Christopher K. Ober, Ph.D. - Publications

Affiliations: 
1986- Materials Science & Engineering Cornell University, Ithaca, NY, United States 
Area:
polymers, photoresists
Website:
https://cober.mse.cornell.edu

440 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2024 Zhang Z, Chaudhuri K, Kaefer F, Malanoski AP, Page KA, Smieska LM, Pham JT, Ober CK. Controlling Anti-Penetration Performance by Post-Grafting of Fluorinated Alkyl Chains onto Polystyrene--poly(vinyl methyl siloxane). Acs Applied Materials & Interfaces. PMID 38588386 DOI: 10.1021/acsami.4c01905  0.309
2023 Rahmaninejad H, Parnell AJ, Chen WL, Duzen N, Sexton T, Dunderdale G, Ankner JF, Bras W, Ober CK, Ryan AJ, Ashkar R. Synthesis and Characterization of Stimuli-Responsive Polymer Brushes in Nanofluidic Channels. Acs Applied Materials & Interfaces. PMID 37973616 DOI: 10.1021/acsami.3c12744  0.414
2023 Medhi R, Cintora A, Guazzelli E, Narayan N, Leonardi AK, Galli G, Oliva M, Pretti C, Finlay JA, Clare AS, Martinelli E, Ober CK. Nitroxide-Containing Amphiphilic Random Terpolymers for Marine Antifouling and Fouling-Release Coatings. Acs Applied Materials & Interfaces. PMID 36802475 DOI: 10.1021/acsami.2c23213  0.802
2022 Wang Z, Wang C, Sun Y, Wang K, Strzalka JW, Patel SN, Nealey PF, Ober CK, Escobedo FA. Ion Transport in 2D Nanostructured π-Conjugated Thieno[3,2-]thiophene-Based Liquid Crystal. Acs Nano. PMID 36475656 DOI: 10.1021/acsnano.2c07789  0.784
2022 Leonardi AK, Medhi R, Zhang A, Düzen N, Finlay JA, Clarke JL, Clare AS, Ober CK. Investigation of N-Substituted Morpholine Structures in an Amphiphilic PDMS-Based Antifouling and Fouling-Release Coating. Biomacromolecules. PMID 35486708 DOI: 10.1021/acs.biomac.1c01474  0.798
2022 Barry ME, Aydogan Gokturk P, DeStefano AJ, Leonardi AK, Ober CK, Crumlin EJ, Segalman RA. Effects of Amphiphilic Polypeptoid Side Chains on Polymer Surface Chemistry and Hydrophilicity. Acs Applied Materials & Interfaces. PMID 35089024 DOI: 10.1021/acsami.1c22683  0.83
2021 Huang Y, Tran H, Ober CK. High-Resolution Nanopatterning of Free-Standing, Self-Supported Helical Polypeptide Rod Brushes via Electron Beam Lithography. Acs Macro Letters. 10: 755-759. PMID 35549094 DOI: 10.1021/acsmacrolett.1c00187  0.616
2021 Yuan C, Käfer F, Ober CK. Polymer-Grafted Nanoparticles (PGNs) with Adjustable Graft-Density and Inter-Particle Hydrogen Bonding Interaction. Macromolecular Rapid Communications. e2100629. PMID 34743391 DOI: 10.1002/marc.202100629  0.474
2021 Leonardi A, Zhang AC, Düzen N, Aldred N, Finlay JA, Clarke JL, Clare AS, Segalman RA, Ober CK. Amphiphilic Nitroxide-Bearing Siloxane-Based Block Copolymer Coatings for Enhanced Marine Fouling Release. Acs Applied Materials & Interfaces. PMID 34105932 DOI: 10.1021/acsami.1c05266  0.812
2020 Misra M, Liu Z, Dong BX, Patel SN, Nealey PF, Ober CK, Escobedo FA. Thermal Stability of π-Conjugated -Ethylene-Glycol-Terminated Quaterthiophene Oligomers: A Computational and Experimental Study. Acs Macro Letters. 9: 295-300. PMID 35648538 DOI: 10.1021/acsmacrolett.9b00935  0.472
2020 Wang S, Easley AD, Thakur RM, Ma T, Yun J, Zhang Y, Ober CK, Lutkenhaus JL. Quantifying internal charge transfer and mixed ion-electron transfer in conjugated radical polymers. Chemical Science. 11: 9962-9970. PMID 34094258 DOI: 10.1039/d0sc03567j  0.592
2020 Wang S, Easley AD, Thakur RM, Ma T, Yun J, Zhang Y, Ober CK, Lutkenhaus JL. Quantifying Internal Charge Transfer and Mixed Ionic-Electronic Transfer in Conjugated Radical Polymers Chemical Science. DOI: 10.1039/D0Sc03567J  0.631
2020 Misra M, Liu Z, Dong BX, Patel SN, Nealey PF, Ober CK, Escobedo FA. Thermal Stability of π-Conjugated n-Ethylene-Glycol-Terminated Quaterthiophene Oligomers: A Computational and Experimental Study Acs Macro Letters. 9: 295-300. DOI: 10.1021/Acsmacrolett.9B00935  0.515
2019 Cintora A, Takano H, Khurana M, Chandra A, Hayakawa T, Ober CK. Block copolymers containing stable radical and fluorinated blocks with long-range ordered morphologies prepared by anionic polymerization. Polymer Chemistry. 10: 5094-5102. PMID 31853268 DOI: 10.1039/C9Py00416E  0.832
2019 Dong BX, Liu Z, Misra M, Strzalka J, Niklas J, Poluektov OG, Escobedo FA, Ober CK, Nealey PF, Patel SN. Structure Control of a π-Conjugated Oligothiophene-Based Liquid Crystal for Enhanced Mixed Ion/Electron Transport Characteristics. Acs Nano. PMID 31194507 DOI: 10.1021/Acsnano.9B01055  0.549
2019 Leonardi AK, Ober CK. Polymer-Based Marine Antifouling and Fouling Release Surfaces: Strategies for Synthesis and Modification. Annual Review of Chemical and Biomolecular Engineering. 10: 241-264. PMID 31173523 DOI: 10.1146/Annurev-Chembioeng-060718-030401  0.811
2019 Sheng W, Amin I, Neumann C, Dong R, Zhang T, Wegener E, Chen WL, Förster P, Tran HQ, Löffler M, Winter A, Rodriguez RD, Zschech E, Ober CK, Feng X, et al. Polymer Brushes on Hexagonal Boron Nitride. Small (Weinheim An Der Bergstrasse, Germany). e1805228. PMID 30932320 DOI: 10.1002/Smll.201805228  0.581
2019 Jiang J, Jung B, Thompson MO, Ober CK. Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications Journal of Vacuum Science & Technology B. 37: 041601. DOI: 10.1116/1.5086871  0.39
2019 Hatton FL, Park AM, Zhang Y, Fuchs GD, Ober CK, Armes SP. Aqueous one-pot synthesis of epoxy-functional diblock copolymer worms from a single monomer: new anisotropic scaffolds for potential charge storage applications Polymer Chemistry. 10: 194-200. DOI: 10.1039/C8Py01427B  0.644
2019 Barry ME, Davidson EC, Zhang C, Patterson AL, Yu B, Leonardi AK, Duzen N, Malaviya K, Clarke JL, Finlay JA, Clare AS, Chen Z, Ober CK, Segalman RA. The Role of Hydrogen Bonding in Peptoid-Based Marine Antifouling Coatings Macromolecules. 52: 1287-1295. DOI: 10.1021/Acs.Macromol.8B02390  0.78
2019 Huang J, Xu H, Peretz E, Wu D, Ober CK, Hanrath T. Three-Dimensional Printing of Hierarchical Porous Architectures Chemistry of Materials. 31: 10017-10022. DOI: 10.1021/Acs.Chemmater.9B02761  0.379
2019 Sheng W, Amin I, Neumann C, Dong R, Zhang T, Wegener E, Chen W, Förster P, Tran HQ, Löffler M, Winter A, Rodriguez RD, Zschech E, Ober CK, Feng X, et al. Polymer Brushes: Polymer Brushes on Hexagonal Boron Nitride (Small 19/2019) Small. 15: 1970099. DOI: 10.1002/Smll.201970099  0.576
2019 Menzel M, Chen W, Simancas K, Xu H, Prucker O, Ober CK, Rühe J. Entropic death of nonpatterned and nanopatterned polyelectrolyte brushes Journal of Polymer Science Part a: Polymer Chemistry. 57: 1283-1295. DOI: 10.1002/Pola.29384  0.498
2019 Gund V, Ruyack A, Leonardi A, Vinayakumar KB, Ober C, Lal A. Spatially Controlled Transience of Graphene‐Polymer Electronics with Silicon Singulation Advanced Functional Materials. 29: 1900592. DOI: 10.1002/Adfm.201900592  0.762
2018 Tran H, Zhang Y, Ober CK. Synthesis, Processing, and Characterization of Helical Polypeptide Rod-Coil Mixed Brushes. Acs Macro Letters. 7: 1186-1191. PMID 35651270 DOI: 10.1021/acsmacrolett.8b00606  0.661
2018 Lin Z, Zhang Y, Ober CK, Goddard JM. Facile preparation of epoxide functionalized surfaces via photocurable copolymer coatings and subsequent immobilization of iminodiacetic acids. Acs Applied Materials & Interfaces. PMID 30398853 DOI: 10.1021/Acsami.8B15716  0.653
2018 Newby C, Piachaud T, Vaynzof Y, Lee JK, Jung SH, Sadhanala A, Ober CK, Friend RH. Electroluminescence from solution-processed pinhole-free nm-thickness layers of conjugated polymers. Nano Letters. PMID 30070851 DOI: 10.1021/Acs.Nanolett.8B01084  0.777
2018 Shi C, Leonardi AK, Ohlendorf P, Zhang Y, Ruyack A, Lal A, Ober CK. UV-triggered Transient Electrospun Poly(propylene carbonate)/Poly(phthalaldehyde) Polymer Blends Fiber Mats. Acs Applied Materials & Interfaces. PMID 30044081 DOI: 10.1021/Acsami.8B06051  0.807
2018 Lu Z, Chen Z, Guo Y, Ju Y, Liu Y, Feng R, Xiong C, Ober CK, Dong L. Flexible hydrophobic antifouling coating with oriented nanotopography and non-leaking capsaicin. Acs Applied Materials & Interfaces. PMID 29464942 DOI: 10.1021/Acsami.7B19436  0.381
2018 Zhang Y, Park A, Cintora A, McMillan SR, Harmon NJ, Moehle A, Flatté ME, Fuchs GD, Ober CK. Impact of the Synthesis Method on the Solid-State Charge Transport of Radical Polymers. Journal of Materials Chemistry. C. 6: 111-118. PMID 29430302 DOI: 10.1039/C7Tc04645F  0.814
2018 Ober CK, Liu Z, Cordero R, Cintora A. Materials Overview for 2-Photon 3D Printing Applications Journal of Photopolymer Science and Technology. 31: 425-429. DOI: 10.2494/Photopolymer.31.425  0.766
2018 Ober CK, Kosma V, Xu H, Sakai K, Giannelis EP. The Challenges of Highly Sensitive EUV Photoresists Journal of Photopolymer Science and Technology. 31: 261-265. DOI: 10.2494/Photopolymer.31.261  0.34
2018 Xu H, Kosma V, Sakai K, Giannelis EP, Ober CK. EUV photolithography: resist progress in metal–organic complex photoresists Journal of Micro-Nanolithography Mems and Moems. 18: 11007. DOI: 10.1117/1.Jmm.18.1.011007  0.424
2018 Sakai K, Xu H, Kosma V, Giannelis EP, Ober CK. Progress in metal organic cluster EUV photoresists Journal of Vacuum Science & Technology B. 36: 06J504. DOI: 10.1116/1.5050942  0.363
2018 Zhang Y, Park A, Cintora A, McMillan SR, Harmon NJ, Moehle A, Flatté ME, Fuchs GD, Ober CK. Correction: Impact of the synthesis method on the solid-state charge transport of radical polymers Journal of Materials Chemistry C. 6: 907-907. DOI: 10.1039/C8Tc90008F  0.778
2018 Tran H, Zhang Y, Ober CK. Synthesis, Processing, and Characterization of Helical Polypeptide Rod–Coil Mixed Brushes Acs Macro Letters. 7: 1186-1191. DOI: 10.1021/Acsmacrolett.8B00606  0.686
2018 Cordero R, Jawaid A, Hsiao M, Lequeux Z, Vaia RA, Ober CK. Mini Monomer Encapsulated Emulsion Polymerization of PMMA Using Aqueous ARGET ATRP Acs Macro Letters. 7: 459-463. DOI: 10.1021/Acsmacrolett.8B00038  0.384
2018 Zhang Y, Park AM, McMillan SR, Harmon NJ, Flatté ME, Fuchs GD, Ober CK. Charge Transport in Conjugated Polymers with Pendent Stable Radical Groups Chemistry of Materials. 30: 4799-4807. DOI: 10.1021/Acs.Chemmater.8B02076  0.668
2018 Xu H, Sakai K, Kasahara K, Kosma V, Yang K, Herbol HC, Odent J, Clancy P, Giannelis EP, Ober CK. Metal–Organic Framework-Inspired Metal-Containing Clusters for High-Resolution Patterning Chemistry of Materials. 30: 4124-4133. DOI: 10.1021/Acs.Chemmater.8B01573  0.382
2018 Liu Z, Dong BX, Misra M, Sun Y, Strzalka J, Patel SN, Escobedo FA, Nealey PF, Ober CK. Self-Assembly Behavior of an Oligothiophene-Based Conjugated Liquid Crystal and Its Implication for Ionic Conductivity Characteristics Advanced Functional Materials. 29: 1805220. DOI: 10.1002/Adfm.201805220  0.524
2017 Li J, Yu Y, Myungwoong K, Li K, Mikhail J, Zhang L, Chang CC, Gersappe D, Simon M, Ober C, Rafailovich M. Manipulation of cell adhesion and dynamics using RGD functionalized polymers. Journal of Materials Chemistry. B. 5: 6307-6316. PMID 32264447 DOI: 10.1039/C7Tb01209H  0.411
2017 Li J, Yu Y, Kim M, Li K, Mikhail J, Zhang L, Chang CC, Gersappe D, Simon M, Ober C, Rafailovich M. Correction: Manipulation of cell adhesion and dynamics using RGD functionalized polymers. Journal of Materials Chemistry. B. 5: 6973. PMID 32264346 DOI: 10.1039/C7Tb90117H  0.514
2017 Liu HY, Chen WL, Ober CK, Daniel S. Biologically Complex Planar Cell Plasma Membranes Supported on Polyelectrolyte Cushions Enhance Transmembrane Protein Mobility and Retain Native Orientation. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29020444 DOI: 10.1021/Acs.Langmuir.7B02945  0.455
2017 Ohlendorf P, Ruyack A, Leonardi AK, Shi C, Cuppoletti C, Bruce I, Lal A, Ober CK. Transient Fiber Mats of Electrospun Poly(Propylene Carbonate) Composites with Remarkable Mechanical Strength. Acs Applied Materials & Interfaces. PMID 28644611 DOI: 10.1021/Acsami.7B04710  0.793
2017 Jiang J, Jacobs AG, Wenning B, Liedel C, Thompson MO, Ober CK. Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing. Acs Applied Materials & Interfaces. PMID 28598156 DOI: 10.1021/Acsami.7B00774  0.787
2017 Wenning BM, Martinelli E, Mieszkin S, Finlay JA, Fischer DA, Callow JA, Callow ME, Leonardi A, Ober CK, Galli G. Model Amphiphilic Block Copolymers with Tailored Molecular Weight and Composition in PDMS-Based Films to Limit Soft Biofouling. Acs Applied Materials & Interfaces. PMID 28429593 DOI: 10.1021/Acsami.7B03168  0.815
2017 Ober CK. Directed self-assembly: A dress code for block copolymers. Nature Nanotechnology. PMID 28346459 DOI: 10.1038/Nnano.2017.49  0.31
2017 Nakatani R, Takano H, Chandra A, Yoshimura Y, Wang L, Suzuki Y, Tanaka Y, Maeda R, Kihara N, Minegishi S, Miyagi K, Kasahara Y, Sato H, Seino Y, Azuma T, ... ... Ober CK, et al. Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing. Acs Applied Materials & Interfaces. PMID 28304153 DOI: 10.1021/Acsami.6B16129  0.807
2017 Chen WL, Menzel M, Watanabe T, Prucker O, Rühe J, Ober CK. Reduced lateral confinement and its effect on stability in patterned strong polyelectrolyte brushes. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28266860 DOI: 10.1021/Acs.Langmuir.7B00165  0.555
