63 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2011 Reiche M, Moutanabbir O, Hoentschel J, Hähnel A, Flachowsky S, Gösele U, Horstmann M. Strained Silicon Nanodevices Mechanical Stress On the Nanoscale: Simulation, Material Systems and Characterization Techniques. 131-150. DOI: 10.1002/9783527639540.ch6  0.557
2010 Lee J, Berger A, Cagnon L, Gösele U, Nielsch K, Lee J. Disproportionation of thermoelectric bismuth telluride nanowires as a result of the annealing process. Physical Chemistry Chemical Physics : Pccp. 12: 15247-50. PMID 21046022 DOI: 10.1039/C0Cp00749H  0.59
2010 Yang RB, Zakharov N, Moutanabbir O, Scheerschmidt K, Wu LM, Gösele U, Bachmann J, Nielsch K. The transition between conformal atomic layer epitaxy and nanowire growth. Journal of the American Chemical Society. 132: 7592-4. PMID 20469861 DOI: 10.1021/Ja102590V  0.781
2010 Qin Y, Kim Y, Zhang L, Lee SM, Yang RB, Pan A, Mathwig K, Alexe M, Gösele U, Knez M. Preparation and elastic properties of helical nanotubes obtained by atomic layer deposition with carbon nanocoils as templates Small. 6: 910-914. PMID 20397206 DOI: 10.1002/smll.200902159  0.656
2010 Moutanabbir O, Reiche M, Hähnel A, Erfurth W, Gösele U, Motohashi M, Tarun A, Hayazawa N, Kawata S. Nanoscale patterning induced strain redistribution in ultrathin strained Si layers on oxide. Nanotechnology. 21: 134013. PMID 20208119 DOI: 10.1088/0957-4484/21/13/134013  0.608
2010 Moutanabbir O, Gösele U. Heterogeneous integration of compound semiconductors Annual Review of Materials Research. 40: 469-500. DOI: 10.1146/Annurev-Matsci-070909-104448  0.582
2010 Moutanabbir O, Scholz R, Gösele U, Guittoum A, Jungmann M, Butterling M, Krause-Rehberg R, Anwand W, Egger W, Sperr P. Experimental elucidation of vacancy complexes associated with hydrogen ion-induced splitting of bulk GaN Physical Review B - Condensed Matter and Materials Physics. 81. DOI: 10.1103/Physrevb.81.115205  0.558
2010 Moutanabbir O, Reiche M, Hähnel A, Erfurth W, Gösele U, Motohashi M, Tarun A, Hayazawa N, Kawata S. Nanoscale patterning induced strain redistribution in ultrathin strained Si layers on oxide Nanotechnology. 21. DOI: 10.1088/0957-4484/21/13/134013  0.589
2010 Lee J, Berger A, Cagnon L, Gösele U, Nielsch K. Disproportionation of thermoelectric bismuth telluride nanowires as a result of the annealing process Physical Chemistry Chemical Physics. 12: 15247-15250. DOI: 10.1039/c0cp00749h  0.586
2010 Yang RB, Zakharov N, Moutanabbir O, Scheerschmidt K, Wu LM, Gösele U, Bachmann J, Nielsch K. The transition between conformal atomic layer epitaxy and nanowire growth Journal of the American Chemical Society. 132: 7592-7594. DOI: 10.1021/ja102590v  0.776
2010 Liu L, Albrecht O, Pippel E, Nielsch K, Gösele U. A novel synthesis of ultrathin CoPt3 nanowires by dealloying larger diameter Co99Pt1 nanowires and subsequent stress-induced crack propagation Electrochemistry Communications. 12: 835-838. DOI: 10.1016/J.Elecom.2010.04.001  0.599
2010 Singh R, Christiansen SH, Moutanabbir O, Gösele U. The phenomenology of ion implantation-induced blistering and thin-layer splitting in compound semiconductors Journal of Electronic Materials. 39: 2177-2189. DOI: 10.1007/S11664-010-1334-X  0.582
