| Year |
Citation |
Score |
| 2012 |
Orloff J. Gertrude Rempfer and the development of high resolution focused ion beam technology. Ultramicroscopy. 119: 5-8. PMID 22079381 DOI: 10.1016/J.Ultramic.2011.10.002 |
0.45 |
|
| 2010 |
Orloff J. Measuring the beam size of a focused ion beam (FIB) system Proceedings of Spie - the International Society For Optical Engineering. 7729. DOI: 10.1117/12.853027 |
0.412 |
|
| 2008 |
Hanssen JL, Hill SB, Orloff J, McClelland JJ. Magneto-optical-trap-based, high brightness ion source for use as a nanoscale probe. Nano Letters. 8: 2844-50. PMID 18715041 DOI: 10.1021/nl801472n |
0.45 |
|
| 2005 |
Liu X, Orloff J. Analytical model of a gas phase field ionization source Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2816-2820. DOI: 10.1116/1.2127946 |
0.533 |
|
| 2005 |
Guharay SK, Orloff J, Wada M. Ion beams and their applications in high-resolution probe formation Ieee Transactions On Plasma Science. 33: 1911-1930. DOI: 10.1109/TPS.2005.860086 |
0.471 |
|
| 2005 |
Liu X, Orloff J. A study of optical properties of gas phase field ionization sources Advances in Imaging and Electron Physics. 138: 147-175. DOI: 10.1016/S1076-5670(05)38003-7 |
0.368 |
|
| 2004 |
Hodzic V, Orloff J, Davis CC. Periodic structures on biconically tapered optical fibers using ion beam milling and boron implantation Journal of Lightwave Technology. 22: 1610-1614. DOI: 10.1109/Jlt.2004.828213 |
0.397 |
|
| 2004 |
Orloff J. Correction of Spherical Aberration in a Focused Ion Beam System by Means of Space Charge Microscopy and Microanalysis. 10: 26-27. DOI: 10.1017/S1431927604555666 |
0.495 |
|
| 2003 |
Stanishevsky A, Edinger K, Orloff J, Melngailis J, Stewart D, Williams A, Clark R. Testing new chemistries for mask repair with focused ion beam gas assisted etching Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 3067-3071. DOI: 10.1116/1.1624253 |
0.486 |
|
| 2003 |
Hodzic V, Orloff J, Davis C. Focused ion beam created periodic structures on tapered optical fibers Journal of Vacuum Science & Technology B. 21: 2711-2714. DOI: 10.1116/1.1621665 |
0.424 |
|
| 2001 |
Cooper GD, Sanabia JE, Orloff J, Moore JH. Electron-stimulated desorption from the products of chemisorption of trifluorochloroethene on silicon International Journal of Mass Spectrometry. 205: 293-298. DOI: 10.1016/S1387-3806(00)00278-5 |
0.367 |
|
| 2000 |
Kuhn JL, Fettig RK, Moseley SH, Kutyrev AS, Orloff J. Fracture tests of etched components using a focused ion beam machine Proceedings of Spie - the International Society For Optical Engineering. 4180: 40-48. DOI: 10.1117/12.395707 |
0.393 |
|
| 2000 |
Orloff J, Narayana C, Ruoff AL. Use of focused ion beams for making tiny sample holes in gaskets for diamond anvil cells Review of Scientific Instruments. 71: 216-219. DOI: 10.1063/1.1150185 |
0.442 |
|
| 1999 |
Guharay SK, Sokolovsky E, Orloff J. Characteristics of ion beams from a Penning source for focused ion beam applications Journal of Vacuum Science & Technology B. 17: 2779-2782. DOI: 10.1116/1.591064 |
0.542 |
|
| 1999 |
Didenko L, Guharay SK, Orloff J, Melngailis J. Coulomb interactions in a focused ion beam column and design guidelines for an experimental system: comparison of results from MONTEC and BOERSCH Nuclear Instruments and Methods in Physics Research, Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 427: 121-125. DOI: 10.1016/S0168-9002(98)01559-9 |
0.534 |
|
| 1998 |
Edinger K, Melngailis J, Orloff J. Study of precursor gases for focused ion beam insulator deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 16: 3311-3314. DOI: 10.1116/1.590497 |