2017 Kasahara K, Xu H, Kosma V, Odent J, Giannelis EP, Ober CK. Recent Progress in EUV Metal Oxide Photoresists Journal of Photopolymer Science and Technology. 30: 93-97. DOI: 10.2494/Photopolymer.30.93  0.306
2017 Kasahara K, Xu H, Kosma V, Odent J, Giannelis EP, Ober CK. Nanoparticle photoresist studies for EUV lithography Proceedings of Spie. 10143: 1014308. DOI: 10.1117/12.2258187  0.418
2017 Kosma V, Kasahara K, Xu H, Odent J, Ober CK. Elucidating the patterning mechanism of zirconium-based hybrid photoresists Journal of Micro/Nanolithography, Mems, and Moems. 16: 1. DOI: 10.1117/1.Jmm.16.4.041007  0.416
2017 Ditter D, Chen W, Best A, Zappe H, Koynov K, Ober CK, Zentel R. MEMS analogous micro-patterning of thermotropic nematic liquid crystalline elastomer films using a fluorinated photoresist and a hard mask process Journal of Materials Chemistry C. 5: 12635-12644. DOI: 10.1039/C7Tc03958A  0.504
2017 Xu H, Kosma V, Giannelis EP, Ober CK. In pursuit of Moore’s Law: polymer chemistry in action Polymer Journal. 50: 45-55. DOI: 10.1038/Pj.2017.64  0.44
2017 Chen W, Menzel M, Prucker O, Wang E, Ober CK, Rühe J. Morphology of Nanostructured Polymer Brushes Dependent on Production and Treatment Macromolecules. 50: 4715-4724. DOI: 10.1021/Acs.Macromol.7B00714  0.572
2017 Chen W, Cordero R, Tran H, Ober CK. 50th Anniversary Perspective: Polymer Brushes: Novel Surfaces for Future Materials Macromolecules. 50: 4089-4113. DOI: 10.1021/Acs.Macromol.7B00450  0.609
2017 Patterson AL, Wenning B, Rizis G, Calabrese DR, Finlay JA, Franco SC, Zuckermann RN, Clare AS, Kramer EJ, Ober CK, Segalman RA. Role of Backbone Chemistry and Monomer Sequence in Amphiphilic Oligopeptide- and Oligopeptoid-Functionalized PDMS- and PEO-Based Block Copolymers for Marine Antifouling and Fouling Release Coatings Macromolecules. 50: 2656-2667. DOI: 10.1021/Acs.Macromol.6B02505  0.822
2016 Giammaria TJ, Ferrarese Lupi F, Seguini G, Perego M, Vita F, Francescangeli O, Wenning B, Ober CK, Sparnacci K, Antonioli D, Gianotti V, Laus M. Micrometer Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High Temperature Thermal Treatments. Acs Applied Materials & Interfaces. PMID 27020526 DOI: 10.1021/Acsami.6B02300  0.808
2016 Martinelli E, Gunes D, Wenning BM, Ober CK, Finlay JA, Callow ME, Callow JA, Di Fino A, Clare AS, Galli G. Effects of surface-active block copolymers with oxyethylene and fluoroalkyl side chains on the antifouling performance of silicone-based films. Biofouling. 32: 81-93. PMID 26769148 DOI: 10.1080/08927014.2015.1131822  0.815
2016 Nakatani R, Takano H, Wang L, Chandra A, Tanaka Y, Maeda R, Kihara N, Minegishi S, Miyagi K, Kasahara Y, Sato H, Seino Y, Azuma T, Ober CK, Hayakawa T. Precise synthesis of fluorine-containing block copolymers via RAFT Journal of Photopolymer Science and Technology. 29: 705-708. DOI: 10.2494/Photopolymer.29.705  0.769
2016 Yu M, Xu H, Kosma V, Odent J, Kasahara K, Giannelis E, Ober C. Positive Tone Nanoparticle Photoresists: New Insight on the Patterning Mechanism Journal of Photopolymer Science and Technology. 29: 509-512. DOI: 10.2494/Photopolymer.29.509  0.347
2016 Jones RG, Kitayama T, Hellwich K, Hess M, Jenkins AD, Kahovec J, Kratochvíl P, Mita I, Mormann W, Ober CK, Penczek S, Stepto RFT, Thurlow K, Vohlídal J, Wilks ES. Source-based nomenclature for single-strand homopolymers and copolymers (IUPAC Recommendations 2016) Pure and Applied Chemistry. 88: 1073-1100. DOI: 10.1515/Pac-2015-0702  0.414
2016 Kasahara K, Kosma V, Odent J, Xu H, Yu M, Giannelis EP, Ober CK. Recent progress in nanoparticle photoresists development for EUV lithography Proceedings of Spie. 9776: 977604. DOI: 10.1117/12.2218704  0.37
2016 Maeda R, Higuchi T, Okuhara K, Kikuchi R, Takahara A, Ober CK, Jinnai H, Hayakawa T. Interface manipulated two-phase nanostructure in a triblock terpolymer with a short middle segment Polymer Journal. 48: 533-538. DOI: 10.1038/Pj.2016.25  0.776
2016 Jacobs AG, Liedel C, Peng H, Wang L, Smilgies DM, Ober CK, Thompson MO. Kinetics of Block Copolymer Phase Segregation during Sub-millisecond Transient Thermal Annealing Macromolecules. 49: 6462-6470. DOI: 10.1021/Acs.Macromol.6B00698  0.33
2016 Liedel C, Ober CK. Nanopatterning of Stable Radical Containing Block Copolymers for Highly Ordered Functional Nanomeshes Macromolecules. 49: 5884-5892. DOI: 10.1021/Acs.Macromol.6B00392  0.396
2016 Camera KL, Wenning B, Lal A, Ober CK. Transient materials from thermally-sensitive polycarbonates and polycarbonate nanocomposites Polymer. 101: 59-66. DOI: 10.1016/J.Polymer.2016.08.050  0.806
2015 Calabrese DR, Ditter D, Liedel C, Blumfield A, Zentel R, Ober CK. Design, Synthesis, and Use of Y-Shaped ATRP/NMP Surface Tethered Initiator. Acs Macro Letters. 4: 606-610. PMID 35596400 DOI: 10.1021/acsmacrolett.5b00175  0.748
2015 Chavis MA, Smilgies DM, Wiesner UB, Ober CK. Widely Tunable Morphologies in Block Copolymer Thin Films Through Solvent Vapor Annealing Using Mixtures of Selective Solvents. Advanced Functional Materials. 25: 3057-3065. PMID 26819574 DOI: 10.1002/Adfm.201404053  0.823
2015 Li L, Chakrabarty S, Jiang J, Zhang B, Ober C, Giannelis EP. Solubility studies of inorganic-organic hybrid nanoparticle photoresists with different surface functional groups. Nanoscale. PMID 26695121 DOI: 10.1039/C5Nr07334K  0.439
2015 Camera KL, Gómez-Zayas J, Yokoyama D, Ediger MD, Ober CK. Photopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist. Acs Applied Materials & Interfaces. 7: 23398-401. PMID 26406303 DOI: 10.1021/Acsami.5B05361  0.791
2015 Takano H, Wang L, Tanaka Y, Maeda R, Kihara N, Seino Y, Sato H, Kawamonzen Y, Miyagi K, Minegishi S, Azuma T, Ober CK, Hayakawa T. Vertical oriented lamellar formation of fluorine- and silicon-containing block copolymers without neutral layers Journal of Photopolymer Science and Technology. 28: 649-652. DOI: 10.2494/Photopolymer.28.649  0.754
2015 Jiang J, Jacobs A, Thompson MO, Ober CK. Laser spike annealing of DSA photoresists Journal of Photopolymer Science and Technology. 28: 631-634. DOI: 10.2494/Photopolymer.28.631  0.349
2015 Jiang J, Zhang B, Yu M, Li L, Neisser M, Chun JS, Giannelis EP, Ober CK. Oxide nanoparticle EUV (ONE) photoresists: Current understanding of the unusual patterning mechanism Journal of Photopolymer Science and Technology. 28: 515-518. DOI: 10.2494/Photopolymer.28.515  0.371
2015 Liedel C, Moehle A, Fuchs GD, Ober CK. Block copolymers with stable radical and fluorinated groups by ATRP Mrs Communications. DOI: 10.1557/Mrc.2015.50  0.412
2015 Jones RG, Ober CK, Hodge P, Kratochvíl P, Moad G, Vert M, Macan J. Terminology for aggregation and self-assembly in polymer science (IUPAC recommendations 2013) | Nazivlje za agregiranje i samoudruživanje u znanosti o polimerima (IUPAC-ove preporuke 2013.) Kemija U Industriji/Journal of Chemists and Chemical Engineers. 64: 611-632. DOI: 10.15255/Kui.2014.009Kui-36/2015  0.33
2015 Jones RG, Kitayama T, Wilks ES, Fox RB, Fradet A, Hellwich KH, Hess M, Hodge P, Horie K, Kahovec J, Kratochvíl P, Kubisa P, Maréchal E, Mormann W, Ober CK, et al. Nomenclature and graphic representations for chemically modified polymers (IUPAC Recommendations 2014) Pure and Applied Chemistry. 87: 307-319. DOI: 10.1515/Pac-2014-0610  0.415
2015 Ober C, Jiang J, Zhang B, Li L, Giannelis E, Chun JS, Neisser M, Sierra-Alvares R. New developments in ligand-stabilized metal oxide nanoparticle photoresists for EUV lithography Proceedings of Spie. 9422: 942207. DOI: 10.1117/12.2086488  0.433
2015 Zhang B, Li L, Jiang J, Neisser M, Chun JS, Ober CK, Giannelis EP. Studying the mechanism of hybrid nanoparticle EUV photoresists Proceedings of Spie. 9425. DOI: 10.1117/12.2085662  0.4
2015 Jiang J, Yu M, Zhang B, Neisser M, Chun JS, Giannelis EP, Ober CK. Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists Proceedings of Spie. 9422: 942222. DOI: 10.1117/12.2084896  0.382
2015 Jacobs AG, Jung B, Jiang J, Ober CK, Thompson MO. Control of polystyrene-block-poly(methyl methacrylate) directed self-Assembly by laser-induced millisecond thermal annealing Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.Jmm.14.3.031205  0.468
2015 Calabrese DR, Ditter D, Liedel C, Blumfield A, Zentel R, Ober CK. Design, Synthesis, and Use of Y-Shaped ATRP/NMP Surface Tethered Initiator Acs Macro Letters. 4: 606-610. DOI: 10.1021/Acsmacrolett.5B00175  0.764
2015 Calabrese D, Wenning B, Ober CK. Block copolymers as antifouling and fouling resistant coatings Anionic Polymerization: Principles, Practice, Strength, Consequences and Applications. 881-924. DOI: 10.1007/978-4-431-54186-8_20  0.785
2015 Pester CW, Poelma JE, Narupai B, Patel SN, Su GM, Mates TE, Luo Y, Ober CK, Hawker CJ, Kramer EJ. Ambiguous anti-fouling surfaces: Facile synthesis by light-mediated radical polymerization Journal of Polymer Science, Part a: Polymer Chemistry. DOI: 10.1002/Pola.27748  0.67
2015 Welch ME, Doublet T, Bernard C, Malliaras GG, Ober CK. A glucose sensor via stable immobilization of the GOx enzyme on an organic transistor using a polymer brush Journal of Polymer Science, Part a: Polymer Chemistry. 53: 372-377. DOI: 10.1002/Pola.27392  0.739
2015 Calabrese DR, Wenning B, Finlay JA, Callow ME, Callow JA, Fischer D, Ober CK. Amphiphilic oligopeptides grafted to PDMS-based diblock copolymers for use in antifouling and fouling release coatings Polymers For Advanced Technologies. 26: 829-836. DOI: 10.1002/Pat.3515  0.813
2015 Chavis MA, Smilgies DM, Wiesner UB, Ober CK. Widely tunable morphologies in block copolymer thin films through solvent vapor annealing using mixtures of selective solvents Advanced Functional Materials. 25: 3057-3065. DOI: 10.1002/adfm.201404053  0.805
2014 Rahaman MS, Thérien-Aubin H, Ben-Sasson M, Ober CK, Nielsen M, Elimelech M. Control of biofouling on reverse osmosis polyamide membranes modified with biocidal nanoparticles and antifouling polymer brushes. Journal of Materials Chemistry. B. 2: 1724-1732. PMID 32261402 DOI: 10.1039/C3Tb21681K  0.729
2014 Padmanabhan P, Chavis M, Ober CK, Escobedo FA. Phase behaviour of PMMA-b-PHEMA with solvents methanol and THF: modelling and comparison to the experiment. Soft Matter. 10: 6172-81. PMID 25011061 DOI: 10.1039/C4Sm00856A  0.802
2014 Jung B, Satish P, Bunck DN, Dichtel WR, Ober CK, Thompson MO. Laser-induced sub-millisecond heating reveals distinct tertiary ester cleavage reaction pathways in a photolithographic resist polymer. Acs Nano. 8: 5746-56. PMID 24824380 DOI: 10.1021/Nn500549W  0.363
2014 Zhou Z, Calabrese DR, Taylor W, Finlay JA, Callow ME, Callow JA, Fischer D, Kramer EJ, Ober CK. Amphiphilic triblock copolymers with PEGylated hydrocarbon structures as environmentally friendly marine antifouling and fouling-release coatings. Biofouling. 30: 589-604. PMID 24730510 DOI: 10.1080/08927014.2014.897335  0.792
2014 Welch ME, Ritzert NL, Chen H, Smith NL, Tague ME, Xu Y, Baird BA, Abruña HD, Ober CK. Generalized platform for antibody detection using the antibody catalyzed water oxidation pathway. Journal of the American Chemical Society. 136: 1879-83. PMID 24410628 DOI: 10.1021/Ja409598C  0.652
2014 Jiang J, Chakrabarty S, Yu M, Ober CK. Metal oxide nanoparticle photoresists for EUV patterning Journal of Photopolymer Science and Technology. 27: 663-666. DOI: 10.2494/Photopolymer.27.663  0.377
2014 Wieberger F, Kolb T, Neuber C, Ober CK, Schmidt HW. Nanopatterning with tailored molecules Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2047109  0.351
2014 Jacobs AG, Jung B, Ober CK, Thompson MO. Control of PS-b-PMMA directed self-assembly registration by laser induced millisecond thermal annealing Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046513  0.326
2014 Jiang J, Thompson MO, Ober CK. Line width roughness reduction by rational design of photoacid generator for sub-millisecond laser post-exposure bake Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2046277  0.397
2014 Jung B, Ober CK, Thompson MO. Controlled roughness reduction of patterned resist polymers using laser-induced sub-millisecond heating Journal of Materials Chemistry C. 2: 9115-9121. DOI: 10.1039/C4Tc01548G  0.426
2014 Ferrarese Lupi F, Giammaria TJ, Seguini G, Laus M, Enrico E, De Leo N, Boarino L, Ober CK, Perego M. Thermally induced orientational flipping of cylindrical phase diblock copolymers Journal of Materials Chemistry C. 2: 2175-2182. DOI: 10.1039/C3Tc32283A  0.39
2014 Okamura H, Forman DC, Ober CK. C60-containing polymers for electron beam lithography Polymer Bulletin. 71: 2395-2405. DOI: 10.1007/S00289-014-1197-Z  0.812
2013 Welch ME, Ober CK. Characterization of Polymer Brush Membranes via HF Etch Liftoff Technique. Acs Macro Letters. 2: 241-245. PMID 35581889 DOI: 10.1021/mz300656f  0.366
2013 Chen L, Thérien-Aubin H, Wong MCY, Hoek EMV, Ober CK. Improved antifouling properties of polymer membranes using a 'layer-by-layer' mediated method. Journal of Materials Chemistry. B. 1: 5651-5658. PMID 32261189 DOI: 10.1039/C3Tb20916D  0.718
2013 Welch ME, Xu Y, Chen H, Smith N, Tague ME, Abruña HD, Baird B, Ober CK. Polymer Brushes as Functional, Patterned Surfaces for Nanobiotechnology. Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]. 25: 53-56. PMID 25484522 DOI: 10.2494/Photopolymer.25.53  0.749
