Eric A. Joseph
Affiliations: | 2000 | State University of New York, Albany, Albany, NY, United States |
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Publications
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Walton SG, Boris DR, Rosenberg SG, et al. (2021) Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films Journal of Vacuum Science & Technology A. 39: 033002 |
Pranda A, Lin K, Engelmann S, et al. (2020) Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist Journal of Vacuum Science and Technology. 38: 52601 |
Collins J, de Souza JP, Lee YS, et al. (2020) Fundamentals, impedance, and performance of solid-state Li-metal microbatteries Journal of Vacuum Science & Technology A. 38: 033212 |
Lin K, Li C, Engelmann S, et al. (2020) Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition Journal of Vacuum Science & Technology A. 38: 032601 |
Lin K, Li C, Engelmann S, et al. (2018) Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors Journal of Vacuum Science & Technology A. 36: 040601 |
Marchack N, Miyazoe H, Bruce RL, et al. (2018) Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 36: 031801 |
Miyazoe H, Marchack N, Bruce RL, et al. (2018) Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 36: 032201 |
Metzler D, Li C, Engelmann S, et al. (2017) Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma. The Journal of Chemical Physics. 146: 052801 |
Wang C, Nam SW, Cotte JM, et al. (2017) Wafer-scale integration of sacrificial nanofluidic chips for detecting and manipulating single DNA molecules. Nature Communications. 8: 14243 |
Engelmann SU, Bruce RL, Joseph EA, et al. (2017) Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35: 051803 |