Dennis W. Hess - Publications

Affiliations: 
Georgia Institute of Technology, Atlanta, GA 
Area:
Materials Science Engineering, Chemical Engineering, Analytical Chemistry

129 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Raj N, Breedveld V, Hess DW. Flow control in fully enclosed microfluidics paper based analytical devices using plasma processes Sensors and Actuators B-Chemical. 320: 128606. DOI: 10.1016/J.Snb.2020.128606  0.333
2019 Raj N, Breedveld V, Hess DW. Fabrication of fully enclosed paper microfluidic devices using plasma deposition and etching. Lab On a Chip. 19: 3337-3343. PMID 31501838 DOI: 10.1039/C9Lc00746F  0.343
2019 Lin H, Rosu C, Jiang L, Sundar VA, Breedveld V, Hess DW. Nonfluorinated Superhydrophobic Chemical Coatings on Polyester Fabric Prepared with Kinetically Controlled Hydrolyzed Methyltrimethoxysilane Industrial & Engineering Chemistry Research. 58: 15368-15378. DOI: 10.1021/Acs.Iecr.9B02471  0.366
2019 McGlothin C, Rosu C, Jiang L, Breedveld V, Hess DW. Lowering protein fouling by rational processing of fluorine-free hydrophobic coatings Surfaces and Interfaces. 17: 100370. DOI: 10.1016/J.Surfin.2019.100370  0.38
2018 Rosu C, Lin H, Jiang L, Breedveld V, Hess DW. Sustainable and long-time 'rejuvenation' of biomimetic water-repellent silica coating on polyester fabrics induced by rough mechanical abrasion. Journal of Colloid and Interface Science. 516: 202-214. PMID 29408106 DOI: 10.1016/J.Jcis.2018.01.055  0.356
2018 Jang Y, Choi WT, Johnson CT, García AJ, Singh PM, Breedveld V, Hess DW, Champion JA. Inhibition of Bacterial Adhesion on Nanotextured Stainless Steel 316L by Electrochemical Etching. Acs Biomaterials Science & Engineering. 4: 90-97. PMID 29333490 DOI: 10.1021/Acsbiomaterials.7B00544  0.331
2017 Yang X, Liu X, Hess DW, Breedveld V. Underwater Oil Droplet Splitting on a Patterned Template. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29120647 DOI: 10.1021/Acs.Langmuir.7B03604  0.346
2017 Jiang L, Tang Z, Clinton RM, Breedveld V, Hess DW. Two-Step Process to Create "Roll-Off" Superamphiphobic Paper Surfaces. Acs Applied Materials & Interfaces. PMID 28225585 DOI: 10.1021/Acsami.7B00829  0.493
2017 Jiang L, Park-Lee KJ, Clinton RM, Tang Z, Breedveld V, Hess DW. Mechanical durability of liquid repellent coatings Surface and Coatings Technology. 328: 182-191. DOI: 10.1016/J.Surfcoat.2017.08.007  0.408
2017 Choi WT, Yang X, Breedveld V, Hess DW. Creation of wettability contrast patterns on metallic surfaces via pen drawn masks Applied Surface Science. 426: 1241-1248. DOI: 10.1016/J.Apsusc.2017.08.215  0.428
2016 Choi WT, Oh K, Singh PM, Breedveld V, Hess DW. Wettability control of stainless steel surfaces via evolution of intrinsic grain structures Journal of Materials Science. 51: 5196-5206. DOI: 10.1007/S10853-016-9821-Y  0.426
2016 Jiang L, Tang Z, Clinton RM, Hess DW, Breedveld V. Fabrication of highly amphiphobic paper using pulp debonder Cellulose. 1-15. DOI: 10.1007/S10570-016-1048-1  0.324
2016 Tang Z, Li H, Hess DW, Breedveld V. Effect of chain length on the wetting properties of alkyltrichlorosilane coated cellulose-based paper Cellulose. 1-13. DOI: 10.1007/S10570-016-0877-2  0.382
2016 Tang Z, Xie L, Hess DW, Breedveld V. Fabrication of amphiphobic softwood and hardwood by treatment with non-fluorinated chemicals Wood Science and Technology. 1-17. DOI: 10.1007/S00226-016-0854-9  0.361
