Year |
Citation |
Score |
2020 |
Kim H, Hopwood J. Tunable millimeter wave photonic crystal for limiting high power pulses using weakly ionized steady state plasma Journal of Applied Physics. 128: 93302. DOI: 10.1063/5.0018252 |
0.492 |
|
2019 |
Kim H, Hopwood J. Wave Propagation in Composites of Plasma and Metamaterials with Negative Permittivity and Permeability. Scientific Reports. 9: 3024. PMID 30816256 DOI: 10.1038/S41598-019-39923-7 |
0.417 |
|
2019 |
Fantini L, Dennison S, Kim H, Sarkarat M, Lanagan M, Hopwood J. Plasma reconfigurable metamaterial using a 6.5 GHz dielectric resonator array Journal of Applied Physics. 126: 203301. DOI: 10.1063/1.5121222 |
0.494 |
|
2019 |
Kim H, Hopwood J. Scalable microplasma array for argon metastable lasing medium Journal of Applied Physics. 126: 163301. DOI: 10.1063/1.5119511 |
0.378 |
|
2018 |
Kim H, Hopwood J. Plasma-enhanced metamaterials using microwave radiative power transfer Plasma Sources Science and Technology. 27: 95007. DOI: 10.1088/1361-6595/Aadb64 |
0.439 |
|
2018 |
Kim H, Parsons S, Hopwood J. Spatially adjustable microplasma generation in proto-metamaterials using microwave radiative power transfer Plasma Sources Science and Technology. 27: 15010. DOI: 10.1088/1361-6595/Aaa2Ee |
0.516 |
|
2017 |
Parsons SG, Hopwood J. Millimeter Wave Plasma Formation Within a 2D Photonic Crystal Ieee Electron Device Letters. 38: 1602-1605. DOI: 10.1109/Led.2017.2750486 |
0.453 |
|
2017 |
Parsons S, Gregório J, Hopwood J. Microwave plasma formation within a 2D photonic crystal Plasma Sources Science and Technology. 26: 55002. DOI: 10.1088/1361-6595/Aa62Ed |
0.509 |
|
2017 |
Gregório J, Parsons S, Hopwood J. Reconfigurable photonic crystal using self-initiated gas breakdown Plasma Sources Science and Technology. 26. DOI: 10.1088/1361-6595/26/2/02Lt03 |
0.43 |
|
2017 |
Hoskinson AR, Gregório J, Hopwood J, Galbally-Kinney KL, Davis SJ, Rawlins WT. Spatially resolved modeling and measurements of metastable argon atoms in argon-helium microplasmas Journal of Applied Physics. 121: 153302. DOI: 10.1063/1.4981922 |
0.538 |
|
2016 |
Hoskinson AR, Parsons S, Hopwood J. Gas breakdown and plasma impedance in split-ring resonators European Physical Journal D. 70. DOI: 10.1140/Epjd/E2016-60445-X |
0.527 |
|
2016 |
Dennison S, Chapman A, Luo W, Lanagan M, Hopwood J. Plasma generation by dielectric resonator arrays Plasma Sources Science and Technology. 25. DOI: 10.1088/0963-0252/25/3/03Lt02 |
0.466 |
|
2016 |
Gregório J, Parsons S, Hopwood J. Microwave harmonic generation and nonlinearity in microplasmas Plasma Sources Science and Technology. 25: 35018. DOI: 10.1088/0963-0252/25/3/035018 |
0.388 |
|
2016 |
Hoskinson AR, Gregorío J, Hopwood J, Galbally-Kinney K, Davis SJ, Rawlins WT. Argon metastable production in argon-helium microplasmas Journal of Applied Physics. 119. DOI: 10.1063/1.4954077 |
0.445 |
|
2015 |
Rawlins WT, Galbally-Kinney KL, Davis SJ, Hoskinson AR, Hopwood JA, Heaven MC. Optically pumped microplasma rare gas laser. Optics Express. 23: 4804-13. PMID 25836515 DOI: 10.1364/Oe.23.004804 |
0.365 |
|
2015 |
