Franco Cerrina - Publications

Affiliations: 
University of Wisconsin, Madison, Madison, WI 
Area:
Electronics and Electrical Engineering, Condensed Matter Physics, Materials Science Engineering

92 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2012 Wang T, Jiang F, Oehrlein S, Zeng E, Kershner R, Cerrina F. Optical trapping force reduction and manipulation of nanoporous beads. Applied Physics Letters. 100: 153702-1537023. PMID 22550360 DOI: 10.1063/1.3703604  0.8
2011 Onses MS, Pathak P, Liu CC, Cerrina F, Nealey PF. Localization of multiple DNA sequences on nanopatterns. Acs Nano. 5: 7899-909. PMID 21899356 DOI: 10.1021/nn2021277  1
2011 del Rio MS, Canestrari N, Jiang F, Cerrina F. SHADOW3: a new version of the synchrotron X-ray optics modelling package. Journal of Synchrotron Radiation. 18: 708-16. PMID 21862849 DOI: 10.1107/S0909049511026306  1
2011 Wang T, Oehrlein S, Somoza MM, Perez JR, Kershner R, Cerrina F. Optical tweezers directed one-bead one-sequence synthesis of oligonucleotides. Lab On a Chip. 11: 1629-37. PMID 21445444 DOI: 10.1039/c0lc00577k  1
2009 Lackey JG, Mitra D, Somoza MM, Cerrina F, Damha MJ. Acetal levulinyl ester (ALE) groups for 2'-hydroxyl protection of ribonucleosides in the synthesis of oligoribonucleotides on glass and microarrays. Journal of the American Chemical Society. 131: 8496-502. PMID 19485360 DOI: 10.1021/ja9002074  1
2009 Chen S, Phillips MF, Cerrina F, Smith LM. Controlling oligonucleotide surface density in light-directed DNA array fabrication. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 6570-5. PMID 19281155 DOI: 10.1021/la9000297  1
2009 Zhang K, Pathak P, Cerrina F, Zhenqiang M. Performance prediction of nuclear micro power sources based on beta emitters Ecs Transactions. 19: 45-50. DOI: 10.1149/1.3247990  1
2009 Marconi MC, Wachulak PW, Urbanski L, Isoyan A, Jiang F, Cheng YC, Rocca JJ, Menoni CS, Cerrina F. Table-top soft X ray lithography Proceedings of Spie - the International Society For Optical Engineering. 7451. DOI: 10.1117/12.825509  1
2009 Isoyan A, Jiang F, Cheng YC, Wachulak P, Urbanski L, Rocca J, Menoni C, Marconi M, Cerrina F. Extreme Ultraviolet Holographic Lithography with a table-top laser Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814678  1
2009 Jiang F, Cheng YC, Isoyan A, Cerrina F. Engineering study of extreme ultraviolet interferometric lithography Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3112006  1
2009 Negrete OD, Onses MS, Nealy PF, Cerrina F. In situ synthesis and direct immobilization of ssDNA on electron beam patterned hydrogen silsesquioxane Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3082-3087. DOI: 10.1116/1.3263190  1
2008 Lockett MR, Weibel SC, Phillips MF, Shortreed MR, Sun B, Corn RM, Hamers RJ, Cerrina F, Smith LM. Carbon-on-metal films for surface plasmon resonance detection of DNA arrays. Journal of the American Chemical Society. 130: 8611-3. PMID 18597426 DOI: 10.1021/ja802454c  1
2008 Isoyan A, Wüest A, Wallace J, Jiang F, Cerrina F. 4X reduction extreme ultraviolet interferometric lithography. Optics Express. 16: 9106-11. PMID 18545622 DOI: 10.1364/OE.16.009106  1
2008 Efremov MY, Soofi SS, Kiyanova AV, Munoz CJ, Burgardt P, Cerrina F, Nealey PF. Vacuum ellipsometry as a method for probing glass transition in thin polymer films. The Review of Scientific Instruments. 79: 043903. PMID 18447531 DOI: 10.1063/1.2901601  1