0.468 |
|
| 1998 |
Guharay SK, Sokolovsky E, Orloff J. Characteristics of focused beam spots using negative ion beams from a compact surface plasma source and merits for new applications Journal of Vacuum Science & Technology B. 16: 3370-3373. DOI: 10.1116/1.590461 |
0.514 |
|
| 1998 |
Chen C-, Jin I, Pai SP, Dong ZW, Sharma RP, Lobb CJ, Venkatesan T, Edinger K, Orloff J, Melngailis J, Zhang Z, Chu WK. Combined method of focused ion beam milling and ion implantation techniques for the fabrication of high temperature superconductor Josephson junctions Journal of Vacuum Science & Technology B. 16: 2898-2901. DOI: 10.1116/1.590291 |
0.455 |
|
| 1998 |
Chen CH, Jin I, Pai SP, Dong ZW, Lobb CJ, Venkatesan T, Edinger K, Orloff J, Melngailis J. Fabrication of high-temperature superconducting Josephson junctions on substrates patterned by focused ion beam Applied Physics Letters. 73: 1730-1732. DOI: 10.1063/1.122259 |
0.414 |
|
| 1997 |
Orloff J. Spherical aberration correction of a focused ion beam with space charge Proceedings of Spie - the International Society For Optical Engineering. 3155: 216-220. DOI: 10.1117/12.279398 |
0.446 |
|
| 1997 |
Chen C-, Trajanovic Z, Dong ZW, Lobb CJ, Venkatesan T, Edinger K, Orloff J, Melngailis J. Fabrication of high-temperature superconductor Josephson junctions by focused ion beam milling Journal of Vacuum Science & Technology B. 15: 2379-2381. DOI: 10.1116/1.589651 |
0.44 |
|
| 1997 |
Edinger K, Yun V, Melngailis J, Orloff J, Magera G. Development of a high brightness gas field ion source Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 15: 2365-2368. DOI: 10.1116/1.589648 |
0.407 |
|
| 1997 |
Santamore D, Edinger K, Orloff J, Melngailis J. Focused ion beam sputter yield change as a function of scan speed Journal of Vacuum Science & Technology B. 15: 2346-2349. DOI: 10.1116/1.589643 |
0.495 |
|
| 1997 |
Guharay SK, Sokolovsky EA, Reiser M, Orloff J, Melngailis J. Study of energy broadening of high-brightness ion beams from a surface plasma Penning source and its relevance in ion projection lithography Microelectronic Engineering. 35: 435-438. DOI: 10.1016/S0167-9317(96)00179-7 |
0.488 |
|
| 1996 |
Guharay SK, Wang W, Dudnikov VG, Reiser M, Orloff J, Melngailis J. High-brightness ion source for ion projection lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 14: 3907-3910. DOI: 10.1116/1.588692 |
0.515 |
|
| 1996 |
Orloff J, Swanson LW, Utlaut M. Fundamental limits to imaging resolution for focused ion beams Journal of Vacuum Science & Technology B. 14: 3759-3763. DOI: 10.1116/1.588663 |
0.427 |
|
| 1996 |
Tang T, Orloff J, Wang L. Modeling and design of space charge lenses/aberration correctors for focused ion beam systems Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 14: 80-84. DOI: 10.1116/1.588438 |
0.357 |
|
| 1995 |
Chen C‐, Guharay SK, Reiser M, Riordon J, Orloff J, Melngailis J. Study of H− beams for ion‐projection lithography Journal of Vacuum Science & Technology B. 13: 2597-2599. DOI: 10.1116/1.588031 |
0.542 |
|
| 1995 |
Wang L, Orloff J, Tang T. Study of space‐charge devices for focused ion beam systems Journal of Vacuum Science & Technology B. 13: 2414-2418. DOI: 10.1116/1.588011 |
0.408 |
|
| 1995 |
Wang L, Orloff J, Book D, Tang T. A new method for calculating the axial potential due to space charge in electrostatic optics Journal of Physics D. 28: 1791-1801. DOI: 10.1088/0022-3727/28/9/006 |
0.338 |
|
| 1993 |