Hoskinson AR, Yared A, Hopwood J. Gas heating and plasma expansion in pulsed microwave-excited microplasmas Plasma Sources Science and Technology. 24. DOI: 10.1088/0963-0252/24/5/055002 |
0.471 |
|
2015 |
Gregório J, Hoskinson AR, Hopwood J. Modeling of microplasmas from GHz to THz Journal of Applied Physics. 118. DOI: 10.1063/1.4928468 |
0.498 |
|
2015 |
Hoskinson AR, Gregório J, Parsons S, Hopwood J. Electron confinement and heating in microwave-sustained argon microplasmas Journal of Applied Physics. 117. DOI: 10.1063/1.4919416 |
0.46 |
|
2014 |
Singh PK, Hopwood J, Sonkusale S. Metamaterials for remote generation of spatially controllable two dimensional array of microplasma. Scientific Reports. 4: 5964. PMID 25098976 DOI: 10.1038/Srep05964 |
0.401 |
|
2014 |
Rawlins WT, Galbally-Kinney KL, Davis SJ, Hoskinson AR, Hopwood JA. Laser excitation dynamics of argon metastables generated in atmospheric pressure flows by microwave frequency microplasma arrays Proceedings of Spie - the International Society For Optical Engineering. 8962. DOI: 10.1117/12.2040083 |
0.399 |
|
2014 |
Wu C, Hopwood J. Investigation of instabilities in microstrip-sustained microplasma Ieee Transactions On Plasma Science. 42: 1629-1635. DOI: 10.1109/Tps.2014.2320410 |
0.556 |
|
2014 |
Hopwood J, Hoskinson AR, Gregório J. Microplasmas ignited and sustained by microwaves Plasma Sources Science and Technology. 23. DOI: 10.1088/0963-0252/23/6/064002 |
0.535 |
|
2014 |
Hoskinson AR, Hopwood J. Spatially resolved spectroscopy and electrical characterization of microplasmas and switchable microplasma arrays Plasma Sources Science and Technology. 23. DOI: 10.1088/0963-0252/23/1/015024 |
0.516 |
|
2014 |
Thejaswini HC, Hoskinson AR, Agasanapura B, Grunde M, Hopwood J. Deposition and characterization of diamond-like carbon films by microwave resonator microplasma at one atmosphere Diamond and Related Materials. 48: 24-31. DOI: 10.1016/J.Diamond.2014.06.004 |
0.35 |
|
2013 |
Hoskinson AR, Singh PK, Sonkusale S, Hopwood J. Low-voltage switchable microplasma arrays generated using microwave resonators Ieee Electron Device Letters. 34: 804-806. DOI: 10.1109/Led.2013.2257659 |
0.4 |
|
2013 |
Monfared SK, Hoskinson AR, Hopwood J. Time-resolved microplasma electron dynamics in a pulsed microwave discharge Journal of Physics D: Applied Physics. 46. DOI: 10.1088/0022-3727/46/42/425201 |
0.371 |
|
2013 |
Narayanamoorthy J, Tsioris K, Omenetto FG, Hopwood J. Plasma etching of silk fibroin: Experiments and models Plasma Processes and Polymers. 10: 451-458. DOI: 10.1002/Ppap.201200082 |
0.417 |
|
2012 |
Hoskinson AR, Hopwood J. A two-dimensional array of microplasmas generated using microwave resonators Plasma Sources Science and Technology. 21. DOI: 10.1088/0963-0252/21/5/052002 |
0.421 |
|
2011 |
Wu C, Hoskinson AR, Hopwood J. Stable linear plasma arrays at atmospheric pressure Plasma Sources Science and Technology. 20. DOI: 10.1088/0963-0252/20/4/045022 |
0.578 |
|
2011 |
Miura N, Hopwood J. Internal structure of 0.9 GHz microplasma Journal of Applied Physics. 109. DOI: 10.1063/1.3592269 |
0.631 |
|
2011 |
