Jianan Yang, Ph.D. - Publications
Affiliations: | 2001 | Purdue University, West Lafayette, IN, United States |
Area:
Electronics and Electrical EngineeringYear | Citation | Score | |||
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2003 | Yang J, Denton J, Neudeck G. Ammonia nitrided isolation oxide for selective epitaxial growth technology to eliminate edge transistor effects of SOI and bulk N-channel MOSFETs Electronics Letters. 39: 1013. DOI: 10.1049/El:20030642 | 0.586 | |||
2002 | Yang J, Neudeck GW, Denton JP. Electrical effects of a single stacking fault on fully depleted thin-film silicon-on-insulator P-channel metal–oxide–semiconductor field-effect transistors Journal of Applied Physics. 91: 420. DOI: 10.1063/1.1417995 | 0.595 | |||
2001 | Yang J, Denton JP, Neudeck GW. Edge transistor elimination in oxide trench isolated N-channel metal–oxide–semiconductor field effect transistors Journal of Vacuum Science & Technology B. 19: 327-332. DOI: 10.1116/1.1358854 | 0.585 | |||
2000 | Yang J, Neudeck GW, Denton JP. Unique method to electrically characterize a single stacking fault in silicon-on-insulator metal–oxide–semiconductor field-effect transistors Applied Physics Letters. 77: 4034-4036. DOI: 10.1063/1.1331641 | 0.595 | |||
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