Uygar E. Avci, Ph.D.

Affiliations: 
2005 Cornell University, Ithaca, NY, United States 
Area:
Electronics and Electrical Engineering
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"Uygar Avci"
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Parents

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Sandip Tiwari grad student 2005 Cornell
 (Back -gated MOSFET for power -adaptive applications.)
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Publications

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Kim R, Avci UE, Young IA. (2020) Computational Study of Temperature Effects on MOSFET Channel Material Benchmarking Ieee Electron Device Letters. 41: 1332-1335
Kim R, Avci UE, Young IA. (2020) Comprehensive n- and pMOSFET Channel Material Benchmarking and Analysis of CMOS Performance Metrics Considering Quantum Transport and Carrier Scattering Effects Ieee Journal of the Electron Devices Society. 8: 505-523
Kim R, Avci UE, Young IA. (2019) Computational Study of Geometrical Designs for Source/Drain Contacts to Reduce Parasitic Resistance in Extremely Scaled MOSFETs Ieee Transactions On Electron Devices. 66: 1189-1196
Vaidyanathan K, Morris DH, Avci UE, et al. (2018) Improving Energy Efficiency of Low-Voltage Logic by Technology-Driven Design Ieee Journal On Exploratory Solid-State Computational Devices and Circuits. 4: 10-18
Chang S, Avci UE, Nikonov DE, et al. (2018) Physical Origin of Transient Negative Capacitance in a Ferroelectric Capacitor Physical Review Applied. 9: 14010
Chang S, Avci UE, Nikonov DE, et al. (2017) A Thermodynamic Perspective of Negative-Capacitance Field-Effect Transistors Ieee Journal On Exploratory Solid-State Computational Devices and Circuits. 3: 56-64
Kim R, Avci UE, Young IA. (2015) Comprehensive Performance Benchmarking of III-V and Si nMOSFETs (Gate Length} = 13 nm) Considering Supply Voltage and OFF-Current Ieee Transactions On Electron Devices
Kim R, Avci UE, Young IA. (2015) Ge Nanowire nMOSFET Design with Optimum Band Structure for High Ballistic Drive Current Ieee Electron Device Letters. 36: 751-753
Avci UE, Morris DH, Young IA. (2015) Tunnel field-effect transistors: Prospects and challenges Ieee Journal of the Electron Devices Society. 3: 88-95
Kim R, Avci UE, Young IA. (2015) Source/drain doping effects and performance analysis of ballistic III-V n-MOSFETs Ieee Journal of the Electron Devices Society. 3: 37-43
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