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Franco Cerrina - Publications

Affiliations: 
University of Wisconsin, Madison, Madison, WI 
Area:
Electronics and Electrical Engineering, Condensed Matter Physics, Materials Science Engineering
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Year Citation  Score
2011 Onses MS, Pathak P, Liu CC, Cerrina F, Nealey PF. Localization of multiple DNA sequences on nanopatterns. Acs Nano. 5: 7899-909. PMID 21899356 DOI: 10.1021/Nn2021277  0.34
2010 Marconi MC, Wachulak P, Urbanski L, Menoni CS, Rocca JJ, Isoyan A, Jiang F, Cheng Y, Cerrina F. Extreme ultraviolet lasers demonstrate new nano-patterning schemes 2010 23rd Annual Meeting of the Ieee Photonics Society, Photinics 2010. 335-336. DOI: 10.1109/Photonics.2010.5698896  0.781
2009 Chen S, Phillips MF, Cerrina F, Smith LM. Controlling oligonucleotide surface density in light-directed DNA array fabrication. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 6570-5. PMID 19281155 DOI: 10.1021/La9000297  0.303
2009 Urbanski L, Wachulak PW, Isoyan A, Jian F, Cheng Y, Rocca JJ, Menoni CS, Marconi MC, Cerrina F. Table Top Schemes for Nano-Patterning with Extreme Ultraviolet Lasers Frontiers in Optics. DOI: 10.1364/Fio.2009.Ftus2  0.766
2009 Marconi MC, Wachulak PW, Urbanski L, Isoyan A, Jiang F, Cheng YC, Rocca JJ, Menoni CS, Cerrina F. Table-top soft X ray lithography Proceedings of Spie - the International Society For Optical Engineering. 7451. DOI: 10.1117/12.825509  0.385
2009 Wang T, Quaglio M, Pirri F, Cheng Y, Busacker D, Cerrina F. Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography Proceedings of Spie. 7274. DOI: 10.1117/12.814831  0.784
2009 Isoyan A, Jiang F, Cheng YC, Wachulak P, Urbanski L, Rocca J, Menoni C, Marconi M, Cerrina F. Extreme Ultraviolet Holographic Lithography with a table-top laser Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814678  0.365
2009 Jiang F, Cheng YC, Isoyan A, Cerrina F. Engineering study of extreme ultraviolet interferometric lithography Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3112006  0.781
2009 Negrete OD, Onses MS, Nealy PF, Cerrina F. In situ synthesis and direct immobilization of ssDNA on electron beam patterned hydrogen silsesquioxane Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3082-3087. DOI: 10.1116/1.3263190  0.773
2009 Isoyan A, Jiang F, Cheng YC, Cerrina F, Wachulak P, Urbanski L, Rocca J, Menoni C, Marconi M. Talbot lithography: Self-imaging of complex structures Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2931-2937. DOI: 10.1116/1.3258144  0.406
2008 Isoyan A, Wüest A, Wallace J, Jiang F, Cerrina F. 4X reduction extreme ultraviolet interferometric lithography. Optics Express. 16: 9106-11. PMID 18545622 DOI: 10.1364/Oe.16.009106  0.367
2008 Phillips MF, Lockett MR, Rodesch MJ, Shortreed MR, Cerrina F, Smith LM. In situ oligonucleotide synthesis on carbon materials: stable substrates for microarray fabrication. Nucleic Acids Research. 36: e7. PMID 18084027 DOI: 10.1093/Nar/Gkm1103  0.306
2008 Brainard R, Hassanein E, Li J, Pathak P, Thiel B, Cerrina F, Moore R, Rodriguez M, Yakshinskiy B, Loginova E, Madey T, Matyi R, Malloy M, Rudack A, Naulleau P, et al. Photons, electrons, and acid yields in EUV photoresists: A progress report Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773869  0.37
2008 Isoyan A, Cheng YC, Jiang F, Wallace J, Efremov M, Nealey P, Cerrina F. Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772681  0.78
2008 Cerrina F, Isoyan A, Jiang F, Cheng YC, Leonard Q, Wallace J, Heinrich K, Ho A, Efremov M, Nealey P. Extreme Ultraviolet Interferometric Lithography: A Path to Nanopatterning Synchrotron Radiation News. 21: 12-24. DOI: 10.1080/08940880802268236  0.387
2008 Negrete OD, Cerrina F. Step-and-scan maskless lithography for ultra large scale DNA chips Microelectronic Engineering. 85: 834-837. DOI: 10.1016/J.Mee.2008.01.014  0.769
2007 Huang W, Cerrina F. The con-focal method on verifying focal plane of MAS machine. Optics Express. 15: 872-7. PMID 19532313 DOI: 10.1364/Oe.15.000872  0.315
2007 Isoyan A, Cheng YC, Jiang F, Wallace J, Cerrina F, Bollepalli S. Progress in extreme ultraviolet interferometric and holographic lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2145-2150. DOI: 10.1116/1.2794069  0.341
2007 Ma Y, Cheng YC, Cerrina F, Barwicz T, Smith HI. Local line edge roughness in microphotonic devices: An electron-beam lithography study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 235-241. DOI: 10.1116/1.2426978  0.788
2007 Cheng YC, Isoyan A, Wallace J, Khan M, Cerrina F. Extreme ultraviolet holographic lithography: Initial results Applied Physics Letters. 90. DOI: 10.1063/1.2430774  0.791
2007 Wallace J, Cheng Y, Isoyan A, Leonard Q, Fisher M, Green M, Bisognano J, Nealey P, Cerrina F. A novel EUV exposure station for nanotechnology studies Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 582: 254-257. DOI: 10.1016/J.Nima.2007.08.124  0.798
2006 Blair S, Richmond K, Rodesch M, Bassetti M, Cerrina F. A scalable method for multiplex LED-controlled synthesis of DNA in capillaries. Nucleic Acids Research. 34: e110. PMID 16963493 DOI: 10.1093/Nar/Gkl641  0.671
2006 Flickinger ST, Patel M, Binkowski BF, Lowe AM, Li MH, Kim C, Cerrina F, Belshaw PJ. Spatial photorelease of oligonucleotides, using a safety-catch photolabile linker. Organic Letters. 8: 2357-60. PMID 16706525 DOI: 10.1021/Ol060644X  0.763
2006 Kim C, Kaysen J, Richmond K, Rodesch M, Binkowski B, Chu L, Li M, Heinrich K, Blair S, Belshaw P, Sussman M, Cerrina F. Progress in gene assembly from a MAS-driven DNA microarray Microelectronic Engineering. 83: 1613-1616. DOI: 10.1016/J.Mee.2006.01.143  0.307
2005 Ma Y, Cerrina F. Effect of a surface inhibition layer on line edge roughness Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1096-1101. DOI: 10.1116/1.1926292  0.645
2005 Junarsa I, Stoykovich MP, Nealey PF, Ma Y, Cerrina F, Solak HH. Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 138-143. DOI: 10.1116/1.1849213  0.639
2005 Gonsalves KE, Thiyagarajan M, Choi JH, Zimmerman P, Cerrina F, Nealey P, Golovkina V, Wallace J, Batina N. High performance resist for EUV lithography Microelectronic Engineering. 77: 27-35. DOI: 10.1016/J.Mee.2004.08.003  0.38
2004 Shaginian A, Patel M, Li MH, Flickinger ST, Kim C, Cerrina F, Belshaw PJ. Light-directed radial combinatorial chemistry: orthogonal safety-catch protecting groups for the synthesis of small molecule microarrays. Journal of the American Chemical Society. 126: 16704-5. PMID 15612691 DOI: 10.1021/Ja044702Q  0.744