2008 Phillips MF, Lockett MR, Rodesch MJ, Shortreed MR, Cerrina F, Smith LM. In situ oligonucleotide synthesis on carbon materials: stable substrates for microarray fabrication. Nucleic Acids Research. 36: e7. PMID 18084027 DOI: 10.1093/nar/gkm1103  1
2008 Brainard R, Hassanein E, Li J, Pathak P, Thiel B, Cerrina F, Moore R, Rodriguez M, Yakshinskiy B, Loginova E, Madey T, Matyi R, Malloy M, Rudack A, Naulleau P, et al. Photons, electrons, and acid yields in EUV photoresists: A progress report Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773869  1
2008 Isoyan A, Cheng YC, Jiang F, Wallace J, Efremov M, Nealey P, Cerrina F. Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772681  1
2008 Negrete OD, Cerrina F. Step-and-scan maskless lithography for ultra large scale DNA chips Microelectronic Engineering. 85: 834-837. DOI: 10.1016/j.mee.2008.01.014  1
2007 Huang W, Cerrina F. The con-focal method on verifying focal plane of MAS machine: erratum. Optics Express. 15: 1954. PMID 19532435 DOI: 10.1364/OE.15.001954  0.52
2007 Huang W, Cerrina F. The con-focal method on verifying focal plane of MAS machine. Optics Express. 15: 872-7. PMID 19532313  0.52
2007 Wei H, Cerrina F. The con-focal method on verifying focal plane of MAS machine Optics Express. 15: 872-877. DOI: 10.1364/OE.15.000872  1
2007 Ma Y, Cheng YC, Cerrina F, Barwicz T, Smith HI. Local line edge roughness in microphotonic devices: An electron-beam lithography study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 235-241. DOI: 10.1116/1.2426978  1
2007 Cheng YC, Isoyan A, Wallace J, Khan M, Cerrina F. Extreme ultraviolet holographic lithography: Initial results Applied Physics Letters. 90. DOI: 10.1063/1.2430774  1
2007 Wallace J, Cheng Y, Isoyan A, Leonard Q, Fisher M, Green M, Bisognano J, Nealey P, Cerrina F. A novel EUV exposure station for nanotechnology studies Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 582: 254-257. DOI: 10.1016/j.nima.2007.08.124  0.8
2006 Blair S, Richmond K, Rodesch M, Bassetti M, Cerrina F. A scalable method for multiplex LED-controlled synthesis of DNA in capillaries. Nucleic Acids Research. 34: e110. PMID 16963493 DOI: 10.1093/nar/gkl641  1
2006 Flickinger ST, Patel M, Binkowski BF, Lowe AM, Li MH, Kim C, Cerrina F, Belshaw PJ. Spatial photorelease of oligonucleotides, using a safety-catch photolabile linker. Organic Letters. 8: 2357-60. PMID 16706525 DOI: 10.1021/ol060644x  1
2005 Ma Y, Cerrina F. Effect of a surface inhibition layer on line edge roughness Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1096-1101. DOI: 10.1116/1.1926292  1
2005 Junarsa I, Stoykovich MP, Nealey PF, Ma Y, Cerrina F, Solak HH. Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 138-143. DOI: 10.1116/1.1849213  1
2004 Shaginian A, Patel M, Li MH, Flickinger ST, Kim C, Cerrina F, Belshaw PJ. Light-directed radial combinatorial chemistry: orthogonal safety-catch protecting groups for the synthesis of small molecule microarrays. Journal of the American Chemical Society. 126: 16704-5. PMID 15612691 DOI: 10.1021/ja044702q  0.52
2004 Richmond KE, Li MH, Rodesch MJ, Patel M, Lowe AM, Kim C, Chu LL, Venkataramaian N, Flickinger SF, Kaysen J, Belshaw PJ, Sussman MR, Cerrina F. Amplification and assembly of chip-eluted DNA (AACED): a method for high-throughput gene synthesis. Nucleic Acids Research. 32: 5011-8. PMID 15448182 DOI: 10.1093/nar/gkh793  1
2004 Malueg DH, Khan M, Cerrina F, Taylor JW. Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray Application Japanese Journal of Applied Physics. 43: 3722-3727. DOI: 10.1143/JJAP.43.3722  0.76
