Do-Joong Lee, Ph. D.
Affiliations: | 2007-2012 | Materials Science and Enigineering | Seoul National University, Seoul, South Korea |
| 2013-2016 | School of Engineering | Brown University, Providence, RI |
Area:
carbon, diamond nanowire, ALDGoogle:
"Do-Joong Lee"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Ki-Bum Kim | grad student | 2007-2012 | Seoul National University |
| Jimmy Xu | post-doc | 2013-2016 | Brown (E-Tree) |
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Publications
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| Kim M, Nabeya S, Han SM, et al. (2020) Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application. Acs Applied Materials & Interfaces |
| Mehmood T, Kim JH, Lee D, et al. (2020) Facile chemical tuning of thermoelectric power factor of graphene oxide Materials Chemistry and Physics. 254: 123488 |
| Mehmood T, Kim JH, Lee D, et al. (2020) A flexible, printable, thin-film thermoelectric generator based on reduced graphene oxide–carbon nanotubes composites Journal of Materials Science. 55: 10572-10581 |
| Lee S, Kim M, Cho SY, et al. (2019) Electrical properties of graphene/In2O3 bilayer with remarkable uniformity as transparent conducting electrode. Nanotechnology |
| Mehmood T, Kim JH, Lee D, et al. (2019) A microstructuring route to enhanced thermoelectric efficiency of reduced graphene oxide films Materials Research Express. 6: 075614 |
| Liu C, Xu J, Lee DJ, et al. (2016) Denitrifying sulfide removal process on high-tetracycline wastewater. Bioresource Technology |
| Kim JB, Kim S, Han WS, et al. (2016) Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 34: 041504 |
| Lee SJ, Kim SH, Saito M, et al. (2016) Plasma-free atomic layer deposition of Ru thin films using H2 molecules as a nonoxidizing reactant Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 34 |
| Kim JB, Jang B, Lee HJ, et al. (2016) A controlled growth of WNx and WCx thin films prepared by atomic layer deposition Materials Letters. 168: 218-222 |
| Jang Y, Kim JB, Hong TE, et al. (2016) Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu Journal of Alloys and Compounds. 663: 651-658 |