2004 Richmond KE, Li MH, Rodesch MJ, Patel M, Lowe AM, Kim C, Chu LL, Venkataramaian N, Flickinger SF, Kaysen J, Belshaw PJ, Sussman MR, Cerrina F. Amplification and assembly of chip-eluted DNA (AACED): a method for high-throughput gene synthesis. Nucleic Acids Research. 32: 5011-8. PMID 15448182 DOI: 10.1093/Nar/Gkh793  0.763
2004 Malueg DH, Taylor JW, Thielman D, Leonard Q, Dhuey S, Cerrina F. Modeling, fabrication, and experimental application of clear x-ray phase masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3575-3580. DOI: 10.1116/1.1809626  0.375
2004 Amy D, Jiang L, Zheng R, Feldman M, Cerrina F, Dhuey S, Leonard Q, Thielman D. Minimal zone plates for x-ray lithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22: 3570. DOI: 10.1116/1.1809625  0.356
2003 Han G, Khan M, Cerrina F. Stochastic modeling of high energy lithographies Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3166. DOI: 10.1116/1.1627798  0.777
2003 Ma Y, Tsvid G, Cerrina F. Line edge roughness of sub-100 nm dense and isolated features: Experimental study Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3124. DOI: 10.1116/1.1624254  0.644
2003 Ma Y, Shin J, Cerrina F. Line edge roughness and photoresist percolation development model Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 112-117. DOI: 10.1116/1.1534572  0.763
2003 Azam Ali M, Gonsalves KE, Golovkina V, Cerrina F. High sensitivity nanocomposite resists for EUV lithography Microelectronic Engineering. 65: 454-462. DOI: 10.1016/S0167-9317(03)00164-3  0.374
2003 Solak HH, David C, Gobrecht J, Golovkina V, Cerrina F, Kim SO, Nealey PF. Sub-50 nm period patterns with EUV interference lithography Microelectronic Engineering. 67: 56-62. DOI: 10.1016/S0167-9317(03)00059-5  0.366
2002 Nuwaysir EF, Huang W, Albert TJ, Singh J, Nuwaysir K, Pitas A, Richmond T, Gorski T, Berg JP, Ballin J, McCormick M, Norton J, Pollock T, Sumwalt T, Butcher L, ... ... Cerrina F, et al. Gene expression analysis using oligonucleotide arrays produced by maskless photolithography. Genome Research. 12: 1749-55. PMID 12421762 DOI: 10.1101/Gr.362402  0.308
2002 Shin J, Ma Y, Cerrina F. Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2927-2931. DOI: 10.1116/1.1526638  0.789
2002 Han G, Khan M, Fang Y, Cerrina F. Comprehensive model of electron energy deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2666-2671. DOI: 10.1116/1.1526633  0.76
2002 Yang L, Cerrina F, Taylor JW. Bright peak enhanced x-ray clear phase mask Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 250-256. DOI: 10.1116/1.1434973  0.328
2002 Solak HH, David C, Gobrecht J, Wang L, Cerrina F. Four-wave EUV interference lithography Microelectronic Engineering. 61: 77-82. DOI: 10.1016/S0167-9317(02)00579-8  0.336
2001 Lee KK, Lim DR, Kimerling LC, Shin J, Cerrina F. Fabrication of ultralow-loss Si/SiO(2) waveguides by roughness reduction. Optics Letters. 26: 1888-90. PMID 18059727 DOI: 10.1364/Ol.26.001888  0.761
2001 Shin J, Han G, Ma Y, Moloni K, Cerrina F. Resist line edge roughness and aerial image contrast Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2890-2895. DOI: 10.1116/1.1418413  0.743
2001 Khan M, Han G, Tsvid G, Kitayama T, Maldonado J, Cerrina F. Can proximity x-ray lithography print 35 nm features? Yes Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2423-2427. DOI: 10.1116/1.1418407  0.794
2001 Toyota E, Hori T, Khan M, Cerrina F. Technique for 25 nm x-ray nanolithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2428-2433. DOI: 10.1116/1.1415503  0.408
2001 Feldman M, Khan M, Cerrina F. Focusing x-ray masks for printing very narrow features Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2434-2438. DOI: 10.1116/1.1410093  0.323
2000 Han G, Cerrina F. Energy transfer between electrons and photoresist: Its relation to resolution Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3297-3302. DOI: 10.1116/1.1318188  0.769
2000 Cerrina F, Bollepalli S, Khan M, Solak H, Li W, He D. Image formation in EUV lithography: multilayer and resist properties Microelectronic Engineering. 53: 13-20. DOI: 10.1016/S0167-9317(00)00260-4  0.341
1999 Singh-Gasson S, Green RD, Yue Y, Nelson C, Blattner F, Sussman MR, Cerrina F. Maskless fabrication of light-directed oligonucleotide microarrays using a digital micromirror array. Nature Biotechnology. 17: 974-8. PMID 10504697 DOI: 10.1038/13664  0.37
1999 Khan M, Han G, Bollepalli SB, Cerrina F, Maldonado J. Extension of x-ray lithography to 50 nm with a harder spectrum Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3426. DOI: 10.1116/1.591024  0.783
1999 Lu B, Taylor JW, Cerrina F, Soo CP, Bourdillon AJ. Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3345. DOI: 10.1116/1.591009  0.35
1999 Bollepalli SB, Khan M, Cerrina F. Image formation in extreme ultraviolet lithography and numerical aperture effects Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 2992. DOI: 10.1116/1.590941  0.363
1999 Yun W, Lai B, Krasnoperova AA, Fabrizio ED, Cai Z, Cerrina F, Chen Z, Gentili M, Gluskin E. Development of zone plates with a blazed profile for hard x-ray applications Review of Scientific Instruments. 70: 3537-3541. DOI: 10.1063/1.1149956  0.325
1999 Yun W, Lai B, Cai Z, Maser J, Legnini D, Gluskin E, Chen Z, Krasnoperova AA, Vladimirsky Y, Cerrina F, Fabrizio ED, Gentili M. Nanometer focusing of hard x rays by phase zone plates Review of Scientific Instruments. 70: 2238-2241. DOI: 10.1063/1.1149744  0.33
1999 Hwu Y, Tsai W, Lai B, Mancini D, Je J, Noh D, Youn H, Hwang C, Cerrina F, Swiech W, Bertolo M, Tromba G, Margaritondo G. Use of photoelectron microscopes as X-ray detectors for imaging and other applications Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 437: 516-520. DOI: 10.1016/S0168-9002(99)00757-3  0.324
1999 Simon K, Vladimirsky O, Vladimirsky Y, Cerrina F. Overlay budget analysis for the 100 nm device generation Microelectronic Engineering. 46: 457-460. DOI: 10.1016/S0167-9317(99)00039-8  0.356
1999 Bollepalli SB, Cerrina F. Computation of reflected images from EUV masks Microelectronic Engineering. 46: 443-447. DOI: 10.1016/S0167-9317(99)00032-5  0.316
1998 Lorusso GF, Solak H, Singh S, Batson PJ, Underwood JH, Cerrina F. Maximum at ALS: A Powerful Tool to Investigate Open Problems in Micro and Optoelectronics Mrs Proceedings. 524: 215. DOI: 10.1557/Proc-524-215  0.325
1998 Solak HH, Lorusso GF, Singh S, Cerrina F, Underwood JH, Batson P. In-Situ X-ray Photoemission Spectromicroscopy of Electromigration in Patterned Al-Cu Lines With Maximum Mrs Proceedings. 516. DOI: 10.1557/Proc-516-39  0.32