Orloff J. High-resolution focused ion beams Review of Scientific Instruments. 64: 1105-1130. DOI: 10.1063/1.1144104 |
0.533 |
|
| 1992 |
Zhou L, Orloff J. Erratum: ‘‘Design of a high resolution focused ion beam system using liquid metal ion source’’ [J. Vac. Sci. Technol. B 8, 1721 (1990)] Journal of Vacuum Science & Technology B. 10: 1228-1228. DOI: 10.1116/1.585895 |
0.502 |
|
| 1992 |
Sato M, Orloff J. A new concept of theoretical resolution of an optical system, comparison with experiment and optimum condition for a point source Ultramicroscopy. 41: 181-192. DOI: 10.1016/0304-3991(92)90107-U |
0.346 |
|
| 1991 |
Orloff J, Li J‐, Sato M. Experimental study of a focused ion beam probe size and comparison with theory Journal of Vacuum Science & Technology B. 9: 2609-2612. DOI: 10.1116/1.585701 |
0.508 |
|
| 1991 |
Sato M, Orloff J. A method for calculating the current density of charged particle beams and the effect of finite source size and spherical and chromatic aberrations on the focusing characteristics Journal of Vacuum Science & Technology B. 9: 2602-2608. DOI: 10.1116/1.585700 |
0.349 |
|
| 1991 |
Zhou L, Holmes F, Orloff J. Energy distribution measurement of a gallium liquid metal ion source modulated at high frequency by a focused laser beam Journal of Vacuum Science & Technology B. 9: 2593-2595. DOI: 10.1116/1.585698 |
0.488 |
|
| 1991 |
Jousten K, Holmes JF, Orloff J. High frequency modulation of a gallium liquid metal ion source using a laser beam and thermal effects Journal of Physics D: Applied Physics. 24: 458-468. DOI: 10.1088/0022-3727/24/3/034 |
0.31 |
|
| 1991 |
Orloff J. Focused ion beams Scientific American. 265: 96-101. DOI: 10.1038/Scientificamerican1091-96 |
0.545 |
|
| 1990 |
Gandhi A, Orloff J. Parametric modeling of focused ion beam induced etching Journal of Vacuum Science & Technology B. 8: 1814-1819. DOI: 10.1116/1.585165 |
0.493 |
|
| 1990 |
Zhou L, Orloff J. Design of a high resolution focused ion beam system using liquid metal ion source Journal of Vacuum Science & Technology B. 8: 1721-1724. DOI: 10.1116/1.585146 |
0.558 |
|
| 1990 |
Ximen H, DeFreez RK, Orloff J, Elliott RA, Evans GA, Carlson NW, Lurie M, Bour DP. Focused ion beam micromachined three‐dimensional features by means of a digital scan Journal of Vacuum Science & Technology B. 8: 1361-1365. DOI: 10.1116/1.585078 |
0.493 |
|
| 1990 |
DeFreez RK, Ximen H, Bossert DJ, Hunt JM, Wilson GA, Elliott RA, Orloff J, Evans GA, Carlson NW, Lurie M, Hammer JM, Bour DP, Palfrey SL, Amantea R. Spectral locking in an extended area two-dimensional coherent grating surface emitting laser array Ieee Photonics Technology Letters. 2: 6-8. DOI: 10.1109/68.47024 |
0.389 |
|
| 1990 |
Bossert DJ, DeFreez RK, Ximen H, Elliott RA, Hunt JM, Wilson GA, Orloff J, Evans GA, Carlson NW, Lurie M, Hammer JM, Bour DP, Palfrey SL, Amantea R. Grating‐surface‐emitting lasers in a ring configuration Applied Physics Letters. 56: 2068-2070. DOI: 10.1063/1.102974 |
0.402 |
|
| 1989 |
Orloff J. Survey of electron sources for high-resolution microscopy Ultramicroscopy. 28: 88-97. DOI: 10.1016/0304-3991(89)90278-7 |
0.335 |
|
| 1989 |
Orloff J, DeFreez RK, Puretz J, Elliott RA, Namba H, Omura E, Namizaki H. The effect of micromachining with focused ion beams on the life and power output of AlGaAs TJS lasers Microelectronic Engineering. 9: 281-283. DOI: 10.1016/0167-9317(89)90065-8 |
0.504 |
|
| 1988 |
Orloff J, Whitney J. Design of a new, two lens ion gun for micromachining Proceedings of Spie - the International Society For Optical Engineering. 923: 121-131. DOI: 10.1117/12.945641 |