2013 Wan AM, Chandler EM, Madhavan M, Infanger DW, Ober CK, Gourdon D, Malliaras GG, Fischbach C. Fibronectin conformation regulates the proangiogenic capability of tumor-associated adipogenic stromal cells. Biochimica Et Biophysica Acta. 1830: 4314-20. PMID 23567798 DOI: 10.1016/J.Bbagen.2013.03.033  0.706
2013 Wieberger F, Kolb T, Neuber C, Ober CK, Schmidt HW. Combinatorial techniques to efficiently investigate and optimize organic thin film processing and properties. Molecules (Basel, Switzerland). 18: 4120-39. PMID 23567361 DOI: 10.3390/Molecules18044120  0.338
2013 Midthun KM, Taylor PG, Newby C, Chatzichristidi M, Petrou PS, Lee JK, Kakabakos SE, Baird BA, Ober CK. Orthogonal patterning of multiple biomolecules using an organic fluorinated resist and imprint lithography. Biomacromolecules. 14: 993-1002. PMID 23439033 DOI: 10.1021/Bm301783T  0.799
2013 Zhou Z, Yu P, Geller HM, Ober CK. Biomimetic polymer brushes containing tethered acetylcholine analogs for protein and hippocampal neuronal cell patterning. Biomacromolecules. 14: 529-37. PMID 23336729 DOI: 10.1021/Bm301785B  0.581
2013 Sun W, Gamez VM, Otero-Gonzalez L, Cho Y, Ober CK, Sierra-Alvarez R. Biodegradability, cytotoxicity, and physicochemical treatability of two novel perfluorooctane sulfonate-free photoacid generators. Archives of Environmental Contamination and Toxicology. 64: 187-97. PMID 23104522 DOI: 10.1007/S00244-012-9822-Z  0.307
2013 Jones RG, Ober CK, Hodge P, Kratochvíl P, Moad G, Vert M. Terminology for aggregation and self-assembly in polymer science (IUPAC recommendations 2013) Pure and Applied Chemistry. 85: 463-492. DOI: 10.1351/Pac-Rec-12-03-12  0.306
2013 Jiang J, Jung B, Thompson MO, Ober CK. Line edge roughness of high deprotection activation energy photoresist by using sub-millisecond post exposure bake Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2011667  0.408
2013 Ouyang CY, Chung YS, Li L, Neisser M, Cho K, Giannelis EP, Ober CK. Non-aqueous negative-tone development of inorganic metal oxide nanoparticle photoresists for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2011282  0.316
2013 Newby C, Lee JK, Ober CK. Inkjet printing of fluorinated materials and their application to patterning organic semiconductors Journal of Materials Chemistry C. 1: 5647-5653. DOI: 10.1039/C3Tc31118J  0.777
2013 Ohm C, Ober CK. From surface coatings to polymer nanofilms: Lifting off polymer brushes Rsc Advances. 3: 18482-18488. DOI: 10.1039/C3Ra42290A  0.454
2013 McCluskey GE, Watkins SE, Holmes AB, Ober CK, Lee JK, Wong WWH. Semi-perfluoroalkyl polyfluorene with varying fluorine content: Synthesis and photophysical properties Polymer Chemistry. 4: 5291-5296. DOI: 10.1039/C3Py00124E  0.651
2013 Welch ME, Ober CK. Characterization of polymer brush membranes via HF etch liftoff technique Acs Macro Letters. 2: 241-245. DOI: 10.1021/Mz300656F  0.753
2013 Ober CK. ConfChem conference on a virtual colloquium to sustain and celebrate IYC 2011 initiatives in global chemical education - The continuing celebration of IYC 2011: What the IUPAC polymer division is doing to keep things going Journal of Chemical Education. 90: 1559-1560. DOI: 10.1021/Ed3007988  0.349
2013 Hiorns R, Boucher R, Duhlev R, Hellwich K, Hodge P, Jenkins A, Jones R, Kahovec J, Moad G, Ober C, Smith D, Stepto R, Vairon J, Vohlídal J. A Brief Guide to Polymer Nomenclature Polymer Degradation and Stability. 98: 1-2. DOI: 10.1016/J.Reactfunctpolym.2012.11.008  0.405
2013 Hoshi Y, Xu Y, Ober CK. Photo-cleavable anti-fouling polymer brushes: A simple and versatile platform for multicomponent protein patterning Polymer (United Kingdom). 54: 1762-1767. DOI: 10.1016/J.Polymer.2013.02.027  0.393
2013 Newby C, Lee JK, Ober CK. The solvent problem: Redissolution of macromolecules in solution-processed organic electronics Macromolecular Research. 21: 248-256. DOI: 10.1007/S13233-013-1129-Z  0.765
2013 Hiorns RC, Boucher RJ, Duhlev R, Hellwich KH, Hodge P, Jenkins AD, Jones RG, Kahovec J, Moad G, Ober CK, Smith DW, Stepto RFT, Vairon JP, Vohlídal J. A brief guide to polymer nomenclature from IUPAC Colloid and Polymer Science. 291: 457-458. DOI: 10.1007/S00396-013-2890-4  0.405
2013 Welch ME, Ober CK. Responsive and patterned polymer brushes Journal of Polymer Science, Part B: Polymer Physics. 51: 1457-1472. DOI: 10.1002/Polb.23356  0.737
2013 Hiorns RC, Boucher RJ, Duhlev R, Hellwich K-, Hodge P, Jenkins AD, Jones RG, Kahovec J, Moad G, Ober CK, Smith DW, Stepto RFT, Vairon J-, Vohlídal J. A brief guide to polymer nomenclature: Version 1.1 (2012) Polymer International. 62. DOI: 10.1002/Pi.4442  0.403
2012 Wieberger F, Neuber C, Ober CK, Schmidt HW. Tailored star block copolymer architecture for high performance chemically amplified resists. Advanced Materials (Deerfield Beach, Fla.). 24: 5939-44. PMID 22961836 DOI: 10.1002/Adma.201201547  0.368
2012 Jung B, Sha J, Paredes F, Chandhok M, Younkin TR, Wiesner U, Ober CK, Thompson MO. Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heating. Acs Nano. 6: 5830-6. PMID 22725269 DOI: 10.1021/Nn300008A  0.562
2012 Prabhu VM, Kang S, Sha J, Bonnesen PV, Satija S, Wu WL, Ober CK. Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme ultraviolet lithography. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 7665-78. PMID 22577835 DOI: 10.1021/La301311M  0.529
2012 Cho Y, Sundaram HS, Finlay JA, Dimitriou MD, Callow ME, Callow JA, Kramer EJ, Ober CK. Reconstruction of surfaces from mixed hydrocarbon and PEG components in water: responsive surfaces aid fouling release. Biomacromolecules. 13: 1864-74. PMID 22530840 DOI: 10.1021/Bm300363G  0.369
2012 Wan AM, Schur RM, Ober CK, Fischbach C, Gourdon D, Malliaras GG. Electrical control of protein conformation. Advanced Materials (Deerfield Beach, Fla.). 24: 2501-5. PMID 22489011 DOI: 10.1002/Adma.201200436  0.726
2012 Cho Y, Cho D, Park JH, Frey MW, Ober CK, Joo YL. Preparation and characterization of amphiphilic triblock terpolymer-based nanofibers as antifouling biomaterials. Biomacromolecules. 13: 1606-14. PMID 22471871 DOI: 10.1021/Bm300327W  0.308
2012 Shayan G, Felix N, Cho Y, Chatzichristidi M, Shuler ML, Ober CK, Lee KH. Synthesis and characterization of high-throughput nanofabricated poly(4-hydroxy styrene) membranes for in vitro models of barrier tissue. Tissue Engineering. Part C, Methods. 18: 667-76. PMID 22435738 DOI: 10.1089/Ten.Tec.2011.0598  0.759
2012 Zhou Z, Yu P, Geller HM, Ober CK. The role of hydrogels with tethered acetylcholine functionality on the adhesion and viability of hippocampal neurons and glial cells. Biomaterials. 33: 2473-81. PMID 22196899 DOI: 10.1016/J.Biomaterials.2011.12.005  0.479
2012 Maeda R, Chavis M, You NH, Ober CK. Top-down meets bottom up: Block copolymers with photoreactive segments Journal of Photopolymer Science and Technology. 25: 17-20. DOI: 10.2494/Photopolymer.25.17  0.786
2012 Hiorns RC, Boucher RJ, Duhlev R, Hellwich K, Hodge P, Jenkins AD, Jones RG, Kahovec J, Moad G, Ober CK, Smith DW, Stepto RFT, Vairon J, Vohlídal J. A brief guide to polymer nomenclature (IUPAC Technical Report) Pure and Applied Chemistry. 84: 2167-2169. DOI: 10.1351/Pac-Rep-12-03-05  0.316
2012 Maeda R, Chavis M, You NH, Ober CK. Synthesis and characterization of self-assembling block copolymers containing fluorine groups Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916418  0.824
2012 Trikeriotis M, Krysak M, Chung YS, Ouyang C, Cardineau B, Brainard R, Ober CK, Giannelis EP, Cho K. A new inorganic EUV resist with high-etch resistance Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.916384  0.326
2012 Ouyang CY, Lee JK, Ober CK. Negative-tone development of photoresists in environmentally friendly silicone fluids Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916297  0.625
2012 Ohm C, Welch ME, Ober CK. Materials for biosurfaces Journal of Materials Chemistry. 22: 19343-19347. DOI: 10.1039/C2Jm90126A  0.645
2012 Ouyang CY, Lee JK, Krysak ME, Sha J, Ober CK. Environmentally friendly patterning of thin films in linear methyl siloxanes Journal of Materials Chemistry. 22: 5746-5750. DOI: 10.1039/C2Jm16603H  0.728
2012 Gwinner MC, Brenner TJK, Lee JK, Newby C, Ober CK, McNeill CR, Sirringhaus H. Organic field-effect transistors and solar cells using novel high electron-affinity conjugated copolymers based on alkylbenzotriazole and benzothiadiazole Journal of Materials Chemistry. 22: 4436-4439. DOI: 10.1039/C2Jm15715B  0.792
2012 Wieberger F, Forman DC, Neuber C, Gröschel AH, Böhm M, Müller AHE, Schmidt HW, Ober CK. Tailored star-shaped statistical teroligomers via ATRP for lithographic applications Journal of Materials Chemistry. 22: 73-79. DOI: 10.1039/C1Jm11922B  0.801
2012 Maeda R, Hayakawa T, Ober CK. Dual mode patterning of fluorine-containing block copolymers through combined top-down and bottom-up lithography Chemistry of Materials. 24: 1454-1461. DOI: 10.1021/Cm300093E  0.802
2012 Dimitriou MD, Sundaram HS, Cho Y, Paik MY, Kondo M, Schmidt K, Fischer DA, Ober CK, Kramer EJ. Amphiphilic block copolymer surface composition: Effects of spin coating versus spray coating Polymer. 53: 1321-1327. DOI: 10.1016/J.Polymer.2011.12.055  0.792
2012 Bosworth JK, Ober CK. Top-Down versus Bottom-Up Patterning of Polymers Polymer Science: a Comprehensive Reference, 10 Volume Set. 8: 9-35. DOI: 10.1016/B978-0-444-53349-4.00200-4  0.79
2012 Kolb T, Neuber C, Krysak M, Ober CK, Schmidt HW. Multicomponent physical vapor deposited films with homogeneous molecular material distribution featuring improved resist sensitivity Advanced Functional Materials. 22: 3865-3873. DOI: 10.1002/Adfm.201103130  0.342
2011 Sundaram HS, Cho Y, Dimitriou MD, Weinman CJ, Finlay JA, Cone G, Callow ME, Callow JA, Kramer EJ, Ober CK. Fluorine-free mixed amphiphilic polymers based on PDMS and PEG side chains for fouling release applications. Biofouling. 27: 589-602. PMID 21985292 DOI: 10.1080/08927014.2011.587662  0.819
2011 Dimitriou MD, Zhou Z, Yoo HS, Killops KL, Finlay JA, Cone G, Sundaram HS, Lynd NA, Barteau KP, Campos LM, Fischer DA, Callow ME, Callow JA, Ober CK, Hawker CJ, et al. A general approach to controlling the surface composition of poly(ethylene oxide)-based block copolymers for antifouling coatings. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 13762-72. PMID 21888355 DOI: 10.1021/La202509M  0.593
2011 Sundaram HS, Cho Y, Dimitriou MD, Finlay JA, Cone G, Williams S, Handlin D, Gatto J, Callow ME, Callow JA, Kramer EJ, Ober CK. Fluorinated amphiphilic polymers and their blends for fouling-release applications: the benefits of a triblock copolymer surface. Acs Applied Materials & Interfaces. 3: 3366-74. PMID 21830813 DOI: 10.1021/Am200529U  0.418
2011 Lee JK, Gwinner MC, Berger R, Newby C, Zentel R, Friend RH, Sirringhaus H, Ober CK. High-performance electron-transporting polymers derived from a heteroaryl bis(trifluoroborate). Journal of the American Chemical Society. 133: 9949-51. PMID 21648485 DOI: 10.1021/Ja201485P  0.801
2011 Chiang EN, Dong R, Ober CK, Baird BA. Cellular responses to patterned poly(acrylic acid) brushes. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 7016-23. PMID 21557546 DOI: 10.1021/La200093E  0.654
2011 Yang SY, Kim BN, Zakhidov AA, Taylor PG, Lee JK, Ober CK, Lindau M, Malliaras GG. Detection of transmitter release from single living cells using conducting polymer microelectrodes. Advanced Materials (Deerfield Beach, Fla.). 23: H184-8. PMID 21400618 DOI: 10.1002/Adma.201100035  0.722
2011 Fong HH, Lee JK, Lim YF, Zakhidov AA, Wong WW, Holmes AB, Ober CK, Malliaras GG. Orthogonal processing and patterning enabled by highly fluorinated light-emitting polymers. Advanced Materials (Deerfield Beach, Fla.). 23: 735-9. PMID 21287633 DOI: 10.1002/Adma.201002986  0.642
2011 Daga VK, Schwartz EL, Chandler CM, Lee JK, Lin Y, Ober CK, Watkins JJ. Photoinduced ordering of block copolymers. Nano Letters. 11: 1153-60. PMID 21280663 DOI: 10.1021/Nl104080V  0.638
2011 Ouyang CY, Lee JK, Ober CK. Studies of environmentally friendly solvent-based developers Journal of Photopolymer Science and Technology. 24: 239-240. DOI: 10.2494/Photopolymer.24.239  0.584
2011 Ober CK, Ouyang C, Lee JK, Krysak M. Solvent development processing of chemically amplified resists: Chemistry, physics, and polymer science considerations Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.882959  0.673
2011 Cho Y, Ouyang CY, Krysak M, Sun W, Gamez V, Sierra-Alvarez R, Ober CK. Environmentally friendly natural materials based photoacid generators for next generation photolithography Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879816  0.332
2011 Krysak M, Trikeriotis M, Schwartz E, Lafferty N, Xie P, Smith B, Zimmerman P, Montgomery W, Giannelis E, Ober CK. Development of an inorganic nanoparticle photoresist for EUV, E-beam and 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879385  0.331
2011 Ouyang CY, Lee JK, Krysak M, Ober CK. Patterning conventional photoresists in environmentally friendly silicone fluids Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879294  0.611
