Jaewoong Sohn, Ph.D. - Publications
Affiliations: | 2008 | University of Wisconsin, Madison, Madison, WI |
Area:
Mechanical EngineeringYear | Citation | Score | |||
---|---|---|---|---|---|
2007 | Nataraju M, Sohn J, Mikkelson AR, Engelstad RL, Turner KT, Van Peski CK, Orvek KJ. Electrostatic chucking of EUVL reticles Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.720621 | 0.586 | |||
2006 | Nataraju M, Sohn J, Veeraraghavan S, Mikkelson AR, Turner KT, Engelstad RL, Van Peski CK, Orvek KJ. Electrostatic chucking for extreme ultraviolet lithography: Simulations and experiments Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 2834-2839. DOI: 10.1116/1.2388967 | 0.628 | |||
2005 | Engelstad RL, Feng Z, Lovell EG, Mikkelson AR, Sohn J. Evaluation of intrinsic film stress distributions from induced substrate deformation Microelectronic Engineering. 78: 404-409. DOI: 10.1016/J.Mee.2005.01.011 | 0.714 | |||
2004 | Mikkelson A, Engelstad R, Sohn J, Lovell E. Effect of electrostatic chucking and substrate thickness uniformity on extreme ultraviolet lithography mask flatness Journal of Vacuum Science & Technology B. 22: 3043-3048. DOI: 10.1116/1.1808738 | 0.59 | |||
2002 | Feng Z, Lovell EG, Engelstad RL, Mikkelson AR, Reu PL, Sohn J. Film stress characterization using substrate shape data and numerical techniques Materials Research Society Symposium - Proceedings. 750: 249-254. DOI: 10.1557/Proc-750-Y3.4 | 0.677 | |||
2001 | Sohn J, Engelstad RL, Lovell EG. Predicting pattern-specific distortions induced during optical mask patterning Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2626-2630. DOI: 10.1116/1.1408956 | 0.65 | |||
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