77 |
|
2014 |
Han C, Li Y, Dong L, Ma X, Guo X. Inverse pupil wavefront optimization for immersion lithography. Applied Optics. 53: 6861-71. PMID 25322394 DOI: 10.1364/Ao.53.006861 |
0.734 |
|
2014 |
Song Z, Ma X, Gao J, Wang J, Li Y, Arce GR. Inverse lithography source optimization via compressive sensing. Optics Express. 22: 14180-98. PMID 24977516 DOI: 10.1364/Oe.22.014180 |
0.786 |
|
2014 |
Ma X, Gao J, Han C, Li Y, Dong L, Liu L. Efficient source polarization optimization for robust optical lithography Proceedings of Spie. 9052. DOI: 10.1117/12.2045724 |
0.53 |
|
2014 |
Guo X, Li Y, Dong L, Liu L, Ma X, Han C. Parametric source-mask-numerical aperture co-optimization for immersion lithography Journal of Micro/Nanolithography, Mems, and Moems. 13: 043013. DOI: 10.1117/1.Jmm.13.4.043013 |
0.714 |
|
2014 |
Ma X, Wu B, Song Z, Jiang S, Li Y. Fast pixel-based optical proximity correction based on nonparametric kernel regression Journal of Micro/Nanolithography, Mems, and Moems. 13: 043007. DOI: 10.1117/1.Jmm.13.4.043007 |
0.687 |
|
2013 |
Li G, Li Y, Liu K, Ma X, Wang H. Improving wavefront reconstruction accuracy by using integration equations with higher-order truncation errors in the Southwell geometry. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 30: 1448-59. PMID 24323162 DOI: 10.1364/Josaa.30.001448 |
0.658 |
|
2013 |
Ma X, Han C, Li Y, Wu B, Song Z, Dong L, Arce GR. Hybrid source mask optimization for robust immersion lithography. Applied Optics. 52: 4200-11. PMID 23842161 DOI: 10.1364/Ao.52.004200 |
0.783 |
|
2013 |
Ma X, Song Z, Li Y, Arce GR. Block-based mask optimization for optical lithography. Applied Optics. 52: 3351-63. PMID 23669851 DOI: 10.1364/Ao.52.003351 |
0.787 |
|
2013 |
Ma X, Han C, Li Y, Dong L, Arce GR. Pixelated source and mask optimization for immersion lithography. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 30: 112-23. PMID 23456007 DOI: 10.1364/Josaa.30.000112 |
0.787 |
|
2012 |
Ma X, Li Y, Dong L. Mask optimization approaches in optical lithography based on a vector imaging model. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 29: 1300-12. PMID 22751396 DOI: 10.1364/Josaa.29.001300 |
0.749 |
|
2012 |
Ma X, Li Y, Guo X, Dong L. Robust resolution enhancement optimization methods to process variations based on vector imaging model Proceedings of Spie. 8326. DOI: 10.1117/12.916147 |
0.556 |
|
2012 |
Ma X, Li Y, Dong L. Gradient-based resolution enhancement optimization methods based on vector imaging model Proceedings of Spie. 8326. DOI: 10.1117/12.916144 |
0.575 |
|
2012 |
Ma X, Li Y, Guo X, Dong L, Arce GR. Vectorial mask optimization methods for robust optical lithography Journal of Micro/Nanolithography, Mems, and Moems. 11: 043008. DOI: 10.1117/1.Jmm.11.4.043008 |
0.774 |
|
2011 |
Ma X, Arce GR, Li Y. Optimal 3D phase-shifting masks in partially coherent illumination. Applied Optics. 50: 5567-76. PMID 22016227 DOI: 10.1364/Ao.50.005567 |
0.753 |
|
2011 |
Ma X, Arce GR. Pixel-based OPC optimization based on conjugate gradients. Optics Express. 19: 2165-80. PMID 21369034 DOI: 10.1364/Oe.19.002165 |
0.701 |
|
2010 |
Ma X, Arce GR. Binary mask optimization for forward lithography based on boundary layer model in coherent systems: erratum. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 27: 82-4. PMID 20035306 DOI: 10.1364/Josaa.27.000082 |
0.564 |
|
2009 |
Ma X, Arce GR. Binary mask optimization for forward lithography based on the boundary layer model in coherent systems. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 26: 1687-95. PMID 19568305 DOI: 10.1364/Josaa.26.001687 |
0.655 |
|
2009 |
Ma X, Arce GR. Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography. Optics Express. 17: 5783-93. PMID 19333347 DOI: 10.1364/Oe.17.005783 |
0.681 |
|
2008 |
Ma X, Arce G. Binary mask optimization for inverse lithography with partially coherent illumination. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 25: 2960-70. PMID 19037387 DOI: 10.1364/Josaa.25.002960 |
0.65 |
|
2008 |
Ma X, Arce GR. PSM design for inverse lithography with partially coherent illumination. Optics Express. 16: 20126-41. PMID 19030098 DOI: 10.1364/Oe.16.020126 |
0.672 |
|
2007 |
Ma X, Arce GR. Generalized inverse lithography methods for phase-shifting mask design. Optics Express. 15: 15066-79. PMID 19550790 DOI: 10.1364/Oe.15.015066 |
0.63 |
|
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