2011 Prabhu VM, Kang S, Kline RJ, Delongchamp DM, Fischer DA, Wu WL, Satija SK, Bonnesen PV, Sha J, Ober CK. Characterization of the non-uniform reaction in chemically amplified calix[4]resorcinarene molecular resist thin films Australian Journal of Chemistry. 64: 1065-1073. DOI: 10.1071/Ch11242  0.571
2011 Zakhidov AA, Fong HH, Defranco JA, Lee JK, Taylor PG, Ober CK, Malliaras GG, He M, Kane MG. Fabrication of polymer-based electronic circuits using photolithography Applied Physics Letters. 99. DOI: 10.1063/1.3650474  0.663
2011 Lee J-, Gwinner MC, Berger R, Newby C, Zentel R, Friend RH, Sirringhaus H, Ober CK. N-Type Polymer from Suzuki Polycondensation Synfacts. 2011: 955-955. DOI: 10.1055/S-0030-1261024  0.717
2011 Xu Y, Hoshi Y, Ober CK. Photo-switchable polyelectrolyte brush for dual protein patterning Journal of Materials Chemistry. 21: 13789-13792. DOI: 10.1039/C1Jm12062J  0.339
2011 Martinelli E, Galli G, Krishnan S, Paik MY, Ober CK, Fischer DA. New poly(dimethylsiloxane)/poly(perfluorooctylethyl acrylate) block copolymers: Structure and order across multiple length scales in thin films Journal of Materials Chemistry. 21: 15357-15368. DOI: 10.1039/C1Jm12044A  0.83
2011 Welch M, Rastogi A, Ober C. Polymer brushes for electrochemical biosensors Soft Matter. 7: 297-302. DOI: 10.1039/C0Sm00035C  0.791
2011 Zakhidov AA, Lee JK, Defranco JA, Fong HH, Taylor PG, Chatzichristidi M, Ober CK, Malliaras GG. Orthogonal processing: A new strategy for organic electronics Chemical Science. 2: 1178-1182. DOI: 10.1039/C0Sc00612B  0.763
2011 Cho Y, Sundaram HS, Weinman CJ, Paik MY, Dimitriou MD, Finlay JA, Callow ME, Callow JA, Kramer EJ, Ober CK. Triblock copolymers with grafted fluorine-free, amphiphilic, non-ionic side chains for antifouling and fouling-release applications Macromolecules. 44: 4783-4792. DOI: 10.1021/Ma200269S  0.821
2011 Thérien-Aubin H, Chen L, Ober CK. Fouling-resistant polymer brush coatings Polymer. 52: 5419-5425. DOI: 10.1016/J.Polymer.2011.09.017  0.407
2011 Koerner H, Ober CK, Xu H. Probing electric field response of LC thermosets via time-resolved X-ray and dielectric spectroscopy Polymer. 52: 2206-2213. DOI: 10.1016/J.Polymer.2011.03.039  0.331
2011 Politakos N, Weinman CJ, Paik MY, Sundaram HS, Ober CK, Avgeropoulos A. Synthesis, molecular, and morphological characterization of initial and modified diblock copolymers with organic acid chloride derivatives Journal of Polymer Science, Part a: Polymer Chemistry. 49: 4292-4305. DOI: 10.1002/Pola.24873  0.796
2011 Bratton D, Ayothi R, Felix N, Ober CK. Applications of Controlled Macromolecular Architectures to Lithography Macromolecular Engineering: Precise Synthesis, Materials Properties, Applications. 4: 2295-2330. DOI: 10.1002/9783527631421.ch55  0.557
2011 Chavis MA, Schwartz EL, Ober CK. Block Copolymer Nanostructured Thin Films for Advanced Patterning Complex Macromolecular Architectures: Synthesis, Characterization, and Self-Assembly. 763-790. DOI: 10.1002/9780470825150.ch25  0.803
2010 Paik MY, Bosworth JK, Smilges DM, Schwartz EL, Andre X, Ober CK. Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An In Situ GISAXS study. Macromolecules. 43: 4253-4260. PMID 21116459 DOI: 10.1021/Ma902646T  0.82
2010 Paik MY, Xu Y, Rastogi A, Tanaka M, Yi Y, Ober CK. Patterning of polymer brushes. A direct approach to complex, sub-surface structures. Nano Letters. 10: 3873-9. PMID 20815408 DOI: 10.1021/Nl102910F  0.835
2010 Dong R, Molloy RP, Lindau M, Ober CK. Direct synthesis of quaternized polymer brushes and their application for guiding neuronal growth. Biomacromolecules. 11: 2027-32. PMID 20690711 DOI: 10.1021/Bm1003702  0.665
2010 Kristalyn CB, Lu X, Weinman CJ, Ober CK, Kramer EJ, Chen Z. Surface structures of an amphiphilic tri-block copolymer in air and in water probed using sum frequency generation vibrational spectroscopy. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 11337-43. PMID 20465236 DOI: 10.1021/La100701B  0.816
2010 Park D, Weinman CJ, Finlay JA, Fletcher BR, Paik MY, Sundaram HS, Dimitriou MD, Sohn KE, Callow ME, Callow JA, Handlin DL, Willis CL, Fischer DA, Kramer EJ, Ober CK. Amphiphilic surface active triblock copolymers with mixed hydrophobic and hydrophilic side chains for tuned marine fouling-release properties. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 9772-81. PMID 20359178 DOI: 10.1021/La100032N  0.825
2010 Park D, Finlay JA, Ward RJ, Weinman CJ, Krishnan S, Paik M, Sohn KE, Callow ME, Callow JA, Handlin DL, Willis CL, Fischer DA, Angert ER, Kramer EJ, Ober CK. Antimicrobial behavior of semifluorinated-quaternized triblock copolymers against airborne and marine microorganisms. Acs Applied Materials & Interfaces. 2: 703-11. PMID 20356271 DOI: 10.1021/Am900748V  0.816
2010 Rastogi A, Paik MY, Tanaka M, Ober CK. Direct patterning of intrinsically electron beam sensitive polymer brushes. Acs Nano. 4: 771-80. PMID 20121228 DOI: 10.1021/Nn901344U  0.83
2010 Stuart MA, Huck WT, Genzer J, Müller M, Ober C, Stamm M, Sukhorukov GB, Szleifer I, Tsukruk VV, Urban M, Winnik F, Zauscher S, Luzinov I, Minko S. Emerging applications of stimuli-responsive polymer materials. Nature Materials. 9: 101-13. PMID 20094081 DOI: 10.1038/Nmat2614  0.362
2010 Hyun BR, Bartnik AC, Lee JK, Imoto H, Sun L, Choi JJ, Chujo Y, Hanrath T, Ober CK, Wise FW. Role of solvent dielectric properties on charge transfer from PbS nanocrystals to molecules. Nano Letters. 10: 318-23. PMID 19968265 DOI: 10.1021/Nl903623N  0.577
2010 Jung B, Sha J, Paredes F, Ober CK, Thompson MO, Chandhok M, Younkin TR. Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848418  0.541
2010 Taylor PG, Lee JK, Zakhidov AA, Hwang HS, DeFranco JA, Fong HH, Chatzichristidi M, Murotani E, Malliaras GG, Ober CK. Orthogonal lithography for organic electronics Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848410  0.765
2010 Schwartz EL, Bosworth JK, Paik MY, Ober CK. New self-assembly strategies for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848409  0.826
2010 Krysak M, Kolb T, Neuber C, Schmidt HW, Ober CK. All-dry processible and PAG-attached molecular glasses for improved lithographic performance Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848385  0.362
2010 Forman DC, Wieberger F, Groeschel A, Müller AHE, Schmidt HW, Ober CK. Comparison of star and linear ArF resists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848344  0.806
2010 Ouyang CY, Lee JK, Sha J, Ober CK. Environmentally friendly processing of photoresists in scCO2 and decamethyltetrasiloxane Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848336  0.739
2010 Trikeriotis M, Bae WJ, Schwartz E, Krysak M, Lafferty N, Xie P, Smith B, Zimmerman PA, Ober CK, Giannelis EP. Development of an inorganic photoresist for DUV, EUV, and electron beam imaging Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.846672  0.359
2010 Bae WJ, Trikeriotis M, Sha J, Schwartz EL, Rodriguez R, Zimmerman P, Giannelis EP, Ober CK. High refractive index and high transparency HfO2 nanocomposites for next generation lithography Journal of Materials Chemistry. 20: 5186-5189. DOI: 10.1039/C0Jm00679C  0.536
2010 Weinman CJ, Gunari N, Krishnan S, Dong R, Paik MY, Sohn KE, Walker GC, Kramer EJ, Fischer DA, Ober CK. Protein adsorption resistance of anti-biofouling block copolymers containing amphiphilic side chains Soft Matter. 6: 3237-3243. DOI: 10.1039/B925114F  0.798
2010 Krishnan S, Paik MY, Ober CK, Martinelli E, Galli G, Sohn KE, Kramer EJ, Fischer DA. NEXAFS depth profiling of surface segregation in block copolymer thin films Macromolecules. 43: 4733-4743. DOI: 10.1021/Ma902866X  0.825
2010 Kang S, Wu WL, Choi KW, De Silva A, Ober CK, Prabhu VM. Characterization of the photoacid diffusion length and reaction kinetics in EUV photoresists with IR spectroscopy Macromolecules. 43: 4275-4286. DOI: 10.1021/Ma902548A  0.313
2010 Lee JK, Fong HH, Zakhidov AA, McCluskey GE, Taylor PG, Santiago-Berrios M, Abruña HD, Holmes AB, Malharas GG, Ober CK. Semiperfluoroalkyl polyfluorenes for orthogonal processing in fluorous solvents Macromolecules. 43: 1195-1198. DOI: 10.1021/Ma902179S  0.57
2010 Sha J, Lee JK, Kang S, Prabhu VM, Soles CL, Bonnesen PV, Ober CK. Architectural effects on acid reaction-diffusion kinetics in molecular glass photoresists Chemistry of Materials. 22: 3093-3098. DOI: 10.1021/Cm9038939  0.685
2009 Murotani E, Lee JK, Chatzichristidi M, Zakhidov AA, Taylor PG, Schwartz EL, Malliaras GG, Ober CK. Cross-linkable molecular glasses: low dielectric constant materials patternable in hydrofluoroethers. Acs Applied Materials & Interfaces. 1: 2363-70. PMID 20355874 DOI: 10.1021/Am9004978  0.786
2009 Rastogi A, Paik MY, Ober CK. Development of a directly patterned low-surface-energy polymer brush in supercritical carbon dioxide. Acs Applied Materials & Interfaces. 1: 2013-20. PMID 20355827 DOI: 10.1021/Am9003733  0.83
2009 Jhaveri SJ, McMullen JD, Sijbesma R, Tan LS, Zipfel W, Ober CK. Direct three-dimensional microfabrication of hydrogels via two-photon lithography in aqueous solution. Chemistry of Materials : a Publication of the American Chemical Society. 21: 2003-2006. PMID 20160917 DOI: 10.1021/Cm803174E  0.772
2009 Weinman CJ, Finlay JA, Park D, Paik MY, Krishnan S, Sundaram HS, Dimitriou M, Sohn KE, Callow ME, Callow JA, Handlin DL, Willis CL, Kramer EJ, Ober CK. ABC triblock surface active block copolymer with grafted ethoxylated fluoroalkyl amphiphilic side chains for marine antifouling/fouling-release applications. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 12266-74. PMID 19821626 DOI: 10.1021/La901654Q  0.825
2009 Rastogi A, Nad S, Tanaka M, Mota ND, Tague M, Baird BA, Abruña HD, Ober CK. Preventing nonspecific adsorption on polymer brush covered gold electrodes using a modified ATRP initiator. Biomacromolecules. 10: 2750-8. PMID 19743841 DOI: 10.1021/Bm900564T  0.613
2009 Bosworth JK, Black CT, Ober CK. Selective area control of self-assembled pattern architecture using a lithographically patternable block copolymer. Acs Nano. 3: 1761-6. PMID 19534477 DOI: 10.1021/Nn900343U  0.8
2009 Wallace WE, Flynn KM, Guttman CM, VanderHart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Quantitative measurement of the polydispersity in the extent of functionalization of glass-forming calix[4]resorcinarenes. Rapid Communications in Mass Spectrometry : Rcm. 23: 1957-62. PMID 19504485 DOI: 10.1002/Rcm.4099  0.604
2009 Dong R, Lindau M, Ober CK. Dissociation behavior of weak polyelectrolyte brushes on a planar surface. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 4774-9. PMID 19243153 DOI: 10.1021/La8039384  0.666
2009 Jhaveri SJ, Hynd MR, Dowell-Mesfin N, Turner JN, Shain W, Ober CK. Release of nerve growth factor from HEMA hydrogel-coated substrates and its effect on the differentiation of neural cells. Biomacromolecules. 10: 174-83. PMID 19061335 DOI: 10.1021/Bm801101E  0.767
2009 Lee JK, Taylor PG, Zakhidov AA, Fong HH, Hwang HS, Chatzichristidi M, Malliaras GG, Ober CK. Orthogonal processing: A novel photolithographic patterning method for organic electronics Journal of Photopolymer Science and Technology. 22: 565-569. DOI: 10.2494/Photopolymer.22.565  0.775
2009 McCluskey GE, Lee JK, Sha J, Ober CK, Watkins SE, Holmes AB. Synthesis and processing of organic materials in supercritical carbon dioxide Mrs Bulletin. 34: 108-115. DOI: 10.1557/Mrs2009.29  0.696
2009 Krysak M, De Silva A, Sha J, Lee JK, Ober CK. Molecular glass resists for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814147  0.718
2009 Sha J, Lee JK, Ober CK. Molecular glass resists developable in supercritical carbon dioxide for 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813956  0.733
2009 Rastogi A, Toepperwein GN, Tanaka M, Riggleman RA, De Pablo JJ, Ober CK. Contact analysis studies of an ESCAP resist with ScCO2 compatible additives Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813814  0.625
2009 Wallace WE, Flynn KM, Guttman CM, VanderHart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Quantitative measurement of the molecular-mass distribution in Calix[4]resorcinarene molecular glass resists by mass spectrometry Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813680  0.597
2009 Sha J, Jung B, Thompson MO, Ober CK, Chandhok M, Younkin TR. Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3020-3024. DOI: 10.1116/1.3263173  0.572
2009 Lim YF, Lee JK, Zakhidov AA, Defranco JA, Fong HH, Taylor PG, Ober CK, Malliaras GG. High voltage polymer solar cell patterned with photolithography Journal of Materials Chemistry. 19: 5394-5397. DOI: 10.1039/B822949J  0.652
2009 Tanaka M, Rastogi A, Kudo H, Watanabe D, Nishikubo T, Ober CK. Environmentally friendly patterning of molecular waterwheel (Noria) in supercritical carbon dioxide Journal of Materials Chemistry. 19: 4622-4626. DOI: 10.1039/B821475A  0.603
2009 Lee JK, Chatzichristidi M, Zakhidov AA, Hwang HS, Schwartz EL, Sha J, Taylor PG, Fong HH, Defranco JA, Murotani E, Wong WWH, Malliaras GG, Ober CK. Acid-diffusion behaviour in organic thin films and its effect on patterning Journal of Materials Chemistry. 19: 2986-2992. DOI: 10.1039/B817286B  0.799