Miura N, Hopwood J. Spatially resolved argon microplasma diagnostics by diode laser absorption Journal of Applied Physics. 109. DOI: 10.1063/1.3531557 |
0.59 |
|
2011 |
Hoskinson AR, Hopwood J, Bostrom NW, Crank JA, Harrison C. Low-power microwave-generated helium microplasma for molecular and atomic spectrometry Journal of Analytical Atomic Spectrometry. 26: 1258-1264. DOI: 10.1039/C0Ja00239A |
0.475 |
|
2010 |
Wu C, Zhang ZB, Hoskinson A, Hopwood J. Circular array of stable atmospheric pressure microplasmas European Physical Journal D. 60: 621-625. DOI: 10.1140/Epjd/E2010-00211-8 |
0.566 |
|
2010 |
Miura N, Xue J, Hopwood JA. Argon microplasma diagnostics by diode laser absorption Ieee Transactions On Plasma Science. 38: 2458-2464. DOI: 10.1109/Tps.2010.2053854 |
0.638 |
|
2009 |
Miura N, Hopwood J. Metastable helium density probe for remote plasmas. The Review of Scientific Instruments. 80: 113502. PMID 19947726 DOI: 10.1063/1.3258198 |
0.614 |
|
2009 |
Xue J, Hopwood JA. Microwave-Frequency Effects on Microplasma Ieee Transactions On Plasma Science. 37: 816-822. DOI: 10.1109/Tps.2009.2015453 |
0.565 |
|
2009 |
Zhang Z, Hopwood J. Linear arrays of stable atmospheric pressure microplasmas Applied Physics Letters. 95: 161502. DOI: 10.1063/1.3251793 |
0.441 |
|
2007 |
Xue J, Hopwood JA. Microplasma Trapping of Particles Ieee Transactions On Plasma Science. 35: 1574-1579. DOI: 10.1109/Tps.2007.905210 |
0.499 |
|
2007 |
Mao D, Wang LP, Hopwood J. On-wafer tunable deposition rates using ionized physical vapor deposition Plasma Processes and Polymers. 4: 19-26. DOI: 10.1002/Ppap.200600073 |
0.404 |
|
2005 |
Iza F, Hopwood JA. Self-organized filaments, striations and other nonuniformities in nonthermal atmospheric microwave excited microdischarges Ieee Transactions On Plasma Science. 33: 306-307. DOI: 10.1109/Tps.2005.845139 |
0.341 |
|
2005 |
Iza F, Hopwood JA. Split-ring resonator microplasma: microwave model, plasma impedance and power efficiency Plasma Sources Science and Technology. 14: 397-406. DOI: 10.1088/0963-0252/14/2/023 |
0.448 |
|
2005 |
Hopwood J, Iza F, Coy S, Fenner DB. A microfabricated atmospheric-pressure microplasma source operating in air Journal of Physics D: Applied Physics. 38: 1698-1703. DOI: 10.1088/0022-3727/38/11/009 |
0.469 |
|
2004 |
Yang X, Hopwood JA. Physical mechanisms for anisotropic plasma etching of cesium iodide Journal of Applied Physics. 96: 4800-4806. DOI: 10.1063/1.1803607 |
0.403 |
|
2004 |
Mao D, Hopwood J. Ionized physical vapor deposition of titanium nitride: A deposition model Journal of Applied Physics. 96: 820-828. DOI: 10.1063/1.1753663 |
0.304 |
|
2004 |
Hopwood JA, Iza F. Ultrahigh frequency microplasmas from 1 pascal to 1 atmosphere Journal of Analytical Atomic Spectrometry. 19: 1145-1150. DOI: 10.1039/B403425B |
0.477 |
|
2003 |
Hopwood J, Mantei TD. Application-driven development of plasma source technology Journal of Vacuum Science and Technology. 21. DOI: 10.1116/1.1600448 |
0.499 |
|
2003 |
Iza F, Hopwood JA. Low-power microwave plasma source based on a microstrip split-ring resonator Ieee Transactions On Plasma Science. 31: 782-787. DOI: 10.1109/Tps.2003.815470 |