0.372 |
|
| 1988 |
Crow G, Puretz J, Orloff J, DeFreez RK, Elliott RA. The use of vector scanning for producing arbitrary surface contours with a focused ion beam Journal of Vacuum Science & Technology B. 6: 1605-1607. DOI: 10.1116/1.584179 |
0.433 |
|
| 1988 |
DeFreez RK, Puretz J, Orloff J, Elliott RA, Namba H, Omura E, Namizaki H. Operating characteristics and elevated temperature lifetests of focused ion beam micromachined transverse junction stripe lasers Applied Physics Letters. 53: 1153-1155. DOI: 10.1063/1.100042 |
0.486 |
|
| 1987 |
Burghard RA, Swanson L, Orloff J. Performance comparison of electrostatic lenses for field emission ion and electron sources Journal of Vacuum Science and Technology. 5: 364-371. DOI: 10.1116/1.574161 |
0.502 |
|
| 1987 |
Puretz J, Defreez RK, Elliott RA, Orloff J, Paoli TL. 300 mW operation of a surface-emitting phase-locked array of diode lasers Electronics Letters. 23: 130-131. DOI: 10.1049/El:19870092 |
0.408 |
|
| 1986 |
Elliott RA, Puretz J, Defreez RK, Orloff J, Swanson LW. Focused-ion-beam micromachining of optical surfaces Optics News. 12: 19-20. DOI: 10.1364/On.12.12.000019 |
0.52 |
|
| 1986 |
Defreez RK, Puretz J, Elliott RA, Orloff J, Swanson LW. CW operation of widely and continuously tunable micromachined-coupled-cavity diode lasers Electronics Letters. 22: 919-921. DOI: 10.1049/El:19860627 |
0.38 |
|
| 1986 |
Puretz J, DeFreez RK, Elliott RA, Orloff J. Focused-ion-beam micromachined AlGaAs semiconductor laser mirrors Electronics Letters. 22: 700-702. DOI: 10.1049/El:19860479 |
0.487 |
|
| 1985 |
Orloff J, Sudraud P. Design of a 100 kV, high resolution focused ion beam column with a liquid metal ion source Microelectronic Engineering. 3: 161-164. DOI: 10.1016/0167-9317(85)90023-1 |
0.467 |
|
| 1985 |
Bozack MJ, Swanson LW, Orloff J. SUCCESSFUL LIQUID METAL ION SOURCE: THE IDEAL REQUIREMENTS Scanning Electron Microscopy. 1339-1345. |
0.329 |
|
| 1984 |
Puretz J, Orloff J, Swanson L. An application of focused ion beams to electron beam testing of integrated circuits Proceedings of Spie - the International Society For Optical Engineering. 471: 38-46. DOI: 10.1117/12.942318 |
0.464 |
|
| 1984 |
Orloff J. EFFECT OF EXTRACTION VOLTAGE AND BEAM VOLTAGE OF A LIQUID METAL ION SOURCE FOCUSED BEAM SYSTEM ON THE CURRENT DENSITY IN A FOCUSED SPOT Scanning Electron Microscopy. 1541-1546. |
0.389 |
|
| 1982 |
Orloff J, Swanson LW. SOME CONSIDERATIONS ON THE DESIGN OF A FIELD EMISSION GUN FOR A SHAPED SPOT LITHOGRAPHY SYSTEM Optik (Jena). 61: 237-245. |
0.33 |
|
| 1981 |
Orloff J, Swanson LW. OPTICAL COLUMN DESIGN WITH LIQUID METAL ION SOURCES Journal of Vacuum Science &Amp; Technology. 19: 1149-1152. DOI: 10.1116/1.571232 |
0.368 |
|
| 1979 |
Tuggle D, Swanson LW, Orloff J. APPLICATION OF A THERMAL FIELD EMISSION SOURCE FOR HIGH RESOLUTION, HIGH CURRENT E-BEAM MICROPROBES Journal of Vacuum Science &Amp; Technology. 16: 1699-1703. DOI: 10.1116/1.570275 |
0.33 |
|
| 1979 |
Orloff J, Swanson LW. Angular intensity of a gas-phase field ionization source Journal of Applied Physics. 50: 6026-6027. DOI: 10.1063/1.326679 |
0.315 |
|
| 1979 |
Orloff J, Swanson LW. An asymmetric electrostatic lens for field-emission microprobe applications Journal of Applied Physics. 50: 2494-2501. DOI: 10.1063/1.326260 |
0.37 |
|
| 1978 |
Orloff J, Swanson LW. FINE-FOCUS ION BEAMS WITH FIELD IONIZATION J Vac Sci Technol. 15: 845-848. DOI: 10.1116/1.569610 |
0.51 |
|
| Show low-probability matches. |