2009 Steidl L, Jhaveri SJ, Ayothi R, Sha J, McMullen JD, Ng SYC, Zipfel WR, Zentel R, Ober CK. Non-ionic photo-acid generators for applications in two-photon lithography Journal of Materials Chemistry. 19: 505-513. DOI: 10.1039/B816434G  0.795
2009 Vanderhart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator Journal of Materials Chemistry. 19: 2683-2694. DOI: 10.1039/B816290E  0.629
2009 Yi Y, Ayothi R, Wang Y, Li M, Barclay G, Sierra-Alvarez R, Ober CK. Sulfonium salts of alicyclic group functionalized semifluorinated alkyl ether sulfonates as photoacid generators Chemistry of Materials. 21: 4037-4046. DOI: 10.1021/Cm901366R  0.552
2009 Tanaka M, Rastogi A, Toepperwein GN, Riggleman RA, Felix NM, De Pablo JJ, Ober CK. Fluorinated quaternary ammonium salts as dissolution aids for polar polymers in environmentally benign supercritical carbon dioxide Chemistry of Materials. 21: 3125-3135. DOI: 10.1021/Cm900406C  0.766
2009 Martinelli E, Menghetti S, Galli G, Glisenti A, Krishnan S, Paik MY, Ober CK, Smilgies DM, Fischer DA. Surface engineering of styrene/PEGylated-fluoroalkyl styrene block copolymer thin films Journal of Polymer Science, Part a: Polymer Chemistry. 47: 267-284. DOI: 10.1002/Pola.23151  0.836
2009 Sha J, Ober CK. Fluorine-and siloxane-containing polymers for supercritical carbon dioxide lithography Polymer International. 58: 302-306. DOI: 10.1002/Pi.2533  0.594
2009 Taylor PG, Lee JK, Zakhidov AA, Chatzichristidi M, Fong HH, DeFranco JA, Malliaras GG, Ober CK. Orthogonal patterning of PEDOT:PSS for organic electronics using hydrofluoroether solvents Advanced Materials. 21: 2314-2317. DOI: 10.1002/Adma.200803291  0.781
2008 Bosworth JK, Paik MY, Ruiz R, Schwartz EL, Huang JQ, Ko AW, Smilgies DM, Black CT, Ober CK. Control of self-assembly of lithographically patternable block copolymer films. Acs Nano. 2: 1396-402. PMID 19206307 DOI: 10.1021/Nn8001505  0.803
2008 Lee JK, Chatzichristidi M, Zakhidov AA, Taylor PG, DeFranco JA, Hwang HS, Fong HH, Holmes AB, Malliaras GG, Ober CK. Acid-sensitive semiperfluoroalkyl resorcinarene: an imaging material for organic electronics. Journal of the American Chemical Society. 130: 11564-5. PMID 18686954 DOI: 10.1021/Ja803493M  0.754
2008 Jang JH, Jhaveri SJ, Rasin B, Koh C, Ober CK, Thomas EL. Three-dimensionally-patterned submicrometer-scale hydrogel/air networks that offer a new platform for biomedical applications. Nano Letters. 8: 1456-60. PMID 18393470 DOI: 10.1021/Nl080444+  0.789
2008 Pfeiffer F, Felix NM, Neuber C, Ober CK, Schmidt HW. Towards environmentally friendly, dry deposited, water developable molecular glass photoresists. Physical Chemistry Chemical Physics : Pccp. 10: 1257-62. PMID 18292859 DOI: 10.1039/B715819J  0.679
2008 Finlay JA, Krishnan S, Callow ME, Callow JA, Dong R, Asgill N, Wong K, Kramer EJ, Ober CK. Settlement of Ulva zoospores on patterned fluorinated and PEGylated monolayer surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 503-10. PMID 18081330 DOI: 10.1021/La702275G  0.736
2008 Tanaka M, Rastogi A, Felix NM, Ober CK. Supercritical carbon dioxide compatible salts: Synthesis and application to next generation lithography Journal of Photopolymer Science and Technology. 21: 393-396. DOI: 10.2494/Photopolymer.21.393  0.678
2008 Vanderhart DL, De Silva A, Felix N, Prabhu VM, Ober CK. The effect of EUV molecular glass architecture on the bulk dispersion of a photo-acid generator Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773048  0.653
2008 Woodward JT, Choi KW, Prabhu VM, Kang S, Lavery K, Wu WL, Leeson M, De Silva A, Felix NM, Ober CK. Characterization of the latent image to developed image in model EUV photoresists Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773036  0.619
2008 Kang S, Lavery K, Choi KW, Prabhu VM, Wu WL, Lin EK, De Silva A, Felix N, Ober C. A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773018  0.667
2008 Yi Y, Ayothi R, Ober CK, Yueh W, Cao H. Ionic photoacid generators containing functionalized semifluorinated sulfonates for high resolution lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772880  0.406
2008 Zimmerman PA, Byers J, Piscani E, Rice B, Ober CK, Giannelis EP, Rodriguez R, Wang D, Whittaker A, Blakey I, Chen L, Dargaville B, Liu H. Development of an operational high refractive index resist for 193nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772871  0.306
2008 De Silva A, Felix N, Forman D, Jing S, Ober CK. New architectures for high resolution patterning Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772667  0.794
2008 Felix NM, De Silva A, Sha J, Ober CK. Achieving small dimensions with an environmentally friendly solvent: Photoresist development using supercritical CO2 Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772635  0.746
2008 Hwang HS, Zakhidov A, Lee JK, DeFranco JA, Fong HH, Malliaras GG, Ober CK. Photolithographic patterning in supercritical carbon dioxide: Application to patterned light-emitting devices Proceedings of the Academic Track of the 2008 Flexible Electronics and Displays - Conference and Exhibition, Flex. DOI: 10.1109/FEDC.2008.4483878  0.534
2008 Kudo H, Watanabe D, Nishikubo T, Maruyama K, Shimizu D, Kai T, Shimokawa T, Ober CK. A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material Journal of Materials Chemistry. 18: 3588-3592. DOI: 10.1039/B805394D  0.347
2008 Hwang HS, Zakhidov AA, Lee JK, André X, Defranco JA, Fong HH, Holmes AB, Malliaras GG, Ober CK. Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent Journal of Materials Chemistry. 18: 3087-3090. DOI: 10.1039/B802713G  0.649
2008 Krishnan S, Weinman CJ, Ober CK. Advances in polymers for anti-biofouling surfaces Journal of Materials Chemistry. 18: 3405-3413. DOI: 10.1039/B801491D  0.829
2008 Ober CK, De Silva A. Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists Journal of Materials Chemistry. 18: 1903-1910. DOI: 10.1039/B719108A  0.335
2008 Sivaniah E, Genzer J, Hexemer A, Kramer EJ, Xiang ML, Li XF, Ober CK, Magonov S. Nonplanar surface organization of monodendrons in Side-Chain modified liquid crystalline block copolymers Macromolecules. 41: 9940-9945. DOI: 10.1021/Ma8015097  0.732
2008 Felix N, Ober CK. Acid-labile, chain-scission polymer systems used as positive-tone photoresists developable in supercritical CO2 Chemistry of Materials. 20: 2932-2936. DOI: 10.1021/Cm703580F  0.681
2008 De Silva A, Lee JK, André X, Felix NM, Cao HB, Deng H, Ober CK. Study of the structure - Properties relationship of phenolic molecular glass resists for next generation photolithography Chemistry of Materials. 20: 1606-1613. DOI: 10.1021/Cm702613N  0.743
2008 Nagarajan S, Bosworth JK, Ober CK, Russell TP, Watkins JJ. Simple fabrication of micropatterned mesoporous silica films using photoacid generators in block copolymers Chemistry of Materials. 20: 604-606. DOI: 10.1021/Cm702397B  0.794
2008 De Silva A, Felix NM, Ober CK. Molecular glass resists as high-resolution patterning materials Advanced Materials. 20: 3355-3361. DOI: 10.1002/Adma.200800763  0.636
2008 Zakhidov AA, Lee JK, Fong HH, DeFranco JA, Chatzichristidi M, Taylor PG, Ober CK, Malliaras GG. Hydrofluoroethers as orthogonal solvents for the chemical processing of organic electronic materials Advanced Materials. 20: 3481-3484. DOI: 10.1002/Adma.200800557  0.759
2008 Felix NM, De Silva A, Ober CK. Calix[4]resorcinarene derivatives as high-resolution resist materials for supercritical CO2 processing Advanced Materials. 20: 1303-1309. DOI: 10.1002/Adma.200702772  0.607
2008 Nagarajan S, Li M, Pai RA, Bosworth JK, Busch P, Smilgies DM, Ober CK, Russell TP, Watkins JJ. An efficient route to mesoporous silica films with perpendicular nanochannels Advanced Materials. 20: 246-251. DOI: 10.1002/Adma.200701766  0.803
2008 Nagarajan S, Bosworth JK, Ober CK, Russell TP, Watkins JJ. Directly patterned mesoporous dielectric films templated from chemically amplified block copolymers Advanced Metallization Conference (Amc). 495-499.  0.776
2007 Dong R, Krishnan S, Baird BA, Lindau M, Ober CK. Patterned biofunctional poly(acrylic acid) brushes on silicon surfaces. Biomacromolecules. 8: 3082-92. PMID 17880179 DOI: 10.1021/Bm700493V  0.762
2007 Niamsiri N, Bergkvist M, Delamarre SC, Cady NC, Coates GW, Ober CK, Batt CA. Insight in the role of bovine serum albumin for promoting the in situ surface growth of polyhydroxybutyrate (PHB) on patterned surfaces via enzymatic surface-initiated polymerization. Colloids and Surfaces. B, Biointerfaces. 60: 68-79. PMID 17629682 DOI: 10.1016/J.Colsurfb.2007.05.023  0.439
2007 Paik MY, Krishnan S, You F, Li X, Hexemer A, Ando Y, Kang SH, Fischer DA, Kramer EJ, Ober CK. Surface organization, light-driven surface changes, and stability of semifluorinated azobenzene polymers. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 5110-9. PMID 17397198 DOI: 10.1021/La0634138  0.817
2007 Bosworth JK, Andre X, Schwartz EL, Ruiz R, Black CT, Ober CK. Control of morphology orientation in lithographically patternable diblock copolymers Journal of Photopolymer Science and Technology. 20: 519-522. DOI: 10.2494/Photopolymer.20.519  0.776
2007 André X, Lee JK, De Silva A, Felix N, Ober CK, Cao HB, Deng H, Kudo H, Watanabe D, Nishikubo T. Phenolic molecular glasses as resists for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.722919  0.654
2007 Felix NM, De Silva A, Luk CMY, Ober CK. Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2 Journal of Materials Chemistry. 17: 4598-4604. DOI: 10.1039/B709649F  0.635
2007 Busch P, Krishnan S, Paik M, Toombes GES, Smilgies DM, Gruner SM, Ober CK. Surface induced tilt propagation in thin films of semifluorinated liquid crystalline side chain block copolymers Macromolecules. 40: 81-89. DOI: 10.1021/Ma061009+  0.818
2007 Bratton D, Ayothi R, Deng H, Cao HB, Ober CK. Diazonaphthoquinone Molecular Glass Photoresists: Patterning without Chemical Amplification Chemistry of Materials. 19: 3780-3786. DOI: 10.1021/Cm062967T  0.349
2007 Ayothi R, Yi Y, Cao HB, Yueh W, Putna aS, Ober CK. Arylonium photoacid generators containing environmentally compatible aryloxyperfluoroalkanesulfonate groups Chemistry of Materials. 19: 1434-1444. DOI: 10.1021/Cm062802K  0.304
2007 Jin J, Antoun S, Ober C, Lenz RW. Thermotropic Liquid Crystalline Polyesters with Rigid or Flexible Spacer Groups British Polymer Journal. 12: 132-146. DOI: 10.1002/Pi.4980120403  0.573
2007 Lange B, Jhaveri SJ, Steidl L, Ayothi R, Ober CK, Zentel R. Creating defined 3-D defects inside an opaline ormocer® matrix with two-photon lithography Macromolecular Rapid Communications. 28: 922-926. DOI: 10.1002/Marc.200600879  0.781
2007 Pfeiffer F, Felix NM, Neuber C, Ober CK, Schmidt HW. Physical vapor deposition of molecular glass photoresists: a new route to chemically amplified patterning Advanced Functional Materials. 17: 2336-2342. DOI: 10.1002/Adfm.200600717  0.643
2006 Krishnan S, Ward RJ, Hexemer A, Sohn KE, Lee KL, Angert ER, Fischer DA, Kramer EJ, Ober CK. Surfaces of fluorinated pyridinium block copolymers with enhanced antibacterial activity. Langmuir : the Acs Journal of Surfaces and Colloids. 22: 11255-66. PMID 17154613 DOI: 10.1021/La061384V  0.641
2006 Krishnan S, Ayothi R, Hexemer A, Finlay JA, Sohn KE, Perry R, Ober CK, Kramer EJ, Callow ME, Callow JA, Fischer DA. Anti-biofouling properties of comblike block copolymers with amphiphilic side chains. Langmuir : the Acs Journal of Surfaces and Colloids. 22: 5075-86. PMID 16700597 DOI: 10.1021/La052978L  0.625
2006 Krishnan S, Wang N, Ober CK, Finlay JA, Callow ME, Callow JA, Hexemer A, Sohn KE, Kramer EJ, Fischer DA. Comparison of the fouling release properties of hydrophobic fluorinated and hydrophilic PEGylated block copolymer surfaces: attachment strength of the diatom Navicula and the green alga Ulva. Biomacromolecules. 7: 1449-62. PMID 16677026 DOI: 10.1021/Bm0509826  0.598
2006 Senaratne W, Sengupta P, Jakubek V, Holowka D, Ober CK, Baird B. Functionalized surface arrays for spatial targeting of immune cell signaling. Journal of the American Chemical Society. 128: 5594-5. PMID 16637600 DOI: 10.1021/Ja058701P  0.754
2006 Kim YR, Paik HJ, Ober CK, Coates GW, Mark SS, Ryan TE, Batt CA. Real-time analysis of enzymatic surface-initiated polymerization using surface plasmon resonance (SPR). Macromolecular Bioscience. 6: 145-52. PMID 16432845 DOI: 10.1002/Mabi.200500213  0.434
2006 Senaratne W, Takada K, Das R, Cohen J, Baird B, Abruña HD, Ober CK. Dinitrophenyl ligand substrates and their application to immunosensors. Biosensors & Bioelectronics. 22: 63-70. PMID 16414258 DOI: 10.1016/J.Bios.2005.12.003  0.74
2006 Ayothi R, Seung WC, Felix N, Cao HB, Deng H, Yueh W, Ober CK. New PFOS free photoresist systems for EUV lithography Journal of Photopolymer Science and Technology. 19: 515-520. DOI: 10.2494/Photopolymer.19.515  0.655
2006 Jhaveri SJ, Senaratne W, Hynd MR, Turner JN, Sengupta P, Shain W, Ober CK. Defining the biology-materials interface using both 2D and 3D lithography Journal of Photopolymer Science and Technology. 19: 435-440. DOI: 10.2494/Photopolymer.19.435  0.787
