Year |
Citation |
Score |
2016 |
Colligon J, Yurasova V. Editorial for Special Issue with selected papers from the 22nd International Conference on the Interaction of Ions with Surfaces Vacuum. 129: 135-136. DOI: 10.1016/J.Vacuum.2016.04.009 |
0.37 |
|
2014 |
Vishnyakov V, Crisan O, Dobrosz P, Colligon J. Ion sputter-deposition and in-air crystallisation of Cr2AlC films Vacuum. 100: 61-65. DOI: 10.1016/J.Vacuum.2013.07.045 |
0.462 |
|
2013 |
Vishnyakov V, Lu J, Eklund P, Hultman L, Colligon J. Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C Vacuum. 93: 56-59. DOI: 10.1016/J.Vacuum.2013.01.003 |
0.405 |
|
2012 |
Colligon J, Yurasova V. 20th International Conference on Ion Surface Interactions (ISI-2012) Vacuum. 86: 1613. DOI: 10.1016/J.Vacuum.2011.12.017 |
0.366 |
|
2011 |
Vishnyakov VM, Ehiasarian AP, Vishnyakov V, Hovsepian P, Colligon J. Amorphous Boron containing silicon carbo-nitrides created by ion sputtering Surface & Coatings Technology. 206: 149-154. DOI: 10.1016/J.Surfcoat.2011.07.002 |
0.48 |
|
2010 |
Milosavljević M, Wong L, Lourenço M, Valizadeh R, Colligon J, Shao G, Homewood K. Correlation of structural and optical properties of sputtered FeSi 2 thin films Japanese Journal of Applied Physics. 49. DOI: 10.1143/Jjap.49.081401 |
0.395 |
|
2006 |
Whitehead KA, Rogers D, Colligon J, Wright C, Verran J. Use of the atomic force microscope to determine the effect of substratum surface topography on the ease of bacterial removal. Colloids and Surfaces. B, Biointerfaces. 51: 44-53. PMID 16822658 DOI: 10.1016/J.Colsurfb.2006.05.003 |
0.305 |
|
2005 |
Whitehead KA, Colligon J, Verran J. Retention of microbial cells in substratum surface features of micrometer and sub-micrometer dimensions. Colloids and Surfaces. B, Biointerfaces. 41: 129-38. PMID 15737538 DOI: 10.1016/J.Colsurfb.2004.11.010 |
0.315 |
|
2005 |
Milosavljević M, Shao G, Loureņo MA, Gwilliam RM, Homewood KP, Edwards SP, Valizadeh R, Colligon JS. Transition from amorphous to crystalline beta phase in co-sputtered Fe Si2 films as a function of temperature Journal of Applied Physics. 98. DOI: 10.1063/1.2148629 |
0.397 |
|
2005 |
Polini R, Amar M, Ahmed W, Kumashiro S, Sein H, Colligon J. A study of diamond synthesis by hot filament chemical vapour deposition on nanocomposite coatings Thin Solid Films. 489: 116-121. DOI: 10.1016/J.Tsf.2005.04.119 |
0.437 |
|
2005 |
Colligon J, Vishnyakov V, Valizadeh R, Donnelly SE, Kumashiro S. Study of nanocrystalline TiN/Si3N4 thin films deposited using a dual ion beam method Thin Solid Films. 485: 148-154. DOI: 10.1016/J.Tsf.2005.03.036 |
0.451 |
|
2004 |
Colligon JS. Ion-assisted sputter deposition. Philosophical Transactions. Series a, Mathematical, Physical, and Engineering Sciences. 362: 103-16. PMID 15306278 DOI: 10.1098/rsta.2003.1303 |
0.381 |
|
2004 |
Whitehead KA, Colligon JS, Verran J. The production of surfaces of defined topography and chemistry for microbial retention studies, using ion beam sputtering technology International Biodeterioration and Biodegradation. 54: 143-151. DOI: 10.1016/J.Ibiod.2004.03.010 |
0.4 |
|
1996 |
Arnell R, Colligon J, Minnebaev K, Yurasova V. The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering Vacuum. 47: 425-431. DOI: 10.1016/0042-207X(95)00241-3 |
0.409 |
|
1995 |
Colligon J, Kheyrandish H, Carter G, Simmonds M. The modification of alloys by low energy ion-assisted deposition Vacuum. 46: 919-922. DOI: 10.1016/0042-207X(95)00072-0 |
0.452 |
|
1994 |
Valizadeh R, Colligon J, Donnelly SE, Faunce CA, Park D, Kheyrandish H. Composition and Structure of Zirconium Nitride Films Produced by Ion Assisted Deposition Mrs Proceedings. 354. DOI: 10.1557/Proc-354-81 |
0.492 |
|
1992 |
Colligon J, Kheyrandish H, Kaye S. Ion bombardment effects on SnO2 and MoS2 films Vacuum. 43: 135. DOI: 10.1016/0042-207X(92)90199-7 |
0.461 |
|
1989 |
Colligon J, Kheyrandish H. Radiation enhanced adhesion of thin films Vacuum. 39: 705-710. DOI: 10.1016/0042-207X(89)90021-3 |
0.398 |
|
1987 |
Hull T, Colligon J, Hill A. Measurement of thin film adhesion Vacuum. 37: 327-330. DOI: 10.1016/0042-207X(87)90018-2 |
0.37 |
|
1986 |
Colligon J. Surface modification by ion beams Vacuum. 36: 413-418. DOI: 10.1016/0042-207X(86)90218-6 |
0.418 |
|
1984 |
Colligon J, Hill A, Kheyrandish H. Applications of dynamic recoil mixing (DRM) Vacuum. 34: 843-846. DOI: 10.1016/0042-207X(84)90161-1 |
0.35 |
|
1982 |
Grant W, Colligon J. Ion beam techniques for material modification Vacuum. 32: 675-683. DOI: 10.1016/0042-207X(82)94047-7 |
0.425 |
|
1982 |
Bolouri H, Colligon J. A simple efficient SIMS apparatus for use on accelerator beam lines Vacuum. 32: 293-295. DOI: 10.1016/0042-207X(82)93817-9 |
0.346 |
|
1979 |
Colligon J, Kiriakidis G. Effect of impurities on SIMS Vacuum. 29: 357-360. DOI: 10.1016/0042-207X(79)90314-2 |
0.475 |
|
1974 |
Colligon J. Surface compositional analysis using low energy ion bombardment induced emission processes Vacuum. 24: 373-388. DOI: 10.1016/0042-207X(74)92117-4 |
0.325 |
|
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