Xuecheng Dong, Ph.D. - Publications
Affiliations: | 2012 | Materials Science | University of Cincinnati, Cincinnati, OH |
Area:
Materials Science EngineeringYear | Citation | Score | |||
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2015 | Hu N, Dong X, He X, Browning JF, Schaefer DW. Effect of sealing on the morphology of anodized aluminum oxide Corrosion Science. 97: 17-24. DOI: 10.1016/J.Corsci.2015.03.021 | 0.594 | |||
2013 | Hu N, Dong X, He X, Argekar S, Zhang Y, Browning JF, Schaefer DW. Interfacial morphology of low-voltage anodic aluminium oxide Journal of Applied Crystallography. 46: 1386-1396. DOI: 10.1107/S0021889813018219 | 0.637 | |||
2011 | Dong X, Argekar S, Wang P, Schaefer DW. In situ evolution of trivalent chromium process passive film on Al in a corrosive aqueous environment. Acs Applied Materials & Interfaces. 3: 4206-14. PMID 21950584 DOI: 10.1021/Am200845V | 0.642 | |||
2010 | Dong X, Wang P, Argekar S, Schaefer DW. Structure and composition of trivalent chromium process (TCP) films on Al alloy. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 10833-41. PMID 20232798 DOI: 10.1021/La100699U | 0.641 | |||
2010 | Wang P, Dong X, Schaefer DW. Structure and water-barrier properties of vanadate-based corrosion inhibitor films Corrosion Science. 52: 943-949. DOI: 10.1016/J.Corsci.2009.11.017 | 0.817 | |||
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