Hoang Vi Tran
Affiliations: | 2002 | University of Texas at Austin, Austin, Texas, U.S.A. |
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Parents
Sign in to add mentor| C. Grant Willson | grad student | 2002 | UT Austin | |
| (Materials for advanced microlithography: Polymers for 157 nm lithography and acid diffusion measurements.) | ||||
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| Sheehan MT, Farnham WB, Tran HV, et al. (2013) High chi polymer development for DSA applications using RAFT technology Proceedings of Spie - the International Society For Optical Engineering. 8682 |
| Sheehan MT, Farnham WB, Chambers CR, et al. (2011) Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology Proceedings of Spie - the International Society For Optical Engineering. 7972 |
| French RH, Tran HV. (2009) Immersion lithography: Photomask and wafer-level materials Annual Review of Materials Research. 39: 93-126 |
| Tran HV, Hendrickx E, Van Roey F, et al. (2009) Fluid-photoresist interactions and imaging in high-index immersion lithography Journal of Micro/Nanolithography, Mems, and Moems. 8 |
| Tran HV, Hendrickx E, French RH, et al. (2008) High refractive index fluid evaluations at 193 nm: Fluid lifetime and fluid/resist interaction studies Journal of Photopolymer Science and Technology. 21: 631-639 |
| French RH, Tran HV, Adelman DJ, et al. (2008) High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches Proceedings of Spie - the International Society For Optical Engineering. 6924 |
| French RH, Liberman V, Tran HV, et al. (2007) High index immersion lithography with second generation immersion fluids to enable numerical apertures of 1.55 for cost effective 32 nm half pitches Proceedings of Spie - the International Society For Optical Engineering. 6520 |
| Feiring AE, Crawford MK, Farnham WB, et al. (2006) New amorphous fluoropolymers of tetrafluoroethylene with fluorinated and non-fluorinated tricyclononenes. Semiconductor photoresists for imaging at 157 and 193 nm Macromolecules. 39: 3252-3261 |
| Feiring AE, Crawford MK, Farnham WB, et al. (2006) Bis(fluoroalcohol) monomers and polymers: Improved transparency fluoropolymer photoresists for semiconductor photolithography at 157 nm Macromolecules. 39: 1443-1448 |
| Zumsteg FC, Leffew KW, Feiring AE, et al. (2005) The impact of fluoropolymers on line edge roughness in 193 nm Imaging Journal of Photopolymer Science and Technology. 18: 467-469 |