Christian Keyser, Ph.D.
Affiliations: | 2003 | University of Central Florida, Orlando, FL, United States |
Area:
Fluid and Plasma Physics, Optics PhysicsGoogle:
"Christian Keyser"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Martin C. Richardson | grad student | 2003 | University of Central Florida | |
| (Optical and spectral characterization of the water droplet laser plasma extreme ultraviolet source.) | ||||
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| Lang J, Kent BJ, Paustian W, et al. (2006) Laboratory calibration of the Extreme-Ultraviolet Imaging Spectrometer for the Solar-B satellite. Applied Optics. 45: 8689-705 |
| Richardson M, Koay CS, Takenoshita K, et al. (2006) Laser plasma EUV sources based on droplet target technology Euv Sources For Lithography. 687-718 |
| Richardson M, Koay CS, Takenoshita K, et al. (2005) Diagnostics for laser plasma EUV sources Proceedings of Spie - the International Society For Optical Engineering. 5580: 434-442 |
| George S, Koay CS, Takenoshita K, et al. (2005) EUV spectroscopy of mass-limited Sn-doped laser microplasmas Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 779-788 |
| Al-Rabban M, Keyser C, George S, et al. (2005) Radiation transport modeling for Xe and Sn-doped droplet laser-plasma sources Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 769-778 |
| Richardson M, Koay CS, Takenoshita K, et al. (2004) Laser plasma EUVL sources - Progress and challenges Proceedings of Spie - the International Society For Optical Engineering. 5374: 447-453 |
| Richardson M, Koay CS, Keyser C, et al. (2004) High efficiency tin-based EUV sources Proceedings of Spie - the International Society For Optical Engineering. 5196: 119-127 |
| Richardson M, Koay C-, Takenoshita K, et al. (2004) High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography Journal of Vacuum Science & Technology B. 22: 785-790 |
| Richardson M, Koay CS, Takenoshita K, et al. (2004) High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 785-790 |
| Koay CS, Keyser C, Takenoshita K, et al. (2003) High conversion efficiency tin material laser plasma source for EUVL Proceedings of Spie - the International Society For Optical Engineering. 5037: 801-806 |