2010 Moutanabbir O, Gösele U. Bulk GaN ion cleaving Journal of Electronic Materials. 39: 482-488. DOI: 10.1007/S11664-010-1100-0  0.58
2010 Lee J, Kim Y, Cagnon L, Gösele U, Nielsch K. Power factor measurements of bismuth telluride nanowires grown by pulsed electrodeposition Physica Status Solidi - Rapid Research Letters. 4: 43-45. DOI: 10.1002/Pssr.200903368  0.598
2010 Singh R, Dadwal U, Scholz R, Moutanabbir O, Christiansen S, Gösele U. Study of implantation-induced blistering/exfoliation in wide bandgap semiconductors for layer transfer applications Physica Status Solidi (C) Current Topics in Solid State Physics. 7: 44-47. DOI: 10.1002/Pssc.200982630  0.57
2010 Klammer J, Bachmann J, Töllner W, Bourgault D, Cagnon L, Gösele U, Nielsch K. Electrochemical route to thermoelectric nanowires via organic electrolytes Physica Status Solidi (B) Basic Research. 247: 1384-1392. DOI: 10.1002/Pssb.200945549  0.731
2009 Geyer N, Huang Z, Fuhrmann B, Grimm S, Reiche M, Nguyen-Duc TK, De Boor J, Leipner HS, Werner P, Gösele U. Sub-20 nm Si/Ge superlattice nanowires by metal-assisted etching Nano Letters. 9: 3106-3110. PMID 19655719 DOI: 10.1021/nl900751g  0.308
2009 Han H, Ji R, Park YJ, Lee SK, Le Rhun G, Alexe M, Nielsch K, Hesse D, Gösele U, Baik S. Wafer-scale arrays of epitaxial ferroelectric nanodiscs and nanorings. Nanotechnology. 20: 015301. PMID 19417246 DOI: 10.1088/0957-4484/20/1/015301  0.737
2009 Reiche M, Moutanabbir O, Hoentschel J, Gösele U, Flachowsky S, Horstmann M. Strained silicon devices Solid State Phenomena. 156: 61-68. DOI: 10.4028/Www.Scientific.Net/Ssp.156-158.61  0.561
2009 Moutanabbir O, Reiche M, Hähnel A, Erfurth W, Naumann F, Petzold M, Gösele U. Probing the strain states in nanopatterned strained SOI Ecs Transactions. 25: 187-194. DOI: 10.1149/1.3204406  0.516
2009 Moutanabbir O, Senz S, Scholz R, Christiansen S, Reiche M, Avramescu A, Strauss U, Gösele U. Stress adjustment and bonding of H-implanted 2 in. Freestanding GaN wafer: The concept of double-sided splitting Electrochemical and Solid-State Letters. 12: H105-H108. DOI: 10.1149/1.3066081  0.56
2009 Moutanabbir O, Scholz R, Gösele U, Terreault B. Facile synthesis of highly stable a-Si by ion implantation of low-keV H isotopes Physical Review B - Condensed Matter and Materials Physics. 79. DOI: 10.1103/Physrevb.79.233202  0.581
2009 Han H, Ji R, Park YJ, Lee SK, Rhun GL, Alexe M, Nielsch K, Hesse D, Gösele U, Baik S. Wafer-scale arrays of epitaxial ferroelectric nanodiscs and nanorings Nanotechnology. 20. DOI: 10.1088/0957-4484/20/1/015301  0.568
2009 Moutanabbir O, Reiche M, Erfurth W, Naumann F, Petzold M, Gösele U. The complex evolution of strain during nanoscale patterning of 60 nm thick strained silicon layer directly on insulator Applied Physics Letters. 94. DOI: 10.1063/1.3157134  0.59
2009 Lee J, Farhangfar S, Yang R, Scholz R, Alexe M, Gösele U, Nielsch K. A novel approach for fabrication of bismuth-silicon dioxide core-shell structures by atomic layer deposition Journal of Materials Chemistry. 19: 7050-7054. DOI: 10.1039/B908615C  0.667
2009 Yang RB, Bachmann J, Reiche M, Gerlach JW, Gösele U, Nielsch K. Atomic layer deposition of antimony oxide and antimony sulfide Chemistry of Materials. 21: 2586-2588. DOI: 10.1021/Cm900623V  0.745
