Year |
Citation |
Score |
2015 |
Xu L, Chou S, Wang J, Shao C, Li W, Zhu X, Shan A. Antimicrobial activity and membrane-active mechanism of tryptophan zipper-like β-hairpin antimicrobial peptides. Amino Acids. PMID 26088720 DOI: 10.1007/s00726-015-2029-7 |
0.424 |
|
2015 |
Chen H, Zhang Q, Chou SY. Patterning of light-extraction nanostructures on sapphire substrates using nanoimprint and ICP etching with different masking materials. Nanotechnology. 26: 085302. PMID 25648720 DOI: 10.1088/0957-4484/26/8/085302 |
0.407 |
|
2014 |
Dong N, Zhu X, Chou S, Shan A, Li W, Jiang J. Antimicrobial potency and selectivity of simplified symmetric-end peptides. Biomaterials. 35: 8028-39. PMID 24952979 DOI: 10.1016/j.biomaterials.2014.06.005 |
0.433 |
|
2014 |
Wang C, Zhang Q, Song Y, Chou SY. Plasmonic bar-coupled dots-on-pillar cavity antenna with dual resonances for infrared absorption and sensing: performance and nanoimprint fabrication. Acs Nano. 8: 2618-24. PMID 24552132 DOI: 10.1021/Nn406281U |
0.386 |
|
2014 |
Mills E, Cannarella J, Zhang Q, Bhadra S, Arnold CB, Chou SY. Silicon nanopillar anodes for lithium-ion batteries using nanoimprint lithography with flexible molds Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 32. DOI: 10.1116/1.4901878 |
0.346 |
|
2014 |
Ding W, Wang Y, Chen H, Chou SY. Plasmonic nanocavity organic light-emitting diode with significantly enhanced light extraction, contrast, viewing angle, brightness, and low-glare Advanced Functional Materials. 24: 6329-6339. DOI: 10.1002/Adfm.201400964 |
0.302 |
|
2013 |
Chou SY, Ding W. Ultrathin, high-efficiency, broad-band, omni-acceptance, organic solar cells enhanced by plasmonic cavity with subwavelength hole array. Optics Express. 21: A60-76. PMID 23389276 DOI: 10.1364/Oe.21.000A60 |
0.364 |
|
2013 |
Smith CJ, Li WD, Wysocki G, Chou SY. Electric current tuning the self-oscillation frequency of EC-VCSELs Ieee Photonics Technology Letters. 25: 1707-1710. DOI: 10.1109/Lpt.2013.2273076 |
0.509 |
|
2012 |
Wang C, Chou SY. Integration of Metallic Nanostructures in Fluidic Channels for Fluorescence and Raman Enhancement by Nanoimprint Lithography and Lift-off on Compositional Resist Stack. Microelectronic Engineering. 98: 693-697. PMID 23175593 DOI: 10.1016/J.Mee.2012.05.051 |
0.356 |
|
2012 |
Li WD, Liang X, Chou SY. Nanoscale negative-tone quantized patterning by novel selective electrochemical etching of a nanoimprinted sub-200 nm bimetallic tile array. Nanotechnology. 23: 355303. PMID 22895113 DOI: 10.1088/0957-4484/23/35/355303 |
0.694 |
|
2012 |
Zhang W, Ding F, Li WD, Wang Y, Hu J, Chou SY. Giant and uniform fluorescence enhancement over large areas using plasmonic nanodots in 3D resonant cavity nanoantenna by nanoimprinting. Nanotechnology. 23: 225301. PMID 22571971 DOI: 10.1088/0957-4484/23/22/225301 |
0.522 |
|
2012 |
Hu J, Li WD, Chou SY. Blocker size effects on extraordinary light transmission through subwavelength holes in opaque thin metal film 2012 Conference On Lasers and Electro-Optics, Cleo 2012. |
0.497 |
|
2011 |
Li WD, Hu J, Chou SY. Extraordinary light transmission through opaque thin metal film with subwavelength holes blocked by metal disks. Optics Express. 19: 21098-108. PMID 21997118 DOI: 10.1364/Oe.19.021098 |
0.534 |
|
2011 |
Wang C, Morton KJ, Fu Z, Li WD, Chou SY. Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding. Nanotechnology. 22: 445301. PMID 21975519 DOI: 10.1088/0957-4484/22/44/445301 |
0.746 |
|
2011 |
Li WD, Ding F, Hu J, Chou SY. Three-dimensional cavity nanoantenna coupled plasmonic nanodots for ultrahigh and uniform surface-enhanced Raman scattering over large area. Optics Express. 19: 3925-36. PMID 21369218 DOI: 10.1364/Oe.19.003925 |
0.57 |
|
2011 |
Smith CJ, Li WD, Wysocki G, Chou SY. Drive-current tuning of self-oscillation frequency of external cavity VCSEL Optics Infobase Conference Papers. |
0.452 |
|
2010 |
