Christian Keyser, Ph.D.

Affiliations: 
2003 University of Central Florida, Orlando, FL, United States 
Area:
Fluid and Plasma Physics, Optics Physics
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"Christian Keyser"
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Martin C. Richardson grad student 2003 University of Central Florida
 (Optical and spectral characterization of the water droplet laser plasma extreme ultraviolet source.)
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Publications

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Lang J, Kent BJ, Paustian W, et al. (2006) Laboratory calibration of the extreme-ultraviolet imaging spectrometer for the solar-B satellite Applied Optics. 45: 8689-8705
Korendyke CM, Brown CM, Thomas RJ, et al. (2006) Optics and mechanisms for the extreme-ultraviolet imaging spectrometer on the solar-B satellite Applied Optics. 45: 8674-8688
Richardson M, Koay CS, Takenoshita K, et al. (2006) Laser plasma EUV sources based on droplet target technology Euv Sources For Lithography. 687-718
Richardson M, Koay CS, Takenoshita K, et al. (2005) Diagnostics for laser plasma EUV sources Proceedings of Spie - the International Society For Optical Engineering. 5580: 434-442
George S, Koay CS, Takenoshita K, et al. (2005) EUV spectroscopy of mass-limited Sn-doped laser microplasmas Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 779-788
Al-Rabban M, Keyser C, George S, et al. (2005) Radiation transport modeling for Xe and Sn-doped droplet laser-plasma sources Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 769-778
Richardson M, Koay CS, Takenoshita K, et al. (2004) Laser plasma EUVL sources - Progress and challenges Proceedings of Spie - the International Society For Optical Engineering. 5374: 447-453
Richardson M, Koay CS, Keyser C, et al. (2004) High efficiency tin-based EUV sources Proceedings of Spie - the International Society For Optical Engineering. 5196: 119-127
Richardson M, Koay CS, Takenoshita K, et al. (2004) High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 785-790
Koay CS, Keyser C, Takenoshita K, et al. (2003) High conversion efficiency tin material laser plasma source for EUVL Proceedings of Spie - the International Society For Optical Engineering. 5037: 801-806
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