2004 Taylor JW, Malueg DH, Cerrina F, Khan M, Thielman D. Modeling for sub-50 nm X-ray application with phase masks Proceedings of Spie - the International Society For Optical Engineering. 5374: 311-315. DOI: 10.1117/12.535422  1
2004 Malueg DH, Taylor JW, Thielman D, Leonard Q, Dhuey S, Cerrina F. Modeling, fabrication, and experimental application of clear x-ray phase masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3575-3580. DOI: 10.1116/1.1809626  1
2003 Alianelli L, Sanchez del Rio M, Khan M, Cerrina F. A comment on 'A new ray-tracing program RIGTRACE for X-ray optical systems' [J. Synchrotron Rad. (2001), 8, 1047-1050]. Journal of Synchrotron Radiation. 10: 191-2. PMID 12606800 DOI: 10.1107/S090904950202352X  1
2003 Ali MA, Gonsalves KE, Batina N, Golovkina V, Cerrina F. High sensitivity nanocomposite resist materials for X-ray and EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 5039: 1173-1180. DOI: 10.1117/12.485139  1
2003 Han G, Khan M, Cerrina F. Stochastic modeling of high energy lithographies Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3166. DOI: 10.1116/1.1627798  0.96
2003 Ma Y, Tsvid G, Cerrina F. Line edge roughness of sub-100 nm dense and isolated features: Experimental study Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3124. DOI: 10.1116/1.1624254  1
2002 Nuwaysir EF, Huang W, Albert TJ, Singh J, Nuwaysir K, Pitas A, Richmond T, Gorski T, Berg JP, Ballin J, McCormick M, Norton J, Pollock T, Sumwalt T, Butcher L, ... ... Cerrina F, et al. Gene expression analysis using oligonucleotide arrays produced by maskless photolithography. Genome Research. 12: 1749-55. PMID 12421762 DOI: 10.1101/gr.362402  0.52
2002 Dai J, Ober CK, Wang L, Cerrina F, Nealey P. Organoelement resists for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 4690: 1193-1202. DOI: 10.1117/12.474197  1
2002 Divan R, Mancini DC, Moldovan N, Lai B, Assoufid L, Leonard Q, Cerrina F. Progress in the fabrication of high-aspect-ratio zone plates by soft X-ray lithography Proceedings of Spie - the International Society For Optical Engineering. 4783: 82-91. DOI: 10.1117/12.451019  1
2002 Yang L, Cerrina F, Taylor JW. Bright peak enhanced x-ray clear phase mask Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 250-256. DOI: 10.1116/1.1434973  1
2001 Lee KK, Lim DR, Kimerling LC, Shin J, Cerrina F. Fabrication of ultralow-loss Si/SiO(2) waveguides by roughness reduction. Optics Letters. 26: 1888-90. PMID 18059727  0.68
2001 Khan M, Han G, Maldonado J, Cerrina F. New results in high energy proximity x-ray lithography Proceedings of Spie - the International Society For Optical Engineering. 4343: 176-181. DOI: 10.1117/12.436639  1
2001 Shin J, Han G, Ma Y, Moloni K, Cerrina F. Resist line edge roughness and aerial image contrast Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2890-2895. DOI: 10.1116/1.1418413  1
2001 Khan M, Han G, Tsvid G, Kitayama T, Maldonado J, Cerrina F. Can proximity x-ray lithography print 35 nm features? Yes Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2423-2427. DOI: 10.1116/1.1418407  1
2001 Toyota E, Hori T, Khan M, Cerrina F. Technique for 25 nm x-ray nanolithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2428-2433. DOI: 10.1116/1.1415503  1
2001 Kim Y, Shapiro NA, Feick H, Armitage R, Weber ER, Yang Y, Cerrina F. Elastic strain relief in nitridated Ga metal buffer layers for epitaxial GaN growth Applied Physics Letters. 78: 895-897. DOI: 10.1063/1.1347016  1