2006 Tanaka S, Ober CK. Adamantane based molecular glass resist for 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 6153. DOI: 10.1117/12.658083  0.316
2006 Kwark YJ, Bravo-Vasquez JP, Chandhok M, Cao H, Deng H, Gullikson E, Ober CK. Absorbance measurement of polymers at extreme ultraviolet wavelength: Correlation between experimental and theoretical calculations Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1822-1826. DOI: 10.1116/1.2214708  0.356
2006 Yang D, Chang SW, Ober CK. Molecular glass photoresists for advanced lithography Journal of Materials Chemistry. 16: 1693-1696. DOI: 10.1039/B514146J  0.334
2006 Chang SW, Ayothi R, Bratton D, Yang D, Felix N, Cao HB, Deng H, Ober CK. Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography Journal of Materials Chemistry. 16: 1470-1474. DOI: 10.1039/B514065J  0.641
2006 Dai J, Chang SW, Hamad A, Yang D, Felix N, Ober CK. Molecular glass resists for high-resolution patterning Chemistry of Materials. 18: 3404-3411. DOI: 10.1021/Cm052452M  0.799
2006 Li M, Ober CK. Block copolymer patterns and templates Materials Today. 9: 30-39. DOI: 10.1016/S1369-7021(06)71620-0  0.504
2006 Bratton D, Yang D, Dai J, Ober CK. Recent progress in high resolution lithography Polymers For Advanced Technologies. 17: 94-103. DOI: 10.1002/Pat.662  0.654
2006 Mao Y, Felix NM, Nguyen PT, Ober CK, Gleason KK. Positive- And negative-tone CVD polyacrylic electron-beam resists developable by supercritical CO2 Chemical Vapor Deposition. 12: 259-262. DOI: 10.1002/Cvde.200506416  0.668
2006 Felix NM, Tsuchiya K, Ober CK. High-resolution patterning of molecular glasses using supercritical carbon dioxide Advanced Materials. 18: 442-446. DOI: 10.1002/Adma.200501802  0.608
2006 You F, Paik MY, Häckel M, Kador L, Kropp D, Schmidt HW, Ober CK. Control and suppression of surface relief gratings in liquid-crystalline perfluoroalkyl-azobenzene polymers Advanced Functional Materials. 16: 1577-1581. DOI: 10.1002/Adfm.200500711  0.81
2005 Senaratne W, Andruzzi L, Ober CK. Self-assembled monolayers and polymer brushes in biotechnology: current applications and future perspectives. Biomacromolecules. 6: 2427-48. PMID 16153077 DOI: 10.1021/Bm050180A  0.775
2005 Paik HJ, Kim YR, Orth RN, Ober CK, Coates GW, Batt CA. End-functionalization of poly(3-hydroxybutyrate)via genetic engineering for solid surface modification. Chemical Communications (Cambridge, England). 1956-8. PMID 15834470 DOI: 10.1039/B415809A  0.304
2005 Andruzzi L, Senaratne W, Hexemer A, Sheets ED, Ilic B, Kramer EJ, Baird B, Ober CK. Oligo(ethylene glycol) containing polymer brushes as bioselective surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 21: 2495-504. PMID 15752045 DOI: 10.1021/La047574S  0.807
2005 Kwark YJ, Pablo Bravo-Vasquez J, Cao HB, Deng H, Ober CK. Silicon containing organic-inorganic hybrid materials as EUV photoresists Journal of Photopolymer Science and Technology. 18: 481-487. DOI: 10.2494/Photopolymer.18.481  0.408
2005 Tsuchiya K, Chang SW, Felix NM, Ueda M, Ober CK. Lithography based on molecular glasses Journal of Photopolymer Science and Technology. 18: 431-434. DOI: 10.2494/Photopolymer.18.431  0.642
2005 Yang D, Jhaveri SJ, Ober CK. Three-Dimensional Microfabrication by Two-Photon Lithography Mrs Bulletin. 30: 976-982. DOI: 10.1557/Mrs2005.251  0.785
2005 Senaratne W, Sengupta P, Harnett C, Craighead H, Baird B, Ober CK. Molecular templates for bio-specific recognition by low-energy electron beam lithography Nanobiotechnology. 1: 23-33. DOI: 10.1385/Nbt:1:1:023  0.743
2005 Galli G, Martinelli E, Chiellini E, Ober CK, Glisenti A. Low Surface Energy Characteristics of Mesophase-Forming ABC and ACB Triblock Copolymers with Fluorinated B Blocks Molecular Crystals and Liquid Crystals. 441: 211-226. DOI: 10.1080/154214091009770  0.631
2005 Kim KM, Ayothi R, Ober CK. Synthesis, characterization and lithography performance of photoacid generator with short perfluoroalkyl anion Polymer Bulletin. 55: 333-340. DOI: 10.1007/S00289-005-0444-8  0.322
2005 Yu T, Wang Q, Johnson DS, Wang MD, Ober CK. Functional Hydrogel Surfaces: Binding Kinesin-Based Molecular Motor Proteins to Selected Patterned Sites Advanced Functional Materials. 15: 1303-1309. DOI: 10.1002/Adfm.200400117  0.636
2004 Andruzzi L, Hexemer A, Li X, Ober CK, Kramer EJ, Galli G, Chiellini E, Fischer DA. Control of surface properties using fluorinated polymer brushes produced by surface-initiated controlled radical polymerization. Langmuir : the Acs Journal of Surfaces and Colloids. 20: 10498-506. PMID 15544378 DOI: 10.1021/La049264F  0.784
2004 Krishnan S, Kwark YJ, Ober CK. Fluorinated polymers: liquid crystalline properties and applications in lithography. Chemical Record (New York, N.Y.). 4: 315-30. PMID 15543605 DOI: 10.1002/Tcr.20022  0.664
2004 Kim YR, Paik HJ, Ober CK, Coates GW, Batt CA. Enzymatic surface-initiated polymerization: a novel approach for the in situ solid-phase synthesis of biocompatible polymer poly(3-hydroxybutyrate). Biomacromolecules. 5: 889-94. PMID 15132678 DOI: 10.1021/Bm0344147  0.432
2004 Chao C, Li X, Ober CK. Directing self-assembly in macromolecular systems: Hydrogen bonding in ordered polymers Pure and Applied Chemistry. 76: 1337-1343. DOI: 10.1351/Pac200476071337  0.761
2004 Kuebler SM, Perry JW, Marder SR, Ober CK, Braun KL, Yu T, Zhou W. High-sensitivity material systems for two-photon three-dimensional microfabrication Proceedings of Spie - the International Society For Optical Engineering. 5347: 111-117. DOI: 10.1117/12.532614  0.595
2004 Mao Y, Felix NM, Nguyen PT, Ober CK, Gleason KK. Towards all-dry lithography: Electron-beam patternable poly(glycidyl methacrylate) thin films from hot filament chemical vapor deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 2473-2478. DOI: 10.1116/1.1800351  0.645
2004 Markley TJ, Marsella JA, Robertson EA, Parris GE, Zarkov Z, Jakubek V, Ober CK. Wetting and dissolution studies of fluoropolymers used in 157 nm photolithography applications Journal of Vacuum Science & Technology B. 22: 140-145. DOI: 10.1116/1.1637914  0.424
2004 Zhang ZS, Wilson OM, Efremov MY, Olson EA, Braun PV, Senaratne W, Ober CK, Zhang M, Allen LH. Heat capacity measurements of two-dimensional self-assembled hexadecanethiol monolayers on polycrystalline gold Applied Physics Letters. 84: 5198-5200. DOI: 10.1063/1.1764938  0.745
2004 Ilic B, Craighead HG, Krylov S, Senaratne W, Ober C, Neuzil P. Attogram detection using nanoelectromechanical oscillators Journal of Applied Physics. 95: 3694-3703. DOI: 10.1063/1.1650542  0.729
2004 Osuji C, Ferreira PJ, Mao G, Ober CK, Vander Sande JB, Thomas EL. Alignment of Self-Assembled Hierarchical Microstructure in Liquid Crystalline Diblock Copolymers Using High Magnetic Fields Macromolecules. 37: 9903-9908. DOI: 10.1021/Ma0483064  0.757
2004 Kempe MD, Kornfield JA, Ober CK, Smith SD. Synthesis and phase behavior of side-group liquid crystalline polymers in nematic solvents Macromolecules. 37: 3569-3575. DOI: 10.1021/Ma0348268  0.441
2004 Li M, Douki K, Goto K, Li X, Coenjarts C, Smilgies DM, Ober CK. Spatially controlled fabrication of nanoporous block copolymers Chemistry of Materials. 16: 3800-3808. DOI: 10.1021/Cm0493445  0.752
2004 Lange B, Zentel R, Ober C, Marder S. Photoprocessable polymer opals Chemistry of Materials. 16: 5286-5292. DOI: 10.1021/Cm048834U  0.447
2004 Coenjarts CA, Ober CK. Two-photon three-dimensional microfabrication of poly(dimethylsiloxane) elastomers Chemistry of Materials. 16: 5556-5558. DOI: 10.1021/Cm048717Z  0.327
2004 Pham VQ, Rao N, Ober CK. Swelling and dissolution rate measurements of polymer thin films in supercritical carbon dioxide Journal of Supercritical Fluids. 31: 323-328. DOI: 10.1016/J.Supflu.2003.12.004  0.717
2004 Chen JS, Ober CK, Poliks MD, Zhang Y, Wiesner U, Cohen C. Controlled degradation of epoxy networks: Analysis of crosslink density and glass transition temperature changes in thermally reworkable thermosets Polymer. 45: 1939-1950. DOI: 10.1016/J.Polymer.2004.01.011  0.392
2004 Bae YC, Ober CK. Patternable block copolymers with high transparency at 157 nm: Fluorocarbinol functionalized poly(isoprene-b-cyclohexane) Polymer Bulletin. 52: 321-328. DOI: 10.1007/S00289-004-0292-Y  0.394
2004 Galli G, Andruzzi L, Chiellini E, Li X, Ober CK, Hexemer A, Kramer EJ. Structural organisations in polystyrene-based semifluorinated block copolymers for low surface energy coatings Surface Coatings International Part B-Coatings Transactions. 87: 77-82. DOI: 10.1007/Bf02699600  0.793
2004 Hexemer A, Sivaniah E, Kramer EJ, Xiang M, Li X, Fischer DA, Ober CK. Managing Polymer Surface Structure Using Surface Active Block Copolymers in Block Copolymer Mixtures Journal of Polymer Science, Part B: Polymer Physics. 42: 411-420. DOI: 10.1002/Polb.10686  0.719
2004 Galli G, Ragnoli M, Bertolucci M, Ober CK, Kramer EJ, Chiellini E. Fluorinated 2-vinylcyclopropane copolymers as low surface energy materials Macromolecular Symposia. 218: 303-312. DOI: 10.1002/Masy.200451431  0.602
2004 Du P, Li M, Douki K, Li X, Garcia CBW, Jain A, Smilgies DM, Fetters LJ, Gruner SM, Wiesner U, Ober CK. Additive-driven phase-selective chemistry in block copolymer thin films: The convergence of top-down and bottom-up approaches Advanced Materials. 16: 953-957. DOI: 10.1002/Adma.200306189  0.731
2004 Chao C, Li X, Ober C, Osuji C, Thomas E. Orientational Switching of Mesogens and Microdomains in Hydrogen-Bonded Side-Chain Liquid-Crystalline Block Copolymers Using AC Electric Fields Advanced Functional Materials. 14: 364-370. DOI: 10.1002/Adfm.200305159  0.661
2003 Youngblood JP, Andruzzi L, Ober CK, Hexemer A, Kramer EJ, Callow JA, Finlay JA, Callow ME. Coatings based on side-chain ether-linked poly(ethylene glycol) and fluorocarbon polymers for the control of marine biofouling. Biofouling. 19: 91-8. PMID 14618709 DOI: 10.1080/0892701021000053381  0.67
2003 Yu T, Ober CK. Methods for the topographical patterning and patterned surface modification of hydrogels based on hydroxyethyl methacrylate. Biomacromolecules. 4: 1126-31. PMID 12959574 DOI: 10.1021/Bm034079M  0.629
2003 Jakúbek V, Liu X, Vohra VR, Douki K, Kwark Y, Ober CK, Markley TJ, Robertson III EA, Carr RV, Marsella JA, Conley W, Miller D, Zimmerman P. Strategies for High Transparency Acrylate Resists for 157 nm Lithography Journal of Photopolymer Science and Technology. 16: 573-580. DOI: 10.2494/Photopolymer.16.573  0.388
2003 Ober CK, Li M, Douki K, Goto K, Li X. Lithographic Patterning with Block Copolymers Journal of Photopolymer Science and Technology. 16: 347-350. DOI: 10.2494/Photopolymer.16.347  0.726
2003 Hamad AH, Houlihan FM, Seger L, Chang C, Ober CK. Evaluation of fluorinated dissolution inhibitors for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 5039: 558-568. DOI: 10.1117/12.485099  0.582
2003 Gopalan P, Zhang Y, Li X, Wiesner U, Ober CK. Liquid crystalline rod-coil block copolymers by stable free radical polymerization: Synthesis, morphology, and rheology Macromolecules. 36: 3357-3364. DOI: 10.1021/Ma021573U  0.809
2003 Koerner H, Luo Y, Li X, Cohen C, Hedden RC, Ober CK. Structural studies of extension-induced mesophase formation in poly(diethylsiloxane) elastomers: In situ synchrotron WAXS and SAXS Macromolecules. 36: 1975-1981. DOI: 10.1021/Ma020856J  0.676
2003 Pham VQ, Ferris RJ, Hamad A, Ober CK. Positive-Tone Photoresist Process for Supercritical Carbon Dioxide Development Chemistry of Materials. 15: 4893-4895. DOI: 10.1021/Cm034343I  0.785
2003 Kuebler SM, Braun KL, Zhou W, Cammack JK, Yu T, Ober CK, Marder SR, Perry JW. Design and application of high sensitivity two-photon initiators for three-dimensional microfabrication Journal of Photochemistry and Photobiology a: Chemistry. 158: 163-170. DOI: 10.1016/S1010-6030(03)00030-3  0.594
2003 Vohra VR, Schmidt DF, Ober CK, Giannelis EP. Deintercalation of a chemically switchable polymer from a layered silicate nanocomposite Journal of Polymer Science, Part B: Polymer Physics. 41: 3151-3159. DOI: 10.1002/Polb.10719  0.45
2003 Gopalan P, Li X, Li M, Ober CK, Gonzales CP, Hawker CJ. Rod-coil block copolymers: An iterative synthetic approach via living free-radical procedures Journal of Polymer Science Part a: Polymer Chemistry. 41: 3640-3656. DOI: 10.1002/Pola.10930  0.804
2003 Chiellini F, Bizzarri R, Ober CK, Schmaljiohann D, Yu T, Saltzman WM, Solaro R, Chiellini E. Surface patterning and biological evaluation of semi-interpenetrated poly(HEMA)/poly(alkyl β-malolactonate)s Macromolecular Symposia. 197: 369-379. DOI: 10.1002/Masy.200350732  0.635
2003 Bizzarri R, Chiellini F, Ober CK, Saltzman WM, Solaro R, Chiellini E. Malolactonate polymers and copolymers for biomedical applications Macromolecular Symposia. 197: 303-314. DOI: 10.1002/Masy.200350727  0.447
2003 Yu T, Ober CK, Kuebler SM, Zhou W, Marder SR, Perry JW. Chemically amplified positive resists for two-photon three-dimensional microfabrication Advanced Materials. 15: 517-521. DOI: 10.1002/Adma.200390120  0.614