Wang C, Xia Q, Li WD, Fu Z, Morton KJ, Chou SY. Fabrication of a 60-nm-diameter perfectly round metal-dot array over a large area on a plastic substrate using nanoimprint lithography and self-perfection by liquefaction. Small (Weinheim An Der Bergstrasse, Germany). 6: 1242-7. PMID 20449853 DOI: 10.1002/Smll.201000104 |
0.802 |
|
2010 |
Li WD, Chou SY. Solar-blind deep-UV band-pass filter (250 - 350 nm) consisting of a metal nano-grid fabricated by nanoimprint lithography. Optics Express. 18: 931-7. PMID 20173915 DOI: 10.1364/Oe.18.000931 |
0.601 |
|
2010 |
Cui B, Keimel C, Chou SY. Ultrafast direct imprinting of nanostructures in metals by pulsed laser melting. Nanotechnology. 21: 045303. PMID 20009206 DOI: 10.1088/0957-4484/21/4/045303 |
0.508 |
|
2010 |
Morton K, Tsui OKC, Tung CK, Sturm JC, Chou SY, Austin R. The anti-lotus leaf effect in nanohydrodynamic bump arrays New Journal of Physics. 12. DOI: 10.1088/1367-2630/12/8/085008 |
0.68 |
|
2010 |
Xia Q, Chou SY. Applications of excimer laser in nanofabrication Applied Physics a: Materials Science and Processing. 98: 9-59. DOI: 10.1007/S00339-009-5455-0 |
0.425 |
|
2010 |
Hu J, Li WD, Ding F, Chou SY. Effects of nanodots on surface plasmons and electric field enhancement in nano-pillar antenna array Optics Infobase Conference Papers. |
0.472 |
|
2010 |
Bentil EN, Li WD, Chen J, Ritter AM, Chou SY, Gmachl CF. InGaAs/InP subwavelength grating filters for the mid-infrared Optics Infobase Conference Papers. |
0.516 |
|
2010 |
Bentil EN, Li WD, Chen J, Ritter AM, Chou SY, Gmachl CF. InGaAs/InP subwavelength grating filters for the mid-infrared Optics Infobase Conference Papers. |
0.445 |
|
2009 |
Liang Y, Murphy P, Li WD, Chou SY. Self-limited self-perfection by liquefaction for sub-20 nm trench/line fabrication. Nanotechnology. 20: 465305. PMID 19847024 DOI: 10.1088/0957-4484/20/46/465305 |
0.734 |
|
2009 |
Xia Q, Murphy PF, Gao H, Chou SY. Ultrafast and selective reduction of sidewall roughness in silicon waveguides using self-perfection by liquefaction. Nanotechnology. 20: 345302. PMID 19652285 DOI: 10.1088/0957-4484/20/34/345302 |
0.737 |
|
2009 |
Xia Q, Chou SY. The fabrication of periodic metal nanodot arrays through pulsed laser melting induced fragmentation of metal nanogratings. Nanotechnology. 20: 285310. PMID 19546488 DOI: 10.1088/0957-4484/20/28/285310 |
0.691 |
|
2009 |
Peng C, Liang X, Chou SY. A novel method for fabricating sub-16 nm footprint T-gate nanoimprint molds. Nanotechnology. 20: 185302. PMID 19420609 DOI: 10.1088/0957-4484/20/18/185302 |
0.675 |
|
2009 |
Chou SY, Li WD, Liang X. Quantized patterning using nanoimprinted blanks. Nanotechnology. 20: 155303. PMID 19420545 DOI: 10.1088/0957-4484/20/15/155303 |
0.706 |
|
2009 |
Li W, Chou S, Khullar A, Gerratana B. Cloning and characterization of the biosynthetic gene cluster for tomaymycin, an SJG-136 monomeric analog. Applied and Environmental Microbiology. 75: 2958-63. PMID 19270147 DOI: 10.1128/Aem.02325-08 |
0.406 |
|
2009 |
Li W, Khullar A, Chou S, Sacramo A, Gerratana B. Biosynthesis of sibiromycin, a potent antitumor antibiotic. Applied and Environmental Microbiology. 75: 2869-78. PMID 19270142 DOI: 10.1128/Aem.02326-08 |
0.426 |
|
2009 |
Wang C, Chou SY. Self-aligned fabrication of 10 nm wide asymmetric trenches for Si/SiGe heterojunction tunneling field effect transistors using nanoimprint lithography, shadow evaporation, and etching Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2790-2794. DOI: 10.1116/1.3237138 |
0.434 |
|
2009 |
Smith CJ, Li WD, Bai S, Chou SY. High frequency polarization switching VCSEL clock using subwavelength quarter-wave plate Optics Infobase Conference Papers. |
0.468 |
|
2008 |
Xia Q, Chou SY. Fabrication of sub-25 nm diameter pillar nanoimprint molds with smooth sidewalls using self-perfection by liquefaction and reactive ion etching. Nanotechnology. 19: 455301. PMID 21832766 DOI: 10.1088/0957-4484/19/45/455301 |
0.716 |
|
2008 |
Cui B, Wu L, Chou SY. Fabrication of high aspect ratio metal nanotips by nanosecond pulse laser melting. Nanotechnology. 19: 345303. PMID 21730645 DOI: 10.1088/0957-4484/19/34/345303 |
0.511 |
|
2008 |