2015 Huffman C, Hess DW, De Marneffe JF, Sekine M, De Gendt S. Preface to the focus issue on atomic layer etch and clean Ecs Journal of Solid State Science and Technology. 4: Y7. DOI: 10.1149/2.0151506Jss  0.36
2015 Choi T, Hess DW. Chemical Etching and Patterning of Copper, Silver, and Gold Films at Low Temperatures Ecs Journal of Solid State Science and Technology. 4. DOI: 10.1149/2.0111501Jss  0.431
2015 Choi T, Hess DW. Etching of Ag and Au films in CH4-based plasmas at low temperature Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 33: 12202. DOI: 10.1116/1.4902332  0.358
2015 Tang Z, Hess DW, Breedveld V. Fabrication of oleophobic paper with tunable hydrophilicity by treatment with non-fluorinated chemicals Journal of Materials Chemistry A. 3: 14651-14660. DOI: 10.1039/C5Ta03520A  0.389
2015 Xie L, Tang Z, Jiang L, Breedveld V, Hess DW. Creation of superhydrophobic wood surfaces by plasma etching and thin-film deposition Surface and Coatings Technology. 281: 125-132. DOI: 10.1016/J.Surfcoat.2015.09.052  0.5
2014 Hess DW. Low temperature plasma etching of copper, silver and gold films Ecs Transactions. 61: 91-96. DOI: 10.1149/06103.0091ecst  0.338
2014 Sherpa SD, Kunc J, Hu Y, Levitin G, De Heer WA, Berger C, Hess DW. Local work function measurements of plasma-fluorinated epitaxial graphene Applied Physics Letters. 104. DOI: 10.1063/1.4866783  0.323
2014 Westafer RS, Levitin G, Hess DW, Bergin MH, Hunt WD. Detection of ppb ozone using a dispersive surface acoustic wave reflective delay line with integrated reference signal Sensors and Actuators B-Chemical. 192: 406-413. DOI: 10.1016/J.Snb.2013.10.104  0.305
2013 Li L, Breedveld V, Hess DW. Design and fabrication of superamphiphobic paper surfaces. Acs Applied Materials & Interfaces. 5: 5381-6. PMID 23647359 DOI: 10.1021/Am401436M  0.392
2013 Choi T, Levitin G, Hess DW. Mechanistic Considerations in Plasma-Assisted Etching of Ag and Au Thin Films Ecs Journal of Solid State Science and Technology. 2. DOI: 10.1149/2.012306Jss  0.357
2013 Choi T, Levitin G, Hess DW. Low Temperature Cu Etching Using CH4-Based Plasmas Ecs Journal of Solid State Science and Technology. 2. DOI: 10.1149/2.002312Jss  0.302
2013 Li L, Roethel S, Breedveld V, Hess DW. Creation of low hysteresis superhydrophobic paper by deposition of hydrophilic diamond-like carbon films Cellulose. 20: 3219-3226. DOI: 10.1007/S10570-013-0078-1  0.424
2013 Li L, Breedveld V, Hess DW. Hysteresis controlled water droplet splitting on superhydrophobic paper Colloid and Polymer Science. 291: 417-426. DOI: 10.1007/S00396-012-2755-2  0.377
2012 Li L, Breedveld V, Hess DW. Creation of superhydrophobic stainless steel surfaces by acid treatments and hydrophobic film deposition. Acs Applied Materials & Interfaces. 4: 4549-56. PMID 22913317 DOI: 10.1021/Am301666C  0.388
2012 Casciato MJ, Levitin G, Hess DW, Grover MA. Synthesis of Cu(2)ZnSnS(4) micro- and nanoparticles via a continuous-flow supercritical carbon dioxide process. Chemsuschem. 5: 1186-9. PMID 22707477 DOI: 10.1002/Cssc.201200171  0.362
2012 Xiu Y, Liu Y, Balu B, Hess DW, Wong C. Robust Superhydrophobic Surfaces Prepared With Epoxy Resin and Silica Nanoparticles Ieee Transactions On Components, Packaging and Manufacturing Technology. 2: 395-401. DOI: 10.1109/Tcpmt.2011.2177088  0.8
2012 Casciato MJ, Kim S, Lu JC, Hess DW, Grover MA. Optimization of a Carbon Dioxide-Assisted Nanoparticle Deposition Process Using Sequential Experimental Design with Adaptive Design Space Industrial & Engineering Chemistry Research. 51: 15807-15807. DOI: 10.1021/Ie2028574  0.343