2009 Moutanabbir O, Chabal YJ, Chicoine M, Christiansen S, Krause-Rehberg R, Schiettekatte F, Scholz R, Seitz O, Senz S, Süßkraut F, Gösele U. Mechanisms of ion-induced GaN thin layer splitting Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions With Materials and Atoms. 267: 1264-1268. DOI: 10.1016/J.Nimb.2009.01.028  0.554
2009 Moutanabbir O, Senz S, Zhang Z, Gösele U. Synthesis of isotopically controlled metal-catalyzed silicon nanowires Nano Today. 4: 393-398. DOI: 10.1016/J.Nantod.2009.08.009  0.604
2009 Yang RB, Bachmann J, Pippel E, Berger A, Woltersdorf J, Gösele U, Nielsch K. Pulsed vapor-liquid-solid growth of antimony selenide and antimony sulfide nanowires Advanced Materials. 21: 3170-3174. DOI: 10.1002/Adma.200803436  0.694
2008 Lee J, Farhangfar S, Lee J, Cagnon L, Scholz R, Gösele U, Nielsch K. Tuning the crystallinity of thermoelectric Bi(2)Te(3) nanowire arrays grown by pulsed electrodeposition. Nanotechnology. 19: 365701. PMID 21828882 DOI: 10.1088/0957-4484/19/36/365701  0.605
2008 Chen X, Ji R, Dai N, Scholz R, Steinhart M, Nielsch K, Gösele U. Manipulating feature sizes in Si-based grating structures by thermal oxidation. Nanotechnology. 19: 325305. PMID 21828812 DOI: 10.1088/0957-4484/19/32/325305  0.583
2008 Liu LF, Lee SW, Li JB, Alexe M, Rao GH, Zhou WY, Lee JJ, Lee W, Gösele U. Enhanced ionic conductivity of AgI nanowires/AAO composites fabricated by a simple approach. Nanotechnology. 19: 495706. PMID 21730686 DOI: 10.1088/0957-4484/19/49/495706  0.63
2008 Schwirn K, Lee W, Hillebrand R, Steinhart M, Nielsch K, Gösele U. Self-ordered anodic aluminum oxide formed by H2SO4 hard anodization. Acs Nano. 2: 302-10. PMID 19206631 DOI: 10.1021/Nn7001322  0.58
2008 Huang Z, Zhang X, Reiche M, Liu L, Lee W, Shimizu T, Senz S, Gösele U. Extended arrays of vertically aligned sub-10 nm diameter [100] Si nanowires by metal-assisted chemical etching. Nano Letters. 8: 3046-51. PMID 18698834 DOI: 10.1021/nl802324y  0.309
2008 Lee W, Han H, Lotnyk A, Schubert MA, Senz S, Alexe M, Hesse D, Baik S, Gösele U. Individually addressable epitaxial ferroelectric nanocapacitor arrays with near Tb inch-2 density. Nature Nanotechnology. 3: 402-7. PMID 18654563 DOI: 10.1038/nnano.2008.161  0.63
2008 Bachmann J, Zierold R, Chong YT, Hauert R, Sturm C, Schmidt-Grund R, Rheinländer B, Grundmann M, Gösele U, Nielsch K. A practical, self-catalytic, atomic layer deposition of silicon dioxide. Angewandte Chemie (International Ed. in English). 47: 6177-9. PMID 18618880 DOI: 10.1002/Anie.200800245  0.739
2008 Reiche M, Moutanabbir O, Himcinschi C, Christiansen S, Erfurth W, Gösele U, Mantl S, Buca D, Zhao QT, Loo R, Nguyen D, Muster F, Petzold M. Strained silicon on wafer level by wafer bonding: Materials processing, strain measurements and strain relaxation Ecs Transactions. 16: 311-320. DOI: 10.1149/1.2982883  0.548
2008 Moutanabbir O, Reiche M, Erfurth W, Scholz R, Gösele U. Strain relaxation in nanostructured ultra thin SSOI Proceedings - Ieee International Soi Conference. 71-72. DOI: 10.1109/SOI.2008.4656299  0.532