Morton KJ, Nieberg G, Bai S, Chou SY. Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching. Nanotechnology. 19: 345301. PMID 21730643 DOI: 10.1088/0957-4484/19/34/345301 |
0.799 |
|
2008 |
Xia Q, Morton KJ, Austin RH, Chou SY. Sub-10 nm self-enclosed self-limited nanofluidic channel arrays. Nano Letters. 8: 3830-3. PMID 18939885 DOI: 10.1021/Nl802219B |
0.795 |
|
2008 |
Morton KJ, Loutherback K, Inglis DW, Tsui OK, Sturm JC, Chou SY, Austin RH. Crossing microfluidic streamlines to lyse, label and wash cells. Lab On a Chip. 8: 1448-53. PMID 18818798 DOI: 10.1039/B805614E |
0.669 |
|
2008 |
Chou SY, Xia Q. Improved nanofabrication through guided transient liquefaction. Nature Nanotechnology. 3: 295-300. PMID 18654527 DOI: 10.1038/Nnano.2008.95 |
0.719 |
|
2008 |
Wang Y, Liang X, Liang Y, Chou SY. Sub-10-nm wide trench, line, and hole fabrication using pressed self-perfection. Nano Letters. 8: 1986-90. PMID 18540656 DOI: 10.1021/Nl801030C |
0.73 |
|
2008 |
Morton KJ, Loutherback K, Inglis DW, Tsui OK, Sturm JC, Chou SY, Austin RH. Hydrodynamic metamaterials: microfabricated arrays to steer, refract, and focus streams of biomaterials. Proceedings of the National Academy of Sciences of the United States of America. 105: 7434-8. PMID 18495920 DOI: 10.1073/Pnas.0712398105 |
0.661 |
|
2008 |
Liang X, Chou SY. Nanogap detector inside nanofluidic channel for fast real-time label-free DNA analysis. Nano Letters. 8: 1472-6. PMID 18416580 DOI: 10.1021/Nl080473K |
0.529 |
|
2008 |
Morton KJ, Loutherback K, Inglis DW, Sturm JC, Austin RH, Chou SY. Crossing streamlines to lyse cells and simultaneously separate genomic contents 12th International Conference On Miniaturized Systems For Chemistry and Life Sciences - the Proceedings of Microtas 2008 Conference. 1965-1967. |
0.609 |
|
2007 |
Pease LF, Deshpande P, Wang Y, Russel WB, Chou SY. Self-formation of sub-60-nm half-pitch gratings with large areas through fracturing Nature Nanotechnology. 2: 545-548. PMID 18654365 DOI: 10.1038/Nnano.2007.264 |
0.394 |
|
2007 |
Liang X, Morton KJ, Austin RH, Chou SY. Single sub-20 nm wide, centimeter-long nanofluidic channel fabricated by novel nanoimprint mold fabrication and direct imprinting. Nano Letters. 7: 3774-80. PMID 17973537 DOI: 10.1021/Nl072253X |
0.751 |
|
2007 |
Peng C, Liang X, Fu Z, Chou SY. High fidelity fabrication of microlens arrays by nanoimprint using conformal mold duplication and low-pressure liquid material curing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 410-414. DOI: 10.1116/1.2713405 |
0.662 |
|
2007 |
Chang ASP, Morton KJ, Tan H, Murphy PF, Wu W, Chou SY. Tunable liquid crystal-resonant grating filter fabricated by nanoimprint lithography Ieee Photonics Technology Letters. 19: 1457-1459. DOI: 10.1109/Lpt.2007.903719 |
0.669 |
|
2007 |
Chang ASP, Tan H, Bai S, Wu W, Yu Z, Chou SY. Tunable external cavity laser with a liquid-crystal subwavelength resonant grating filter as wavelength-selective mirror Ieee Photonics Technology Letters. 19: 1099-1101. DOI: 10.1109/Lpt.2007.899437 |
0.519 |
|
2007 |
Li WD, Chou SY. Large-area metal grid ultraviolet filter fabricated by nanoimprint lithography Conference On Lasers and Electro-Optics, 2007, Cleo 2007. DOI: 10.1109/CLEO.2007.4452830 |
0.543 |
|
2007 |
Yu Z, Gao H, Chou SY. RIMS (real-time imprint monitoring by scattering of light) study of pressure, temperature and resist effects on nanoimprint lithography Nanotechnology. 18. DOI: 10.1088/0957-4484/18/6/065304 |
0.584 |
|
2007 |
Liang X, Tan H, Fu Z, Chou SY. Air bubble formation and dissolution in dispensing nanoimprint lithography Nanotechnology. 18. DOI: 10.1088/0957-4484/18/2/025303 |
0.498 |
|
2007 |
Murphy PF, Morton KJ, Fu Z, Chou SY. Nanoimprint mold fabrication and replication by room-temperature conformal chemical vapor deposition Applied Physics Letters. 90. DOI: 10.1063/1.2741122 |
0.709 |
|
2007 |
Cui B, Yu Z, Ge H, Chou SY. Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling Applied Physics Letters. 90. DOI: 10.1063/1.2390652 |
0.652 |