1998 Lorusso GF, Solak H, Cerrina F, Underwood JH, Batson PJ, Kim Y, Cho Y, Kisielowski C, Krueger J, Weber ER. X-Ray Photoemission Spectromicroscopy Of Gan And AIGan Mrs Proceedings. 512: 393. DOI: 10.1557/Proc-512-393  0.319
1998 Chen Z, Krasnoperov NL, Gearhart SS, Vladimirsky Y, Cerrina F. High-aspect-ratio x-ray lithography for magnetic head fabrication Proceedings of Spie. 3512: 169-172. DOI: 10.1117/12.324053  0.376
1998 Bollepalli BS, Khan M, Cerrina F. Imaging properties of the extreme ultraviolet mask Journal of Vacuum Science & Technology B. 16: 3444-3448. DOI: 10.1116/1.590475  0.317
1998 De Stasio G, Gilbert B, Perfetti L, Fauchoux O, Valiquer A, Nelson T, Capozi M, Baudat PA, Cerrina F, Chen Z, Perfetti P, Tonner BP, Margaritondo G. Soft-x-ray transmission photoelectron spectromicroscopy with the MEPHISTO system Review of Scientific Instruments. 69: 3106-3108. DOI: 10.1063/1.1149067  0.363
1998 Shamoun B, Sprague M, Bedford F, Engelstad R, Cerrina F. X-ray mask distortions during e-beam patterning Microelectronic Engineering. 41: 283-286. DOI: 10.1016/S0167-9317(98)00065-3  0.338
1998 Hector S, Pol V, Khan M, Bollepalli S, Cerrina F. Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography Microelectronic Engineering. 41: 271-274. DOI: 10.1016/S0167-9317(98)00062-8  0.402
1997 Fisher AH, Laudon MF, Engelstad RL, Lovell EG, Cerrina F. Pattern placement errors in mask membranes Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 15: 2249-2254. DOI: 10.1116/1.589623  0.32
1997 Bollepalli BS, Khan M, Cerrina F. Automatic mask generation in x-ray lithography Journal of Vacuum Science & Technology B. 15: 2238-2242. DOI: 10.1116/1.589621  0.368
1997 Laudon M, Fisher A, Engelstad R, Cerrina F, Cummings K, Dauksher W, Resnick D, Johnson W, Puisto D. Prediction of in-plane distortions due to mask fabrication processes Microelectronic Engineering. 35: 549-552. DOI: 10.1016/S0167-9317(96)00154-2  0.302
1996 Welnak JT, Solak H, Wallace J, Cerrina F, Barbo F, Bertolo M, Bianco A, Fonzo SD, Fontana S, Jark W, Mazzolini F, Rosei R, Savoia A, Underwood JH, Margaritondo G. A new scanning photoemission microscope for ELETTRA: SuperMAXIMUM Review of Scientific Instruments. 67: 3358-3358. DOI: 10.1063/1.1147500  0.327
1996 Cerrina F. Preparation of microfocusing optics using synchrotron radiation sources (invited, abstract) Review of Scientific Instruments. 67: 3357-3357. DOI: 10.1063/1.1147380  0.339
1995 Cerrina F. The limits of patterning in X-ray lithography Mrs Proceedings. 380. DOI: 10.1557/Proc-380-173  0.374
1995 Ray‐Chaudhuri AK, Ng W, Cerrina F, Tan Z, Bjorkholm J, Tennant D, Spector SJ. Alignment of a multilayer‐coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing Journal of Vacuum Science & Technology B. 13: 3089-3093. DOI: 10.1116/1.588328  0.325
1995 Tan Z, MacDowell AA, Fontaine BL, Bjorkholm JE, Tennant D, Taylor D, Himel M, Freeman RR, Waskiewicz WK, Windt DL, Spector S, Ray‐Chaudhuri AK, Stulen RH, Ng W, Cerrina F. At‐wavelength metrology of 13 nm lithography imaging optics Review of Scientific Instruments. 66: 2241-2243. DOI: 10.1063/1.1145718  0.366
1995 Lai B, Yun W, Xiao Y, Yang L, Legnini D, Cai Z, Krasnoperova A, Cerrina F, DiFabrizio E, Grella L, Gentili M. Development of a hard x‐ray imaging microscope Review of Scientific Instruments. 66: 2287-2289. DOI: 10.1063/1.1145666  0.358
1995 Welnak J, Dong Z, Solak H, Wallace J, Cerrina F, Bertolo M, Bianco A, Di Fonzo S, Fontana S, Jark W, Mazzolini F, Rosei R, Savoia A, Underwood JH, Margaritondo G. SuperMAXIMUM: A Schwarzschild-based, spectromicroscope for ELETTRA Review of Scientific Instruments. 66: 2273-2276. DOI: 10.1063/1.1145662  0.32
1994 Krasnoperova AA, Bell T, Rhyner S, Taylor JW, DePablo J, Cerrina F. Dissolution study of a novolak-based photoresist based on a developer diffusion model Japanese Journal of Applied Physics. 33: 701-706. DOI: 10.1143/Jjap.33.7012  0.311
1994 Wells GM, Anderson PD, Leonard QJ, Cerrina F, Waldo WG, Yamazaki K. Evaluation of a solid state detector for X-ray lithography dosimetry Japanese Journal of Applied Physics. 33: 690-697. DOI: 10.1143/Jjap.33.6905  0.342
1994 Reilly M, Leonard Q, Wells G, Capasso C, Anderson P, Taylor J, Waldo W, Yamazaki K, Chen G, Simon K, Cerrina F. Performance of the Modified Suss XRS 200/2M X-Ray Stepper at CXrL Japanese Journal of Applied Physics. 33: 6899-6904. DOI: 10.1143/Jjap.33.6899  0.321
1994 Chen G, Yamazaki K, Waldo W, Welnak J, Wells GM, Cerrina F. Synchrotron radiation x‐ray lithography beamline optics alignment using the Hartmann method Journal of Vacuum Science & Technology B. 12: 4013-4017. DOI: 10.1116/1.587421  0.303
1994 Fabrizio ED, Gentili M, Grella L, Baciocchi M, Krasnoperova A, Cerrina F, Yun W, Lai B, Gluskin E. High-performance multilevel blazed x-ray microscopy Fresnel zone plates: Fabricated using x-ray lithography Journal of Vacuum Science & Technology B. 12: 3979-3985. DOI: 10.1116/1.587414  0.372
1994 Gentili M, Fabrizio ED, Grella L, Baciocchi M, Mastrogiacomo L, Maggiora R, Xiao J, Cerrina F. Fabrication of controlled slope attenuated phase‐shift x‐ray masks for 250 nm synchrotron lithography Journal of Vacuum Science & Technology B. 12: 3954-3958. DOI: 10.1116/1.587409  0.402
1994 Wells GM, Brodsky EL, Reilly M, Taylor JW, Cerrina F. The center for X-ray lithography facility status and beamlines development Nuclear Inst. and Methods in Physics Research, A. 347: 466-471. DOI: 10.1016/0168-9002(94)91929-1  0.302
1994 Ng W, Ray-Chaudhuri AK, Liang S, Singh S, Solak H, Welnak J, Cerrina F, Margaritondo G, Underwood JH, Kortright JB, Perera RCC. High resolution spectromicroscopy with MAXIMUM: Photoemission spectroscopy reaches the 1000 Å scale Nuclear Inst. and Methods in Physics Research, A. 347: 422-430. DOI: 10.1016/0168-9002(94)91921-6  0.362
1994 Chen GJ, Cerrina F, Voss KF, Hyde Kim K, Brown FC. Ray-tracing of X-ray focusing capillaries Nuclear Inst. and Methods in Physics Research, A. 347: 407-411. DOI: 10.1016/0168-9002(94)91918-6  0.318
1994 Welnak J, Ray-Chaudhuri AK, Ng W, Cerrina F. Double-moment Kirkpatrick-Baez condensing mirrors: In situ alignment Nuclear Inst. and Methods in Physics Research, A. 347: 372-375. DOI: 10.1016/0168-9002(94)91912-7  0.347
1994 Ray-Chaudhuri AK, Ng W, Liang S, Cerrina F. Soft X-ray Foucault test: A path to diffraction-limited imaging Nuclear Inst. and Methods in Physics Research, A. 347: 364-371. DOI: 10.1016/0168-9002(94)91911-9  0.335
