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Michael David Henry - Publications

Affiliations: 
2010 Applied Physics California Institute of Technology, Pasadena, CA 
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13 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Henry MD, Douglas EA. Chemical downstream etching of Ge, Si, and SiNx films Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 34. DOI: 10.1116/1.4961944  0.357
2014 Henry MD, Wolfley S, Monson T, Lewis R. Ga lithography in sputtered niobium for superconductive micro and nanowires Applied Physics Letters. 105. DOI: 10.1063/1.4893446  0.349
2013 Walavalkar SS, Homyk AP, Henry MD, Scherer A. Three-dimensional etching of silicon for the fabrication of low-dimensional and suspended devices. Nanoscale. 5: 927-31. PMID 23292113 DOI: 10.1039/C2Nr32981F  0.754
2012 Welch CC, Olynick DL, Liu Z, Holmberg A, Peroz C, Robinson APG, Henry MD, Scherer A, Mollenhauer T, Genova V, Ng DKT. Formation of nanoscale structures by inductively coupled plasma etching Proceedings of Spie - the International Society For Optical Engineering. 8700. DOI: 10.1117/12.2017609  0.427
2011 Walavalkar SS, Homyk AP, Hofmann CE, Henry MD, Shin C, Atwater HA, Scherer A. Size tunable visible and near-infrared photoluminescence from vertically etched silicon quantum dots Applied Physics Letters. 98. DOI: 10.1063/1.3580768  0.723
2010 Walavalkar SS, Hofmann CE, Homyk AP, Henry MD, Atwater HA, Scherer A. Tunable visible and near-IR emission from sub-10 nm etched single-crystal Si nanopillars. Nano Letters. 10: 4423-8. PMID 20919695 DOI: 10.1021/Nl102140K  0.747
2010 Henry MD, Shearn MJ, Chhim B, Scherer A. Ga(+) beam lithography for nanoscale silicon reactive ion etching. Nanotechnology. 21: 245303. PMID 20484788 DOI: 10.1088/0957-4484/21/24/245303  0.745
2010 Henry MD, Shearn M, Scherer A. Ga+ beam lithography for suspended lateral beams and nanowires Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6F26-C6F30. DOI: 10.1116/1.3497013  0.745
2010 Walavalkar SS, Homyk AP, Henry MD, Scherer A. Controllable deformation of silicon nanowires with strain up to 24% Journal of Applied Physics. 107. DOI: 10.1063/1.3436589  0.727
2009 Henry MD, Walavalkar S, Homyk A, Scherer A. Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars. Nanotechnology. 20: 255305. PMID 19487807 DOI: 10.1088/0957-4484/20/25/255305  0.744
2009 Henry MD, Welch C, Scherer A. Techniques of cryogenic reactive ion etching in silicon for fabrication of sensors Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 27: 1211-1216. DOI: 10.1116/1.3196790  0.594
2008 Kayes BM, Filler MA, Henry MD, Maiolo JR, Kelzenberg MD, Putnam MC, Spurgeon JM, Plass KE, Scherer A, Lewis NS, Atwater HA. Radial PN junction, wire array solar cells Conference Record of the Ieee Photovoltaic Specialists Conference. DOI: 10.1109/PVSC.2008.4922460  0.41
2007 Borselli M, Johnson TJ, Michael CP, Henry MD, Painter O. Surface encapsulation for low-loss silicon photonics Applied Physics Letters. 91. DOI: 10.1063/1.2793820  0.585
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