2012 Casciato MJ, Kim S, Lu JC, Hess DW, Grover MA. Optimization of carbon dioxide-assisted nanoparticle deposition process with uncertain design space Computer Aided Chemical Engineering. 31: 1191-1195. DOI: 10.1016/B978-0-444-59506-5.50069-9  0.309
2012 Casciato MJ, Levitin G, Hess DW, Grover MA. Controlling the properties of silver nanoparticles deposited on surfaces using supercritical carbon dioxide for surface-enhanced Raman spectroscopy Journal of Nanoparticle Research. 14: 836. DOI: 10.1007/S11051-012-0836-2  0.434
2011 Levitin G, Hess DW. Surface reactions in microelectronics process technology. Annual Review of Chemical and Biomolecular Engineering. 2: 299-324. PMID 22432621 DOI: 10.1146/Annurev-Chembioeng-061010-114249  0.437
2011 Riccardi CS, Hess DW, Mizaikoff B. Surface-modified ZnSe waveguides for label-free infrared attenuated total reflection detection of DNA hybridization. The Analyst. 136: 4906-11. PMID 21994915 DOI: 10.1039/C0An00504E  0.301
2011 Wu F, Levitin G, Hess DW. Temperature Effects and Optical Emission Spectroscopy Studies of Hydrogen-Based Plasma Etching of Copper Journal of the Electrochemical Society. 159. DOI: 10.1149/2.015202Jes  0.746
2011 Wu F, Levitin G, Hess DW. Mechanistic considerations of low temperature hydrogen-based plasma etching of Cu Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 29: 11013. DOI: 10.1116/1.3520461  0.776
2010 Xiu Y, Liu Y, Hess DW, Wong CP. Mechanically robust superhydrophobicity on hierarchically structured Si surfaces. Nanotechnology. 21: 155705. PMID 20332558 DOI: 10.1088/0957-4484/21/15/155705  0.768
2010 Liu Y, Xiu Y, Hess DW, Wong CP. Silicon surface structure-controlled oleophobicity. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 8908-13. PMID 20205405 DOI: 10.1021/La904686C  0.781
2010 Balu B, Berry AD, Patel KT, Breedveld V, Hess DW. Directional mobility and adhesion of water drops on patterned superhydrophobic surfaces Journal of Adhesion Science and Technology. 25: 627-642. DOI: 10.1163/016942410X525849  0.795
2010 Pande AA, Levitin G, Hess DW. Formulation of Selective Etch Chemistries for Silicon Dioxide–Based Films Journal of the Electrochemical Society. 157. DOI: 10.1149/1.3374176  0.411
2010 Wu F, Levitin G, Hess DW. Patterning of Cu Films by a Two-Step Plasma Etching Process at Low Temperature Journal of the Electrochemical Society. 157. DOI: 10.1149/1.3314292  0.778
2010 Wu F, Levitin G, Hess DW. Low-Temperature Etching of Cu by Hydrogen-Based Plasmas Acs Applied Materials & Interfaces. 2: 2175-2179. DOI: 10.1021/Am1003206  0.769
2009 Balu B, Berry AD, Hess DW, Breedveld V. Patterning of superhydrophobic paper to control the mobility of micro-liter drops for two-dimensional lab-on-paper applications. Lab On a Chip. 9: 3066-75. PMID 19823721 DOI: 10.1039/B909868B  0.789
2009 Song IG, Timmons C, Levitin G, Hess DW. Photoresist Removal Using Alternative Chemistries and Pressures Solid State Phenomena. 303-310. DOI: 10.4028/Www.Scientific.Net/Ssp.145-146.303  0.458
2009 Xiu Y, Liu Y, Hess DW, Wong C. Superhydrophobic Silicon Surfaces with Low Light Reflectivity Mrs Proceedings. 1158. DOI: 10.1557/Proc-1158-F03-07  0.779
2009 Balu B, Kim JS, Breedveld V, Hess DW. Tunability of the adhesion of water drops on a superhydrophobic paper surface via selective plasma etching Journal of Adhesion Science and Technology. 23: 361-380. DOI: 10.1163/156856108X383547  0.805
