Rosa A. Orozco-Teran, Ph.D. - Publications
Affiliations: | 2005 | University of North Texas, Denton, TX, United States |
Area:
Materials Science EngineeringYear | Citation | Score | |||
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2005 | Orozco-Teran R, Gorman B, Mueller D, Baklanov M, Reidy R. Effect of silylation on triethoxyfluorosilane xerogel films by means of atmospheric pressure drying Thin Solid Films. 471: 145-153. DOI: 10.1016/J.Tsf.2004.05.005 | 0.644 | |||
2004 | Gorman BP, Orozco-Teran RA, Zhang Z, Matz PD, Mueller DW, Reidy RF. Rapid repair of plasma ash damage in low-k dielectrics using supercritical CO 2 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 1210-1212. DOI: 10.1116/1.1755220 | 0.58 | |||
2004 | Dong H, Gorman B, Zhang Z, Orozco-Teran R, Roepsch J, Mueller D, Kim M, Reidy R. Reinforcement mechanism for mechanically enhanced xerogel films Journal of Non-Crystalline Solids. 350: 345-350. DOI: 10.1016/J.Jnoncrysol.2004.08.231 | 0.636 | |||
2003 | Zhang Z, Gorman BP, Dong H, Orozco-Teran RA, Mueller DW, Reidy RF. Investigation of polymerization and cyclization of dimethyldiethoxysilane by 29Si NMR and FTIR Journal of Sol-Gel Science and Technology. 28: 159-165. DOI: 10.1023/A:1026098729993 | 0.531 | |||
2001 | Gorman BP, Orozco-Teran RA, Roepsch JA, Mueller DW, Reidy RF. Low Dielectric Constant Functionalized Silica Gels Mrs Proceedings. 714. DOI: 10.1557/Proc-714-L7.17.1 | 0.67 | |||
2001 | Gorman BP, Orozco-Teran RA, Roepsch JA, Dong H, Reidy RF, Mueller DW. High strength, low dielectric constant fluorinated silica xerogel films Applied Physics Letters. 79: 4010-4012. DOI: 10.1063/1.1418267 | 0.67 | |||
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