|
2007 |
Liang X, Fu Z, Chou SY. Graphene transistors fabricated via transfer-printing in device active-areas on large wafer Nano Letters. 7: 3840-3844. DOI: 10.1021/Nl072566S |
0.539 |
|
2007 |
Crnogorac F, Witte DJ, Xia Q, Rajendran B, Pickard DS, Liu Z, Mehta A, Sharma S, Yasseri A, Kamins TI, Chou SY, Pease RFW. Nano-graphoepitaxy of semiconductors for 3D integration Microelectronic Engineering. 84: 891-894. DOI: 10.1016/J.Mee.2007.01.067 |
0.361 |
|
2006 |
Li N, Wu W, Chou SY. Sub-20-nm alignment in nanoimprint lithography using Moiré fringe. Nano Letters. 6: 2626-9. PMID 17090103 DOI: 10.1021/Nl0603395 |
0.616 |
|
2006 |
Gao H, Tan H, Zhang W, Morton K, Chou SY. Air cushion press for excellent uniformity, high yield, and fast nanoimprint across a 100 mm field. Nano Letters. 6: 2438-41. PMID 17090070 DOI: 10.1021/Nl0615118 |
0.725 |
|
2006 |
Davis JA, Inglis DW, Morton KJ, Lawrence DA, Huang LR, Chou SY, Sturm JC, Austin RH. Deterministic hydrodynamics: taking blood apart. Proceedings of the National Academy of Sciences of the United States of America. 103: 14779-84. PMID 17001005 DOI: 10.1073/Pnas.0605967103 |
0.643 |
|
2006 |
Bakajin O, Fountain E, Morton K, Chou SY, Sturm JC, Austin RH. Materials aspects in micro- and nanofluidic systems applied to biology Mrs Bulletin. 31: 108-113. DOI: 10.1557/Mrs2006.24 |
0.657 |
|
2006 |
Yasseri AA, Sharma S, Kamins TI, Xia Q, Chou SY, Pease RFW. Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO 2 templates Applied Physics Letters. 89. DOI: 10.1063/1.2360920 |
0.312 |
|
2006 |
Xia Q, Yu Z, Gao H, Chou SY. In situ real time monitoring of nanosecond imprint process Applied Physics Letters. 89. DOI: 10.1063/1.2335952 |
0.59 |
|
2006 |
Kamins TI, Yasseri AA, Sharma S, Pease RFW, Xia Q, Chou SY. Effect of nanoimprinted surface relief on Si and Ge nucleation and ordering Microelectronics Journal. 37: 1481-1485. DOI: 10.1016/J.Mejo.2006.05.023 |
0.306 |
|
2006 |
Cui B, Wu W, Keimel C, Chou SY. Filling of nano-via holes by laser-assisted direct imprint Microelectronic Engineering. 83: 1547-1550. DOI: 10.1016/J.Mee.2006.01.087 |
0.529 |
|
2006 |
Morton KJ, Sturm JC, Austin RH, Chou SY. Nanoimprinted fluidic device for continuous separation of nanoparticles Micro Total Analysis Systems - Proceedings of Microtas 2006 Conference: 10th International Conference On Miniaturized Systems For Chemistry and Life Sciences. 1014-1016. |
0.633 |
|
2005 |
Reisner W, Morton KJ, Riehn R, Wang YM, Yu Z, Rosen M, Sturm JC, Chou SY, Frey E, Austin RH. Statics and dynamics of single DNA molecules confined in nanochannels. Physical Review Letters. 94: 196101. PMID 16090189 DOI: 10.1103/Physrevlett.94.196101 |
0.717 |
|
2005 |
Liang X, Zhang W, Li M, Xia Q, Wu W, Ge H, Huang X, Chou SY. Electrostatic force-assisted nanoimprint lithography (EFAN). Nano Letters. 5: 527-30. PMID 15755108 DOI: 10.1021/Nl0480161 |
0.768 |
|
2005 |
Chen L, Zhuang L, Deshpande P, Chou S. Novel polymer patterns formed by lithographically induced self-assembly (LISA). Langmuir : the Acs Journal of Surfaces and Colloids. 21: 818-21. PMID 15667153 DOI: 10.1021/La047674Y |
0.567 |
|
2005 |
Reisner WW, Morton K, Riehn R, Wang YM, Chou S, Austin RH. DNA statics and dynamics in nanoscale confinement Proceedings of Spie - the International Society For Optical Engineering. 5592: 193-200. DOI: 10.1117/12.570565 |
0.615 |
|
2005 |
Austin MD, Zhang W, Ge H, Wasserman D, Lyon SA, Chou SY. 6 nm half-pitch lines and 0.04 νm 2 static random access memory patterns by nanoimprint lithography Nanotechnology. 16: 1058-1061. DOI: 10.1088/0957-4484/16/8/010 |
0.403 |
|
2004 |
Tegenfeldt JO, Prinz C, Cao H, Chou S, Reisner WW, Riehn R, Wang YM, Cox EC, Sturm JC, Silberzan P, Austin RH. From the Cover: The dynamics of genomic-length DNA molecules in 100-nm channels. Proceedings of the National Academy of Sciences of the United States of America. 101: 10979-83. PMID 15252203 DOI: 10.1073/Pnas.0403849101 |
0.301 |
|
2004 |