0.48 |
|
2003 |
Minayeva OB, Hopwood J. Langmuir probe diagnostics of a microfabricated inductively coupled plasma on a chip Journal of Applied Physics. 94: 2821-2828. DOI: 10.1063/1.1597976 |
0.548 |
|
2003 |
Minayeva OB, Hopwood JA. Microfabricated inductively coupled plasma-on-a-chip for molecular SO2 detection: a comparison between global model and optical emission spectrometry Journal of Analytical Atomic Spectrometry. 18: 856-863. DOI: 10.1039/B303821A |
0.5 |
|
2002 |
Mao D, Tao K, Hopwood J. Ionized physical vapor deposition of titanium nitride: Plasma and film characterization Journal of Vacuum Science and Technology, Part a: Vacuum, Surfaces and Films. 20: 379-387. DOI: 10.1116/1.1446448 |
0.415 |
|
2002 |
Yang X, Hopwood J, Tipnis S, Nagarkar V, Gaysinskiy V. Plasma etching of cesium iodide Journal of Vacuum Science and Technology. 20: 132-137. DOI: 10.1116/1.1426363 |
0.389 |
|
2002 |
Iza F, Hopwood JA. Influence of operating frequency and coupling coefficient on the efficiency of microfabricated inductively coupled plasma sources Plasma Sources Science and Technology. 11: 229-235. DOI: 10.1088/0963-0252/11/3/301 |
0.483 |
|
2002 |
Tao K, Mao D, Hopwood J. Ionized physical vapor deposition of titanium nitride: A global plasma model Journal of Applied Physics. 91: 4040-4048. DOI: 10.1063/1.1455139 |
0.45 |
|
2002 |
Minayeva OB, Hopwood JA. Emission spectroscopy using a microfabricated inductively coupled plasma-on-a-chip Journal of Analytical Atomic Spectrometry. 17: 1103-1107. DOI: 10.1039/B202121H |
0.507 |
|
2000 |
Hopwood J, Minayeva O, Yin Y. Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator Journal of Vacuum Science & Technology B. 18: 2446-2451. DOI: 10.1116/1.1288945 |
0.556 |
|
2000 |
Hopwood JA. A microfabricated inductively coupled plasma generator Ieee\/Asme Journal of Microelectromechanical Systems. 9: 309-313. DOI: 10.1109/84.870056 |
0.55 |
|
2000 |
Hopwood JA. The role of ionized physical vapor deposition in integrated circuit fabrication Thin Films. 27: 1-7. DOI: 10.1016/S1079-4050(00)80003-4 |
0.335 |
|
1999 |
Zhong G, Hopwood J. Ionized titanium deposition into high aspect ratio vias and trenches Journal of Vacuum Science & Technology B. 17: 405-409. DOI: 10.1116/1.590569 |
0.5 |
|
1999 |
Yin Y, Messier J, Hopwood JA. Miniaturization of inductively coupled plasma sources Ieee Transactions On Plasma Science. 27: 1516-1524. DOI: 10.1109/27.799834 |
0.491 |
|
1998 |
Dickson M, Zhong G, Hopwood J. Radial uniformity of an external-coil ionized physical vapor deposition source Journal of Vacuum Science & Technology B. 16: 523-531. DOI: 10.1116/1.589856 |
0.463 |
|
1998 |
Hopwood J. Ionized physical vapor deposition of integrated circuit interconnects Physics of Plasmas. 5: 1624-1631. DOI: 10.1063/1.872829 |
0.301 |
|
1997 |
Dickson M, Hopwood J. Axially-resolved study of highly ionized physical vapor deposition Journal of Vacuum Science and Technology. 15: 2307-2312. DOI: 10.1116/1.580739 |
0.428 |
|
1997 |
Dickson M, Qian F, Hopwood J. Quenching of electron temperature and electron density in ionized physical vapor deposition Journal of Vacuum Science and Technology. 15: 340-344. DOI: 10.1116/1.580489 |