2002 Zhou W, Kuebler SM, Braun KL, Yu T, Cammack JK, Ober CK, Perry JW, Marder SR. An efficient two-photon-generated photoacid applied to positive-tone 3D microfabrication. Science (New York, N.Y.). 296: 1106-9. PMID 12004126 DOI: 10.1126/Science.296.5570.1106  0.586
2002 Ober CK, Douki K, Vohra VR, Kwark Y, Liu X, Conley W, Miller D, Zimmerman P. New Strategies for High Resolution Photoresists Journal of Photopolymer Science and Technology. 15: 603-611. DOI: 10.2494/Photopolymer.15.603  0.437
2002 Hamad AH, Bae YC, Liu XQ, Ober CK, Houlihan FM. Fluorinated dissolution inhibitors for 157 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 4690: 477-485. DOI: 10.1117/12.474245  0.584
2002 Vohra VR, Douki K, Kwark YJ, Liu XQ, Ober CK, Bae YC, Conley W, Miller D, Zimmerman P. Highly transparent resist platforms for 157 nm microlithography: An update Proceedings of Spie - the International Society For Optical Engineering. 4690: 84-93. DOI: 10.1117/12.474169  0.325
2002 Andruzzi L, Chiellini E, Galli G, Li X, Kang SH, Ober CK. Engineering low surface energy polymers through molecular design: synthetic routes to fluorinated polystyrene-based block copolymers Journal of Materials Chemistry. 12: 1684-1692. DOI: 10.1039/B200891B  0.79
2002 Li X, Andruzzi L, Chiellini E, Galli G, Ober CK, Hexemer A, Kramer EJ, Fischer DA. Semifluorinated aromatic side-group polystyrene-based block copolymers: Bulk structure and surface orientation studies Macromolecules. 35: 8078-8087. DOI: 10.1021/Ma020463K  0.765
2002 Bae YC, Douki K, Yu T, Dai J, Schmaljohann D, Koerner H, Ober CK, Conley W. Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones Chemistry of Materials. 14: 1306-1313. DOI: 10.1021/Cm010789S  0.762
2002 Chen JS, Poliks MD, Ober CK, Zhang Y, Wiesner U, Giannelis E. Study of the interlayer expansion mechanism and thermal-mechanical properties of surface-initiated epoxy nanocomposites Polymer. 43: 4895-4904. DOI: 10.1016/S0032-3861(02)00318-X  0.429
2002 Chen J, Ober CK, Poliks MD. Characterization of thermally reworkable thermosets: materials for environmentally friendly processing and reuse Polymer. 43: 131-139. DOI: 10.1016/S0032-3861(01)00605-X  0.453
2002 Osuji C, Chao C-, Bita I, Ober CK, Thomas EL. Temperature-Dependent Photonic Bandgap in a Self-Assembled Hydrogen-Bonded Liquid-Crystalline Diblock Copolymer Advanced Functional Materials. 12: 753-758. DOI: 10.1002/Adfm.200290003  0.381
2002 Bizzarri R, Chiellini F, Ober CK, Saltzman WM, Solaro R. Influence of structural parameters on the ring-opening polymerization of new alkyl malolactonate monomers and on the biocompatibility of polymers therefrom Macromolecular Chemistry and Physics. 203: 1684-1693. DOI: 10.1002/1521-3935(200207)203:10/11<1684::Aid-Macp1684>3.0.Co;2-L  0.439
2002 Gopalan P, Andruzzi L, Li X, Ober CK. Fluorinated mesogen-jacketed liquid-crystalline polymers as surface-modifying agents: Design, synthesis and characterization Macromolecular Chemistry and Physics. 203: 1573-1583. DOI: 10.1002/1521-3935(200207)203:10/11<1573::Aid-Macp1573>3.0.Co;2-Z  0.817
2001 Bae YC, Douki K, Yu T, Dai J, Schmaljohann D, Kang SH, Kim KH, Koerner H, Conley W, Miller D, Balasubramanian R, Holl S, Ober CK. Rejuvenation of 248nm Resist Backbones for 157nm Lithography. Journal of Photopolymer Science and Technology. 14: 613-620. DOI: 10.2494/Photopolymer.14.613  0.755
2001 Koga T, Zhou S, Chu B, Fulton JL, Yang S, Ober CK, Erman B. High-pressure cell for simultaneous small-angle x-ray scattering and laser light scattering measurements Review of Scientific Instruments. 72: 2679-2685. DOI: 10.1063/1.1372696  0.506
2001 Gopalan P, Ober CK. Highly reactive 2,5-disubstituted styrene-based monomer polymerized via stable free radical polymerization: Effect of substitution and liquid crystallinity on polymerization Macromolecules. 34: 5120-5124. DOI: 10.1021/Ma002212M  0.689
2001 Sivaniah E, Genzer J, Fredrickson GH, Kramer EJ, Xiang M, Li X, Ober C, Magonov S. Periodic surface topology of three-arm semifluorinated alkane monodendron diblock copolymers Langmuir. 17: 4342-4346. DOI: 10.1021/La010510M  0.722
2001 Takada K, Gopalan P, Ober CK, Abruña HD. Synthesis, characterization, and redox reactivity of novel quinone-containing polymer Chemistry of Materials. 13: 2928-2932. DOI: 10.1021/Cm010159Q  0.667
2001 Chiellini F, Bizzarri R, Ober CK, Schmaljohann D, Yu T, Solaro R, Chiellini E. Patterning of Polymeric Hydrogels for Biomedical Applications Macromolecular Rapid Communications. 22: 1284. DOI: 10.1002/1521-3927(20011001)22:15<1284::Aid-Marc1284>3.0.Co;2-M  0.631
2000 Ober CK. Shape persistence of synthetic polymers. Science (New York, N.Y.). 288: 448-9. PMID 10798980 DOI: 10.1126/Science.288.5465.448  0.421
2000 Schmaljohann D, Young CB, Dai J, Weibel GL, Hamad AH, Ober CK. Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography. Journal of Photopolymer Science and Technology. 13: 451-458. DOI: 10.2494/Photopolymer.13.451  0.784
2000 Bunning TJ, Adams W, Ober CK, Korner H. Synchrotron radiation for probing the electric field alignment of LC macromolecules and polymers International Journal of Polymeric Materials. 45: 451-501. DOI: 10.1080/00914030008035051  0.353
2000 Ortiz C, Belenky L, Ober CK, Kramer EJ. Journal of Materials Science. 35: 2079-2086. DOI: 10.1023/A:1004707628052  0.571
2000 Hayakawa T, Wang J, Xiang M, Li X, Ueda M, Ober CK, Genzer J, Sivaniah E, Kramer EJ, Fischer DA. Effect of Changing Molecular End Groups on Surface Properties:  Synthesis and Characterization of Poly(styrene-b-semifluorinated isoprene) Block Copolymers with −CF2H End Groups Macromolecules. 33: 8012-8019. DOI: 10.1021/Ma992112K  0.775
2000 Xiang M, Li X, Ober CK, Char K, Genzer J, Sivaniah E, Kramer EJ, Fischer DA. Surface Stability in Liquid-Crystalline Block Copolymers with Semifluorinated Monodendron Side Groups Macromolecules. 33: 6106-6119. DOI: 10.1021/Ma992111S  0.74
2000 Genzer J, Sivaniah E, Kramer EJ, Wang J, Xiang M, Char K, Ober CK, Bubeck RA, Fischer DA, Graupe M, Colorado R, Shmakova OE, Lee TR. Molecular orientation of single and two-armed monodendron semifluorinated chains on 'soft' and 'hard' surfaces studied using NEXAFS Macromolecules. 33: 6068-6077. DOI: 10.1021/Ma991710W  0.351
2000 Genzer J, Sivaniah E, Kramer EJ, Wang J, Körner H, Xiang M, Char K, Ober CK, DeKoven BM, Bubeck RA, Chaudhury MK, Sambasivan S, Fischer DA. Orientation of semifluorinated alkanes attached to polymers at the surface of polymer films Macromolecules. 33: 1882-1887. DOI: 10.1021/Ma991182O  0.429
2000 Böker A, Reihs K, Wang J, Stadler R, Ober CK. Selectively Thermally Cleavable Fluorinated Side Chain Block Copolymers:  Surface Chemistry and Surface Properties Macromolecules. 33: 1310-1320. DOI: 10.1021/Ma990828+  0.658
2000 Genzer J, Sivaniah E, Kramer EJ, Wang J, Körner H, Char K, Ober CK, DeKoven BM, Bubeck RA, Fischer DA, Sambasivan S. Temperature Dependence of Molecular Orientation on the Surfaces of Semifluorinated Polymer Thin Films Langmuir. 16: 1993-1997. DOI: 10.1021/La9910327  0.403
2000 Sundararajan N, Yang S, Ogino K, Valiyaveettil S, Wang J, Zhou X, Ober CK, Obendorf SK, Allen RD. Supercritical CO2 processing for submicron imaging of fluoropolymers Chemistry of Materials. 12: 41-48. DOI: 10.1021/Cm9902467  0.552
2000 Yang S, Wang J, Ogino K, Valiyaveettil S, Ober CK. Low-surface-energy fluoromethacrylate block copolymers with patternable elements Chemistry of Materials. 12: 33-40. DOI: 10.1021/Cm990241+  0.629
2000 Osuji CO, Chen JT, Mao G, Ober CK, Thomas EL. Understanding and controlling the morphology of styrene-isoprene side-group liquid crystalline diblock copolymers Polymer. 41: 8897-8907. DOI: 10.1016/S0032-3861(00)00233-0  0.778
2000 Moriya K, Seki T, Nakagawa M, Mao G, Ober CK. Photochromism of 4-cyanophenylazobenzene in liquid crystalline-coil AB diblock copolymers: the influence of microstructure Macromolecular Rapid Communications. 21: 1309-1312. DOI: 10.1002/1521-3927(20001201)21:18<1309::Aid-Marc1309>3.0.Co;2-1  0.8
2000 Hayakawa T, Wang J, Sundararajan N, Xiang M, Li X, Gl�sen B, Leung GC, Ueda M, Ober CK. Switching surface polarity: synthesis and characterization of a fluorinated block copolymer with surface-activetert-butoxycarbonyl groups Journal of Physical Organic Chemistry. 13: 787-795. DOI: 10.1002/1099-1395(200012)13:12<787::Aid-Poc326>3.0.Co;2-#  0.795
2000 Samuel JDJS, Dhamodharan R, Ober CK. A solvent-free method for the synthesis of block copolymers with fluorinated pendant groups by a hydrosilylation reaction Journal of Polymer Science Part a: Polymer Chemistry. 38: 1179-1183. DOI: 10.1002/(Sici)1099-0518(20000401)38:7<1179::Aid-Pola17>3.0.Co;2-L  0.684
1999 Lin Q, Angelopoulos M, Babich K, Medeiros D, Sundararajan N, Weibel G, Ober C. Diffusion and Distribution of Photoacid Generators in thin Polymer Films Mrs Proceedings. 584. DOI: 10.1557/Proc-584-155  0.362
1999 Chane L, Torres-Filho A, Ober CK, Yang S, Chen J, Johnson RW. Development of reworkable underfills, materials, reliability and processing Ieee Transactions On Components and Packaging Technologies. 22: 163-167. DOI: 10.1109/6144.774724  0.568
1999 Osuji C, Zhang Y, Mao G, Ober CK, Thomas EL. Transverse cylindrical microdomain orientation in an LC diblock copolymer under oscillatory shear Macromolecules. 32: 7703-7706. DOI: 10.1021/Ma991155Y  0.753
1999 Bignozzi MC, Ober CK, Novembre AJ, Knurek C. Lithographic results of electron beam photoresists prepared by living free radical polymerization Polymer Bulletin. 43: 93-100. DOI: 10.1007/S002890050538  0.331
1999 Pragliola S, Ober CK, Mather PT, Jeon HG. Mesogen-jacketed liquid crystalline polymers via stable free radical polymerization Macromolecular Chemistry and Physics. 200: 2338-2344. DOI: 10.1002/(Sici)1521-3935(19991001)200:10<2338::Aid-Macp2338>3.0.Co;2-D  0.452
1999 Bignozzi MC, Ober CK, Laus M. Liquid crystalline side chain-coil diblock copolymers by living free radical polymerization Macromolecular Rapid Communications. 20: 622-627. DOI: 10.1002/(Sici)1521-3927(19991201)20:12<622::Aid-Marc622>3.0.Co;2-A  0.36
1999 Clingman SR, Mao G, Ober CK, Colby RH, Brehmer M, Zentel R, Bignozzi M, Laus M, Angeloni A, Gillmor JR. Effect of polymer architecture on self-diffusion of LC polymers Journal of Polymer Science Part B: Polymer Physics. 37: 405-414. DOI: 10.1002/(Sici)1099-0488(19990301)37:5<405::Aid-Polb1>3.0.Co;2-U  0.781
1998 Genzer J, Sivaniah JE, Kramer EJ, Wang J, Körner H, Xiang M, Yang S, Ober CK, Char K, Chaudhury MK, Dekoven BM, Bubeck RA, Fischer DA, Sambasivan S. Surfaces of Semi-Fluorinated Block Copolymers Studied Using Nexafs Mrs Proceedings. 524. DOI: 10.1557/Proc-524-365  0.362
1998 Hupcey MAZ, Ober CK. Copolymer approach to charge-dissipating electron-beam resists Journal of Vacuum Science & Technology B. 16: 3701-3704. DOI: 10.1116/1.590393  0.377
1998 Ortiz C, Kim R, Rodighiero E, Ober CK, Kramer EJ. Deformation of a Polydomain, Liquid Crystalline Epoxy-Based Thermoset Macromolecules. 31: 4074-4088. DOI: 10.1021/Ma971439N  0.592
1998 Ortiz C, Wagner M, Bhargava N, Ober CK, Kramer EJ. Deformation of a Polydomain, Smectic Liquid Crystalline Elastomer Macromolecules. 31: 8531-8539. DOI: 10.1021/Ma971423X  0.591
1998 Perutz S, Wang J, Kramer EJ, Ober CK, Ellis K. Synthesis and Surface Energy Measurement of Semi-Fluorinated, Low-Energy Surfaces† Macromolecules. 31: 4272-4276. DOI: 10.1021/Ma9700993  0.303
1998 Ogino K, Chen J, Ober CK. Synthesis and Characterization of Thermally Degradable Polymer Networks Chemistry of Materials. 10: 3833-3838. DOI: 10.1021/Cm9801183  0.434
1998 Mao G, Wang aJ, Ober CK, Brehmer M, and MJO, Thomas EL. Microphase-Stabilized Ferroelectric Liquid Crystals (MSFLC): Bistable Switching of Ferroelectric Liquid Crystal−Coil Diblock Copolymers Chemistry of Materials. 10: 1538-1545. DOI: 10.1021/Cm970775F  0.764
1998 Yang S, Chen J, Körner H, Breiner aT, Ober CK, Poliks MD. Reworkable Epoxies: Thermosets with Thermally Cleavable Groups for Controlled Network Breakdown Chemistry of Materials. 10: 1475-1482. DOI: 10.1021/Cm970667T  0.575
1998 Schofield P, Cohen C, Ober CK. Synthesis and mechanical properties of semi-flexible polymer networks Polymer Gels and Networks. 6: 291-300. DOI: 10.1016/S0966-7822(98)80001-4  0.369
1998 Gunther J, Thomas EL, Clingman S, Ober CK. Curvature driven relaxation of disclination loops in liquid crystals Polymer. 39: 4497-4503. DOI: 10.1016/S0032-3861(97)10315-9  0.802
1998 Dadmun MD, Clingman S, Ober CK, Nakatani AI. Flow-induced structure in a thermotropic liquid crystalline polymer as studied by SANS Journal of Polymer Science Part B. 36: 3017-3023. DOI: 10.1002/(Sici)1099-0488(199812)36:17<3017::Aid-Polb2>3.0.Co;2-7  0.81
1997 Barber DB, Pollock CR, Beecroft LL, Ober CK. Amplification by optical composites. Optics Letters. 22: 1247-9. PMID 18185809 DOI: 10.1364/Ol.22.001247  0.788
1997 Muthukumar M, Ober CK, Thomas EL. Competing interactions and levels of ordering in self-organizing polymeric materials Science. 277: 1225-1232. DOI: 10.1126/Science.277.5330.1225  0.39
