Year |
Citation |
Score |
2020 |
Lee MH, Peterson RL. Accelerated Aging Stability of β-GaO - Titanium/Gold Ohmic Interfaces. Acs Applied Materials & Interfaces. PMID 32954727 DOI: 10.1021/Acsami.0C10598 |
0.333 |
|
2020 |
Allemang CR, Cho TH, Trejo O, Ravan S, Rodríguez RE, Dasgupta NP, Peterson RL. High‐Performance Zinc Tin Oxide TFTs with Active Layers Deposited by Atomic Layer Deposition Advanced Electronic Materials. 6: 2000195. DOI: 10.1002/Aelm.202000195 |
0.31 |
|
2019 |
Allemang CR, Peterson RL. Passivation of Thin Channel Zinc Tin Oxide TFTs Using Al2O3 Deposited by O3-Based Atomic Layer Deposition Ieee Electron Device Letters. 40: 1120-1123. DOI: 10.1109/Led.2019.2914238 |
0.364 |
|
2019 |
Lee M, Peterson RL. Interfacial reactions of titanium/gold ohmic contacts with Sn-doped β-Ga2O3 Apl Materials. 7: 22524. DOI: 10.1063/1.5054624 |
0.33 |
|
2019 |
Son Y, Peterson RL. Thin Films: Exploiting In Situ Redox and Diffusion of Molybdenum to Enable Thin‐Film Circuitry for Low‐Cost Wireless Energy Harvesting (Adv. Funct. Mater. 5/2019) Advanced Functional Materials. 29: 1970029. DOI: 10.1002/Adfm.201970029 |
0.326 |
|
2017 |
Hu W, Peterson RL. The roles of rare-earth dopants in solution-processed ZnO-based transparent conductive oxides Journal of Applied Physics. 122: 105301. DOI: 10.1063/1.4991943 |
0.362 |
|
2017 |
Son Y, Liao A, Peterson RL. Effect of relative humidity and pre-annealing temperature on spin-coated zinc tin oxide films made via the metal–organic decomposition route Journal of Materials Chemistry C. 5: 8071-8081. DOI: 10.1039/C7Tc02343J |
0.374 |
|
2016 |
Son Y, Li J, Peterson RL. In situ chemical modification of Schottky barrier in solution-processed zinc tin oxide diode. Acs Applied Materials & Interfaces. PMID 27559750 DOI: 10.1021/Acsami.6B05953 |
0.334 |
|
2016 |
Hu W, Frost B, Peterson RL. Thermally stable yttrium-scandium oxide high-k dielectrics deposited by a solution process Journal of Physics D: Applied Physics. 49. DOI: 10.1088/0022-3727/49/11/115109 |
0.392 |
|
2015 |
Lo C, Peterson RL. Ink Deposition of Quaternary Amorphous Oxide Semiconductors for Electronic and Optoelectronic Devices Frontiers in Optics. DOI: 10.1364/Fio.2015.Fth4F.1 |
0.38 |
|
2014 |
Banger KK, Peterson RL, Mori K, Yamashita Y, Leedham T, Sirringhaus H. High Performance, Low Temperature Solution-Processed Barium and Strontium Doped Oxide Thin Film Transistors. Chemistry of Materials : a Publication of the American Chemical Society. 26: 1195-1203. PMID 24511184 DOI: 10.1021/Cm4035837 |
0.404 |
|
2014 |
Aktakka EE, Peterson RL, Najafi K. High stroke and high deflection bulk-PZT diaphragm and cantilever micro actuators and effect of pre-stress on device performance Journal of Microelectromechanical Systems. 23: 438-451. DOI: 10.1109/Jmems.2013.2279079 |
0.379 |
|
2014 |
Hu W, Peterson RL. Molybdenum as a contact material in zinc tin oxide thin film transistors Applied Physics Letters. 104. DOI: 10.1063/1.4875958 |
0.401 |
|
2013 |
Aktakka EE, Peterson RL, Najafi K. Wafer-level integration of high-quality bulk piezoelectric ceramics on silicon Ieee Transactions On Electron Devices. 60: 2022-2030. DOI: 10.1109/Ted.2013.2259240 |
0.445 |
|
2013 |
Aktakka EE, Ghafouri N, Smith CE, Peterson RL, Hussain MM, Najafi K. Post-CMOS FinFET integration of bismuth telluride and antimony telluride thin-film-based thermoelectric devices on SoI substrate Ieee Electron Device Letters. 34: 1334-1336. DOI: 10.1109/Led.2013.2277693 |
