Jiangtao Hu, Ph.D.
Affiliations: | 2000 | Harvard University, Cambridge, MA, United States |
Area:
nanoscienceGoogle:
"Jiangtao Hu"Mean distance: 7.85 | S | N | B | C | P |
Parents
Sign in to add mentor| Charles M. Lieber | grad student | 2000 | Harvard | |
| (Synthesis of novel materials by pulsed laser deposition and chemical vapor deposition: Part I: Energetic deposition and stability of carbon nitride thin films. Part II: Catalytic growth of one dimensional materials and devices.) | ||||
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Publications
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| Hong W, Guo X, Zhang T, et al. (2023) Flexible Capacitive Pressure Sensor with High Sensitivity and Wide Range Based on a Cheetah Leg Structure via 3D Printing. Acs Applied Materials & Interfaces |
| Li J, Zangooie S, Boinapally K, et al. (2014) Scatterometry performance improvement by parameter and spectrum feed-forward Proceedings of Spie. 9050 |
| Li J, Zangooie S, Boinapally K, et al. (2014) Scatterometry performance enhancement by holistic approach Journal of Micro/Nanolithography, Mems, and Moems. 13: 041406 |
| Chin H, Ling M, Liu B, et al. (2013) Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry Proceedings of Spie. 8681 |
| Dasari P, Kritsun O, Li J, et al. (2013) Scatterometry evaluation of focus-dose effects of EUV structures Proceedings of Spie. 8681 |
| Li J, Kritsun O, Dasari P, et al. (2013) Evaluating scatterometry 3D capabilities for EUV Proceedings of Spie. 8681 |
| Li J, Kritsun O, Liu Y, et al. (2012) Faster diffraction-based overlay measurements with smaller targets using 3D gratings Proceedings of Spie. 8324 |
| Dasari P, Li J, Hu J, et al. (2012) Scatterometry metrology challenges of EUV Proceedings of Spie. 8324 |
| Dasari P, Li J, Hu J, et al. (2011) Metrology characterization of spacer double patterning by scatterometry Proceedings of Spie. 7971: 797111 |
| Li J, Kritsun O, Liu Y, et al. (2011) Advancements of diffraction-based overlay metrology for double patterning Proceedings of Spie. 7971 |