Yu Z, Gao H, Chou SY. In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry Applied Physics Letters. 85: 4166-4168. DOI: 10.1063/1.1811396 |
0.586 |
|
2004 |
Austin MD, Ge H, Wu W, Li M, Yu Z, Wasserman D, Lyon SA, Chou SY. Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography Applied Physics Letters. 84: 5299-5301. DOI: 10.1063/1.1766071 |
0.657 |
|
2004 |
Yu Z, Chou SY. Triangular Profile Imprint Molds in Nanograting Fabrication Nano Letters. 4: 341-344. DOI: 10.1021/Nl034947L |
0.559 |
|
2003 |
Yu Z, Gao H, Wu W, Ge H, Chou SY. Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff Journal of Vacuum Science & Technology B. 21: 2874-2877. DOI: 10.1116/1.1619958 |
0.663 |
|
2003 |
Yu Z, Chen L, Wu W, Ge H, Chou SY. Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography Journal of Vacuum Science & Technology B. 21: 2089-2092. DOI: 10.1116/1.1609471 |
0.55 |
|
2003 |
Li M, Tan H, Chen L, Wang J, Chou SY. Large area direct nanoimprinting of SiO[sub 2]–TiO[sub 2] gel gratings for optical applications Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 660. DOI: 10.1116/1.1545736 |
0.533 |
|
2003 |
Lei X, Wu L, Deshpande P, Yu Z, Wu W, Ge H, Chou SY. 100 nm period gratings produced by lithographically induced self-construction Nanotechnology. 14: 786-790. DOI: 10.1088/0957-4484/14/7/315 |
0.568 |
|
2003 |
Xia Q, Keimel C, Ge H, Yu Z, Wu W, Chou SY. Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography Applied Physics Letters. 83: 4417-4419. DOI: 10.1063/1.1630162 |
0.551 |
|
2003 |
Wu W, Gu J, Ge H, Keimel C, Chou SY. Room-temperature Si single-electron memory fabricated by nanoimprint lithography Applied Physics Letters. 83: 2268-2270. DOI: 10.1063/1.1610814 |
0.478 |
|
2003 |
Zhang W, Chou SY. Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels Applied Physics Letters. 83: 1632-1634. DOI: 10.1063/1.1600505 |
0.423 |
|
2003 |
Austin MD, Chou SY. Fabrication of a Molecular Self-Assembled Monolayer Diode Using Nanoimprint Lithography Nano Letters. 3: 1687-1690. DOI: 10.1021/Nl034831P |
0.379 |
|
2002 |
Chou SY, Keimel C, Gu J. Ultrafast and direct imprint of nanostructures in silicon. Nature. 417: 835-7. PMID 12075347 DOI: 10.1038/Nature00792 |
0.547 |
|
2002 |
Rokhinson LP, Guo LJ, Chou SY, Tsui DC, Eisenberg E, Berkovits R, Altshuler BL. Coherent electron transport in a Si quantum dot dimer. Physical Review Letters. 88: 186801. PMID 12005708 DOI: 10.1103/Physrevlett.88.186801 |
0.486 |
|
2002 |
Austin M, Chou SY. Fabrication of nanocontacts for molecular devices using nanoimprint lithography Journal of Vacuum Science & Technology B. 20: 665-667. DOI: 10.1116/1.1463068 |
0.436 |
|
2002 |
Austin RH, Tegenfeldt JO, Cao H, Chou SY, Cox EC. Scanning the controls: Genomics and nanotechnology Ieee Transactions On Nanotechnology. 1: 12-17. DOI: 10.1109/Tnano.2002.1005422 |
0.3 |
|
2002 |
Li M, Chen L, Zhang W, Chou SY. Pattern transfer fidelity of nanoimprint lithography on six-inch wafers Nanotechnology. 14: 33-36. DOI: 10.1088/0957-4484/14/1/308 |
0.509 |
|
2002 |
Austin MD, Chou SY. Fabrication of 70 nm channel length polymer organic thin-film transistors using nanoimprint lithography Applied Physics Letters. 81: 4431-4433. DOI: 10.1063/1.1526457 |
0.367 |
|
2002 |
Gu J, Chou SY, Yao N, Zandbergen H, Farrer JK. Single-crystal Si formed on amorphous substrate at low temperature by nanopatterning and nickel-induced lateral crystallization Applied Physics Letters. 81: 1104-1106. DOI: 10.1063/1.1498146 |
0.461 |
|
2002 |
Cao H, Yu Z, Wang J, Tegenfeldt JO, Austin RH, Chen E, Wu W, Chou SY. Fabrication of 10 nm enclosed nanofluidic channels Applied Physics Letters. 81: 174-176. DOI: 10.1063/1.1489102 |
0.564 |
|
2002 |
Feng J, Cui B, Zhan Y, Chou SY. Flexible metal film with micro- and nanopatterns transferred by electrochemical deposition Electrochemistry Communications. 4: 102-104. DOI: 10.1016/S1388-2481(01)00282-X |
0.455 |
|
2001 |
Rokhinson LP, Guo LJ, Chou SY, Tsui DC. Magnetically induced reconstruction of the ground state in a few-electron Si quantum dot. Physical Review Letters. 87: 166802. PMID 11690224 DOI: 10.1103/Physrevlett.87.166802 |