1994 Welnak C, Chen GJ, Cerrina F. SHADOW: A synchrotron radiation and X-ray optics simulation tool Nuclear Inst. and Methods in Physics Research, A. 347: 344-347. DOI: 10.1016/0168-9002(94)91906-2  0.318
1994 Chen GJ, Guo JZY, Cerrina F. Applications of faceted mirrors to X-ray lithography beamlines Nuclear Inst. and Methods in Physics Research, A. 347: 238-243. DOI: 10.1016/0168-9002(94)91884-8  0.355
1994 Xiao J, Cerrina F. Design of an aspheric mirror for synchrotron radiation X-ray lithography beamline Nuclear Inst. and Methods in Physics Research, A. 347: 231-237. DOI: 10.1016/0168-9002(94)91883-X  0.34
1994 Ray-Chaudhuri AK, Cerrina F. Status of soft X-ray photoemission microscopy utilizing synchrotron radiation Nuclear Inst. and Methods in Physics Research, B. 87: 104-111. DOI: 10.1016/0168-583X(94)95244-2  0.32
1993 Ray-Chaudhuri AK, Ng W, Liang S, Singh S, Solak H, Cerrina F. Characterization of Cleaved GaAs(110) with a Scanning Photoemission Microscope Capable of Submicron Resolution Mrs Proceedings. 307. DOI: 10.1557/Proc-307-255  0.335
1993 Chen G, Wallace JP, Cerrina F. Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method For Sub-0.25 μM X-Ray Lithography System Japanese Journal of Applied Physics. 32: 5977-5981. DOI: 10.1143/Jjap.32.5977  0.33
1993 Laudon MF, Laird DL, Engelstad RL, Cerrina F. Mechanical Response Of X-Ray Masks Japanese Journal of Applied Physics. 32: 5928-5932. DOI: 10.1143/Jjap.32.5928  0.334
1993 Wells GM, Brodsky EL, Cerrina F, Waldo WG. Evaluation of beryllium foils for x‐ray lithography beamlines Journal of Vacuum Science & Technology B. 11: 3008-3011. DOI: 10.1116/1.586885  0.322
1993 Fabrizio ED, Grella L, Luciani L, Gentili M, Baciocchi M, Figliomeni M, Mastrogiacomo L, Maggiora R, Leonard Q, Cerrina F, Molino M, Powderly D. Metrology of high‐resolution resist structures on insulating substrates Journal of Vacuum Science & Technology B. 11: 2456-2462. DOI: 10.1116/1.586646  0.321
1993 Krasnoperova AA, Xiao J, Cerrina F, Fabrizio ED, Luciani L, Figliomeni M, Gentili M, Yun W, Lai B, Gluskin E. Fabrication of hard x‐ray phase zone plate by x‐ray lithography Journal of Vacuum Science & Technology B. 11: 2588-2591. DOI: 10.1116/1.586630  0.331
1993 Gentili M, Grella L, Fabrizio ED, Luciani L, Baciocchi M, Figliomeni M, Maggiora R, Mastrogiacomo L, Cerrina F. Development of an electron‐beam process for the fabrication of x‐ray nanomasks Journal of Vacuum Science & Technology B. 11: 2938-2942. DOI: 10.1116/1.586564  0.367
1993 Ray-Chaudhuri AK, Margaritondo G, Underwood JH, Ng W, Kortright JB, Singh S, Perera RC, Welnak JT, Wallace JP, Capasso C, Cerrina F. First Results of Microspectroscopy from a Scanning Photoemission Microscope with a Submicron Probe Size Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 2324-2329. DOI: 10.1116/1.578370  0.362
1993 Capasso C, Ng W, Ray-Chaudhuri AK, Liang SH, Cole RK, Guo ZY, Wallace J, Cerrina F, Underwood J, Perera R, Kortright J, Stasio GD, Margaritondo G. Scanning photoemission microscopy on MAXIMUM reaches 0.1 micron resolution Surface Science. 287: 1046-1050. DOI: 10.1016/0039-6028(93)91124-8  0.332
1992 Chen G, Wallace J, Nachman R, Wells G, Bodoh D, Anderson P, Reilly M, Cerrina F. CXrL aligner: An experimental x‐ray lithography system for quarter‐micron feature devices Journal of Vacuum Science & Technology B. 10: 3229-3234. DOI: 10.1116/1.585919  0.307
1992 Welnak C, Anderson P, Khan M, Singh S, Cerrina F. Recent developments in SHADOW Review of Scientific Instruments. 63: 865-868. DOI: 10.1063/1.1142630  0.31
1992 Lai B, Yun WB, Legnini D, Xiao Y, Chrzas J, Viccaro PJ, White V, Bajikar S, Denton D, Cerrina F, Di Fabrizio E, Gentili M, Grella L, Baciocchi M. Hard x‐ray phase zone plate fabricated by lithographic techniques Applied Physics Letters. 61: 1877-1879. DOI: 10.1063/1.108400  0.332
1992 Wallace J, Chen G, Reilly M, Anderson P, Cerrina F. A novel aligner for X-ray lithography Nuclear Inst. and Methods in Physics Research, A. 319: 371-375. DOI: 10.1016/0168-9002(92)90580-W  0.348
1992 Gentili M, Grella L, Baciocchi M, Kumar R, Meneghini G, Plumb D, Leonard Q, Cerrina F. Fabrication of DFB laser gratings using synchrotron radiation proximity lithography Microelectronic Engineering. 17: 551-554. DOI: 10.1016/0167-9317(92)90113-6  0.408
1992 Prewett PD, Gentili M, Maggiora R, Mastrogiacomo L, Watson JG, Turner GS, Brown GW, Plumb D, Leonard Q, Cerrina F. FIB repair of clear and opaque defects in x-ray masks Microelectronic Engineering. 17: 249-253. DOI: 10.1016/0167-9317(92)90050-2  0.319
1992 Laird DL, Lenius PE, Engelstad RL, Cerrina F. Analysis and optimization of x-ray masks using finite element methods Microelectronic Engineering. 17: 209-213. DOI: 10.1016/0167-9317(92)90043-Q  0.302
1992 Cerrina F, Guo JZY, Turner S, Ocola L, Khan M, Anderson P. Image formation in x-ray lithography: Process optimization Microelectronic Engineering. 17: 135-139. DOI: 10.1016/0167-9317(92)90027-O  0.304
1991 Wells CMM, Pearson DW, De Luca PM, Wells GM, Cerrina F, Kennan WS, Gould MN. Synchrotron-produced ultrasoft x-rays: A tool for testing biophysical models of radiation action International Journal of Radiation Biology. 59: 985-996. PMID 1674282 DOI: 10.1080/09553009114550871  0.326
1991 Capasso C, Ray-Chaudhuri AK, Ng W, Liang S, Cole RK, Wallace J, Cerrina F, Underwood JH, Kortright JB, Perera RCC. High-resolution x-ray microscopy using an undulator source, photoelectron studies with MAXIMUM Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 9: 1248-1253. DOI: 10.1116/1.577607  0.379
1991 Cole RK, Cerrina F. Novel beamline optics for x-ray lithography Microelectronic Engineering. 13: 295-298. DOI: 10.1016/0167-9317(91)90097-W  0.371
1990 White V, Wallace J, Cerrina F, Vladimirski Y, Su Y, Maldonado J. Contrast amplification of very high resolution x-ray masks Journal of Vacuum Science & Technology B. 8: 1595-1599. DOI: 10.1116/1.585122  0.38
1990 Guo JZY, Chen G, White V, Anderson P, Cerrina F. Aerial image formation in synchrotron‐radiation‐based x‐ray lithography: The whole picture Journal of Vacuum Science & Technology B. 8: 1551-1556. DOI: 10.1116/1.585114  0.341
1990 Blackwell RJ, Baker JW, Wells GM, Hansen M, Wallace J, Cerrina F. Synchrotron radiation x‐ray lithography fabrication of 0.35 μm gate‐length n‐type metal–oxide–semiconductor transistors Journal of Vacuum Science & Technology B. 8: 439-445. DOI: 10.1116/1.585041  0.328
