James J. Watkins, Ph.D - US grants
Affiliations: | Polymer Science and Engineering | University of Massachusetts, Amherst, Amherst, MA |
Website:
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The funding information displayed below comes from the NIH Research Portfolio Online Reporting Tools and the NSF Award Database.The grant data on this page is limited to grants awarded in the United States and is thus partial. It can nonetheless be used to understand how funding patterns influence mentorship networks and vice-versa, which has deep implications on how research is done.
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High-probability grants
According to our matching algorithm, James J. Watkins is the likely recipient of the following grants.Years | Recipients | Code | Title / Keywords | Matching score |
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1998 — 2003 | Watkins, James | N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
Career: Low Temperature Deposition of Thin Metal Films From Supercritical Carbon Dioxide Solution @ University of Massachusetts Amherst Abstract - Watkins - 9734177 The demands of present and future microelectronic and optoelectronic device fabrication place stringent requirements on metal deposition schemes. These include high film purity, low temperatures and rapid, controllable deposition rates. The PI postulates that these objectives can be met via Chemical Fluid Deposition (CFD), a new approach to metal deposition that involves the chemical or thermal reduction of soluble organometallic compounds in supercritical carbon dioxide at low temperatures (40-80oC) to yield continuous films on inorganic or organic substrates. CFD exploits the unique, and adjustable, physicochemical properties of SCF solvents, which lie intermediate to those of liquids and gases, to circumvent the limitations of both vapor and liquid phase techniques. In CFD, precursor transport and reduction occurs in solution at significantly lower temperatures and higher reagent concentrations than those of vapor phase techniques such as chemical vapor deposition (CVD). While CFD is a solution-based process, the "gas-like" transport properties of the SCF and its miscibility with gaseous reducing agents such as hydrogen, render the process unencumbered by issues of poor mass transfer and poor deposition rates associated with liquid phase reductions. Preliminary experiments demonstrate that high-purity, continuous platinum and palladium films can be deposited from SCF solution onto silicon wafers and other inorganic substrates at temperatures up to 170oC below those employed in CVD. The research program will focus on the deposition of thin films from carbon dioxide solution by the hydrogenolysis of dimethylcyclooctadine platinum (II) and the deposition of copper films by reduction of copper(II)bis(hexafluoroacetylacetone) and copper(II)bis(2,2,6,6-tetramethyl-3,5-heptanedionate). The precursors were chosen to facilitate a direct comparison of film quality and reduction kinetics in CFD to those of existing techniques and the potential utility of the m etal deposits in microelectronics copper and catalytic platinum devices. The educational portion of the work are to: (1) train graduate students who will work at the interface of engineering and materials chemistry, (2) provide undergraduates with opportunities for research experience, (3) develop a two-course series in materials processing that addresses the interests of students and is reinforced by the expanding materials research efforts in the Department of Chemical Engineering, and (4) incorporate research problems and active learning principles into the classroom and assist in the implementation of interactive teaching tools across the curriculum. |
0.915 |
1998 — 2002 | Vlachos, Dionisios (co-PI) [⬀] Watkins, James Tsapatsis, Michael (co-PI) [⬀] |
N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
Preparation of Nanostructured Membranes by Reactive Depositions From Supercritical Fluids @ University of Massachusetts Amherst Watkins - 9811088 The development of functional, nanostructured metal composite membranes will have a substantial economic impact on the separation, purification and recovery of gases as well as novel membrane reactor applications for oxygen-enriched combustion, controlled partial oxidation and equilibrium limited dehydrogenation reactions. Despite progress that has been achieved to date, precise control of deposit microstructure, composition and distribution within the support has not been realized. The challenge for porous-inorganic support/metal composites remains the development of methodologies for the controlled infiltration and deposition of nanostructured metal and metal alloys within interior pores at a prescribed depth and thickness. These architectures are inaccessible by current techniques including chemical vapor deposition, metal sputtering and electroless plating due to constraints of these processes that do not allow for optimization of deposit microstructure or composition. Polymer/metal composites membranes are plagued by poor and to rectify this deficiency, processes leading to gradient interfaces are required. The PI's plan to integrate materials synthesis, characterization and multi-scale simulations for the development of a processing strategy based on the concept of chemical fluid deposition (CFD). CFD is a form of metal deposition that involves the chemical reduction of soluble organometallic compounds in supercritical