☰

Kyuhwan Chang, Ph.D. - Publications

Affiliations: 
2005 Pennsylvania State University, State College, PA, United States 
Area:
Electronics and Electrical Engineering, Materials Science Engineering, Condensed Matter Physics
Tree Info Similar researchers PubMed Report error

5 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Wu CH, Huang BW, Chang KM, Wang SJ, Lin JH, Hsu JM. The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel. Journal of Nanoscience and Nanotechnology. 16: 6044-8. PMID 27427669  0.378
2007 Chang K, Shanmugasundaram K, Shallenberger J, Ruzyllo J. Studies of Hf(Si,O) dielectrics for metal-oxide-semiconductor applications Thin Solid Films. 515: 3802-3805. DOI: 10.1016/J.Tsf.2006.09.048  0.656
2007 Shanmugasundaram K, Brubaker M, Chang K, Mumbauer P, Roman P, Ruzyllo J. Studies of solution processed metal oxides on silicon Microelectronic Engineering. 84: 2294-2297. DOI: 10.1016/J.Mee.2007.04.098  0.665
2006 Chang K, Chang FM, Ruzyllo J. Charge trapping in HfO2 and HfSiO4 MOS gate dielectrics Solid-State Electronics. 50: 1670-1672. DOI: 10.1016/J.Sse.2006.08.010  0.627
2004 Chang K, Shanmugasundaram K, Lee DO, Roman P, Wu CT, Wang J, Shallenberger J, Mumbauer P, Grant R, Ridley R, Dolny G, Ruzyllo J. Silicon surface treatments in advanced MOS gate processing Microelectronic Engineering. 72: 130-135. DOI: 10.1016/J.Mee.2003.12.028  0.665
Show low-probability matches.