Xuecheng Dong, Ph.D.
Affiliations: | 2012 | Materials Science | University of Cincinnati, Cincinnati, OH |
Area:
Materials Science EngineeringGoogle:
"Xuecheng Dong"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Dale W. Schaefer | grad student | 2012 | University of Cincinnati | |
| (Mechanism of Passivation and Inhibition of Trivalent Chromium Process Coating on Aluminum Alloys.) | ||||
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Publications
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| Hu N, Dong X, He X, et al. (2015) Effect of sealing on the morphology of anodized aluminum oxide Corrosion Science. 97: 17-24 |
| Hu N, Dong X, He X, et al. (2013) Interfacial morphology of low-voltage anodic aluminium oxide Journal of Applied Crystallography. 46: 1386-1396 |
| Dong X, Argekar S, Wang P, et al. (2011) In situ evolution of trivalent chromium process passive film on Al in a corrosive aqueous environment. Acs Applied Materials & Interfaces. 3: 4206-14 |
| Dong X, Wang P, Argekar S, et al. (2010) Structure and composition of trivalent chromium process (TCP) films on Al alloy. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 10833-41 |
| Wang P, Dong X, Schaefer DW. (2010) Structure and water-barrier properties of vanadate-based corrosion inhibitor films Corrosion Science. 52: 943-949 |