1997 Beecroft LL, Ober CK. High Refractive Index Polymers for Optical Applications Journal of Macromolecular Science, Part A. 34: 573-586. DOI: 10.1080/10601329708014985  0.816
1997 Wang J, Ober CK. Self-Organizing Materials with Low Surface Energy: The Synthesis and Solid-State Properties of Semifluorinated Side-Chain Ionenes Macromolecules. 30: 7560-7567. DOI: 10.1021/Ma9700901  0.379
1997 Mao G, Wang J, Clingman SR, Ober CK, Chen JT, Thomas EL. Molecular Design, Synthesis, and Characterization of Liquid Crystal−Coil Diblock Copolymers with Azobenzene Side Groups Macromolecules. 30: 2556-2567. DOI: 10.1021/Ma9617835  0.779
1997 Wang J, Mao G, Ober CK, Kramer EJ. Liquid Crystalline, Semifluorinated Side Group Block Copolymers with Stable Low Energy Surfaces: Synthesis, Liquid Crystalline Structure, and Critical Surface Tension Macromolecules. 30: 1906-1914. DOI: 10.1021/Ma961412O  0.794
1997 Dai C, Osuji CO, Jandt KD, Dair BJ, Ober CK, Kramer EJ, Hui C. Effect of the Monomer Ratio on the Strengthening of Polymer Phase Boundaries by Random Copolymers Macromolecules. 30: 6727-6736. DOI: 10.1021/Ma960543M  0.351
1997 Beecroft LL, Ober CK. Nanocomposite Materials for Optical Applications Chemistry of Materials. 9: 1302-1317. DOI: 10.1021/Cm960441A  0.781
1997 Shiota A, Ober CK. Analysis of smectic structure formation in liquid crystalline thermosets Polymer. 38: 5857-5867. DOI: 10.1016/S0032-3861(97)00146-8  0.309
1997 Colby RH, Ober CK, Gillmor JR, Connelly RW, Duong T, Galli G, Laus M. Smectic rheology Rheologica Acta. 36: 498-504. DOI: 10.1007/BF00368127  0.456
1997 Ober CK, Wang JG, Mao GP. Order within order: Studies of semifluorinated block copolymers Macromolecular Symposia. 118: 701-706. DOI: 10.1002/Masy.19971180190  0.418
1997 Thomas EL, Chen JT, O'Rourke MJE, Ober CK, Mao G. Influence of a liquid crystalline block on the microdomain structure of block copolymers Macromolecular Symposia. 117: 241-256. DOI: 10.1002/Masy.19971170128  0.785
1997 Brehmer M, Mao G, Ober C, Zentel R. Ferroelectric block copolymers Macromolecular Symposia. 117: 175-179. DOI: 10.1002/Masy.19971170121  0.802
1997 Ober CK, Wang J, Mao G, Kramer EJ, Chen JT, Thomas EL. Multiple length scale self-organization in liquid crystalline block copolymers Macromolecular Symposia. 117: 141-152. DOI: 10.1002/Masy.19971170118  0.778
1997 Shiota A, Körner H, Ober CK. Liquid crystalline networks from 1,4-benzenedicarboxylic acid bis(4-cyanatomethylphenyl) ester Macromolecular Chemistry and Physics. 198: 2957-2970. DOI: 10.1002/Macp.1997.021980924  0.301
1997 Ober CK, Gabor AH, Gallagher‐Wetmore P, Allen RD. Imaging polymers with supercritical carbon dioxide Advanced Materials. 9: 1039-1043. DOI: 10.1002/Adma.19970091309  0.332
1997 Ober CK, Wegner G. Polyelectrolyte-Surfactant Complexes in the Solid State: Facile building blocks for self-organizing materials Advanced Materials. 9: 17-31. DOI: 10.1002/Adma.19970090104  0.351
1997 Mao G, Ober CK. Block Copolymers Containing Liquid Crystalline Segments Acta Polymerica. 48: 405-422. DOI: 10.1002/9783527619276.Ch1Dd  0.776
1997 Beecroft LL, Johnen NA, Ober CK. Covalently Linked, Transparent Silica-Poly(imide) Hybrids Polymers For Advanced Technologies. 8: 289-296. DOI: 10.1002/(Sici)1099-1581(199705)8:5<289::Aid-Pat648>3.0.Co;2-3  0.808
1996 Chen JT, Thomas EL, Ober CK, Mao G. Self-Assembled Smectic Phases in Rod-Coil Block Copolymers Science (New York, N.Y.). 273: 343-6. PMID 8662518 DOI: 10.1126/Science.273.5273.343  0.524
1996 OBER CK, GABOR AH. Block Copolymers as Lithographic Materials. Journal of Photopolymer Science and Technology. 9: 1-11. DOI: 10.2494/Photopolymer.9.1  0.408
1996 Beecroft LL, Leidner RT, Ober CK, Barber DB, Pollock CR. The Formation of Laser Active Composite Films from Silicate Ceramics Mrs Proceedings. 435. DOI: 10.1557/Proc-435-575  0.802
1996 Körner H, Shiota A, Ober CK. The Processing of LC Thermosets in Orienting External Fields Mrs Proceedings. 425. DOI: 10.1557/Proc-425-149  0.328
1996 Iyengar DR, Perutz SM, Dai C, Ober CK, Kramer EJ. Surface Segregation Studies of Fluorine-Containing Diblock Copolymers† Macromolecules. 29: 1229-1234. DOI: 10.1021/Ma950544Z  0.418
1996 Xu D, Crepeau RH, Ober CK, Freed JH. Molecular dynamics of a liquid crystalline polymer studied by two-dimensional fourier transform and CW ESR Journal of Physical Chemistry. 100: 15873-15885. DOI: 10.1021/Jp9605156  0.382
1996 Xu D, Budil DE, Ober CK, Freed JH. Rotational diffusion and order parameters of a liquid crystalline polymer studied by ESR: Molecular weight dependence Journal of Physical Chemistry. 100: 15867-15872. DOI: 10.1021/Jp960514D  0.348
1996 Xu D, Hall E, Ober CK, Moscicki JK, Freed JH. Translational diffusion in polydisperse polymer samples studied by dynamic imaging of diffusion ESR Journal of Physical Chemistry. 100: 15856-15866. DOI: 10.1021/Jp960513L  0.595
1996 Gabor AH, Pruette LC, Ober CK. Lithographic Properties of Poly(tert-butyl methacrylate)-Based Block and Random Copolymer Resists Designed for 193 nm Wavelength Exposure Tools Chemistry of Materials. 8: 2282-2290. DOI: 10.1021/Cm9600135  0.389
1996 Gabor AH, Ober CK. Group-Transfer Polymerization oftert-Butyl Methacrylate and [3-(Methacryloxy)propyl]pentamethyldisiloxane:  Synthesis and Characterization of Homopolymers and Random and Block Copolymers Chemistry of Materials. 8: 2272-2281. DOI: 10.1021/Cm960012C  0.317
1996 Ober CK, Körner H, Shiota A, Laus M. Angewandte Makromolekulare Chemie. 240: 59-66. DOI: 10.1002/Apmc.1996.052400105  0.373
1996 Shiota A, Ober CK. Synthesis and curing of novel LC twin epoxy monomers for liquid crystal thermosets Journal of Polymer Science Part a: Polymer Chemistry. 34: 1291-1303. DOI: 10.1002/(Sici)1099-0518(199605)34:7<1291::Aid-Pola16>3.0.Co;2-4  0.347
1995 Chen JT, Thomas EL, Ober CK, Hwang SS. Zigzag Morphology of a Poly(styrene-b-hexyl isocyanate) Rod-Coil Block Copolymer Macromolecules. 28: 1688-1697. DOI: 10.1021/Ma00109A048  0.381
1995 Hwang SS, Ober CK, Perutz S, Iyengar DR, Schneggenburger LA, Kramer EJ. Block copolymers with low surface energy segments: siloxane- and perfluoroalkane-modified blocks Polymer. 36: 1321-1325. DOI: 10.1016/0032-3861(95)93937-H  0.462
1995 Hall EE, Robinson AA, Mcnamee SG, Ober CK, Freidzon YS. Nematic-smectic biphase of a main-chain liquid crystalline polyether Journal of Materials Science. 30: 2023-2028. DOI: 10.1007/Bf00353028  0.319
1995 Beecroft LL, Ober CK. Novel ceramic particle synthesis for optical applications: Dispersion polymerized preceramic polymers as size templates for fine ceramic powders Advanced Materials. 7: 1009-1012. DOI: 10.1002/Adma.19950071207  0.803
1994 Dai CA, Dair BJ, Dai KH, Ober CK, Kramer EJ, Hui CY, Jelinski LW. Reinforcement of polymer interfaces with random copolymers. Physical Review Letters. 73: 2472-2475. PMID 10057068 DOI: 10.1103/Physrevlett.73.2472  0.414
1994 Gillmor JR, Colby RH, Hall E, Ober CK. Viscoelastic properties of a model main-chain liquid crystalline polyether Journal of Rheology. 38: 1623-1638. DOI: 10.1122/1.550562  0.565
1994 Gabor AH, Lehner EA, Mao G, Schneggenburger LA, Ober CK. Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks Chemistry of Materials. 6: 927-934. DOI: 10.1021/Cm00043A011  0.782
1993 Kim HK, Ober CK. Development of poly(phenylene)-based materials for thin film applications: Optical waveguides and low dielectric materials Journal of Macromolecular Science, Part A. 30: 877-897. DOI: 10.1080/10601329308009433  0.419
1993 Hall E, Ober CK, Galli G. The temperature dependence of nematic liquid crystalline polymer melt diffusion Liquid Crystals. 14: 1351-1358. DOI: 10.1080/02678299308026447  0.705
1993 Colby RH, Gillmor JR, Galli G, Laus M, Ober CK, Hall E. Linear viscoelasticity of side chain liquid crystal polymer Liquid Crystals. 13: 233-245. DOI: 10.1080/02678299308026297  0.72
1993 Hall E, Ober CK, Kramer EJ, Colby RH, Gillmor JR. Diffusion and melt viscosity of a main-chain liquid crystalline polyether Macromolecules. 26: 3764-3771. DOI: 10.1021/Ma00067A007  0.538
1993 Mates TE, Ober CK, Norwood RA. Conductivity and third-order nonlinear optical measurements of polymers with distyrylbenzene and diphenylbutadiene segments Chemistry of Materials. 5: 217-221. DOI: 10.1021/Cm00026A012  0.327
1993 Barclay GG, Ober CK. Liquid crystalline and rigid-rod networks Progress in Polymer Science. 18: 899-945. DOI: 10.1016/0079-6700(93)90021-4  0.312
1993 Galli G, McNamee SG, Ober CK. Investigation of the smectic-isotropic transition in a side-chain liquid crystal polymer by synchrotron radiation X-ray diffraction Journal of Polymer Science, Part B: Polymer Physics. 31: 773-777. DOI: 10.1002/Polb.1993.090310704  0.574
1992 Kim HK, Kahn S, Mates T, Barclay G, Ober CK. Development of New Polymeric Materials for Linear Waveguides Mrs Proceedings. 264. DOI: 10.1557/Proc-264-347  0.693
1992 Martin MHE, Ober CK, Hubbard CR, Porter WD, Cavin OB. Poly(methacrylate) Precursors to Forsterite Journal of the American Ceramic Society. 75: 1831-1838. DOI: 10.1111/J.1151-2916.1992.Tb07204.X  0.394
1992 Kim HK, Hove CR, Ober CK. Synthesis of Novel Fluorinated [sgrave]-Conjugated Silicon-Containing Polymers: Polysilynes and Polysilanes Journal of Macromolecular Science, Part A. 29: 787-800. DOI: 10.1080/10601329208054116  0.353
1992 Kim HK, Ober CK. Acid-catalyzed photoaromatization of poly(cyclohexadiene-1,2-diol) derivatives into polyphenylene Polymer Bulletin. 28: 33-40. DOI: 10.1007/Bf01045635  0.416
1992 Mates TE, Ober CK. New liquid crystal polyethers and polyesters based on diphenylbutadiene mesogens Journal of Polymer Science, Part a: Polymer Chemistry. 30: 2541-2547. DOI: 10.1002/Pola.1992.080301208  0.711
1991 Hall E, Ober C, Kramer E, Colby R, Gillmor J, Galli G. Melt Diffusion in Model Liquid Crystalline Polyiers Mrs Proceedings. 248. DOI: 10.1557/Proc-248-113  0.684
1991 Mcnamee SG, Galli G, Ober CK. Time-Resolved X-Ray Diffraction from Liquid Crystalliine Systems: Thermotropic Phase Transitions and the Effect of Applied Electric Fields Mrs Proceedings. 248. DOI: 10.1557/Proc-248-101  0.538
1990 Misyan A, Ober CK. Liquid crystal copolyethers with mixed mesogenic units and flexible spacers Polymer Bulletin. 23: 535-542. DOI: 10.1007/Bf00419974  0.42
1990 Ober CK, Delvin A, Bluhm TL. Dynamic X-ray diffraction studies of liquid-crystalline polyesters Journal of Polymer Science, Part B: Polymer Physics. 28: 1047-1062. DOI: 10.1002/Polb.1990.090280705  0.345
1990 Mates TE, Ober CK. New thermotropic polyesters from distyrylbenzene bisphenols Journal of Polymer Science. Part C, Polymer Letters. 28: 331-339. DOI: 10.1002/Pol.1990.140281103  0.721
1989 Mates T, Ober CK, Angelopolous B, Martin H. Environmentally Stable, Low Dielectric Polymers from Soluble Intermediates Mrs Proceedings. 167. DOI: 10.1557/Proc-167-123  0.735
1989 Delvin A, Ober CK, Bluhm TL. Studies of liquid-crystalline polymer phase transitions using synchrotron x-radiation Macromolecules. 22: 498-500. DOI: 10.1021/Ma00191A098  0.347
1989 Ober CK. Polymer tacticity in simulated NMR spectra Journal of Chemical Education. 66: 645. DOI: 10.1021/Ed066P645  0.312
1988 Delvin A, Ober CK. Liquid crystalline polyesters by staged-addition polycondensation Polymer Bulletin. 20: 45-51. DOI: 10.1007/Bf00262248  0.427
1987 Ober CK, Hair ML. The effect of temperature and initiator levels on the dispersion polymerization of polystyrene Journal of Polymer Science Part a: Polymer Chemistry. 25: 1395-1407. DOI: 10.1002/Pola.1987.080250516  0.349
1986 Ober C, van Grunsven F, McGrath M, Hair M. Partitioning of monomer during dispersion polymerisation Colloids and Surfaces. 21: 347-354. DOI: 10.1016/0166-6622(86)80103-2  0.368
1986 Ober CK, Bluhm TL. Thermotropic liquid crystalline polyesters containing naphthalenic mesogenic groups Polymer Bulletin. 15: 233-239. DOI: 10.1007/Bf00255068  0.38
1985 Lok KP, Ober CK. Particle size control in dispersion polymerization of polystyrene Canadian Journal of Chemistry. 63: 209-216. DOI: 10.1139/V85-033  0.37
1983 Ober C, Lenz RW, Galli G, Chiellini E. Liquid-crystalline polymers. 12. Polyesters with either alternating or random orientation of mesogenic units Macromolecules. 16: 1034-1036. DOI: 10.1021/Ma00241A002  0.571
1983 Ober CK, Jin J, Lenz RW. Die Makromolekulare Chemie, Rapid Communications. 4: 49-55. DOI: 10.1002/Marc.1983.030040201  0.475
1982 Ober C, Jin JI, Lenz RW. Liquid crystal polymers. V. Thermotropic polyesters with either dyad or triad aromatic ester mesogenic units and flexible polymethylene spacers in the main chain Polymer Journal. 14: 9-17. DOI: 10.1295/Polymj.14.9  0.584
1982 Galli G, Nieri P, Ober CK, Chiellini E. Die Makromolekulare Chemie, Rapid Communications. 3: 543-548. DOI: 10.1002/Marc.1982.030030804  0.45
1982 Galli G, Chiellini E, Ober CK, Lenz RW. Die Makromolekulare Chemie. 183: 2693-2708. DOI: 10.1002/Macp.1982.021831108  0.688
1981 Galli G, Benedetti E, Chiellini E, Ober C, Lenz RW. Phase transitions in alkylene glycol terephthalate copolyesters containing mesogenic p-oxybenzoate units Polymer Bulletin. 5: 497-504. DOI: 10.1007/Bf00254356  0.642
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