2009 Xiu Y, Xiao F, Hess DW, Wong C. Superhydrophobic optically transparent silica films formed with a eutectic liquid Thin Solid Films. 517: 1610-1615. DOI: 10.1016/J.Tsf.2008.09.081  0.793
2008 Xiu Y, Zhang S, Yelundur V, Rohatgi A, Hess DW, Wong CP. Superhydrophobic and low light reflectivity silicon surfaces fabricated by hierarchical etching. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 10421-6. PMID 18710271 DOI: 10.1021/La801206M  0.784
2008 Xiu Y, Hess DW, Wong CP. UV and thermally stable superhydrophobic coatings from sol-gel processing. Journal of Colloid and Interface Science. 326: 465-70. PMID 18656893 DOI: 10.1016/J.Jcis.2008.06.042  0.779
2008 Wiedemair J, Balu B, Moon JS, Hess DW, Mizaikoff B, Kranz C. Plasma-deposited fluorocarbon films: insulation material for microelectrodes and combined atomic force microscopy-scanning electrochemical microscopy probes. Analytical Chemistry. 80: 5260-5. PMID 18510344 DOI: 10.1021/Ac800246Q  0.794
2008 Balu B, Breedveld V, Hess DW. Fabrication of "roll-off" and "sticky" superhydrophobic cellulose surfaces via plasma processing. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 4785-90. PMID 18315020 DOI: 10.1021/La703766C  0.819
2008 Xiu Y, Hess DW, Wong CP. UV-Resistant and Superhydrophobic Self-Cleaning Surfaces Using Sol–Gel Processes Journal of Adhesion Science and Technology. 22: 1907-1917. DOI: 10.1163/156856108X320050  0.774
2008 Timmons CL, Hess DW. Photoresist and Fluorocarbon Postplasma Etch Residue Removal Using Electrochemically Generated Radical Anions Journal of the Electrochemical Society. 155: H771. DOI: 10.1149/1.2965533  0.364
2008 Xiu Y, Zhu L, Hess DW, Wong CP. Relationship between Work of Adhesion and Contact Angle Hysteresis on Superhydrophobic Surfaces The Journal of Physical Chemistry C. 112: 11403-11407. DOI: 10.1021/Jp711571K  0.807
2007 Dobbs GT, Balu B, Young C, Kranz C, Hess DW, Mizaikoff B. Mid-infrared chemical sensors utilizing plasma-deposited fluorocarbon membranes. Analytical Chemistry. 79: 9566-71. PMID 18020310 DOI: 10.1021/Ac070832G  0.818
2007 Xiu Y, Zhu L, Hess DW, Wong CP. Hierarchical silicon etched structures for controlled hydrophobicity/superhydrophobicity. Nano Letters. 7: 3388-93. PMID 17929875 DOI: 10.1021/Nl0717457  0.813
2007 Zhu L, Hess DW, Wong C. Assembly of Fine-Pitch Carbon Nanotube Bundles for Electrical Interconnect Applications Mrs Proceedings. 990. DOI: 10.1557/Proc-0990-B10-01  0.699
2007 Wong C, Zhu L, Hess DW, Wong CP. Sol-Gel Process Derived Superhydrophobic Silica Thin Films for Antistiction of MEMS Devices Mrs Proceedings. 990. DOI: 10.1557/Proc-0990-B05-02  0.763
2007 Sinha A, Hess DW, Henderson CL. A novel top surface imaging approach utilizing direct area selective atomic layer deposition of hard masks Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.712458  0.652
2007 Sinha A, Hess DW, Henderson CL. Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1721-1728. DOI: 10.1116/1.2782546  0.589
2007 Simões AZ, Riccardi CS, Cavalcante LS, Longo E, Varela JA, Mizaikoff B, Hess DW. Ferroelectric fatigue endurance of Bi4−xLaxTi3O12 thin films explained in terms of x-ray photoelectron spectroscopy Journal of Applied Physics. 101: 084112. DOI: 10.1063/1.2719013  0.325
2007 Tamirisa PA, Levitin G, Kulkarni NS, Hess DW. Plasma etching of copper films at low temperature Microelectronic Engineering. 84: 105-108. DOI: 10.1016/J.Mee.2006.08.012  0.815