1990 Ng W, Ray‐Chaudhuri AK, Crossley S, Crossley D, Gong C, Guo J, Hansen R, Margaritondo G, Cerrina F, Underwood J, Perera R, Kortright J. The photoemission spectromicroscope multiple‐application x‐ray imaging undulator microscope (maximum) Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 8: 2563-2565. DOI: 10.1116/1.576736  0.355
1990 De Stasio G, Ng W, Ray-Chaudhuri A, Cole R, Guo Z, Wallace J, Margaritondo G, Cerrina F, Underwood J, Perera R, Kortright J, Mercanti D, Ciotti M. Scanning photoelectron microscopy with undulator radiation: A successful test on uncoated neurons Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 294: 351-354. DOI: 10.1016/0168-9002(90)91851-2  0.316
1990 Margaritondo G, Cerrina F. Overview of soft-x-ray photoemission spectromicroscopy Nuclear Inst. and Methods in Physics Research, A. 291: 26-35. DOI: 10.1016/0168-9002(90)90028-5  0.319
1990 Vladimirsky Y, Maldonado JR, Vladimirsky O, Cerrina F, Hansen M, Nachman R, Wells GM. Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation Microelectronic Engineering. 11: 287-293. DOI: 10.1016/0167-9317(90)90117-C  0.347
1989 Smith A, Riedel C, Edwards B, Savage D, Lai B, Ray‐Chaudhuri A, Cerrina F, Lagally MG, Underwood J, Falco C. A simple monochromator based on x‐ray multilayer mirrors Review of Scientific Instruments. 60: 2003-2005. DOI: 10.1063/1.1140860  0.314
1989 Chapman K, Lai B, Cerrina F, Viccaro J. Modeling of undulator sources (abstract) Review of Scientific Instruments. 60: 2127-2127. DOI: 10.1063/1.1140846  0.301
1989 Meger CM, Pearson DW, DeLuca PM, Wells GM, Cerrina F, Gould MN. Beamline and irradiation chamber for dosimetry and biology studies using synchrotron radiation Review of Scientific Instruments. 60: 2235-2238. DOI: 10.1063/1.1140778  0.341
1989 Chapman K, Lai B, Cerrina F, Viccaro J. Modelling of undulator sources Nuclear Inst. and Methods in Physics Research, A. 283: 88-99. DOI: 10.1016/0168-9002(89)91260-6  0.312
1989 Lai B, Nachman R, Ray-Chaudhuri AK, Cerrina F. X-ray assisted nitridation of silicon surface at ambient temperature Solid State Communications. 71: 721-725. DOI: 10.1016/0038-1098(89)90073-2  0.301
1988 Wells GM, Chen G, So D, Brodsky EL, Kriesel K, Cerrina F, Karnezos M. Quantitative in situ characterization of x‐ray mask distortions Journal of Vacuum Science & Technology B. 6: 2190-2195. DOI: 10.1116/1.584080  0.325
1988 Visser CCG, Uglow JE, Burns DW, Wells G, Redaelli R, Cerrina F, Guckel H. The development of a silicon nitride mask technology for synchrotron radiation X-ray lithography Nuclear Inst. and Methods in Physics Research, A. 266: 686-690. DOI: 10.1016/0168-9002(88)90466-4  0.343
1988 Meger CM, Pearson DW, Deluca PM, Wells GM, Redaelli R, Cerrina F. A comparison of three detectors for soft X-ray dosimetry Nuclear Inst. and Methods in Physics Research, A. 266: 608-611. DOI: 10.1016/0168-9002(88)90453-6  0.331
1988 Boudry J, Riedel C, Edwards B, Lagally M, Redaelli R, Cerrina F, Falco C, Fernandez F, Underwood JH, Hettrick M. A beamline for layered synthetic microstructure studies Nuclear Inst. and Methods in Physics Research, A. 266: 351-355. DOI: 10.1016/0168-9002(88)90409-3  0.321
1988 Cerrina F, Margaritondo G, Underwood JH, Hettrick M, Green MA, Brillson LJ, Franciosi A, Höchst H, Deluca PM, Gould MN. Maximum: A scanning photoelectron microscope at Aladdin Nuclear Inst. and Methods in Physics Research, A. 266: 303-307. DOI: 10.1016/0168-9002(88)90401-9  0.404
1988 Wells GM, Lai B, So D, Redaelli R, Cerrina F. X-ray lithography beamlines at Aladdin Nuclear Inst. and Methods in Physics Research, A. 266: 278-286. DOI: 10.1016/0168-9002(88)90397-X  0.349
1987 Redaelli R, Wells GM, Cerrina F, Crapella S, Vento G. Evaluation of x-ray resists for submicron lithography Microelectronic Engineering. 6: 519-525. DOI: 10.1016/0167-9317(87)90082-7  0.343
1986 Lai B, Mitchell G, Wells GM, Cerrina F. The University of Wisconsin X-ray lithography beamline: First results Nuclear Inst. and Methods in Physics Research, A. 246: 681-686. DOI: 10.1016/0168-9002(86)90173-7  0.326
1986 Lai B, Cerrina F, Pouey M. A new undulator grazing incidence monochromator Nuclear Inst. and Methods in Physics Research, A. 246: 297-302. DOI: 10.1016/0168-9002(86)90095-1  0.306
Low-probability matches (unlikely to be authored by this person)
1992 Hansen ME, Chen HTH, Chen G, Engelstad RL, Cerrina F. Novel x‐ray mask distortion measurement technique employing holographic gratings and phase‐shifting interferometry Journal of Vacuum Science & Technology B. 10: 2657-2661. DOI: 10.1116/1.586020  0.299
1993 Guo JZY, Leonard Q, Cerrina F, Fabrizio ED, Luciani L, Gentili M, Frank J. Experimental study of aerial images in x‐ray lithography Journal of Vacuum Science & Technology B. 11: 2902-2905. DOI: 10.1116/1.586558  0.299
2008 Lockett MR, Weibel SC, Phillips MF, Shortreed MR, Sun B, Corn RM, Hamers RJ, Cerrina F, Smith LM. Carbon-on-metal films for surface plasmon resonance detection of DNA arrays. Journal of the American Chemical Society. 130: 8611-3. PMID 18597426 DOI: 10.1021/Ja802454C  0.299
1997 Dicks G, Bedford F, Engelstad R, Cerrina F. X-ray mask temperature distribution and magnification control Microelectronic Engineering. 35: 561-563. DOI: 10.1016/S0167-9317(96)00160-8  0.299
2000 Cerrina F. X-ray imaging: applications to patterning and lithography Journal of Physics D: Applied Physics. 33. DOI: 10.1088/0022-3727/33/12/201  0.298
1986 Wells GM, Cerrina F. Differential pumping: Is it really effective? Nuclear Inst. and Methods in Physics Research, A. 246: 790-793. DOI: 10.1016/0168-9002(86)90194-4  0.297
1993 Reilly M, Wells GM, Guo J, Wallace JP, Edwards N, Cerrina F, Melngailis J. X‐ray mask replication using square synchrotron radiation illumination Journal of Vacuum Science & Technology B. 11: 2971-2975. DOI: 10.1116/1.586570  0.296
1987 Cerrina F, Lai B, Wells GM, Wiley JR, Kilday DG, Margaritondo G. Synchrotron-radiation-induced surface nitridation of silicon at room temperature Applied Physics Letters. 50: 533-534. DOI: 10.1063/1.98150  0.295
1991 Mercanti D, De Stasio G, Ciotti MT, Capasso C, Ng W, Ray‐Chaudhuri AK, Liang SH, Cole RK, Guo ZY, Wallace J, Margaritondo G, Cerrina F, Underwood J, Perera R, Kortright J. Photoelectron microscopy in the life sciences: Imaging neuron networks Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 9: 1320-1322. DOI: 10.1116/1.577619  0.295
1999 Khan M, Cerrina F, Toyota E. Pattern resolution of an x-ray beamline with a wide exposure field Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3433. DOI: 10.1116/1.591025  0.294