0.5 |
|
2001 |
Chou SY. Nanoimprint Lithography and Lithographically Induced Self-Assembly Mrs Bulletin. 26: 512-517. DOI: 10.1557/Mrs2001.122 |
0.303 |
|
2001 |
Deshpande P, Chou SY. Lithographically induced self-assembly of microstructures with a liquid-filled gap between the mask and polymer surface Journal of Vacuum Science & Technology B. 19: 2741-2744. DOI: 10.1116/1.1414015 |
0.321 |
|
2001 |
Yu Z, Wu W, Chen L, Chou SY. Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications Journal of Vacuum Science & Technology B. 19: 2816-2819. DOI: 10.1116/1.1409384 |
0.588 |
|
2001 |
Deshpande P, Sun X, Chou SY. Observation of dynamic behavior of lithographically induced self-assembly of supramolecular periodic pillar arrays in a homopolymer film Applied Physics Letters. 79: 1688-1690. DOI: 10.1063/1.1398616 |
0.312 |
|
2001 |
Zhang W, Chou SY. Multilevel nanoimprint lithography with submicron alignment over 4 in. Si wafers Applied Physics Letters. 79: 845-847. DOI: 10.1063/1.1391400 |
0.332 |
|
2001 |
Li M, Chen L, Chou SY. Direct three-dimensional patterning using nanoimprint lithography Applied Physics Letters. 78: 3322-3324. DOI: 10.1063/1.1375006 |
0.516 |
|
2000 |
Yu Z, Deshpande P, Wu W, Wang J, Chou SY. Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography Applied Physics Letters. 77: 927-929. DOI: 10.1063/1.1288674 |
0.523 |
|
2000 |
Wang J, Sun X, Chen L, Zhuang L, Chou SY. Molecular alignment in submicron patterned polymer matrix using nanoimprint lithography Applied Physics Letters. 77: 166-168. DOI: 10.1063/1.126912 |
0.563 |
|
2000 |
Rokhinson LP, Guo LJ, Chou SY, Tsui DC. Double-dot charge transport in Si single-electron/hole transistors Applied Physics Letters. 76: 1591-1593. DOI: 10.1063/1.126105 |
0.308 |
|
2000 |
Li M, Wang J, Zhuang L, Chou SY. Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography Applied Physics Letters. 76: 673-675. DOI: 10.1063/1.125896 |
0.675 |
|
2000 |
Rokhinson LP, Guo LJ, Chou SY, Tsui DC. Formation of unintentional dots in small Si nanostructures Superlattices and Microstructures. 28: 413-417. DOI: 10.1006/Spmi.2000.0942 |
0.499 |
|
1999 |
Chou SY, Zhuang L. Lithographically induced self-assembly of periodic polymer micropillar arrays Journal of Vacuum Science & Technology B. 17: 3197-3202. DOI: 10.1116/1.590979 |
0.575 |
|
1999 |
Wang J, Schablitsky S, Yu Z, Wu W, Chou SY. Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography Journal of Vacuum Science & Technology B. 17: 2957-2960. DOI: 10.1116/1.590933 |
0.564 |
|
1999 |
Rokhinson LP, Guo LJ, Chou SY, Tsui DC. Kondo-like zero-bias anomaly in electronic transport through an ultrasmall si quantum dot Physical Review B. 60. DOI: 10.1103/Physrevb.60.R16319 |
0.304 |
|
1999 |
Cui B, Wu W, Kong L, Sun X, Chou SY. Perpendicular quantized magnetic disks with 45 Gbits on a 4×4 cm2 area Journal of Applied Physics. 85: 5534-5536. DOI: 10.1063/1.369885 |
0.472 |
|
1999 |
Kong L, Pan Q, Cui B, Li M, Chou SY. Magnetotransport and domain structures in nanoscale NiFe/Cu/Co spin valve Journal of Applied Physics. 85: 5492-5494. DOI: 10.1063/1.369872 |
0.585 |
|
1999 |
Wang J, Sun X, Chen L, Chou SY. Direct Nanoimprint Of Submicron Organic Light-Emitting Structures Applied Physics Letters. 75: 2767-2769. DOI: 10.1063/1.125143 |
0.317 |
|
1999 |
Chou SY, Zhuang L, Guo L. Lithographically induced self-construction of polymer microstructures for resistless patterning Applied Physics Letters. 75: 1004-1006. DOI: 10.1063/1.124579 |
0.568 |
|
1999 |
Yu Z, Schablitsky SJ, Chou SY. Nanoscale GaAs metal–semiconductor–metal photodetectors fabricated using nanoimprint lithography Applied Physics Letters. 74: 2381-2383. DOI: 10.1063/1.123858 |
0.506 |
|
1999 |
Kamins TI, Ohlberg DAA, Williams RS, Zhang W, Chou SY. Positioning of self-assembled, single-crystal, germanium islands by silicon nanoimprinting Applied Physics Letters. 74: 1773-1775. DOI: 10.1063/1.123683 |
0.337 |
|
1998 |
