Amitesh Shrivastava, Ph.D.

Affiliations: 
2008 Electrical Engineering University of South Carolina, Columbia, SC 
Area:
Materials Science Engineering, Electronics and Electrical Engineering
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"Amitesh Shrivastava"

Parents

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Tangali S. Sudarshan grad student 2008 University of South Carolina
 (Epitaxial growth and characterization of 4H-silicon carbide on low off-axis substrates for high-power devices.)
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Publications

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Klein PB, Shrivastava A, Sudarshan TS. (2011) Slow de-trapping of minority holes in n-type 4H-SiC epilayers Physica Status Solidi (a) Applications and Materials Science. 208: 2790-2795
Klein PB, Myers-Ward R, Lew KK, et al. (2010) Temperature dependence of the carrier lifetime in 4H-SiC epilayers Materials Science Forum. 645: 203-206
Klein PB, Myers-Ward R, Lew KK, et al. (2010) Recombination processes controlling the carrier lifetime in n -4H-SiC epilayers with low Z1/2 concentrations Journal of Applied Physics. 108
Shrivastava A, Klein PB, Glaser ER, et al. (2009) Long carrier lifetime in 4H-SiC epilayers using chlorinated precursors Materials Science Forum. 615: 291-294
Shrivastava A, Muzykov PG, Sudarshan TS. (2009) Inverted Pyramid Defects in 4H-SiC Epilayers Materials Science Forum. 125-128
Maximenko SI, Freitas JA, Klein PB, et al. (2009) Cathodoluminescence study of the properties of stacking faults in 4H-SiC homoepitaxial layers Applied Physics Letters. 94: 092101
Klein PB, Caldwell JD, Shrivastava A, et al. (2008) Variations in the Measured Carrier Lifetimes of n- 4H-SiC Epilayers Materials Science Forum. 489-492
Shrivastava A, Muzykov PG, Pearman B, et al. (2008) Investigation of Triangular Defects in 4H-SiC 4° Off Cut (0001) Si Face Epilayers Grown by CVD Materials Science Forum. 139-142
Shrivastava A, Muzykov P, Sudarshan TS. (2008) Identification of nucleation sites and formation mechanism of inverted pyramids in 4H-SiC epilayers Journal of Applied Physics. 104
Shrivastava A, Muzykov P, Caldwell J, et al. (2008) Study of triangular defects and inverted pyramids in 4H-SiC 4° off-cut (0001) Si face epilayers Journal of Crystal Growth. 310: 4443-4450
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