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Darren L. Forman, Ph.D. - Publications

Affiliations: 
2014 Electrical Engineering University of Colorado, Boulder, Boulder, CO, United States 
Area:
Optics Physics, Polymer Chemistry, Nanotechnology
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8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Miller DB, Forman DL, Jones AM, McLeod RR. Super-resolved critical dimensions in far-field I-line photolithography Journal of Micro-Nanolithography Mems and Moems. 18: 13505. DOI: 10.1117/1.Jmm.18.1.013505  0.484
2015 Forman DL, McLeod RR, Shah PK, Stansbury JW. Evaporation of low-volatility components in polymeric dental resins. Dental Materials : Official Publication of the Academy of Dental Materials. PMID 26119701 DOI: 10.1016/J.Dental.2015.06.008  0.483
2014 Forman DL, McLeod RR. Photoinhibited superresolution lithography: Overcoming chemical blur Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2063254  0.551
2013 Forman DL, Cole MC, McLeod RR. Radical diffusion limits to photoinhibited superresolution lithography. Physical Chemistry Chemical Physics : Pccp. 15: 14862-7. PMID 23807723 DOI: 10.1039/C3Cp51512E  0.581
2013 Forman DL, Cole MC, McLeod RR. Surpassing the optical diffraction limit with photo-inhibited super-resolution (PInSR) lithography Cleo: Science and Innovations, Cleo_si 2013. CM2M.4.  0.555
2013 Forman DL, Cole MC, McLeod RR. Surpassing the optical diffraction limit with photo-inhibited super-resolution (PInSR) lithography Cleo: Science and Innovations, Cleo_si 2013. CM2M.4.  0.582
2012 Forman DL, Heuvelman GL, McLeod RR. Materials development for photoinhibited superresolution (PINSR) lithography Proceedings of Spie - the International Society For Optical Engineering. 8249. DOI: 10.1117/12.908512  0.518
2011 Scott TF, Kloxin CJ, Forman DL, McLeod RR, Bowman CN. Principles of voxel refinement in optical direct write lithography Journal of Materials Chemistry. 21: 14150-14155. DOI: 10.1039/C1Jm11915J  0.585
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