carbon dioxide solution. The key to the process is physicochemical properties of the solvent which lie intermediate to those of liquids and gases. Transport and reduction in solution offers low process temperatures, high reagent concentrations and eliminates precursor volatility requirements associated with vapor phase techniques. The absence of surface tension and low viscosity of supercritical fluid (SCF) solutions are well suited to the delivery of relatively high concentrations of organometallic precursors within porous environments. Deposi tion is triggered by the introduction of a reducing agent to produce metal deposits. This reaction scheme can be used to dictate deposit composition and microstructure via direct control of nucleation and growth kinetics by precise adjustments in stoichiometry of the soluble precursors. Mass-transport limitations are largely eliminated due to high precursor concentration and favorable transport properties of the SCF solution which is similar to those of a gas. The permeability of polymer substrates to SCF/organometallic solutions can be exploited to produce composite membranes with adherent, gradient polymer/metal interfaces and metal interlayers. |
0.915 |
2001 — 2004 | Chen, Wei Watkins, James Mccarthy, Thomas (co-PI) [⬀] Russell, Thomas (co-PI) [⬀] Desu, Seshu (co-PI) [⬀] |
N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
@ University of Massachusetts Amherst This award from the Major Research Instrumentation Program will allow the University of Massachusetts to purchase a x-ray photoelectron spectrometer (XPS) with integrated Auger analysis. The instrument will significantly enhance the capabilities of Interface Analysis Laboratory at UMass by providing high-resolution surface analysis and depth profiling capabilities that are currently lacking. The facility is accessible to the UMass community as well as research personnel from the surrounding Five College Community that includes Smith, Mt. Holyoke, Amherst and Hampshire Colleges and local industry. The Interface Analysis Laboratory and its director play an instrumental role in the support of broadly funded research programs in the chemical biological and materials sciences and for training of graduate and undergraduate students at these and other institutions. Specific programs include assessment of composition, contamination, interfacial properties and growth mechanisms for metal and semiconductor multi-layer films deposited from supercritical fluids, characterizing the chemical composition of polymer surfaces and interfaces modified to control interfacial interactions, surface wetting and biocompatability and the rational design of constrained-geometry catalysts for olefin polymerization. |
0.915 |
2003 — 2008 | Schulberg, Michelle Maroudas, Dimitrios (co-PI) [⬀] Burkett, Sandra Watkins, James Ober, Christopher |
N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
@ University of Massachusetts Amherst Research Objectives: A Multi-University/Industry/NIST team will address the development and integration of mesoporous, ultra-low dielectric constant films for semiconductor devices. Continuation of the historical trend of reduced device dimensions requires materials with dielectric constants (k) of less than 2.4 that can survive the structural and mechanical demands of integration. Moreover, at dimensions less than 70 nm, techniques that offer control over long range order, pore orientation and patterning at multiple length scales are required for practical integration schemes. A new approach offers these possibilities. The technique involves the infusion and selective condensation of metal oxide precursors within one domain of highly ordered block copolymer templates using supercritical (SC) carbon dioxide as the reaction medium. The template is then removed to produce the mesoporous oxide. By separating template preparation from oxide condensation, the block copolymer architecture can be manipulated at the local level by domain orientation and alignment using surface and external fields and at the device level by lithographic patterning prior to precursor infusion. Watkins (UMass) will coordinate the NIRT Team and lead the development of highly ordered mesoporous films in SC CO2. Ober (Cornell) will lead the development of templates for direct patterning by photolithography. Burkett (Amherst College) will characterize film structure and composition using solid state NMR. Maroudas (UMass) will develop models to relate film architecture to mechanical properties. Lin (NIST) will lead the development of new metrology tools for the analysis of patterned, highly ordered films. Schulberg from Novellus Systems, a leading semiconductor equipment company, will lead process development and scale-up efforts to full process wafers (200 and 300 mm) and develop post-processing strategies and integration schemes. |
0.915 |
2003 — 2007 | Mcinerney, Edward Gochberg, Lawrence Watkins, James |
N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
