John F. Conley
Affiliations: | Electrical Engineering | Oregon State University, Corvallis, OR |
Area:
high dielectric materials, thin filmsWebsite:
http://web.engr.oregonstate.edu/~jconley/people.htmlGoogle:
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Publications
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| Holden K, Dezelah CL, Conley JF. (2019) Atomic Layer Deposition of Transparent p-Type Semiconducting Nickel Oxide using Ni(DAD) and Ozone. Acs Applied Materials & Interfaces |
| Jenkins M, Austin DZ, Conley JF, et al. (2019) Review—Beyond the highs and lows: A perspective on the future of dielectrics research for nanoelectronic devices Ecs Journal of Solid State Science and Technology. 8 |
| Holden KEK, Conley JF. (2019) Characterization of atomic layer deposited semiconducting Co3O4 Journal of Vacuum Science and Technology. 37: 20903 |
| Jenkins MA, Austin DZ, Holden KEK, et al. (2019) Laminate Al 2 O 3 /Ta 2 O 5 Metal/Insulator/Insulator/Metal (MIIM) Devices for High-Voltage Applications Ieee Transactions On Electron Devices. 66: 5260-5265 |
| Septevani AA, Evans DAC, Hosseinmardi A, et al. (2018) Atomic Layer Deposition of Metal Oxide on Nanocellulose for Enabling Microscopic Characterization of Polymer Nanocomposites. Small (Weinheim An Der Bergstrasse, Germany). e1803439 |
| Septevani AA, Evans DAC, Hosseinmardi A, et al. (2018) Polymer Nanocomposites Characterization: Atomic Layer Deposition of Metal Oxide on Nanocellulose for Enabling Microscopic Characterization of Polymer Nanocomposites (Small 46/2018) Small. 14: 1870217 |
| Buesch C, Smith SW, Eschbach P, et al. (2016) The Microstructure of Cellulose Nanocrystal Aerogels as Revealed by Transmission Electron Microscope Tomography. Biomacromolecules |
| Murari NM, Mansergh RH, Huang Y, et al. (2016) Aerosol jet fog (ajFOG) deposition of aluminum oxide phosphate thin films from an aqueous fog Journal of Materials Research. 31: 3303-3312 |
| Valdivia A, Tweet DJ, Conley JF. (2016) Atomic layer deposition of two dimensional MoS2 on 150 mm substrates Journal of Vacuum Science and Technology. 34: 21515 |
| Austin DZ, Allman D, Price D, et al. (2015) Plasma Enhanced Atomic Layer Deposition of Al 2 O 3 /SiO 2 MIM Capacitors Ieee Electron Device Letters. 36: 496-498 |