Kong L, Zhuang L, Li M, Cui B, Chou SY. Fabrication, Writing, and Reading of 10 Gbits/in2 Longitudinal Quantized Magnetic Disks with a Switching Field over 1000 Oe Japanese Journal of Applied Physics. 37: 5973-5975. DOI: 10.1143/Jjap.37.5973 |
0.693 |
|
1998 |
Sun X, Zhuang L, Zhang W, Chou SY. Multilayer resist methods for nanoimprint lithography on nonflat surfaces Journal of Vacuum Science & Technology B. 16: 3922-3925. DOI: 10.1116/1.590437 |
0.567 |
|
1998 |
Wu W, Cui B, Sun X, Zhang W, Zhuang L, Kong L, Chou SY. Large area high density quantized magnetic disks fabricated using nanoimprint lithography Journal of Vacuum Science & Technology B. 16: 3825-3829. DOI: 10.1116/1.590417 |
0.629 |
|
1998 |
Rudin AM, Guo LJ, Glazman LI, Chou SY. Charge-ring model for the charge-induced confinement enhancement in stacked quantum-dot transistors Applied Physics Letters. 73: 3429-3431. DOI: 10.1063/1.122787 |
0.479 |
|
1998 |
Zhuang L, Guo L, Chou SY. Silicon single-electron quantum-dot transistor switch operating at room temperature Applied Physics Letters. 72: 1205-1207. DOI: 10.1063/1.121014 |
0.667 |
|
1998 |
Guo LJ, Chou SY. Stacked quantum dot transistor and charge-induced confinement enhancement Electronics Letters. 34: 1030-1031. DOI: 10.1049/El:19980717 |
0.502 |
|
1997 |
Guo L, Leobandung E, Chou SY. A silicon single-electron transistor memory operating at room temperature Science. 275: 649-651. PMID 9005847 DOI: 10.1126/Science.275.5300.649 |
0.522 |
|
1997 |
Chou SY, Schablitsky S, Zhuang L. Subwavelength transmission gratings and their applications in VCSELs High-Power Lasers and Applications. 3290: 73-81. DOI: 10.1117/12.298228 |
0.554 |
|
1997 |
Chou SY, Krauss PR, Zhang W, Guo L, Zhuang L. Sub-10 nm imprint lithography and applications Journal of Vacuum Science & Technology B. 15: 2897-2904. DOI: 10.1116/1.589752 |
0.717 |
|
1997 |
Chou SY, Schablitsky SJ, Zhuang L. Application of amorphous silicon subwavelength gratings in polarization switching vertical-cavity surface-emitting lasers Journal of Vacuum Science & Technology B. 15: 2864-2867. DOI: 10.1116/1.589745 |
0.579 |
|
1997 |
Guo L, Leobandung E, Zhuang L, Chou SY. Fabrication and characterization of room temperature silicon single electron memory Journal of Vacuum Science & Technology B. 15: 2840-2843. DOI: 10.1116/1.589740 |
0.691 |
|
1997 |
Leobandung E, Gu J, Guo L, Chou SY. Wire-channel and wrap-around-gate metal–oxide–semiconductor field-effect transistors with a significant reduction of short channel effects Journal of Vacuum Science & Technology B. 15: 2791-2794. DOI: 10.1116/1.589729 |
0.604 |
|
1997 |
Chou SY, Shi RC, Kong L. Effects of nanoscale trenches and mesas patterned in a substrate on domain structures of magnetic films and ion applications in magnetic disk tracking (abstract) Journal of Applied Physics. 81: 4673-4673. DOI: 10.1063/1.365521 |
0.359 |
|
1997 |
Jia YQ, Chou SY, Zhu J. Effect of bar width on magnetoresistance of nanoscale nickel and cobalt bars Journal of Applied Physics. 81: 5461-5463. DOI: 10.1063/1.364947 |
0.348 |
|
1997 |
Kong L, Chou SY. Study of magnetic properties of magnetic force microscopy probes using micronscale current rings Journal of Applied Physics. 81: 5026-5028. DOI: 10.1063/1.364499 |
0.304 |
|
1997 |
Guo L, Leobandung E, Chou SY. Erratum: “A room-temperature silicon single-electron metal–oxide–semiconductor memory with nanoscale floating-gate and ultranarrow channel” [Appl. Phys. Lett. 70, 850 (1997)] Applied Physics Letters. 71: 558-558. DOI: 10.1063/1.120560 |
0.49 |
|
1997 |
Guo L, Krauss PR, Chou SY. Nanoscale silicon field effect transistors fabricated using imprint lithography Applied Physics Letters. 71: 1881-1883. DOI: 10.1063/1.119426 |
0.596 |
|
1997 |
Kong L, Chou SY. Quantification of magnetic force microscopy using a micronscale current ring Applied Physics Letters. 70: 2043-2045. DOI: 10.1063/1.118808 |
0.306 |
|
1997 |
Chen E, Chou SY. High-efficiency and high-speed silicon metal–semiconductor–metal photodetectors operating in the infrared Applied Physics Letters. 70: 753-755. DOI: 10.1063/1.118270 |