0.411 |
|
1996 |
Forgotson N, Khemka V, Hopwood J. Inductively coupled plasma for polymer etching of 200 mm wafers Journal of Vacuum Science & Technology B. 14: 732-737. DOI: 10.1116/1.588706 |
0.503 |
|
1995 |
Hopwood J, Qian F. Mechanisms for highly ionized magnetron sputtering Journal of Applied Physics. 78: 758-765. DOI: 10.1063/1.360334 |
0.477 |
|
1994 |
Rossnagel SM, Hopwood J. Metal ion deposition from ionized mangetron sputtering discharge Journal of Vacuum Science & Technology B. 12: 449-453. DOI: 10.1116/1.587142 |
0.452 |
|
1994 |
Hopwood J. Planar RF induction plasma coupling efficiency Plasma Sources Science and Technology. 3: 460-464. DOI: 10.1088/0963-0252/3/4/002 |
0.436 |
|
1993 |
Hopwood J, Guarnieri CR, Whitehair SJ, Cuomo JJ. Langmuir probe measurements of a radio frequency induction plasma Journal of Vacuum Science and Technology. 11: 152-156. DOI: 10.1116/1.578282 |
0.519 |
|
1993 |
Hopwood J, Guarnieri CR, Whitehair SJ, Cuomo JJ. Electromagnetic fields in a radio‐frequency induction plasma Journal of Vacuum Science and Technology. 11: 147-151. DOI: 10.1116/1.578281 |
0.381 |
|
1993 |
Rossnagel SM, Hopwood J. Magnetron sputter deposition with high levels of metal ionization Applied Physics Letters. 63: 3285-3287. DOI: 10.1063/1.110176 |
0.463 |
|
1993 |
Hopwood J. Ion bombardment energy distributions in a radio frequency induction plasma Applied Physics Letters. 62: 940-942. DOI: 10.1063/1.108526 |
0.451 |
|
1992 |
Hopwood J. Review of inductively coupled plasmas for plasma processing Plasma Sources Science and Technology. 1: 109-116. DOI: 10.1088/0963-0252/1/2/006 |
0.509 |
|
1991 |
Hopwood J, Asmussen J. Neutral gas temperatures in a multipolar electron cyclotron resonance plasma Applied Physics Letters. 58: 2473-2475. DOI: 10.1063/1.105232 |
0.489 |
|
1990 |
Hopwood J, Waaner R, Reinhard DK, Asmussen J. Electric fields in a microwave-cavity electron-cyclotron-resonant plasma source Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 8: 2904-2908. DOI: 10.1116/1.576647 |
0.486 |
|
1990 |
Hopwood J, Reinhard DK, Asmussen J. Charged particle densities and energy distributions in a multipolar electron cyclotron resonant plasma etching source Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 8: 3103-3112. DOI: 10.1116/1.576592 |
0.473 |
|
1990 |
Asmussen J, Hopwood J, Sze FC. A 915 MHz/2.45 GHz ECR plasma source for large area ion beam and plasma processing Review of Scientific Instruments. 61: 250-252. DOI: 10.1063/1.1141310 |
0.451 |
|
1988 |
Hopwood J, Reinhard DK, Asmussen J. Experimental conditions for uniform anisotropic etching of silicon with a microwave electron cyclotron resonance plasma system Journal of Vacuum Science & Technology B. 6: 1896-1899. DOI: 10.1116/1.584197 |
0.494 |
|
1988 |
Hopwood J, Dahimene M, Reinhard DK, Asmussen J. Plasma etching with a microwave cavity plasma disk source Journal of Vacuum Science & Technology B. 6: 268-271. DOI: 10.1116/1.584020 |
0.502 |
|
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