1988 Cerrina F, Hoechst H, Rosenberg R, Yates B, Lai B, Beall C, Mancini D, Niles DW, Kelly MK, Margaritondo G, Fisher GB, Taylor JW. The general motors-University of Wisconsin extended range grasshopper beam line Nuclear Inst. and Methods in Physics Research, A. 266: 208-209. DOI: 10.1016/0168-9002(88)90385-3  0.293
1990 Baszler F, Hansen M, Cerrina F. Absolute flux measurements for x‐ray lithography beamlines Journal of Vacuum Science & Technology B. 8: 1529-1534. DOI: 10.1116/1.585110  0.29
1989 Wells GM, Chen G, White V, Wallace J, Cerrina F, Lien N. Wisconsin x-ray lithography program (invited) Review of Scientific Instruments. 60: 1636-1637. DOI: 10.1063/1.1141048  0.29
1991 Boily S, Chaker M, Pépin H, Kerdja T, Voyer J, Jean A, Kieffer JC, Leung P, Cerrina F, Wells G. SiC membranes for x‐ray masks produced by laser ablation deposition Journal of Vacuum Science & Technology B. 9: 3254-3257. DOI: 10.1116/1.585298  0.29
1980 Perfetti P, Nannarone S, Patella F, Quaresima C, Savoia A, Cerrina F, Capozi M. ENERGY LOSS SPECTROSCOPY (ELS) ON THE Si-Au SYSTEM Solid State Communications. 35: 151-153. DOI: 10.1016/0038-1098(80)90233-1  0.289
1981 Perfetti P, Nannarone S, Patella F, Quaresima C, Cerrina F, Capozi M, Savoia A, Lindau I. Low energy electron loss spectroscopy of Si–Ge interfaces Journal of Vacuum Science and Technology. 19: 319-322. DOI: 10.1116/1.571056  0.288
1999 Zhang X, Solak H, Cerrina F, Lai B, Cai Z, Ilinski P, Legnini D, Rodrigues W. Synchrotron radiation x-ray microdiffraction study of Cu interconnects. Mrs Proceedings. 590: 259. DOI: 10.1557/Proc-590-259  0.287
1993 Capasso C, Ng W, Ray-Chaudhuri AK, Liang SH, Cole RK, Guo ZY, Wallace J, Cerrina F, Underwood J, Perera R, Kortright J, Stasio GD, Margaritondo G. Surface microscopiesScanning photoemission microscopy on MAXIMUM reaches 0.1 micron resolution Surface Science Letters. DOI: 10.1016/0167-2584(93)90588-A  0.287
2011 Wang T, Oehrlein S, Somoza MM, Perez JR, Kershner R, Cerrina F. Optical tweezers directed one-bead one-sequence synthesis of oligonucleotides. Lab On a Chip. 11: 1629-37. PMID 21445444 DOI: 10.1039/C0Lc00577K  0.286
1993 Yun W, Lai B, Cai Z, Legnini D, Randall K, Krasnoperova AA, Cerrina F, Fabrizio ED. Development of X-ray focusing optics for microdiffraction Acta Crystallographica Section A. 49: 9-9. DOI: 10.1107/S0108767378099717  0.286
1992 Ng W, Wallace JP, Ray‐Chandhuri AK, Capasso C, Cerrina F. Micropositioning in MAXIMUM: Photoemission microscopy with normal incident optics (abstract) Review of Scientific Instruments. 63: 619-619. DOI: 10.1063/1.1142669  0.282
1990 Ng W, Ray-Chaudhuri AK, Cole RK, Wallace J, Crossley S, Crossley D, Chen G, Green M, Guo J, Hansen RWC, Cerrina F, Margaritondo G, Underwood JH, Korthright J, Perera RCC. Photoemission spectromicroscopy with MAXIMUM at Wisconsin Physica Scripta. 41: 758-760. DOI: 10.1088/0031-8949/41/6/006  0.281
1996 Fanfoni M, Goletti C, Chiaradia P, Ng W, Cerrina F, Hwu Y, Terrasi A, Margaritondo G. Schottky barrier at the Au/Gap (110) interface Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 14: 2433-2436. DOI: 10.1116/1.580032  0.281
2000 Yang XM, Peters RD, Nealey PF, Solak HH, Cerrina F. Guided self-assembly of symmetric diblock copolymer films on chemically nanopatterned substrates Macromolecules. 33: 9575-9582. DOI: 10.1021/Ma001326V  0.28
1988 Lai B, Chapman K, Cerrina F. SHADOW: New developments Nuclear Inst. and Methods in Physics Research, A. 266: 544-549. DOI: 10.1016/0168-9002(88)90444-5  0.274
2002 Cerrina F, Blattner F, Huang W, Hue Y, Green R, Singh-Gasson S, Sussman M. Biological lithography: Development of a maskless microarray synthesizer for DNA chips Microelectronic Engineering. 61: 33-40. DOI: 10.1016/S0167-9317(02)00566-X  0.273
2012 Wang T, Jiang F, Oehrlein S, Zeng E, Kershner R, Cerrina F. Optical trapping force reduction and manipulation of nanoporous beads. Applied Physics Letters. 100: 153702-1537023. PMID 22550360 DOI: 10.1063/1.3703604  0.272
1989 Vladimirsky Y, Maldonado J, Fair R, Acosta R, Vladimirsky O, Viswanathan R, Voelker H, Cerrina F, Wells GM, Hansen M, Nachman R. Thermal effects in x‐ray masks during synchrotron storage ring irradiation Journal of Vacuum Science & Technology B. 7: 1657-1661. DOI: 10.1116/1.584509  0.271
1991 Stasio Gd, Capasso C, Ng W, Ray-Chaudhuri AK, Liang SH, Cole RK, Guo ZY, Wallace J, Cerrina F, Margaritondo G, Underwood J, Perera R, Kortright J, Mercanti D, Ciotti MT, et al. High-Resolution Photoelectron Microimaging of Neuron Networks Europhysics Letters (Epl). 16: 411-414. DOI: 10.1209/0295-5075/16/4/016  0.27
2003 Alianelli L, Sanchez del Rio M, Khan M, Cerrina F. A comment on 'A new ray-tracing program RIGTRACE for X-ray optical systems' [J. Synchrotron Rad. (2001), 8, 1047-1050]. Journal of Synchrotron Radiation. 10: 191-2. PMID 12606800 DOI: 10.1107/S090904950202352X  0.269
1993 Wells GM, Reilly M, Nachman R, Cerrina F, Khakani MAE, Chaker M. Characterization of a Silicon Nitride Mask Membrane Process Mrs Proceedings. 306: 81. DOI: 10.1557/Proc-306-81  0.269
1993 Cerrina F, Ray-Chaudhuri AK, Ng W, Liang S, Singh S, Welnak JT, Wallace JP, Capasso C, Underwood JH, Kortright JB, Perera RCC, Margaritondo G. Microscopic-scale lateral inhomogeneities of the photoemission response of cleaved GaAs Applied Physics Letters. 63: 63-65. DOI: 10.1063/1.109698  0.267
1992 Lee KH, Campbell SA, Nachman R, Reilly M, Cerrina F. X-ray damage in low temperature ultrathin silicon dioxide Applied Physics Letters. 61: 1635-1637. DOI: 10.1063/1.108435  0.266
1986 Lai B, Cerrina F. SHADOW: A synchrotron radiation ray tracing program Nuclear Inst. and Methods in Physics Research, A. 246: 337-341. DOI: 10.1016/0168-9002(86)90101-4  0.265
2019 Perfetti P, Ng W, Ray-Chaudhuri AK, Liang SH, Singh S, Cole RK, Guo ZY, Wallace J, Capasso C, Cerrina F, Mercanti D, Ciotti MT, Gozzo F, Margaritondo G. Scanning photoemission spectromicroscopy of neurons. Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics. 48: 1478-1482. PMID 9960737 DOI: 10.1103/Physreve.48.1478  0.265
1993 Gozzo F, Marsi M, Berger H, Margaritondo G, Ottolenghi A, Ray-Chaudhuri AK, Ng W, Liang S, Singh S, Welnak JT, Wallace JP, Capasso C, Cerrina F. Microscopic-scale lateral inhomogeneities of the Schottky-barrier-formation process Physical Review B. 48: 17163-17167. DOI: 10.1103/Physrevb.48.17163  0.264
1993 White V, Bajikar S, Denton D, Cerrina F, Lai B, Yun W, Legnini D, Xiao Y, Chrzas J, DiFabrizio E, Grella L, Baciocchi M. Microfabrication of phase shifting zone plates for hard x-rays Microelectronic Engineering. 21: 99-102. DOI: 10.1016/0167-9317(93)90036-5  0.264