2000 Han G, Cerrina F. Energy transfer between electrons and photoresist: Its relation to resolution Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3297-3302. DOI: 10.1116/1.1318188  1
2000 Cerrina F. X-ray imaging: applications to patterning and lithography Journal of Physics D: Applied Physics. 33. DOI: 10.1088/0022-3727/33/12/201  1
2000 Yang XM, Peters RD, Nealey PF, Solak HH, Cerrina F. Guided self-assembly of symmetric diblock copolymer films on chemically nanopatterned substrates Macromolecules. 33: 9575-9582. DOI: 10.1021/ma001326v  1
1999 Singh-Gasson S, Green RD, Yue Y, Nelson C, Blattner F, Sussman MR, Cerrina F. Maskless fabrication of light-directed oligonucleotide microarrays using a digital micromirror array. Nature Biotechnology. 17: 974-8. PMID 10504697 DOI: 10.1038/13664  1
1999 Khan M, Cerrina F, Toyota E. Pattern resolution of an x-ray beamline with a wide exposure field Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3433. DOI: 10.1116/1.591025  0.76
1999 Khan M, Han G, Bollepalli SB, Cerrina F, Maldonado J. Extension of x-ray lithography to 50 nm with a harder spectrum Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3426. DOI: 10.1116/1.591024  0.96
1999 Lu B, Taylor JW, Cerrina F, Soo CP, Bourdillon AJ. Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3345. DOI: 10.1116/1.591009  0.4
1999 Bollepalli SB, Khan M, Cerrina F. Image formation in extreme ultraviolet lithography and numerical aperture effects Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 2992. DOI: 10.1116/1.590941  0.76
1999 Hwu Y, Tsai W, Lai B, Mancini D, Je J, Noh D, Youn H, Hwang C, Cerrina F, Swiech W, Bertolo M, Tromba G, Margaritondo G. Use of photoelectron microscopes as X-ray detectors for imaging and other applications Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 437: 516-520. DOI: 10.1016/S0168-9002(99)00757-3  0.44
1998 Lai B, Yun W, Maser J, Cai Z, Rodrigues W, Legnini D, Chen Z, Krasnoperova AA, Vladimirsky Y, Cerrina F, Di Fabrizio E, Gentili M. Advanced zone plate microfocusing optics Proceedings of Spie - the International Society For Optical Engineering. 3449: 133-136. DOI: 10.1117/12.330340  1
1998 Chen Z, Vladimirsky Y, Cerrina F, Lai B, Yun W, Gluskin E. 0.1 μm high aspect ratio pattern replication and linewidth control Proceedings of Spie - the International Society For Optical Engineering. 3331: 591-600. DOI: 10.1117/12.309620  1
1998 Shamoun B, Sprague M, Engelstad R, Cerrina F. Photomask in-plane distortion induced during e-beam patterning Proceedings of Spie - the International Society For Optical Engineering. 3331: 275-279. DOI: 10.1117/12.309581  1
1998 Feng Z, Engelstad RL, Lovell EG, Cerrina F. Transient thermal distortions of x-ray mask membranes during exposure scanning Proceedings of Spie - the International Society For Optical Engineering. 3331: 261-274. DOI: 10.1117/12.309579  1
1998 Simon K, Macklin R, Selzer R, Vladimirsky O, Vladimirsky Y, Cerrina F. Analysis and identification of factors contributing to the overlay budget Proceedings of Spie - the International Society For Optical Engineering. 3331: 157-164. DOI: 10.1117/12.309567  1
1998 Cazzanti L, Khan M, Cerrina F. Parameter extraction with neural networks Proceedings of Spie - the International Society For Optical Engineering. 3332: 654-664. DOI: 10.1117/12.308780  1
1998 De Stasio G, Gilbert B, Perfetti L, Fauchoux O, Valiquer A, Nelson T, Capozi M, Baudat PA, Cerrina F, Chen Z, Perfetti P, Tonner BP, Margaritondo G. Soft-x-ray transmission photoelectron spectromicroscopy with the MEPHISTO system Review of Scientific Instruments. 69: 3106-3108. DOI: 10.1063/1.1149067  0.44
