| Year |
Citation |
Score |
| 2017 |
Thibaut S, Raley A, Mohanty N, Kal S, Liu E, Ko A, O'Meara D, Tapily K, Biolsi P. Self-aligned quadruple patterning using spacer on spacer integration optimization for N5 Proceedings of Spie. 10149. DOI: 10.1117/12.2258173 |
0.384 |
|
| 2017 |
Mohanty N, Smith JT, Huli L, Pereira C, Raley A, Kal S, Fonseca C, Sun X, Burns RL, Farrell RA, Hetzer DR, Metz AW, Ko A, Scheer SA, Biolsi P, et al. EPE improvement thru self-alignment via multi-color material integration Proceedings of Spie. 10147: 1014704. DOI: 10.1117/12.2258108 |
0.364 |
|
| 2017 |
Liu E, Ko A, O'Meara D, Mohanty N, Franke E, Pillai K, Biolsi P. Roughness and uniformity improvements on self-aligned quadruple patterning technique for 10nm node and beyond by wafer stress engineering Proceedings of Spie. 10149. DOI: 10.1117/12.2258097 |
0.34 |
|
| 2017 |
Lazzarino F, Mohanty N, Feurprier Y, Huli L, Luong V, Demand M, Decoster S, Gonzalez VV, Ryckaert J, Kim RRH, Mallik A, Leray P, Wilson C, Boemmels J, Kumar K, et al. Self-aligned block technology: a step toward further scaling Proceedings of Spie. 10149: 1014908. DOI: 10.1117/12.2258028 |
0.322 |
|
| 2017 |
Raley A, Mohanty N, Sun X, Farrell RA, Smith JT, Ko A, Metz AW, Biolsi P, Devilliers A. Self-aligned blocking integration demonstration for critical sub-40nm pitch Mx level patterning Proceedings of Spie. 10149. DOI: 10.1117/12.2257769 |
0.367 |
|
| 2017 |
Kal S, Mohanty N, Farrell RA, Franke E, Raley A, Thibaut S, Pereira C, Pillai K, Ko A, Mosden A, Biolsi P. Dry-plasma-free chemical etch technique for variability reduction in multi-patterning (Conference Presentation) Proceedings of Spie. 10149. DOI: 10.1117/12.2257507 |
0.31 |
|
| 2016 |
Raley A, Thibaut S, Mohanty N, Subhadeep K, Nakamura S, Ko A, O'Meara D, Tapily K, Consiglio S, Biolsi P. Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications Proceedings of Spie - the International Society For Optical Engineering. 9782. DOI: 10.1117/12.2219321 |
0.349 |
|
| 2016 |
Mohanty N, Farrell R, Periera C, Subhadeep K, Franke E, Smith J, Ko A, Devilliers A, Biolsi P, Sun L, Beique G, Hosler E, Verdujn E, Wang W, Labelle C, et al. LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL) Proceedings of Spie - the International Society For Optical Engineering. 9782. DOI: 10.1117/12.2219259 |
0.33 |
|
| 2015 |
Liu CC, Lie FL, Rastogi V, Franke E, Mohanty N, Farrell R, Tsai H, Lai K, Ozlem M, Cho W, Jung SG, Strane J, Somervell M, Burns S, Felix N, et al. Fin formation using graphoepitaxy DSA for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086053 |
0.363 |
|
| 2015 |
Mohanty N, Franke E, Liu E, Raley A, Smith J, Farrell R, Wang M, Ito K, Das S, Ko A, Kumar K, Ranjan A, O'Meara D, Nawa K, Scheer S, et al. Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme Proceedings of Spie - the International Society For Optical Engineering. 9428. DOI: 10.1117/12.2085016 |
0.311 |
|
| 2014 |
Farrell RA, Hosler ER, Schmid GM, Xu J, Preil ME, Rastogi V, Mohanty N, Kumar K, Cicoria MJ, Hetzer DR, Devilliers AJ. Manufacturability considerations for DSA Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2048396 |
0.333 |
|
| 2014 |
Liu CC, Estrada-Raygoza C, He H, Cicoria M, Rastogi V, Mohanty N, Tsai H, Schepis A, Lai K, Chao R, Liu D, Guillorn M, Cantone J, Mignot S, Kim RH, et al. Towards electrical testable soi devices using directed self-assembly for fin formation Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046462 |
0.305 |
|
| 2013 |
Nguyen P, Li J, Sreeprasad TS, Jasuja K, Mohanty N, Ikenberry M, Hohn K, Shenoy VB, Berry V. Covalent functionalization of dipole-modulating molecules on trilayer graphene: an avenue for graphene-interfaced molecular machines. Small (Weinheim An Der Bergstrasse, Germany). 9: 3823-8. PMID 23713056 DOI: 10.1002/Smll.201300857 |
0.66 |
|
| 2013 |
Schmid G, Farrell R, Xu J, Park C, Preil M, Chakrapani V, Mohanty N, Ko A, Cicoria M, Hetzer D, Somervell M, Rathsack B. Fabrication of 28nm pitch Si fins with DSA lithography Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011607 |
0.374 |
|
| 2012 |
Mohanty N, Moore D, Xu Z, Sreeprasad TS, Nagaraja A, Rodriguez AA, Berry V. Nanotomy-based production of transferable and dispersible graphene nanostructures of controlled shape and size. Nature Communications. 3: 844. PMID 22588306 DOI: 10.1038/Ncomms1834 |
0.693 |
|
| 2012 |
Ahn BK, Sung J, Li Y, Kim N, Ikenberry M, Hohn K, Mohanty N, Nguyen P, Sreeprasad TS, Kraft S, Berry V, Sun XS. Synthesis and characterization of amphiphilic reduced graphene oxide with epoxidized methyl oleate. Advanced Materials (Deerfield Beach, Fla.). 24: 2123-9. PMID 22431169 DOI: 10.1002/Adma.201104080 |
0.677 |
|
| 2011 |
Mohanty N, Fahrenholtz M, Nagaraja A, Boyle D, Berry V. Impermeable graphenic encasement of bacteria. Nano Letters. 11: 1270-5. PMID 21271738 DOI: 10.1021/Nl104292K |
0.652 |
|
| 2010 |
Park S, Mohanty N, Suk JW, Nagaraja A, An J, Piner RD, Cai W, Dreyer DR, Berry V, Ruoff RS. Biocompatible, robust free-standing paper composed of a TWEEN/graphene composite. Advanced Materials (Deerfield Beach, Fla.). 22: 1736-40. PMID 20496406 DOI: 10.1002/Adma.200903611 |
0.628 |
|
| 2010 |
Mohanty N, Nagaraja A, Armesto J, Berry V. High-throughput, ultrafast synthesis of solution- dispersed graphene via a facile hydride chemistry. Small (Weinheim An Der Bergstrasse, Germany). 6: 226-31. PMID 19943253 DOI: 10.1002/Smll.200901505 |
0.697 |
|
| 2008 |
Mohanty N, Berry V. Graphene-based single-bacterium resolution biodevice and DNA transistor: interfacing graphene derivatives with nanoscale and microscale biocomponents. Nano Letters. 8: 4469-76. PMID 19367973 DOI: 10.1021/Nl802412N |
0.647 |
|
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