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Marc Schaepkens - Publications

Affiliations: 
State University of New York, Albany, Albany, NY, United States 
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5 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2003 Li X, Oehrlein GS, Schaepkens M, Ellefson RE, Frees LC. Spatially resolved mass spectrometric sampling of inductively coupled plasmas using a movable sampling orifice Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 1971-1977. DOI: 10.1116/1.1619413  0.411
2001 Schaepkens M, Oehrlein GS. A Review of SiO2 Etching Studies in Inductively Coupled Fluorocarbon Plasmas Journal of the Electrochemical Society. 148. DOI: 10.1149/1.1348260  0.454
1999 Li X, Schaepkens M, Oehrlein GS, Ellefson RE, Frees LC, Mueller N, Korner N. Mass spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive ions, radicals and endpoint detection Journal of Vacuum Science and Technology. 17: 2438-2446. DOI: 10.1116/1.581980  0.448
1998 Schaepkens M, Oehrlein GS, Hedlund C, Jonsson LB, Blom H. Selective SiO2-to-Si3N4 etching in inductively coupled fluorocarbon plasmas: Angular dependence of SiO2 and Si3N4 etching rates Journal of Vacuum Science and Technology. 16: 3281-3286. DOI: 10.1116/1.581534  0.381
1998 Schaepkens M, Oehrlein GS. Asymmetric microtrenching during inductively coupled plasma oxide etching in the presence of a weak magnetic field Applied Physics Letters. 72: 1293-1295. DOI: 10.1063/1.121068  0.423
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