1997 Krasnoperov NL, Chen Z, Cerrina F. E-beam-induced distortions on SiN x-ray mask membrane Proceedings of Spie - the International Society For Optical Engineering. 3050: 565-573. DOI: 10.1117/12.275949  1
1997 Cerrina F. Application of X rays to nanolithography Proceedings of the Ieee. 85: 644-651. DOI: 10.1109/5.573753  1
1996 Ted Liang S, Cerrina F, Lucatorto T. Novel x-ray mask inspection tool based on transmission x-ray conversion microscope Proceedings of Spie - the International Society For Optical Engineering. 2723: 211-220. DOI: 10.1117/12.240473  0.32
1996 Fanfoni M, Goletti C, Chiaradia P, Ng W, Cerrina F, Hwu Y, Terrasi A, Margaritondo G. Schottky barrier at the Au/Gap (110) interface Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 14: 2433-2436. DOI: 10.1116/1.580032  0.4
1996 Ng W, Perera R, Underwood J, Singh S, Solak H, Cerrina F. Installation of the MAXIMUM microscope at the ALS Review of Scientific Instruments. 67: 3358-3359. DOI: 10.1063/1.1147384  0.32
1994 Wells GM, Anderson PD, Leonard QJ, Cerrina F, Waldo WG, Yamazaki K. Evaluation of a solid state detector for X-ray lithography dosimetry Japanese Journal of Applied Physics. 33: 690-697. DOI: 10.1143/JJAP.33.6905  1
1994 Reilly M, Leonard Q, Wells G, Capasso C, Anderson P, Taylor J, Waldo W, Yamazaki K, Chen G, Simon K, Cerrina F. Performance of the Modified Suss XRS 200/2M X-Ray Stepper at CXrL Japanese Journal of Applied Physics. 33: 6899-6904. DOI: 10.1143/JJAP.33.6899  0.4
1994 Xiao J. Novel single mirror condenser for x-ray lithography beam lines Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12: 4018. DOI: 10.1116/1.587422  0.72
1994 Ng W, Ray-Chaudhuri AK, Liang S, Singh S, Solak H, Cerrina F, Margaritondo G, Brillson L, Franciosi A, Underwood JH, Kortrigki JB, Perera RCC. Study of Surfaces and Interfaces by Scanning Photoemission Microscopy Synchrotron Radiation News. 7: 25-29. DOI: 10.1080/08940889408261261  0.64
1994 Ray-Chaudhuri AK, Ng W, Liang S, Cerrina F. Soft X-ray Foucault test: A path to diffraction-limited imaging Nuclear Inst. and Methods in Physics Research, A. 347: 364-371. DOI: 10.1016/0168-9002(94)91911-9  1
1994 Xiao J, Cerrina F. Design of an aspheric mirror for synchrotron radiation X-ray lithography beamline Nuclear Inst. and Methods in Physics Research, A. 347: 231-237. DOI: 10.1016/0168-9002(94)91883-X  0.64
1994 Ray-Chaudhuri AK, Cerrina F. Status of soft X-ray photoemission microscopy utilizing synchrotron radiation Nuclear Inst. and Methods in Physics Research, B. 87: 104-111. DOI: 10.1016/0168-583X(94)95244-2  0.64
1994 Moses WW, Derenzo SE, Weber MJ, Ray-Chaudhuri AK, Cerrina F. Scintillation mechanisms in cerium fluoride Journal of Luminescence. 59: 89-100. DOI: 10.1016/0022-2313(94)90026-4  0.64
1993 Ray-Chaudhuri AK, Ng W, Liang S, Singh S, Solak H, Cerrina F. Characterization of Cleaved GaAs(110) with a Scanning Photoemission Microscope Capable of Submicron Resolution Mrs Proceedings. 307. DOI: 10.1557/PROC-307-255  0.32
1993 Chen G, Wallace JP, Cerrina F. Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method For Sub-0.25 μM X-Ray Lithography System Japanese Journal of Applied Physics. 32: 5977-5981. DOI: 10.1143/JJAP.32.5977  1
1993 Laudon MF, Laird DL, Engelstad RL, Cerrina F. Mechanical Response Of X-Ray Masks Japanese Journal of Applied Physics. 32: 5928-5932. DOI: 10.1143/JJAP.32.5928  0.32
