Brian Cardineau, Ph.D.
Affiliations: | 2013 | Nanoscale Science and Engineering | State University of New York, Albany, Albany, NY, United States |
Area:
Nanoscience, Polymer Chemistry, Inorganic ChemistryGoogle:
"Brian Cardineau"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Robert L. Brainard | grad student | 2013 | SUNY Albany | |
| (Novel Resist Systems for EUV Lithography: LER, Chain-Scission, Nanoparticle and MORE.) | ||||
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Publications
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| Stowers J, Anderson J, Cardineau B, et al. (2016) Metal oxide EUV photoresist performance for N7 relevant patterns and processes Proceedings of Spie - the International Society For Optical Engineering. 9779 |
| Del Re R, Sortland M, Passarelli J, et al. (2015) Low-LER tin carboxylate photoresists using EUV Proceedings of Spie - the International Society For Optical Engineering. 9422 |
| Re RD, Passarelli J, Sortland M, et al. (2015) Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates Journal of Micro-Nanolithography Mems and Moems. 14: 43506-43506 |
| Passarelli J, Sortland M, Del Re R, et al. (2014) Bismuth resists for EUV lithography Journal of Photopolymer Science and Technology. 27: 655-661 |
| Passarelli J, Cardineau B, Del Re R, et al. (2014) EUV resists comprised of main group organometallic oligomeric materials Proceedings of Spie - the International Society For Optical Engineering. 9051 |
| Cardineau B, Del Re R, Al-Mashat H, et al. (2014) EUV resists based on Tin-Oxo clusters Proceedings of Spie - the International Society For Optical Engineering. 9051 |
| Cardineau B, Del Re R, Marnell M, et al. (2014) Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5 nm) Microelectronic Engineering. 127: 44-50 |
| Cardineau B, Garczynski P, Earley W, et al. (2013) Chain-scission polyethers for EUV lithography Journal of Photopolymer Science and Technology. 26: 665-671 |
| Cardineau B, Earley W, Fujisawa T, et al. (2012) LER limitations of resist thin films Journal of Photopolymer Science and Technology. 25: 633-640 |
| Trikeriotis M, Krysaki M, Chung YS, et al. (2012) Nanoparticle photoresists from HfO 2 and ZrO 2 for EUV patterning Journal of Photopolymer Science and Technology. 25: 583-586 |