2007 Zhu L, Xu J, Xiao F, Jiang H, Hess DW, Wong C. The growth of carbon nanotube stacks in the kinetics-controlled regime Carbon. 45: 344-348. DOI: 10.1016/J.Carbon.2006.09.014  0.68
2006 Xiu Y, Zhu L, Hess DW, Wong CP. Biomimetic creation of hierarchical surface structures by combining colloidal self-assembly and Au sputter deposition. Langmuir : the Acs Journal of Surfaces and Colloids. 22: 9676-81. PMID 17073496 DOI: 10.1021/La061698I  0.81
2006 Zhu L, Xu J, Xiu Y, Sun Y, Hess DW, Wong CP. Electrowetting of aligned carbon nanotube films. The Journal of Physical Chemistry. B. 110: 15945-50. PMID 16898749 DOI: 10.1021/Jp063265U  0.813
2006 Zhu L, Hess DW, Wong CP. Monitoring carbon nanotube growth by formation of nanotube stacks and investigation of the diffusion-controlled kinetics. The Journal of Physical Chemistry. B. 110: 5445-9. PMID 16539482 DOI: 10.1021/Jp060027Q  0.706
2006 Zhu L, Sun Y, Hess DW, Wong CP. Well-aligned open-ended carbon nanotube architectures: an approach for device assembly. Nano Letters. 6: 243-7. PMID 16464043 DOI: 10.1021/Nl052183Z  0.695
2006 Kulkarni NS, Tamirisa P, Levitin G, Kasica RJ, Hess DW. Low Temperature Plasma Etching of Copper for Minimizing Size Effects in sub-100 nm Features Mrs Proceedings. 914. DOI: 10.1557/Proc-0914-F09-08  0.791
2006 Sinha A, Hess DW, Henderson CL. A top surface imaging method using area selective ALD on chemically amplified polymer photoresist films Electrochemical and Solid-State Letters. 9. DOI: 10.1149/1.2335939  0.651
2006 Levitin G, Timmons C, Hess DW. Photoresist and Etch Residue Removal Effect of Surface Energy and Interfacial Tension Journal of the Electrochemical Society. 153. DOI: 10.1149/1.2203096  0.43
2006 Sinha A, Hess DW, Henderson CL. Area-selective ALD of titanium dioxide using lithographically defined poly(methyl methacrylate) films Journal of the Electrochemical Society. 153. DOI: 10.1149/1.2184068  0.604
2006 Song I, Spuller M, Levitin G, Hess DW. Photoresist and Residue Removal Using Gas-Expanded Liquids Journal of the Electrochemical Society. 153: G314. DOI: 10.1149/1.2171824  0.74
2006 Luo Q, Dragomir-Cernatescu I, Snyder RL, Rees WS, Hess DW. Comparison of Nitrided HfO2 Films Deposited in O2 and N2O by Direct Liquid Injection CVD Journal of the Electrochemical Society. 153. DOI: 10.1149/1.2128119  0.401
2006 Sinha A, Hess DW, Henderson CL. Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 2523-2532. DOI: 10.1116/1.2359728  0.599
2006 Vaswani S, Koskinen J, Hess DW. Sorption and desorption behaviors of hexadecane vapors in plasma deposited fluorocarbon films using a quartz crystal microbalance Journal of Vacuum Science and Technology. 24: 1737-1745. DOI: 10.1116/1.2217981  0.766
2006 Tamirisa PA, Hess DW. Water and Moisture Uptake by Plasma Polymerized Thermoresponsive Hydrogel Films Macromolecules. 39: 7092-7097. DOI: 10.1021/Ma060944U  0.435
2006 Tamirisa PA, Koskinen J, Hess DW. Plasma polymerized hydrogel thin films Thin Solid Films. 515: 2618-2624. DOI: 10.1016/J.Tsf.2006.03.021  0.823
2006 Zhu L, Xu J, Xiu Y, Sun Y, Hess DW, Wong C. Growth and electrical characterization of high-aspect-ratio carbon nanotube arrays Carbon. 44: 253-258. DOI: 10.1016/J.Carbon.2005.07.037  0.788
2006 Zhu L, Xu J, Xiu Y, Hess DW, Wong CP. A rapid growth of aligned carbon nanotube films and high-aspect-ratio arrays Journal of Electronic Materials. 35: 195-199. DOI: 10.1007/Bf02692435  0.806
