Robert Bernath, Ph.D.

Affiliations: 
2007 University of Central Florida, Orlando, FL, United States 
Area:
Optics Physics, Electronics and Electrical Engineering
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Martin C. Richardson grad student 2007 University of Central Florida
 (High-intensity ultra-fast laser interaction technologies.)
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Publications

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Kamtaprasad R, Bernath R, Takenoshita K, et al. (2008) EUV spectroscopy of tin-doped laser plasma source Optics Infobase Conference Papers
George SA, Silfvast WT, Takenoshita K, et al. (2007) Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas. Optics Letters. 32: 997-9
Takenoshita K, George SA, Schmid T, et al. (2007) Characterization of the tin-doped droplet laser plasma EUVL sources for HVM Proceedings of Spie - the International Society For Optical Engineering. 6517
Schmid T, George SA, Cunado J, et al. (2007) High repetition-rate LPP-source facility for EUVL Proceedings of Spie - the International Society For Optical Engineering. 6517
Cunado J, Takenoshita K, George SA, et al. (2007) Stabilized droplet target delivery for high power EUV generation for lithography Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-Leos. 484-485
Brown CG, Bernath R, Fisher M, et al. (2006) Remote femtosecond Laser Induced Breakdown Spectroscopy (LIBS) in a standoff detection regime Proceedings of Spie - the International Society For Optical Engineering. 6219
Richardson M, Koay CS, Takenoshita K, et al. (2005) Diagnostics for laser plasma EUV sources Proceedings of Spie - the International Society For Optical Engineering. 5580: 434-442
George S, Koay CS, Takenoshita K, et al. (2005) EUV spectroscopy of mass-limited Sn-doped laser microplasmas Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 779-788
Koay CS, George S, Takenoshita K, et al. (2005) High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 279-292
Richardson M, Koay CS, Takenoshita K, et al. (2005) Efficient 13.5 nm EUV generation from a laser plasma Quantum Electronics and Laser Science Conference (Qels). 3: 1947-1949
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