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Marcos J. Barela, Ph.D. - Publications

Affiliations: 
2003 University of New Mexico, Albuquerque, NM, United States 
Area:
Chemical Engineering, Fluid and Plasma Physics
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4 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2005 Barela MJ, Anderson HM, Oehrlein GS. Role of C 2 F 4, CF 2, and ions in C 4 F 8 Ar plasma discharges under active oxide etch conditions in an inductively coupled GEC cell reactor Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 408-416. DOI: 10.1116/1.1874173  0.392
2003 Li X, Ling L, Hua X, Fukasawa M, Oehrlein GS, Barela M, Anderson HM. Effects of Ar and O2 additives on SiO2 etching in C4F8-based plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 284-293. DOI: 10.1116/1.1531140  0.399
2002 Li X, Hua X, Ling L, Oehrlein GS, Barela M, Anderson HM. Fluorocarbon-based plasma etching of Sio2: Comparison of C4F6/Ar and C4F8/Ar discharges Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 2052-2061. DOI: 10.1116/1.1517256  0.448
2001 Perry WL, Waters K, Barela M, Anderson HM. Oxide etch behavior in a high-density, low-pressure, inductively coupled C2F6 plasma: Etch rates, selectivity to photoresist, plasma parameters, and CFx radical densities Journal of Vacuum Science and Technology. 19: 2272-2281. DOI: 10.1116/1.1382874  0.444
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