2006 Luo Q, Hess DW, Rees WS. Effect of oxidant on downstream microwave plasma enhanced CVD of hafnium oxynitride films Chemical Vapor Deposition. 12: 181-186. DOI: 10.1002/Cvde.200506440  0.413
2005 Diao J, Hess DW. Refractive index measurements of films with biaxial symmetry. 2. Determination of film thickness and refractive indices using polarized transmission spectra in the transparent wavelength range. The Journal of Physical Chemistry. B. 109: 12819-25. PMID 16852589 DOI: 10.1021/Jp0462761  0.626
2005 Diao J, Hess DW. Refractive index measurements of films with biaxial symmetry. 1. Determination of complex refractive indices using polarized reflectance/transmittance ratio. The Journal of Physical Chemistry. B. 109: 12800-18. PMID 16852588 DOI: 10.1021/Jp046277T  0.603
2005 Zhu L, Xiu Y, Hess DW, Wong CP. Aligned carbon nanotube stacks by water-assisted selective etching. Nano Letters. 5: 2641-5. PMID 16351229 DOI: 10.1021/Nl051906B  0.781
2005 Zhu L, Xiu Y, Xu J, Tamirisa PA, Hess DW, Wong CP. Superhydrophobicity on two-tier rough surfaces fabricated by controlled growth of aligned carbon nanotube arrays coated with fluorocarbon. Langmuir : the Acs Journal of Surfaces and Colloids. 21: 11208-12. PMID 16285792 DOI: 10.1021/La051410+  0.805
2005 Myneni S, Hess DW. Post Plasma Etch Residue Removal Using CO[sub 2]-Based Mixtures: Mechanistic Considerations Journal of the Electrochemical Society. 152: G757. DOI: 10.1149/1.2007147  0.735
2005 Levitin G, Hess DW. Ionic Conductivity of Elevated Pressure TMAHCO[sub 3]/MeOH/CO[sub 2] Mixtures Electrochemical and Solid-State Letters. 8: G23. DOI: 10.1149/1.1836116  0.363
2005 Spuller MT, Perchuk RS, Hess DW. Evaluating Photoresist Dissolution, Swelling, and Removal with an In Situ Film Refractive Index and Thickness Monitor Journal of the Electrochemical Society. 152: G40. DOI: 10.1149/1.1817716  0.794
2005 Myneni S, Peng HG, Gidley DW, Hess DW. Compatibility of high pressure cleaning mixtures with a porous low dielectric constant film: A positronium annihilation lifetime spectroscopic study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1463-1469. DOI: 10.1116/1.1941227  0.723
2005 Diao J, Hess DW. Through-plane uniformity of optical anisotropy in spin-coated biphenyl dianhydride-p-phenylenediamine films Thin Solid Films. 483: 226-231. DOI: 10.1016/J.Tsf.2004.11.246  0.63
2005 Vaswani S, Koskinen J, Hess DW. Surface modification of paper and cellulose by plasma-assisted deposition of fluorocarbon films Surface & Coatings Technology. 195: 121-129. DOI: 10.1016/J.Surfcoat.2004.10.013  0.79
2004 Timmons CL, Hess DW. Electrochemical Cleaning of Post-Plasma Etch Fluorocarbon Residues Using Reductive Radical Anion Chemistry Electrochemical and Solid-State Letters. 7: G302. DOI: 10.1149/1.1813211  0.359
2004 Levitin G, Myneni S, Hess DW. Post Plasma Etch Residue Removal Using CO[sub 2]-TMAHCO[sub 3] Mixtures: Comparison of Single-Phase and Two-Phase Mixtures Journal of the Electrochemical Society. 151: G380. DOI: 10.1149/1.1723503  0.712
2004 McCoy K, Hess DW, Henderson CL, Tolbert LM. Patterning via surface monolayer initiated polymerization: A study of surface initiator photoreaction kinetics Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3503-3508. DOI: 10.1116/1.1824061  0.381
2004 Mays EL, Hess DW, Rees WS. Deposition and characterization of zirconium tin titanate thin films as a potential high-k material for electronic devices Journal of Crystal Growth. 261: 309-315. DOI: 10.1016/J.Jcrysgro.2003.11.039  0.427