1992 Ng W, Wallace JP, Ray‐Chandhuri AK, Capasso C, Cerrina F. Micropositioning in MAXIMUM: Photoemission microscopy with normal incident optics (abstract) Review of Scientific Instruments. 63: 619-619. DOI: 10.1063/1.1142669  0.4
1991 Stasio Gd, Capasso C, Ng W, Ray-Chaudhuri AK, Liang SH, Cole RK, Guo ZY, Wallace J, Cerrina F, Margaritondo G, Underwood J, Perera R, Kortright J, Mercanti D, Ciotti MT, et al. High-Resolution Photoelectron Microimaging of Neuron Networks Europhysics Letters (Epl). 16: 411-414. DOI: 10.1209/0295-5075/16/4/016  0.36
1991 Mercanti D, De Stasio G, Ciotti MT, Capasso C, Ng W, Ray‐Chaudhuri AK, Liang SH, Cole RK, Guo ZY, Wallace J, Margaritondo G, Cerrina F, Underwood J, Perera R, Kortright J. Photoelectron microscopy in the life sciences: Imaging neuron networks Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 9: 1320-1322. DOI: 10.1116/1.577619  0.36
1990 Ng W, Ray‐Chaudhuri AK, Crossley S, Crossley D, Gong C, Guo J, Hansen R, Margaritondo G, Cerrina F, Underwood J, Perera R, Kortright J. The photoemission spectromicroscope multiple‐application x‐ray imaging undulator microscope (maximum) Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 8: 2563-2565. DOI: 10.1116/1.576736  0.32
1990 Ng W, Ray-Chaudhuri AK, Cole RK, Wallace J, Crossley S, Crossley D, Chen G, Green M, Guo J, Hansen RWC, Cerrina F, Margaritondo G, Underwood JH, Korthright J, Perera RCC. Photoemission spectromicroscopy with MAXIMUM at Wisconsin Physica Scripta. 41: 758-760. DOI: 10.1088/0031-8949/41/6/006  1
1990 De Stasio G, Ng W, Ray-Chaudhuri A, Cole R, Guo Z, Wallace J, Margaritondo G, Cerrina F, Underwood J, Perera R, Kortright J, Mercanti D, Ciotti M. Scanning photoelectron microscopy with undulator radiation: A successful test on uncoated neurons Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 294: 351-354. DOI: 10.1016/0168-9002(90)91851-2  0.36
1988 Boudry J, Riedel C, Edwards B, Lagally M, Redaelli R, Cerrina F, Falco C, Fernandez F, Underwood JH, Hettrick M. A beamline for layered synthetic microstructure studies Nuclear Inst. and Methods in Physics Research, A. 266: 351-355. DOI: 10.1016/0168-9002(88)90409-3  1
1988 Cerrina F, Margaritondo G, Underwood JH, Hettrick M, Green MA, Brillson LJ, Franciosi A, Höchst H, Deluca PM, Gould MN. Maximum: A scanning photoelectron microscope at Aladdin Nuclear Inst. and Methods in Physics Research, A. 266: 303-307. DOI: 10.1016/0168-9002(88)90401-9  1
1988 Green M, Kelly M, Lai B, Otte R, Rowe E, Stott J, Trzeciak W, Wallace D, Winter W, Cerrina F, Margaritondo G, Huber D, Winick H. First undulator operation at SRC Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 266: 91-95. DOI: 10.1016/0168-9002(88)90365-8  0.44
1986 Wells GM, Cerrina F. Differential pumping: Is it really effective? Nuclear Inst. and Methods in Physics Research, A. 246: 790-793. DOI: 10.1016/0168-9002(86)90194-4  1
1986 Lai B, Mitchell G, Wells GM, Cerrina F. The University of Wisconsin X-ray lithography beamline: First results Nuclear Inst. and Methods in Physics Research, A. 246: 681-686. DOI: 10.1016/0168-9002(86)90173-7  0.32
1986 Lai B, Cerrina F. SHADOW: A synchrotron radiation ray tracing program Nuclear Inst. and Methods in Physics Research, A. 246: 337-341. DOI: 10.1016/0168-9002(86)90101-4  0.32
1986 Lai B, Cerrina F, Pouey M. A new undulator grazing incidence monochromator Nuclear Inst. and Methods in Physics Research, A. 246: 297-302. DOI: 10.1016/0168-9002(86)90095-1  1
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