Mark J. Kushner
Affiliations: | Electrical and Computer Engineering | Iowa State University, Ames, IA, United States |
Area:
Electronics and Electrical EngineeringGoogle:
"Mark Kushner"Children
Sign in to add trainee| Mingmei Wang | grad student | 2011 | Iowa State |
| Juline Shoeb | grad student | 2012 | Iowa State |
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Publications
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| Das S, Meyer M, Kushner MJ, et al. (2025) Ignition of non-equilibrium methane dielectric barrier discharges in a multiphase plasma-liquid microfluidic device. Lab On a Chip |
| Sapunar M, Meyer M, Ambalampitiya HB, et al. (2024) Fundamental data for modeling electron-induced processes in plasma remediation of perfluoroalkyl substances. Physical Chemistry Chemical Physics : Pccp. 26: 26037-26050 |
| Kruszelnicki J, Ma R, Kushner MJ. (2021) Propagation of atmospheric pressure plasmas through interconnected pores in dielectric materials Journal of Applied Physics. 129: 143302 |
| Huang S, Shim S, Nam SK, et al. (2020) Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2 Journal of Vacuum Science & Technology A. 38: 023001 |
| Jung J, Barsukov Y, Volynets V, et al. (2020) Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism Journal of Vacuum Science & Technology A. 38: 023008 |
| Volynets V, Barsukov Y, Kim G, et al. (2020) Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes Journal of Vacuum Science & Technology A. 38: 023007 |
| Qu C, Nam SK, Kushner MJ. (2020) Transients using low-high pulsed power in inductively coupled plasmas Plasma Sources Science and Technology. 29: 85006 |
| Qu C, Lanham SJ, Shannon SC, et al. (2020) Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)] Journal of Applied Physics. 128: 89901 |
| Lietz AM, Barnat EV, Foster JE, et al. (2020) Ionization wave propagation in a He plasma jet in a controlled gas environment Journal of Applied Physics. 128: 83301 |
| Qu C, Lanham SJ, Shannon SC, et al. (2020) Power matching to pulsed inductively coupled plasmas Journal of Applied Physics. 127: 133302 |