Larry F. Thompson, Ph.D.

Affiliations: 
University of Missouri-Rolla, Rolla, MO, United States 
 AT&T Bell Laboratories 
Area:
microlithography
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"Larry Thompson"
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Publications

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Novembre AE, Tai WW, Kometani JM, et al. (1992) Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide) Chemistry of Materials. 4: 278-284
Novembre AE, Hanson JE, Kometani JM, et al. (1992) Lithographic properties of chemically amplified resists based on copolymers of 4-tert-butoxycarbonyloxystyrene (TBS) and sulfur dioxide (SO2) Microelectronic Engineering. 17: 257-260
Kanga RS, Kometani JM, Reichmanis E, et al. (1991) Synthesis and characterization of poly[4-((tert -butoxycarbonyl)oxy)styrene-sulfone] Chemistry of Materials. 3: 660-667
Reichmanis E, Thompson LF. (1991) Chemistry and processes for deep-UV resists Microelectronic Engineering. 13: 3-10
Novembre AE, Hanson JE, Kometani JM, et al. (1991) Arylmethyl sulfones. A new class of photoacid generators Photopolymers: Principles - Processes and Materials. 41-50
Neenan TX, Houlihan FM, Reichmanis E, et al. (1990) Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices. Studies pertaining to chemical amplification and imaging Macromolecules. 23: 145-150
Reichmanis E, Thompson LF. (1989) Polymer materials for microlithography Chemical Reviews. 89: 1273-1289
Tarascon RG, Reichmanis E, Houlihan FM, et al. (1989) Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography Polymer Engineering and Science. 29: 850-855
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