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Jeffrey B. Fortin, Ph.D. - Publications

Affiliations: 
2001 Rensselaer Polytechnic Institute, Troy, NY, United States 
 2014- Pennsylvania State University, State College, PA, United States 
Area:
Materials Science Engineering, Polymer Chemistry
Website:
https://www.research.psu.edu/node/146
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7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2003 Senkevich JJ, Wang B, Fortin JB, Nielsen MC, McDonald JF, Lu TM, Nuesca GM, Peterson GG, Selbrede SC, Weise MT. Stability of fluorinated parylenes to oxygen reactive-ion etching under aluminum, aluminum oxide, and tantalum nitride overlayers Journal of Electronic Materials. 32: 925-931.  0.361
2002 Fortin JB, Lu TM. A model for the chemical vapor deposition of poly(para-xylylene) (parylene) thin films Chemistry of Materials. 14: 1945-1949. DOI: 10.1021/cm010454a  0.429
2001 Li M, Fortin J, Kim JY, Fox G, Chu F, Davenport T, Lu T, Zhang X. Dielectric constant measurement of thin films using goniometric terahertz time-domain spectroscopy Ieee Journal of Selected Topics in Quantum Electronics. 7: 624-629. DOI: 10.1109/2944.974234  0.393
2001 Fortin JB, Lu TM. Ultraviolet radiation induced degradation of poly-para-xylylene (parylene) thin films Thin Solid Films. 397: 223-228. DOI: 10.1016/S0040-6090(01)01355-4  0.353
2001 Kumar A, Bakhru H, Fortin JB, Yang GR, Lu TM, Jin C, Lee WW. Thermal stability of xerogel films Thin Solid Films. 396: 5-8. DOI: 10.1016/S0040-6090(01)01161-0  0.404
2000 Zhao YP, Fortin JB, Bonvallet G, Wang GC, Lu TM. Kinetic roughening in polymer film growth by vapor deposition. Physical Review Letters. 85: 3229-32. PMID 11019308 DOI: 10.1103/PhysRevLett.85.3229  0.452
2000 Fortin JB, Lu TM. Mass spectrometry study during the vapor deposition of poly-para-xylylene thin films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 2459-2465. DOI: 10.1116/1.1289773  0.315
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