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Jing Sha, Ph.D. - Publications

Affiliations: 
2010 Cornell University, Ithaca, NY, United States 
Area:
polymers
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17 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2015 Zhou T, Guo Y, Zhou Z, Guo X, Sha J. An update of the macaque testis proteome. Data in Brief. 5: 95-8. PMID 26484360 DOI: 10.1016/j.dib.2015.08.029  0.31
2012 Jung B, Sha J, Paredes F, Chandhok M, Younkin TR, Wiesner U, Ober CK, Thompson MO. Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heating. Acs Nano. 6: 5830-6. PMID 22725269 DOI: 10.1021/Nn300008A  0.542
2012 Prabhu VM, Kang S, Sha J, Bonnesen PV, Satija S, Wu WL, Ober CK. Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme ultraviolet lithography. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 7665-78. PMID 22577835 DOI: 10.1021/La301311M  0.535
2012 Ouyang CY, Lee JK, Krysak ME, Sha J, Ober CK. Environmentally friendly patterning of thin films in linear methyl siloxanes Journal of Materials Chemistry. 22: 5746-5750. DOI: 10.1039/C2Jm16603H  0.664
2011 Prabhu VM, Kang S, Kline RJ, Delongchamp DM, Fischer DA, Wu WL, Satija SK, Bonnesen PV, Sha J, Ober CK. Characterization of the non-uniform reaction in chemically amplified calix[4]resorcinarene molecular resist thin films Australian Journal of Chemistry. 64: 1065-1073. DOI: 10.1071/Ch11242  0.512
2010 Jung B, Sha J, Paredes F, Ober CK, Thompson MO, Chandhok M, Younkin TR. Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848418  0.536
2010 Ouyang CY, Lee JK, Sha J, Ober CK. Environmentally friendly processing of photoresists in scCO2 and decamethyltetrasiloxane Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848336  0.695
2010 Bae WJ, Trikeriotis M, Sha J, Schwartz EL, Rodriguez R, Zimmerman P, Giannelis EP, Ober CK. High refractive index and high transparency HfO2 nanocomposites for next generation lithography Journal of Materials Chemistry. 20: 5186-5189. DOI: 10.1039/C0Jm00679C  0.49
2010 Sha J, Lee JK, Kang S, Prabhu VM, Soles CL, Bonnesen PV, Ober CK. Architectural effects on acid reaction-diffusion kinetics in molecular glass photoresists Chemistry of Materials. 22: 3093-3098. DOI: 10.1021/Cm9038939  0.668
2009 McCluskey GE, Lee JK, Sha J, Ober CK, Watkins SE, Holmes AB. Synthesis and processing of organic materials in supercritical carbon dioxide Mrs Bulletin. 34: 108-115. DOI: 10.1557/Mrs2009.29  0.653
2009 Krysak M, De Silva A, Sha J, Lee JK, Ober CK. Molecular glass resists for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814147  0.676
2009 Sha J, Lee JK, Ober CK. Molecular glass resists developable in supercritical carbon dioxide for 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813956  0.709
2009 Sha J, Jung B, Thompson MO, Ober CK, Chandhok M, Younkin TR. Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3020-3024. DOI: 10.1116/1.3263173  0.562
2009 Lee JK, Chatzichristidi M, Zakhidov AA, Hwang HS, Schwartz EL, Sha J, Taylor PG, Fong HH, Defranco JA, Murotani E, Wong WWH, Malliaras GG, Ober CK. Acid-diffusion behaviour in organic thin films and its effect on patterning Journal of Materials Chemistry. 19: 2986-2992. DOI: 10.1039/B817286B  0.722
2009 Steidl L, Jhaveri SJ, Ayothi R, Sha J, McMullen JD, Ng SYC, Zipfel WR, Zentel R, Ober CK. Non-ionic photo-acid generators for applications in two-photon lithography Journal of Materials Chemistry. 19: 505-513. DOI: 10.1039/B816434G  0.684
2009 Sha J, Ober CK. Fluorine-and siloxane-containing polymers for supercritical carbon dioxide lithography Polymer International. 58: 302-306. DOI: 10.1002/Pi.2533  0.536
2008 Felix NM, De Silva A, Sha J, Ober CK. Achieving small dimensions with an environmentally friendly solvent: Photoresist development using supercritical CO2 Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772635  0.672
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