Robert L. Brainard
Affiliations: | 1987-1990 | Polaroid, Sankt-Peterburg, Saint Petersburg, Russia | |
| 2005- | Nanoscale Science and Engineering | State University of New York, Albany, Albany, NY, United States |
Area:
nanotechnologyWebsite:
http://www.sunycnse.com/aboutus/facultystaff/faculty/robertbrainard.aspxGoogle:
"Robert Lyle Brainard"Bio:
https://books.google.com/books?id=Sx39H8XR1FcC&lpg=PA316&pg=PA316#v=onepage&q&f=false
Mean distance: 6.62 | S | N | B | C | P |
Parents
Sign in to add mentor| George M. Whitesides | grad student | 1985 | MIT | |
| (The Thermal Chemistry of Alkylchlorobis(trialkylphosphine)platinum (II) Compounds: B-hydride Elimination, G-hydride Activation, and Intermolecular Activation of Aromatic C-H Bonds) | ||||
| Robert J. Madix | post-doc | 1985-1987 | Stanford | |
Children
Sign in to add trainee| Craig Higgins | grad student | 2011 | SUNY Albany |
| Seth Kruger | grad student | 2011 | SUNY Albany |
| Brian Cardineau | grad student | 2013 | SUNY Albany |
BETA: Related publications
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Publications
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| Murphy M, Narasimhan A, Grzeskowiak S, et al. (2017) EUV Mechanistic Studies of Antimony Resists Journal of Photopolymer Science and Technology. 30: 121-131 |
| Rangan S, Bartynski RA, Narasimhan A, et al. (2017) Electronic structure, excitation properties, and chemical transformations of extreme ultra-violet resist materials Journal of Applied Physics. 122: 025305 |
| Passarelli J, Murphy M, Del Re R, et al. (2015) High-sensitivity molecular organometallic resist for EUV (MORE) Proceedings of Spie - the International Society For Optical Engineering. 9425 |
| Sortland M, Del Re R, Passarelli J, et al. (2015) Positive-tone EUV resists: Complexes of platinum and palladium Proceedings of Spie - the International Society For Optical Engineering. 9422 |
| Del Re R, Sortland M, Passarelli J, et al. (2015) Low-LER tin carboxylate photoresists using EUV Proceedings of Spie - the International Society For Optical Engineering. 9422 |
| Narasimhan A, Grzeskowiak S, Srivats B, et al. (2015) Studying secondary electron behavior in EUV resists using experimentation and modeling Proceedings of Spie - the International Society For Optical Engineering. 9422 |
| Sortland M, Hotalen J, Re RD, et al. (2015) Platinum and palladium oxalates: Positive-tone extreme ultraviolet resists Journal of Micro/ Nanolithography, Mems, and Moems. 14 |
| Re RD, Passarelli J, Sortland M, et al. (2015) Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates Journal of Micro-Nanolithography Mems and Moems. 14: 43506-43506 |
| Passarelli J, Murphy M, Del Re R, et al. (2015) Organometallic carboxylate resists for extreme ultraviolet with high sensitivity Journal of Micro/ Nanolithography, Mems, and Moems. 14 |
| Narasimhan A, Grzeskowiak S, Srivats B, et al. (2015) Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling Journal of Micro/ Nanolithography, Mems, and Moems. 14 |