Ashish Baraskar, Ph.D.

Affiliations: 
2011 Electrical amp; Computer Engineering University of California, Santa Barbara, Santa Barbara, CA, United States 
Area:
Electronics & Photonics
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"Ashish Baraskar"

Parents

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Mark J. W. Rodwell grad student 2011 UC Santa Barbara
 (Development of Ultra-Low Resistance Ohmic Contacts for indium gallium arsenide/indium phosphide HBTs.)
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Publications

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Wistey MA, Baraskar AK, Singisetti U, et al. (2015) Control of InGaAs and InAs facets using metal modulation epitaxy Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 33
Zhang Z, Koswatta SO, Bedell SW, et al. (2013) Ultra low contact resistivities for CMOS beyond 10-nm node Ieee Electron Device Letters. 34: 723-725
Baraskar A, Gossard AC, Rodwell MJW. (2013) Lower limits to metal-semiconductor contact resistance: Theoretical models and experimental data Journal of Applied Physics. 114
Maassen J, Jeong C, Baraskar A, et al. (2013) Full band calculations of the intrinsic lower limit of contact resistivity Applied Physics Letters. 102
Lobisser E, Rode JC, Jain V, et al. (2013) InGaAs/InP DHBTs with emitter and base defined through electron-beam lithography for reduced Ccb and increased RF cut-off frequency Physica Status Solidi (C) Current Topics in Solid State Physics. 10: 769-772
Hashemi P, Kobayashi M, Majumdar A, et al. (2013) High-performance Si1-xGex channel on insulator trigate PFETs featuring an implant-free process and aggressively-scaled fin and gate dimensions Ieee Symposium On Vlsi Circuits, Digest of Technical Papers. T18-T19
Jain V, Lobisser E, Baraskar A, et al. (2011) InGaAs/InP DHBTs in a dry-etched refractory metal emitter process demonstrating simultaneous fτ/fmax ∼430/800GHz Ieee Electron Device Letters. 32: 24-26
Jain V, Rode JC, Chiang HW, et al. (2011) 1.0 THz fmax InP DHBTs in a refractory emitter and self-aligned base process for reduced base access resistance Device Research Conference - Conference Digest, Drc. 271-272
Jain V, Lobisser E, Baraskar A, et al. (2011) InGaAs/InP DHBTs demonstrating simultaneous f τ/f max ∼ 460/850 GHz in a refractory emitter process Conference Proceedings - International Conference On Indium Phosphide and Related Materials
Baraskar A, Wistey MA, Jain V, et al. (2010) Ex situ Ohmic contacts to n-InGaAs Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C5l7-C5l9
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