Kie J. Park, Ph.D.
Affiliations: | North Carolina State University, Raleigh, NC |
Area:
NanotechnologyGoogle:
"Kie Park"Mean distance: 11.2
Parents
Sign in to add mentor| Gregory N. Parsons | grad student | 2005 | NCSU | |
| (The atomic layer deposition of noble metals for microelectronics applications.) | ||||
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Publications
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| Choi SS, Park MJ, Yamaguchi T, et al. (2016) Nanopore formation on Au coated pyramid under electron beam irradiations (plasmonic nanopore on pyramid) Sensing and Bio-Sensing Research. 7: 153-161 |
| Han SW, Kim DH, Jeong MG, et al. (2016) CO oxidation catalyzed by NiO supported on mesoporous Al |
| Park KJ, Parsons GN. (2012) Atomic layer deposition of Ru onto organic monolayers: Shifting metal effective work function using monolayer structure Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30 |
| Peng Q, Spagnola JC, Daisuke H, et al. (2008) Conformal metal oxide coatings on nanotubes by direct low temperature metal-organic pyrolysis in supercritical carbon dioxide Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 978-982 |
| Peng Q, Hojo D, Park KJ, et al. (2008) Low temperature metal oxide film deposition and reaction kinetics in supercritical carbon dioxide Thin Solid Films. 516: 4997-5003 |
| Hyde GK, Park KJ, Stewart SM, et al. (2007) Atomic layer deposition of conformal inorganic nanoscale coatings on three-dimensional natural fiber systems: Effect of surface topology on film growth characteristics Langmuir. 23: 9844-9849 |
| Park KJ, Terry DB, Stewart SM, et al. (2007) In situ auger electron spectroscopy study of atomic layer deposition: growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 6106-12 |
| Park KJ, Terry DB, Stewart SM, et al. (2007) In situ auger electron spectroscopy study of atomic layer deposition: Growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces Langmuir. 23: 6106-6112 |
| Park KJ, Parsons GN. (2006) Selective area atomic layer deposition of rhodium and effective work function characterization in capacitor structures Applied Physics Letters. 89 |
| Park KJ, Doub JM, Gougousi T, et al. (2005) Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition Applied Physics Letters. 86: 1-3 |