2004 Diao J, Hess DW. Use of angle-resolved XPS to determine depth profiles based on Fick's second law of diffusion: Description of method and simulation study Journal of Electron Spectroscopy and Related Phenomena. 135: 87-104. DOI: 10.1016/J.Elspec.2003.12.008  0.581
2003 Myneni S, Hess DW. Post-Plasma-Etch Residue Removal Using CO[sub 2]-Based Fluids Journal of the Electrochemical Society. 150: G744. DOI: 10.1149/1.1621879  0.723
2003 Spuller MT, Hess DW. Incomplete Wetting of Nanoscale Thin-Film Structures Journal of the Electrochemical Society. 150. DOI: 10.1149/1.1588303  0.776
2003 Levitin G, Myneni S, Hess DW. Reactions Between CO[sub 2] and Tetramethylammonium Hydroxide in Cleaning Solutions Electrochemical and Solid-State Letters. 6: G101. DOI: 10.1149/1.1583372  0.367
2003 Chavez KL, Hess DW. Removal of Resist Materials Using Acetic Acid Journal of the Electrochemical Society. 150: G284. DOI: 10.1149/1.1557085  0.353
2002 Henderson CL, Barstow S, Jeyakumar A, McCoy K, Hess DW, Tolbert LM. Novel approaches to nanopatterning: From surface monolayer initiated polymerization to hybrid organometallic-organic bilayers Materials Research Society Symposium - Proceedings. 705: 3-14. DOI: 10.1557/Proc-705-Y2.6  0.355
2002 Li Y, Hess DW. Plasma etching of thick polynorbornene layers for electronic packaging applications Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20: 2007. DOI: 10.1116/1.1506175  0.358
2002 Tanikella RV, Agraharam S, Allen SAB, Hess DW, Kohl PA. Moisture absorption studies of fluorocarbon films deposited from pentafluoroethane and octafluorocyclobutane plasmas Journal of Electronic Materials. 31: 1096-1103. DOI: 10.1007/S11664-002-0048-0  0.45
2001 Chavez KL, Hess DW. A Novel Method of Etching Copper Oxide Using Acetic Acid Journal of the Electrochemical Society. 148: G640. DOI: 10.1149/1.1409400  0.307
2001 Agraharam S, Hess DW, Kohl PA, Allen SAB. Electrical Properties and Temperature-Humidity Studies of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas Journal of the Electrochemical Society. 148. DOI: 10.1149/1.1366629  0.424
2001 Chavez KL, Bakker GL, Hess DW. Ion-implanted photoresist removal using water/carbon dioxide mixtures at elevated temperature and pressure Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19: 2144. DOI: 10.1116/1.1415519  0.337
2001 Chen X, Tolbert LM, Henderson CL, Hess DW, Ruhe J. Polymer pattern formation on SiO2 surfaces using surface monolayer initiated polymerization Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2013-2019. DOI: 10.1116/1.1409391  0.388
2001 Agraharam S, Hess DW, Kohl PA, Bidstrup Allen SA. Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomers Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 439-446. DOI: 10.1116/1.1354980  0.426
2001 Chen X, Tolbert LM, Hess DW, Henderson C. A Bergman Cyclization Approach to Polymers for Thin-Film Lithography Macromolecules. 34: 4104-4108. DOI: 10.1021/Ma002071O  0.343
2000 Kamal T, Hess DW. Photoresist Removal Using Low Molecular Weight Alcohols Journal of the Electrochemical Society. 147: 2749. DOI: 10.1149/1.1393600  0.358
2000 Agraharam S, Hess DW, Kohl PA, Bidstrup Allen SA. Thermal stability of fluorocarbon films deposited from pentafluoroethane/argon plasmas Journal of the Electrochemical Society. 147: 2665-2670. DOI: 10.1149/1.1393587  0.411