1988 Lai B, Wells GM, Redaelli R, Cerrina F, Tan K, Underwood JH, Kortright J. Direct observation of surface standing waves in MoSi multilayers Nuclear Instruments & Methods in Physics Research Section a-Accelerators Spectrometers Detectors and Associated Equipment. 266: 684-685. DOI: 10.1016/0168-9002(88)90465-2  0.263
2002 Divan R, Mancini DC, Moldovan N, Lai B, Assoufid L, Leonard Q, Cerrina F. Progress in the fabrication of high-aspect-ratio zone plates by soft X-ray lithography Proceedings of Spie - the International Society For Optical Engineering. 4783: 82-91. DOI: 10.1117/12.451019  0.262
1994 Pan S, Leonard Q, Taylor JW, Reilly MT, Cerrina F, Fabrizio ED. An Optimization Design Method for Chemically Amplified Resist Process Control Ieee Transactions On Semiconductor Manufacturing. 7: 325-332. DOI: 10.1109/66.311336  0.259
1993 Campbell SA, Lee KH, Li HH, Nachman R, Cerrina F. Charge trapping and device degradation induced by x-ray irradiation in metal-oxide-semiconductor field-effect transistors Applied Physics Letters. 63: 1646-1647. DOI: 10.1063/1.110723  0.256
1991 Chen G, Wallace J, Cerrina F, Palmer S, Newell B, Randall J. Experimental evaluation of the two‐state alignment system Journal of Vacuum Science & Technology B. 9: 3222-3226. DOI: 10.1116/1.585291  0.254
1997 Cerrina F. Application of X rays to nanolithography Proceedings of the Ieee. 85: 644-651. DOI: 10.1109/5.573753  0.252
1994 Ng W, Ray-Chaudhuri AK, Liang S, Singh S, Solak H, Cerrina F, Margaritondo G, Brillson L, Franciosi A, Underwood JH, Kortrigki JB, Perera RCC. Study of Surfaces and Interfaces by Scanning Photoemission Microscopy Synchrotron Radiation News. 7: 25-29. DOI: 10.1080/08940889408261261  0.252
1983 Piancastelli MN, Cerrina F, Margaritondo G, Franciosi A, Weaver JH. Strongly bound chemisorption state for benzene on silicon Applied Physics Letters. 42: 990-991. DOI: 10.1063/1.93825  0.251
1987 Niles DW, Lai B, McKinley JT, Margaritondo G, Wells G, Cerrina F, Gualtieri GJ, Schwartz GP. Summary Abstract: A nondestructive synchrotron radiation photoemission study of the band lineup for buried GaSb–AlSb interfaces Journal of Vacuum Science & Technology B. 5: 1286-1287. DOI: 10.1116/1.583821  0.251
2008 Efremov MY, Soofi SS, Kiyanova AV, Munoz CJ, Burgardt P, Cerrina F, Nealey PF. Vacuum ellipsometry as a method for probing glass transition in thin polymer films. The Review of Scientific Instruments. 79: 043903. PMID 18447531 DOI: 10.1063/1.2901601  0.248
1988 Levy RA, Resnick DJ, Frye RC, Yanof AW, Wells GM, Cerrina F. An improved boron nitride technology for synchrotron x‐ray masks Journal of Vacuum Science & Technology B. 6: 154-161. DOI: 10.1116/1.584035  0.245
2019 Gozzo F, Berger H, Collins IR, Margaritondo G, Ng W, Ray-Chaudhuri AK, Liang S, Singh S, Cerrina F. Microscopic-scale lateral inhomogeneities of the GaSe-Ge heterojunction energy lineup. Physical Review. B, Condensed Matter. 51: 5024-5027. PMID 9979374 DOI: 10.1103/Physrevb.51.5024  0.245
1988 Cerrina F, Wallace DJ, Pruett CH, Lien NC. Computer controlled machining of bent mirrors Nuclear Inst. and Methods in Physics Research, A. 266: 392-393. DOI: 10.1016/0168-9002(88)90416-0  0.245
1994 Nachman R, Cerrina F. Effect of Phosphorus-Doped Polysilicon Anneal on Thin Oxide Reliability as Probed with X-Ray Damage Characterization Mrs Proceedings. 338. DOI: 10.1557/Proc-338-63  0.245
1985 Krause MO, Carlson TA, Svensson WA, Fahlman A, Cerrina F, Grimm FA, Whitley TA. Autoionization resonances in the outer regions of atoms and molecules as probed with synchrotron radiation Nuclear Inst. and Methods in Physics Research, B. 10: 318-322. DOI: 10.1016/0168-583X(85)90260-5  0.243
1996 Ted Liang S, Cerrina F, Lucatorto T. Novel x-ray mask inspection tool based on transmission x-ray conversion microscope Proceedings of Spie - the International Society For Optical Engineering. 2723: 211-220. DOI: 10.1117/12.240473  0.243
1989 Cerrina F, Lai B, Gong C, Ray‐Chaudhuri A, Margaritondo G, Green MA, Höchst H, Cole R, Crossley D, Collier S, Underwood J, Brillson LJ, Franciosi A, DeLuca PM, Gould MN. MAXIMUM: Status of the scanning photoelectron microscope (abstract) Review of Scientific Instruments. 60: 2249-2249. DOI: 10.1063/1.1140782  0.243
2004 Taylor JW, Malueg DH, Cerrina F, Khan M, Thielman D. Modeling for sub-50 nm X-ray application with phase masks Proceedings of Spie - the International Society For Optical Engineering. 5374: 311-315. DOI: 10.1117/12.535422  0.241
1993 Pan S‐, Reilly MT, Taylor JW, Cerrina F. Optimization design program for chemically amplified resist process Journal of Vacuum Science & Technology B. 11: 2845-2849. DOI: 10.1116/1.586613  0.24
2019 Gozzo F, Marsi M, Berger H, Margaritondo G, Ottolenghi A, Ray-Chaudhuri AK, Ng W, Liang S, Singh S, Welnak JT, Wallace JP, Capasso C, Cerrina F. Erratum: Microscopic-scale lateral inhomogeneities of the Schottky-barrier-formation process Physical Review. B, Condensed Matter. 49: 14085. PMID 10021609 DOI: 10.1103/Physrevb.49.14085.2  0.24
1988 Green M, Kelly M, Lai B, Otte R, Rowe E, Stott J, Trzeciak W, Wallace D, Winter W, Cerrina F, Margaritondo G, Huber D, Winick H. First undulator operation at SRC Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 266: 91-95. DOI: 10.1016/0168-9002(88)90365-8  0.237
1990 Stasio GD, Margaritondo G, Capasso C, Cerrina F. X‐ray photoemission enters the life sciences X‐Ray and Inner‐Shell Processes. 215: 231-241. DOI: 10.1063/1.39794  0.237
2000 Kim Y, Subramanya SG, Krueger J, Siegle H, Shapiro N, Armitage R, Feick H, Weber ER, Kisielowski C, Yang Y, Cerrina F. Improved Heteroepitaxial MBE GaN Growth with a Ga Metal Buffer Layer Mrs Proceedings. 622. DOI: 10.1557/Proc-622-T4.10.1  0.236
1984 Margaritondo G, Cerrina F, Capasso C, Patella F, Perfetti P, Quaresima C, Grunthaner FJ. ZnSeGe heterojunction interface states in the energy region of the valence band discontinuity Solid State Communications. 52: 495-498. DOI: 10.1016/0038-1098(84)90862-7  0.235
2009 Lackey JG, Mitra D, Somoza MM, Cerrina F, Damha MJ. Acetal levulinyl ester (ALE) groups for 2'-hydroxyl protection of ribonucleosides in the synthesis of oligoribonucleotides on glass and microarrays. Journal of the American Chemical Society. 131: 8496-502. PMID 19485360 DOI: 10.1021/Ja9002074  0.229
1980 Cerrina F, Quaresima C, Abbati I, Braicovich L, Picco P, Margaritondo G. Electronic states of CdIn2S4 and of other II-III2-VI4 compounds: How sensitive are they to the crystal structure? Solid State Communications. 33: 429-431. DOI: 10.1016/0038-1098(80)90436-6  0.229