0.42 |
|
2012 |
Hu W, Peterson RL. Charge transport in solution-processed zinc tin oxide thin film transistors Journal of Materials Research. 27: 2286-2292. DOI: 10.1557/Jmr.2012.134 |
0.417 |
|
2011 |
Banger KK, Yamashita Y, Mori K, Peterson RL, Leedham T, Rickard J, Sirringhaus H. Low-temperature, high-performance solution-processed metal oxide thin-film transistors formed by a ‘sol–gel on chip’ process. Nature Materials. 10: 45-50. PMID 21151167 DOI: 10.1038/Nmat2914 |
0.372 |
|
2011 |
Gross AJ, Hwang GS, Huang B, Yang H, Ghafouri N, Kim H, Peterson RL, Uher C, Kaviany M, Najafi K. Multistage planar thermoelectric microcoolers Journal of Microelectromechanical Systems. 20: 1201-1210. DOI: 10.1109/Jmems.2011.2163302 |
0.305 |
|
2007 |
Sun B, Peterson RL, Sirringhaus H, Mori K. Low-Temperature Sintering of In-Plane Self-Assembled ZnO Nanorods for Solution-Processed High-Performance Thin Film Transistors The Journal of Physical Chemistry C. 111: 18831-18835. DOI: 10.1021/Jp077740F |
0.378 |
|
2006 |
Peterson RL, Hobart KD, Yin H, Kub FJ, Sturm JC. Publisher's Note: “Maximizing uniaxial tensile strain in large-area silicon-on-insulator islands on compliant substrates” [J. Appl. Phys. 100, 023537 (2006)] Journal of Applied Physics. 100: 129901. DOI: 10.1063/1.2403772 |
0.548 |
|
2006 |
Peterson RL, Hobart KD, Yin H, Kub FJ, Sturm JC. Maximizing uniaxial tensile strain in large-area silicon-on-insulator islands on compliant substrates Journal of Applied Physics. 100. DOI: 10.1063/1.2210810 |
0.571 |
|
2006 |
Peterson RL, Hobart KD, Kub FJ, Yin H, Sturm JC. Reduced buckling in one dimension versus two dimensions of a compressively strained film on a compliant substrate Applied Physics Letters. 88. DOI: 10.1063/1.2204456 |
0.457 |
|
2006 |
Peterson RL, Hobart KD, Kub FJ, Sturm JC. Comment on "fabrication of strained silicon on insulator by strain transfer process" [Appl. Phys. Lett. 87, 051921 (2005)] Applied Physics Letters. 88. DOI: 10.1063/1.2192641 |
0.594 |
|
2005 |
Yin H, Hobart KD, Peterson RL, Kub FJ, Sturm JC. Ultrathin strained-SOI by stress balance on compliant substrates and FET performance Ieee Transactions On Electron Devices. 52: 2207-2213. DOI: 10.1109/Ted.2005.856185 |
0.502 |
|
2005 |
Yin H, Peterson RL, Hobart KD, Shieh SR, Duffy TS, Sturm JC. Tunable uniaxial vs biaxial in-plane strain using compliant substrates Applied Physics Letters. 87. DOI: 10.1063/1.2006215 |
0.599 |
|
2004 |
Sturm JC, Yin H, Peterson RL, Hobart KD, Kub FJ. High-Perfection Approaches to Si-based Devices through Strained Layer Epitaxy The Japan Society of Applied Physics. 2004: 220-221. DOI: 10.7567/Ssdm.2004.C-4-1 |
0.419 |
|
2004 |
Peterson RL, Yin H, Sturm JC. Island Scaling Effects on Photoluminescence of Strained SiGe/Si (100) Mrs Proceedings. 809: 133-138. DOI: 10.1557/Proc-809-B8.4 |
0.611 |
|
2004 |
Yin H, Hobart KD, Shieh SR, Peterson RL, Duffy TS, Sturm JC. Interference-enhanced Raman Scattering in Strain Characterization of Ultra-thin Strained SiGe and Si Films on Insulator Mrs Proceedings. 809. DOI: 10.1557/Proc-809-B3.6 |
0.634 |
|
2003 |
Yin H, Peterson R, Hobart K, Shieh S, Duffy T, Sturm J. Relaxed SiGe Layers with High Ge Content by Compliant Substrates Mrs Proceedings. 768. DOI: 10.1557/Proc-768-G1.7/D4.7 |
0.568 |
|
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