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Hong Xu, Ph.D. - Publications

Affiliations: 
2016-2018 Materials Science & Engineering Cornell University, Ithaca, NY, United States 
 2018- Nuclear Engineering Tsinghua University 
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12 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Huang J, Xu H, Peretz E, Wu D, Ober CK, Hanrath T. Three-Dimensional Printing of Hierarchical Porous Architectures Chemistry of Materials. 31: 10017-10022. DOI: 10.1021/Acs.Chemmater.9B02761  0.421
2019 Menzel M, Chen W, Simancas K, Xu H, Prucker O, Ober CK, Rühe J. Entropic death of nonpatterned and nanopatterned polyelectrolyte brushes Journal of Polymer Science Part a: Polymer Chemistry. 57: 1283-1295. DOI: 10.1002/Pola.29384  0.485
2018 Ober CK, Kosma V, Xu H, Sakai K, Giannelis EP. The Challenges of Highly Sensitive EUV Photoresists Journal of Photopolymer Science and Technology. 31: 261-265. DOI: 10.2494/Photopolymer.31.261  0.433
2018 Xu H, Kosma V, Sakai K, Giannelis EP, Ober CK. EUV photolithography: resist progress in metal–organic complex photoresists Journal of Micro-Nanolithography Mems and Moems. 18: 11007. DOI: 10.1117/1.Jmm.18.1.011007  0.51
2018 Sakai K, Xu H, Kosma V, Giannelis EP, Ober CK. Progress in metal organic cluster EUV photoresists Journal of Vacuum Science & Technology B. 36: 06J504. DOI: 10.1116/1.5050942  0.463
2018 Xu H, Sakai K, Kasahara K, Kosma V, Yang K, Herbol HC, Odent J, Clancy P, Giannelis EP, Ober CK. Metal–Organic Framework-Inspired Metal-Containing Clusters for High-Resolution Patterning Chemistry of Materials. 30: 4124-4133. DOI: 10.1021/Acs.Chemmater.8B01573  0.452
2017 Kasahara K, Xu H, Kosma V, Odent J, Giannelis EP, Ober CK. Recent Progress in EUV Metal Oxide Photoresists Journal of Photopolymer Science and Technology. 30: 93-97. DOI: 10.2494/Photopolymer.30.93  0.439
2017 Kasahara K, Xu H, Kosma V, Odent J, Giannelis EP, Ober CK. Nanoparticle photoresist studies for EUV lithography Proceedings of Spie. 10143: 1014308. DOI: 10.1117/12.2258187  0.505
2017 Kosma V, Kasahara K, Xu H, Odent J, Ober CK. Elucidating the patterning mechanism of zirconium-based hybrid photoresists Journal of Micro/Nanolithography, Mems, and Moems. 16: 1. DOI: 10.1117/1.Jmm.16.4.041007  0.471
2017 Xu H, Kosma V, Giannelis EP, Ober CK. In pursuit of Moore’s Law: polymer chemistry in action Polymer Journal. 50: 45-55. DOI: 10.1038/Pj.2017.64  0.435
2016 Yu M, Xu H, Kosma V, Odent J, Kasahara K, Giannelis E, Ober C. Positive Tone Nanoparticle Photoresists: New Insight on the Patterning Mechanism Journal of Photopolymer Science and Technology. 29: 509-512. DOI: 10.2494/Photopolymer.29.509  0.441
2016 Kasahara K, Kosma V, Odent J, Xu H, Yu M, Giannelis EP, Ober CK. Recent progress in nanoparticle photoresists development for EUV lithography Proceedings of Spie. 9776: 977604. DOI: 10.1117/12.2218704  0.515
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