Dnyanesh C. Tamboli, Ph.D. - Publications
Affiliations: | 2000 | University of Central Florida, Orlando, FL, United States |
Area:
Materials Science EngineeringYear | Citation | Score | |||
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2004 | Du T, Tamboli D, Desai V, Seal S. Mechanism of Copper Removal during CMP in Acidic H 2 O 2 Slurry Journal of the Electrochemical Society. 151. DOI: 10.1149/1.1648029 | 0.645 | |||
2004 | Du T, Tamboli D, Luo Y, Desai V. Electrochemical characterization of copper chemical mechanical planarization in KIO3 slurry Applied Surface Science. 229: 167-174. DOI: 10.1016/J.Apsusc.2004.01.062 | 0.629 | |||
2003 | Du T, Tamboli D, Desai V. Electrochemical characterization of copper chemical mechanical polishing Microelectronic Engineering. 69: 1-9. DOI: 10.1016/S0167-9317(03)00222-3 | 0.644 | |||
1999 | Tamboli D, Seal S, Desai V. XPS and electrochemical studies on tungsten-oxidizer interaction in chemical mechanical polishing Materials Research Society Symposium - Proceedings. 566: 89-95. DOI: 10.1557/Proc-566-89 | 0.47 | |||
1999 | Tamboli D, Seal S, Desai V, Maury A. Studies on passivation behavior of tungsten in application to chemical mechanical polishing Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 17: 1168-1173. DOI: 10.1116/1.581790 | 0.607 | |||
1998 | Desai VH, Tamboli DC, Cheruvu NS. Oxidation characteristics of Nickel based superalloys in steam Proceedings of the Asme Turbo Expo. 5. DOI: 10.1115/98-GT-587 | 0.529 | |||
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