1999 Agraharam S, Hess DW, Kohl PA, Bidstrup Allen SA. Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 17: 3265-3271. DOI: 10.1116/1.582053  0.428
1998 Chen X, Tolbert LM, Ning ZY, Hess DW. Deposition and Etching of Amorphous Carbon Films Prepared by ECR-Plasma-Enhanced Benzene Chemical Vapor Deposition Mrs Proceedings. 555. DOI: 10.1557/Proc-555-315  0.453
1998 Kaluri SR, Hess DW. Nitrogen Incorporation in Thin Silicon Oxides in a  N 2 O  Plasma: Effects of Processing Conditions Journal of the Electrochemical Society. 145: 662-668. DOI: 10.1149/1.1838320  0.323
1998 Bakker GL, Hess DW. Surface Cleaning and Carbonaceous Film Removal Using High Pressure, High Temperature Water, and Water/ CO 2 Mixtures Journal of the Electrochemical Society. 145: 284-291. DOI: 10.1149/1.1838248  0.428
1997 Kaluri SR, Hess DW. Constant Current  N 2 O  Plasma Anodization of Silicon Journal of the Electrochemical Society. 144: 2200-2205. DOI: 10.1149/1.1837765  0.303
1996 Zhao Q, Lu HY, Hess DW. In Situ Infrared Studies of Polyvinyl Chloride Films Exposed to  H 2 /  O 2 / Ar Downstream Microwave Plasmas Journal of the Electrochemical Society. 143: 2896-2905. DOI: 10.1149/1.1837124  0.436
1996 Kaluri SR, Hess DW. Nitrogen incorporation in thin oxides by constant current N2O plasma anodization of silicon and N2 plasma nitridation of silicon oxides Applied Physics Letters. 69: 1053-1055. DOI: 10.1063/1.116928  0.312
1995 Bakker GL, Hess DW. Removal of Thermally Grown Silicon Dioxide Films Using Water at Elevated Temperature and Pressure Journal of the Electrochemical Society. 142: 3940-3944. DOI: 10.1149/1.2048438  0.444
1992 Bell SA, Hess DW. Radiation Damage to Thermal Silicon Dioxide Films in Radio Frequency and Microwave Downstream Photoresist Stripping Systems Journal of the Electrochemical Society. 139: 2904-2908. DOI: 10.1149/1.2069004  0.348
1992 Martz JC, Hess DW, Petersen EE. A generalized model of heat effects in surface reactions. II. Application to plasma etching reactions Journal of Applied Physics. 72: 3289-3293. DOI: 10.1063/1.351450  0.317
1992 Martz JC, Hess DW, Petersen EE. A generalized model of heat effects in surface reactions. I. Model development Journal of Applied Physics. 72: 3282-3288. DOI: 10.1063/1.351449  0.311
1990 Hess DW. Plasma material interactions Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 8: 1677-1684. DOI: 10.1116/1.576829  0.466
1989 Chiang JN, Hess DW. Plasma Deposited Silicon Nitride Film Chemistry Mrs Proceedings. 165. DOI: 10.1557/Proc-165-79  0.433
1988 Greene WM, Oldham WG, Hess DW. Comparison of low‐pressure and plasma‐enhanced chemical vapor deposited tungsten thin films Applied Physics Letters. 52: 1133-1135. DOI: 10.1063/1.99184  0.441
1988 Livengood RE, Petrich MA, Hess DW, Reimer JA. Structure and optical properties of plasma-deposited fluorinated silicon nitride thin films Journal of Applied Physics. 63: 2651-2659. DOI: 10.1063/1.341005  0.404
1984 Hess DW. Plasma‐enhanced CVD: Oxides, nitrides, transition metals, and transition metal silicides Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 2: 244-252. DOI: 10.1116/1.572734  0.397
1984 Flack WW, Soong DS, Bell AT, Hess DW. A mathematical model for spin coating of polymer resists Journal of Applied Physics. 56: 1199-1206. DOI: 10.1063/1.334049  0.36
1977 Hess DW. Effect of Chlorine on the Negative Bias Instability in MOS Structures Journal of the Electrochemical Society. 124: 740-743. DOI: 10.1149/1.2133397  0.307
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