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Ravi Saxena, Ph.D. - Publications

Affiliations: 
2005 Rensselaer Polytechnic Institute, Troy, NY, United States 
Area:
Chemical Engineering, Materials Science Engineering, Electronics and Electrical Engineering
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13 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2006 Saxena R, Frederick MJ, Ramanath G, Gill WN, Plawsky JL. Erratum: Kinetics of voiding and agglomeration of copper nanolayers on silica [Phys. Rev. B72, 115425 (2005)] Physical Review B. 74. DOI: 10.1103/Physrevb.74.079901  0.527
2005 Cho W, Saxena R, Rodriguez O, Ojha M, Achanta R, Plawsky JL, Gill WN. Polymer penetration and pore sealing in nanoporous silica by CHF 3 plasma exposure Journal of the Electrochemical Society. 152. DOI: 10.1149/1.1901664  0.716
2005 Cho W, Rodriguez O, Saxena R, Ojha M, Achanta R, Plawsky JL, Gill WN. A model for the etching of nanoporous silica in C4F8 plasmas based on pore geometry and porosity effects Journal of the Electrochemical Society. 152. DOI: 10.1149/1.1850375  0.722
2005 Saxena R, Frederick MJ, Ramanath G, Gill WN, Plawsky JL. Kinetics of voiding and agglomeration of copper nanolayers on silica Physical Review B - Condensed Matter and Materials Physics. 72. DOI: 10.1103/Physrevb.72.115425  0.662
2005 Rodriguez OR, Cho W, Saxena R, Plawsky JL, Gill WN. Mechanism of Cu diffusion in porous low- κ dielectrics Journal of Applied Physics. 98. DOI: 10.1063/1.1954869  0.67
2005 Rodriguez O, Saxena R, Cho W, Plawsky JL, Gill WN. Diffusion of Copper in Nanoporous Dielectric Films Industrial & Engineering Chemistry Research. 44: 1220-1225. DOI: 10.1021/Ie049554R  0.652
2004 Rodriguez O, Cho W, Saxena R, Achanta R, Gill WN, Plawsky OL. Effect of Surface Chemistry on the diffusion of Copper in nanoporous dielectrics Mrs Proceedings. 812. DOI: 10.1557/Proc-812-F6.8  0.705
2004 Cho W, Saxena R, Rodriguez O, Achanta R, Ojha M, Plawsky JL, Gill WN, Baklanov MR. Modification of Nanoporous Silica Structures by Fluorocarbon Plasma Treatment Mrs Proceedings. 812. DOI: 10.1557/Proc-812-F6.7  0.743
2004 Saxena R, Cho W, Rodriguez O, Gill WN, Plawsky JL. Barrier Layer Morphological Stability and Adhesion to Porous Low-κ Dielectrics Mrs Proceedings. 812. DOI: 10.1557/Proc-812-F3.12  0.56
2004 Saxena R, Thakurta DG, Gutmann RJ, Gill WN. A feature scale model for chemical mechanical planarization of damascene structures Thin Solid Films. 449: 192-206. DOI: 10.1016/J.Tsf.2003.10.078  0.345
2004 Saxena R, Cho W, Rodriguez O, Gill WN, Plawsky JL. Stability of thin copper films on mesoporous dielectrics Journal of Non-Crystalline Solids. 350: 14-22. DOI: 10.1016/J.Jnoncrysol.2004.08.229  0.708
2004 Saxena R, Rodriguez O, Cho W, Gill WN, Plawsky JL, Baklanov MR, Mogilnikov KP. Internal matrix structure of low-κ mesoporous silica and its relation to mechanical properties Journal of Non-Crystalline Solids. 349: 189-199. DOI: 10.1016/J.Jnoncrysol.2004.08.185  0.711
2004 Cho W, Saxena R, Rodriguez O, Achanta R, Plawsky JL, Gill WN. Effects of sintering on dielectric constants of mesoporous silica Journal of Non-Crystalline Solids. 350: 336-344. DOI: 10.1016/J.Jnoncrysol.2004.07.084  0.748
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