2008 Moutanabbir O, Scholz R, Senz S, Gösele U, Chicoine M, Schiettekatte F, Süßkraut F, Krause-Rehberg R. Microstructural evolution in H ion induced splitting of freestanding GaN Applied Physics Letters. 93. DOI: 10.1063/1.2955832  0.599
2008 Langner A, Knez M, Müller F, Gösele U. TiO2 microstructures by inversion of macroporous silicon using atomic layer deposition Applied Physics a: Materials Science and Processing. 93: 399-403. DOI: 10.1007/s00339-008-4784-8  0.304
2008 Himcinschi C, Singh R, Moutanabbir O, Scholz R, Reiche M, Christiansen SH, Gösele U, Zahn DRT. Etching-back of uniaxially strained silicon on insulator investigated by spectroscopic ellipsometry Physica Status Solidi (a) Applications and Materials Science. 205: 841-844. DOI: 10.1002/Pssa.200777753  0.623
2007 Chen X, Knez M, Berger A, Nielsch K, Gösele U, Steinhart M. Formation of titania/silica hybrid nanowires containing linear mesocage arrays by evaporation-induced block-copolymer self-assembly and atomic layer deposition. Angewandte Chemie (International Ed. in English). 46: 6829-32. PMID 17668904 DOI: 10.1002/Anie.200700923  0.619
2007 Bachmann J, Jing J, Knez M, Barth S, Shen H, Mathur S, Gösele U, Nielsch K. Ordered iron oxide nanotube arrays of controlled geometry and tunable magnetism by atomic layer deposition. Journal of the American Chemical Society. 129: 9554-5. PMID 17630739 DOI: 10.1021/Ja072465W  0.738
2007 Fan HJ, Knez M, Scholz R, Hesse D, Nielsch K, Zacharias M, Gösele U. Influence of surface diffusion on the formation of hollow nanostructures induced by the Kirkendall effect: the basic concept. Nano Letters. 7: 993-7. PMID 17381161 DOI: 10.1021/Nl070026P  0.553
2007 Kim DS, Ji R, Fan HJ, Bertram F, Scholz R, Dadgar A, Nielsch K, Krost A, Christen J, Gösele U, Zacharias M. Laser-interference lithography tailored for highly symmetrically arranged ZnO nanowire arrays. Small (Weinheim An Der Bergstrasse, Germany). 3: 76-80. PMID 17294473 DOI: 10.1002/Smll.200600307  0.558
2007 Daub M, Bachmann J, Jing J, Knez M, Gösele U, Barth S, Mathur S, Escrig J, Altbir D, Nielsch K. Ferromagnetic nanostructures by atomic layer deposition: From thin films towards core-shell nanotubes Ecs Transactions. 11: 139-148. DOI: 10.1149/1.2779078  0.782
2007 Sommerlatte J, Cagnon L, Bourgault D, Gösele U, Nielsch K. Ordered nanowires based on V-VI materials: From synthesis in organic electrolytes to electrical characterization International Conference On Thermoelectrics, Ict, Proceedings. 5-7. DOI: 10.1109/ICT.2007.4569409  0.554
2007 Lee W, Nielsch K, Gösele U. Self-ordering behavior of nanoporous anodic aluminum oxide (AAO) in malonic acid anodization Nanotechnology. 18. DOI: 10.1088/0957-4484/18/47/475713  0.573
2007 Chen X, Ji R, Steinhart M, Milenin A, Nielsch K, Gösele U. Aligned horizontal silica nanochannels by oxidative self-sealing of patterned silicon wafers Chemistry of Materials. 19: 3-5. DOI: 10.1021/Cm062485H  0.592
2007 González-Díaz JB, García-Martín A, Amelles G, Navas D, Vázquez M, Nielsch K, Wehrspohn RB, Gösele U. Enhanced magneto-optics and size effects in ferromagnetic nanowire arrays Advanced Materials. 19: 2643-2647. DOI: 10.1002/Adma.200602938  0.556
