Shiyu Sun, Ph.D.
Affiliations: | 2007 | Stanford University, Palo Alto, CA |
Area:
Photoemission spectroscopyGoogle:
"Shiyu Sun"Mean distance: 15.36 | S | N | B | C | P |
Parents
Sign in to add mentor| Piero Antonio Pianetta | grad student | 2007 | Stanford | |
| (Germanium surface cleaning, passivation, and initial oxidation.) | ||||
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Publications
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| Sun S, Liu X, Ma B, et al. (2016) The role of autoinducer-2 in aerobic granulation using alternating feed loadings strategy Bioresource Technology. 201: 58-64 |
| Toyoda S, Okabayashi J, Komatsu M, et al. (2010) Effects of Al doping and annealing on chemical states and band diagram of Y2 O3 /Si gate stacks studied by photoemission and x-ray absorption spectroscopy Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 16-19 |
| Toyoda S, Takahashi H, Kumigashira H, et al. (2009) Study on mechanism of crystallization in HfO2 films on Si substrates by in-depth profile analysis using photoemission spectroscopy Journal of Applied Physics. 106 |
| Sun Y, Liu Z, Sun S, et al. (2008) The effectiveness of HCl and HF cleaning of Si0.85Ge 0.15 surface Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 1248-1250 |
| Lee DI, Sun Y, Liu Z, et al. (2007) Angular dependence of the photoelectron energy distribution of InP(100) and GaAs(100) negative electron affinity photocathodes Applied Physics Letters. 91 |
| Lee DI, Sun Y, Liu Z, et al. (2007) The distribution of oxide species in the CsO activation layer on InP(100) negative electron affinity photocathodes Journal of Applied Physics. 102 |
| Sun S, Sun Y, Liu Z, et al. (2006) Roles of oxygen and water vapor in the oxidation of halogen terminated Ge(111) surfaces Applied Physics Letters. 89 |
| Sun S, Sun Y, Liu Z, et al. (2006) Surface termination and roughness of Ge(100) cleaned by HF and HCl solutions Applied Physics Letters. 88: 1-3 |
| Adhikari H, McIntyre PC, Sun S, et al. (2005) Photoemission studies of passivation of germanium nanowires Applied Physics Letters. 87: 1-3 |
| Toyoda S, Okabayashi J, Takahashi H, et al. (2005) Nitrogen doping and thermal stability in HfSiO xN y studied by photoemission and x-ray absorption spectroscopy Applied Physics Letters. 87: 1-3 |