Ye Xu - Publications
Affiliations: | 2006 | Materials Science and Engineering | Stanford University, Palo Alto, CA |
Year | Citation | Score | |||
---|---|---|---|---|---|
2005 | Xu Y, Musgrave CB. Atomic layer deposition of high- κ dielectrics on nitrided silicon surfaces Applied Physics Letters. 86: 1-3. DOI: 10.1063/1.1922080 | 0.529 | |||
2005 | Xu Y, Musgrave CB. A chemical mechanism for nitrogen incorporation into HfO2 ALD films using ammonia and alkylamide as precursors Surface Science. 591: L280-L285. DOI: 10.1016/J.Susc.2005.06.032 | 0.516 | |||
2005 | Xu Y, Musgrave CB. Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors Chemical Physics Letters. 407: 272-275. DOI: 10.1016/J.Cplett.2005.03.084 | 0.526 | |||
2004 | Xu Y, Musgrave CB. A DFT Study of the Al2O3 Atomic Layer Deposition on SAMs: Effect of SAM Termination Chemistry of Materials. 16: 646-653. DOI: 10.1021/Cm035009P | 0.505 | |||
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