@ University of Massachusetts Amherst Research: The continuous drive towards smaller and more complex microelectronic devices is placing new demands on the fabrication technologies used for their production. One of the most difficult challenges is the rapid, defect-free deposition of high purity metals within narrow device features with dimensions below 100 nanometers. One prominent example of immediate concern is the fabrication of advanced copper interconnects for integrated circuits. With recent NSF funding, a fundamentally new technique that meets the performance criteria for device metallization, called supercritical fluid deposition (SFD), was developed at the University of Massachusetts. In SFD, soluble organometallic compounds are reduced in supercritical fluids including carbon dioxide to yield high purity deposits at low temperature. A supercritical fluid can be viewed as hybrid medium with properties that lie intermediate to those of gases and liquids. These properties are such that the limitations of current liquid and vapor-phase techniques can be circumvented while preserving the benefits of each. The result for Cu deposition is unprecedented feature fill at sub-100 nm device dimensions, while maintaining other critical film properties. |
0.915 |
2005 — 2012 | Rotello, Vincent (co-PI) [⬀] Tuominen, Mark (co-PI) [⬀] Watkins, James Russell, Thomas (co-PI) [⬀] Desu, Seshu (co-PI) [⬀] |
N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
Igert: Research and Innovation in Nanoscale Device Development @ University of Massachusetts Amherst This Integrative Graduate Education and Research Training (IGERT) award supports interdisciplinary doctoral training in nanotechnology at the University of Massachusetts Amherst. The research and education activities span six science and engineering departments using a structure that ties advances in fundamental science to complementary coursework and practical experience in innovation and technology development. The program's intellectual merit and research emphasis is on the design, prototyping and market-oriented development of nanoscale devices through seamless integration of novel bottom-up processing schemes, including self-assembly, with conventional top-down approaches. Doctoral training is centered around three related research thrusts: nanoscale materials and processes; electronic applications; and biomedical and environmental applications. Specifically, IGERT students conduct research on the directed self-assembly of block copolymers, advanced lithography, novel deposition and metallization techniques, and their implementation in nanoelectronic devices, high-density data storage, biosensors and therapeutics. In addition to multidisciplinary technical, professional and product development training, the students team-train on annual Technical Challenge Projects that develop their ability to design and prototype technically and commercially feasible devices using nanotechnology. These projects include external research experiences at R&D facilities and fabrication centers located in the U.S. and abroad. Collaborators and advisors for the projects include TIAX and Lucent Technologies' Bell Laboratories. Additional activities focus on ethics, leadership and communication. The program's broader impacts include developing scientists and engineers that are comfortable working at disciplinary boundaries, possess a well-rounded mastery of nanoscience and engineering and have the ability to transform advances in basic science to functional materials and devices that can be commercialized to meet emerging technological and societal needs. IGERT is an NSF-wide program intended to meet the challenges of educating U.S. Ph.D. scientists and engineers with the interdisciplinary background, deep knowledge in a chosen discipline, and the technical, professional, and personal skills needed for the career demands of the future. The program is intended to catalyze a cultural change in graduate education by establishing innovative new models for graduate education and training in a fertile environment for collaborative research that transcends traditional disciplinary boundaries. |
0.915 |
2005 — 2006 | Crosby, Alfred [⬀] Kim, Byung Watkins, James Carter, Kenneth (co-PI) [⬀] Desu, Seshu (co-PI) [⬀] |
N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
Mri: Aquisition of Nano-Imprint Lithography System @ University of Massachusetts Amherst The establishment of a Nano-Imprint Lithography (NIL) Laboratory on the campus of the University of Massachusetts Amherst will permit the definition of material patterns from the multi-micron to sub-50nm length scales in an economical and efficient manner. The rapid replication and prototyping provided by this technique will enable the study of devices and structures that would otherwise be difficult or prohibitively expensive to make. NIL involves 1) the physical templating of topographic or chemical structures and 2) subsequent photo- or thermal-initiated materials synthesis. The full implementation of this laboratory requires the purchase of two instruments for which we are requesting funding: a Step-and-Flash NIL instrument from Molecular Imprints, Inc. and a state-of-the-art plasma etching system from Trion, Inc. This laboratory is critical to the success of multiple research activities involving the co-PIs and other members of the NSF MRSEC at UMass including the development of advanced materials for nanostructured devices (e.g. nanoscale patterned surfaces for sensors, single-step processing of ultra-low dielectric constant patterns, and high power density pulsed power capacitors for electric vehicles) and fundamental research into the challenges that are limiting the implementation of NIL on the manufacturing scale. The instruments will be housed in the open access Keck Nanostructures Laboratory and a comprehensive management plan is in place to ensure maintenance and accessibility to a broad user base. Additionally, the NIL Laboratory will be incorporated into existing courses on nanotechnology, and its open-access management plan will encourage use by participants in our REU and RET programs as well as faculty and students in the local five college community that includes two women's colleges: Mt. Holyoke College and Smith College. UMass Amherst is an established leader in nanoscale materials science, and this facility will further secure our leadership in device-level implementation of our discoveries while preparing students with expertise in real-world nano-scale manufacturing. |
