Larry F. Thompson, Ph.D.
Affiliations: | University of Missouri-Rolla, Rolla, MO, United States | ||
| AT&T Bell Laboratories |
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Publications
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| Novembre AE, Kometani JM, Tai WW, et al. (1992) Sensitivity enhancement of t-BOC based chemically amplified resists through optimization of process prebake conditions. Journal of Photopolymer Science and Technology. 5: 9-15 |
| Novembre AE, Tai WW, Kometani JM, et al. (1992) Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide) Chemistry of Materials. 4: 278-284 |
| Novembre AE, Hanson JE, Kometani JM, et al. (1992) Lithographic properties of chemically amplified resists based on copolymers of 4-tert-butoxycarbonyloxystyrene (TBS) and sulfur dioxide (SO2) Microelectronic Engineering. 17: 257-260 |
| NALAMASU O, CHENG M, TIMKO AG, et al. (1991) An overview of resist processing for deep-UV lithography. Journal of Photopolymer Science and Technology. 4: 299-318 |
| Kanga RS, Kometani JM, Reichmanis E, et al. (1991) Synthesis and characterization of poly[4-((tert -butoxycarbonyl)oxy)styrene-sulfone] Chemistry of Materials. 3: 660-667 |
| Reichmanis E, Thompson LF. (1991) Chemistry and processes for deep-UV resists Microelectronic Engineering. 13: 3-10 |
| Novembre AE, Hanson JE, Kometani JM, et al. (1991) Arylmethyl sulfones. A new class of photoacid generators Photopolymers: Principles - Processes and Materials. 41-50 |
| Houlihan FM, Neenan TX, Reichmanis E, et al. (1990) Chemically amplified resists: The chemistry and lithographic characteristics of nitrobenzyl benzenesulfonate derivatives. Journal of Photopolymer Science and Technology. 3: 259-273 |
| Neenan TX, Houlihan FM, Reichmanis E, et al. (1990) Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices. Studies pertaining to chemical amplification and imaging Macromolecules. 23: 145-150 |
| Reichmanis E, Thompson LF. (1990) Challenges in Lithographic Materials and Processes At&T Technical Journal. 69: 32-45 |