2006 Lee W, Ji R, Ross CA, Gösele U, Nielsch K. Wafer-scale Ni imprint stamps for porous alumina membranes based on interference lithography. Small (Weinheim An Der Bergstrasse, Germany). 2: 978-82. PMID 17193153 DOI: 10.1002/Smll.200600100  0.611
2006 Fan HJ, Lee W, Hauschild R, Alexe M, Le Rhun G, Scholz R, Dadgar A, Nielsch K, Kalt H, Krost A, Zacharias M, Gösele U. Template-assisted large-scale ordered arrays of ZnO pillars for optical and piezoelectric applications. Small (Weinheim An Der Bergstrasse, Germany). 2: 561-8. PMID 17193086 DOI: 10.1002/Smll.200500331  0.751
2006 Lee W, Ji R, Gösele U, Nielsch K. Fast fabrication of long-range ordered porous alumina membranes by hard anodization. Nature Materials. 5: 741-7. PMID 16921361 DOI: 10.1038/Nmat1717  0.587
2006 Jin Fan H, Knez M, Scholz R, Nielsch K, Pippel E, Hesse D, Zacharias M, Gösele U. Monocrystalline spinel nanotube fabrication based on the Kirkendall effect. Nature Materials. 5: 627-31. PMID 16845423 DOI: 10.1038/Nmat1673  0.635
2006 Knez M, Kadri A, Wege C, Gösele U, Jeske H, Nielsch K. Atomic layer deposition on biological macromolecules: metal oxide coating of tobacco mosaic virus and ferritin. Nano Letters. 6: 1172-7. PMID 16771575 DOI: 10.1021/Nl060413J  0.622
2006 Lee W, Fan HJ, Alexe M, Scholz R, Zacharias M, Nielsch K, Gösele U. Metal nanotube membranes and their lithographic applications 2006 Ieee Nanotechnology Materials and Devices Conference, Nmdc. 1: 306-307. DOI: 10.1109/NMDC.2006.4388876  0.541
2006 Sommerlatte J, Lee W, Scholz R, Gösele U, Bente K, Nielsch K. A nonaqueous way to thermoelectric nanowires International Conference On Thermoelectrics, Ict, Proceedings. 252-253. DOI: 10.1109/ICT.2006.331362  0.584
2006 Fan H, Knez M, Scholz R, Nielsch K, Pippel E, Hesse D, Gösele U, Zacharias M. Single-crystalline MgAl2O4 spinel nanotubes using a reactive and removable MgO nanowire template Nanotechnology. 17: 5157-5162. DOI: 10.1088/0957-4484/17/20/020  0.647
2006 Moyen E, Wulfhekel W, Lee W, Leycuras A, Nielsch K, Gösele U, Hanbücken M. Etching nano-holes in silicon carbide using catalytic platinum nano-particles Applied Physics a: Materials Science and Processing. 84: 369-371. DOI: 10.1007/S00339-006-3639-4  0.59
2006 Lee W, Moyen E, Wulfhekel W, Leycuras A, Nielsch K, Gösele U, Hanbücken M. Vertical nanopatterning of 6H-SiC(0001) surfaces using gold-metal nanotube membrane lithography Applied Physics a: Materials Science and Processing. 83: 361-363. DOI: 10.1007/S00339-006-3566-4  0.609
2005 Lee W, Scholz R, Nielsch K, Gösele U. A template-based electrochemical method for the synthesis of multisegmented metallic nanotubes. Angewandte Chemie (International Ed. in English). 44: 6050-4. PMID 16124018 DOI: 10.1002/Anie.200501341  0.553
2002 Wang ZK, Kuok MH, Ng SC, Lockwood DJ, Cottam MG, Nielsch K, Wehrspohn RB, Gösele U. Spin-wave quantization in ferromagnetic nickel nanowires. Physical Review Letters. 89: 027201. PMID 12097013 DOI: 10.1103/Physrevlett.89.027201  0.524
2002 Steinhart M, Wendorff JH, Greiner A, Wehrspohn RB, Nielsch K, Schilling J, Choi J, Gösele U. Polymer nanotubes by wetting of ordered porous templates. Science (New York, N.Y.). 296: 1997. PMID 12065828 DOI: 10.1126/Science.1071210  0.697
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