0.915 |
2005 — 2009 | Watkins, James | N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
Sensors: Hierarchical Metal Oxides For Next Generation Devices @ University of Massachusetts Amherst ABSTRACT |
0.915 |
2006 — 2017 | Tuominen, Mark (co-PI) [⬀] Watkins, James |
N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
Nsec: Center For Hierarchical Manufacturing @ University of Massachusetts Amherst This Nanoscale Science and Engineering Center (NSEC) is a comprehensive research and education platform that will stimulate U.S. competitiveness by moving nanotechnology from laboratory innovation to manufacturable nanostructured components and devices. The Center for Hierarchical Manufacturing builds on recognized excellence in nanoscience and technology at UMass and a world-class program in polymer research to yield complete specification of nanostructures combining directed self-assembly and imprinting with subsequent transfer of 2-D and 3-D structures, and advanced deposition techniques, into active components, functional materials, and fully-integrated devices. Bottom-up processes will be seamlessly integrated with conventional fabrication methods for dramatic advances in semiconductor devices, microelectronics, biomedical applications, and other areas. In addition, the Center offers a new strategic model to bridge the innovation-to-implementation gap through test beds that combine leading breakthrough technology, professional market analysis, industrial-scale fabrication processes, and facilitated technology transfer. |
0.915 |
2012 — 2015 | Watkins, James | N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
@ University of Massachusetts Amherst This NSF award to University of Massachusetts Amherst funds U.S. researchers participating in a project competitively selected by the G8 Research Councils Initiative ?Structural Bamboo Products.? This is a pilot collaboration among the U.S. National Science Foundation, the Canadian National Sciences and Engineering Research Council (NSERC), the French Agence Nationale de la Recherche (ANR), the German Deutsche Forschungsgemeinschaft (DFG), the Japan Society for the Promotion of Science (JSPS), the Russian Foundation for Basic Research (RFBR),and the United Kingdom Research Councils (RCUK), supporting collaborative research projects selected on a competitive basis that are comprised of researchers from at least three of the partner countries. |
0.915 |
2017 | Watkins, James | N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
I-Corps: Low Cost Durable Masters For Pattern Transfer @ University of Massachusetts Amherst The broader impact/commercial potential of this I-Corps project is to deliver a low cost mastering technology to enable the cost-effective pattering of polymer and other surfaces to impart function without the use of chemical additives. The masters will be used in microreplication, injection molding and embossing to impart structural color, antimicrobial activity, anti-counterfeiting marks, light collection for solar energy and other surface functionality with high yield and high throughput, impacting consumer products and technology companies alike. The use of surface patterns as opposed to chemical additives to achieve function offers environmental and consumer safety advantages and is resource and energy efficient. |
0.915 |
2021 — 2024 | Arbabi, Amir Waldman, David Watkins, James Gonen Williams, Zehra Gardner, Eric |
N/AActivity Code Description: No activity code was retrieved: click on the grant title for more information |
Pfi-Rp: Additive Manufacturing For Scalable Metalens Fabrication @ University of Massachusetts Amherst The broader impact/commercial potential of this Partnerships for Innovation – Research Partnerships (PFI-RP) project is the design and fabrication of high performance metalenses using an innovative, cost-effective approach that will enable a superior product that cannot otherwise be manufactured in a scalable manner. Metalenses (or flat lenses) are ultrathin planar lenses that use nanofeatures patterned on the surface to efficiently control light. thereby eliminating the bulkiness of traditional glass and plastic lenses while providing more utility and function in a substantially lighter and smaller volume. Lens miniaturization and the introduction of wide fields of view and corrections for distortion and color aberration, all possible with metalenses, have enormous economic potential for consumer products, medical, defense, and space applications. Technology insertion points include cell phone cameras, augmented reality / virtual reality (AR/VR), heads-up displays, medical and scientific imaging, precision optics, and high-resolution imaging satellites, with associated markets exceeding $100 billion. The PFI RP team addresses the critical elements of the supply and technology chains enabling domestic commercialization of an emerging technology with substantial societal impact. |
0.915 |