2001 Kim Y, Shapiro NA, Feick H, Armitage R, Weber ER, Yang Y, Cerrina F. Elastic strain relief in nitridated Ga metal buffer layers for epitaxial GaN growth Applied Physics Letters. 78: 895-897. DOI: 10.1063/1.1347016  0.228
1983 Krause MO, Cerrina F, Fahlman A. Population of the three major exit channels in the 3d resonance region of atomic gallium Physical Review Letters. 50: 1118-1121. DOI: 10.1103/Physrevlett.50.1118  0.225
2007 Huang W, Cerrina F. The con-focal method on verifying focal plane of MAS machine: erratum. Optics Express. 15: 1954. PMID 19532435 DOI: 10.1364/Oe.15.001954  0.225
2002 Dai J, Ober CK, Wang L, Cerrina F, Nealey P. Organoelement resists for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 4690: 1193-1202. DOI: 10.1117/12.474197  0.221
1999 Zacchigna M, Berger H, Sirigu L, Margaritondo G, Lorusso GF, Solak H, Cerrina F. A spectromicroscopy study of the Al/GaS interface: Evidence of band bending lateral inhomogeneities Journal of Electron Spectroscopy and Related Phenomena. 103: 671-675. DOI: 10.1016/S0368-2048(98)00334-X  0.22
1993 Cerrina F, Baszler F, Turner S, Khan M. Transmit: A beamline modelling program Microelectronic Engineering. 21: 103-106. DOI: 10.1016/0167-9317(93)90037-6  0.213
1993 Liang S, Ray-Chaudhuri AK, Ng W, Singh S, Welnak JT, Cerrina F. A Spectromicroscopic Study of Corrosion in AI-Cu-Si Metallization Mrs Proceedings. 309: 449. DOI: 10.1557/Proc-309-449  0.207
1998 Simon K, Macklin R, Selzer R, Vladimirsky O, Vladimirsky Y, Cerrina F. Analysis and identification of factors contributing to the overlay budget Proceedings of Spie - the International Society For Optical Engineering. 3331: 157-164. DOI: 10.1117/12.309567  0.204
1998 Feng Z, Engelstad RL, Lovell EG, Cerrina F. Transient thermal distortions of x-ray mask membranes during exposure scanning Proceedings of Spie - the International Society For Optical Engineering. 3331: 261-274. DOI: 10.1117/12.309579  0.196
1986 Krause MO, Svensson A, Fahlmann A, Carlson TA, Cerrina F. Autoionization resonances in atomic Ga, In, and Pb Zeitschrift FüR Physik D Atoms, Molecules and Clusters. 2: 327-335. DOI: 10.1007/Bf01426237  0.196
1998 Chen Z, Vladimirsky Y, Cerrina F, Lai B, Yun W, Gluskin E. 0.1 μm high aspect ratio pattern replication and linewidth control Proceedings of Spie - the International Society For Optical Engineering. 3331: 591-600. DOI: 10.1117/12.309620  0.194
1983 Krause MO, Cerrina F, Fahlman A, Carlson TA. Evidence for resonance states of lead decaying into two exit channels with counterbalancing contributions Physical Review Letters. 51: 2093-2096. DOI: 10.1103/Physrevlett.51.2093  0.193
1998 Lai B, Yun W, Maser J, Cai Z, Rodrigues W, Legnini D, Chen Z, Krasnoperova AA, Vladimirsky Y, Cerrina F, Di Fabrizio E, Gentili M. Advanced zone plate microfocusing optics Proceedings of Spie - the International Society For Optical Engineering. 3449: 133-136. DOI: 10.1117/12.330340  0.186
2003 Ali MA, Gonsalves KE, Batina N, Golovkina V, Cerrina F. High sensitivity nanocomposite resist materials for X-ray and EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 5039: 1173-1180. DOI: 10.1117/12.485139  0.184
2007 Wei H, Cerrina F. The con-focal method on verifying focal plane of MAS machine Optics Express. 15: 872-877. DOI: 10.1364/OE.15.000872  0.184
1996 Ng W, Perera R, Underwood J, Singh S, Solak H, Cerrina F. Installation of the MAXIMUM microscope at the ALS Review of Scientific Instruments. 67: 3358-3359. DOI: 10.1063/1.1147384  0.178
1998 Shamoun B, Sprague M, Engelstad R, Cerrina F. Photomask in-plane distortion induced during e-beam patterning Proceedings of Spie - the International Society For Optical Engineering. 3331: 275-279. DOI: 10.1117/12.309581  0.177
2011 del Rio MS, Canestrari N, Jiang F, Cerrina F. SHADOW3: a new version of the synchrotron X-ray optics modelling package. Journal of Synchrotron Radiation. 18: 708-16. PMID 21862849 DOI: 10.1107/S0909049511026306  0.176
2004 Malueg DH, Khan M, Cerrina F, Taylor JW. Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray Application Japanese Journal of Applied Physics. 43: 3722-3727. DOI: 10.1143/JJAP.43.3722  0.171
2001 Khan M, Han G, Maldonado J, Cerrina F. New results in high energy proximity x-ray lithography Proceedings of Spie - the International Society For Optical Engineering. 4343: 176-181. DOI: 10.1117/12.436639  0.162
1997 Krasnoperov NL, Chen Z, Cerrina F. E-beam-induced distortions on SiN x-ray mask membrane Proceedings of Spie - the International Society For Optical Engineering. 3050: 565-573. DOI: 10.1117/12.275949  0.16
1993 Guo JZY, Cerrina F. Modeling X-ray proximity lithography Ibm Journal of Research and Development. 37: 331-350. DOI: 10.1147/rd.373.0331  0.146
2009 Cerrina F. Guest editorial: Extreme-ultraviolet interference lithography Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3156651  0.144
1994 Moses WW, Derenzo SE, Weber MJ, Ray-Chaudhuri AK, Cerrina F. Scintillation mechanisms in cerium fluoride Journal of Luminescence. 59: 89-100. DOI: 10.1016/0022-2313(94)90026-4  0.128
2009 Zhang K, Pathak P, Cerrina F, Zhenqiang M. Performance prediction of nuclear micro power sources based on beta emitters Ecs Transactions. 19: 45-50. DOI: 10.1149/1.3247990  0.124
1974 Perfetti P, Cerrina F, Coluzza C, Margaritondo G. Lead telluride-germanium heterojunction properties Journal of Applied Physics. 45: 972-973. DOI: 10.1063/1.1663357  0.116
2010 Lackey JG, Somoza MM, Mitra D, Cerrina F, Damha MJ. ChemInform Abstract: In situ Chemical Synthesis of RU-DNA Chimeras on Chips and Enzymic Recognition Cheminform. 41: no-no. DOI: 10.1002/chin.201028266  0.097
1975 Cerrina F, Margaritondo G, Migliorato P, Perfetti P, Salusti E. Carrier injection in semiconductors: Pre-break-down electrical conduction theory Il Nuovo Cimento B Series 11. 27: 229-239. DOI: 10.1007/BF02738941  0.079
2010 Carlson CD, Warren CL, Hauschild KE, Ozers MS, Qadir N, Bhimsaria D, Lee Y, Cerrina F, Ansari AZ. Specificity landscapes of DNA binding molecules elucidate biological function Proceedings of the National Academy of Sciences of the United States of America. 107: 4544-4549. PMID 20176964 DOI: 10.1073/Pnas.0914023107  0.079
1998 Cazzanti L, Khan M, Cerrina F. Parameter extraction with neural networks Proceedings of Spie - the International Society For Optical Engineering. 3332: 654-664. DOI: 10.1117/12.308780  0.01
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