0.395 |
|
1997 |
Guo L, Leobandung E, Chou SY. A room-temperature silicon single-electron metal–oxide–semiconductor memory with nanoscale floating-gate and ultranarrow channel Applied Physics Letters. 70: 850-852. DOI: 10.1063/1.118236 |
0.541 |
|
1997 |
Chou SY, Krauss PR. Imprint lithography with sub-10 nm feature size and high throughput Microelectronic Engineering. 35: 237-240. DOI: 10.1016/S0167-9317(96)00097-4 |
0.425 |
|
1996 |
Chou SY, Krauss PR, Renstrom PJ. Imprint Lithography with 25-Nanometer Resolution Science. 272: 85-87. DOI: 10.1126/Science.272.5258.85 |
0.387 |
|
1996 |
Zhuang L, Schablitsky S, Shi RC, Chou SY. Fabrication and performance of thin amorphous Si subwavelength transmission grating for controlling vertical cavity surface emitting laser polarization Journal of Vacuum Science & Technology B. 14: 4055-4057. DOI: 10.1116/1.588643 |
0.602 |
|
1996 |
Jia YQ, Shi RC, Chou SY. Spin-valve effects in nickel/silicon/nickel junctions Ieee Transactions On Magnetics. 32: 4707-4709. DOI: 10.1109/20.539125 |
0.31 |
|
1996 |
Kong L, Chou SY. Effects of bar length on switching field of nanoscale nickel and cobalt bars fabricated using lithography Journal of Applied Physics. 80: 5205-5208. DOI: 10.1063/1.363504 |
0.365 |
|
1996 |
Chou SY, Kong L. Effects of magnetostatic interaction between two single‐domain cobalt bars on crystal anisotropy and switching field (abstract) Journal of Applied Physics. 79: 5855-5855. DOI: 10.1063/1.362148 |
0.352 |
|
1996 |
Suriono U, Chou SY. Quantized writing processes in quantum magnetic disks (abstract) Journal of Applied Physics. 79: 5066-5066. DOI: 10.1063/1.361858 |
0.333 |
|
1996 |
Kong L, Chou SY. Nonmonotonic length dependence of switching field of nanolithographically defined single‐domain nickel and cobalt bars (abstract) Journal of Applied Physics. 79: 5067-5067. DOI: 10.1063/1.361574 |
0.343 |
|
1996 |
Chou SY, Krauss PR. 65 Gbits/in.2 quantum magnetic disk (abstract) Journal of Applied Physics. 79: 5066-5066. DOI: 10.1063/1.361573 |
0.303 |
|
1996 |
Schablitsky SJ, Zhuang L, Shi RC, Chou SY. Controlling polarization of vertical-cavity surface-emitting lasers using amorphous silicon subwavelength transmission gratings Applied Physics Letters. 69: 7-9. DOI: 10.1063/1.118126 |
0.56 |
|
1996 |
Liu MY, Chou SY. High‐modulation‐depth and short‐cavity‐length silicon Fabry–Perot modulator with two grating Bragg reflectors Applied Physics Letters. 68: 170-172. DOI: 10.1063/1.116449 |
0.341 |
|
1996 |
Chen E, Chou SY. Wavelength detector using a pair of metal-semiconductor-metal photodetectors with subwavelength finger spacings Electronics Letters. 32: 1510-1511. DOI: 10.1049/El:19960964 |
0.354 |
|
1995 |
Deng W, Chou SY. Fabrication and properties of visible‐light subwavelength amorphous silicon transmission gratings Journal of Vacuum Science & Technology B. 13: 2879-2882. DOI: 10.1116/1.588309 |
0.392 |
|
1995 |
Leobandung E, Guo L, Wang Y, Chou SY. Single electron and hole quantum dot transistors operating above 110 K Journal of Vacuum Science & Technology B. 13: 2865-2868. DOI: 10.1116/1.588306 |
0.492 |
|
1995 |
Krauss PR, Chou SY. Fabrication of planar quantum magnetic disk structure using electron beam lithography, reactive ion etching, and chemical mechanical polishing Journal of Vacuum Science & Technology B. 13: 2850-2852. DOI: 10.1116/1.588303 |
0.354 |
|
1995 |
Chou SY, Deng W. Subwavelength amorphous silicon transmission gratings and applications in polarizers and waveplates Applied Physics Letters. 67: 742-744. DOI: 10.1063/1.115211 |
0.376 |
|
1995 |
Chou SY, Krauss PR, Renstrom PJ. Imprint of sub-25 nm vias and trenches in polymers Applied Physics Letters. 67: 3114-3116. DOI: 10.1063/1.114851 |
0.389 |
|
1995 |
Leobandung E, Guo L, Wang Y, Chou SY. Observation of quantum effects and Coulomb blockade in silicon quantum-dot transistors at temperatures over 100 K Applied Physics Letters. 67: 938-940. DOI: 10.1063/1.114701 |
0.506 |
|
1995 |
Leobandung E, Guo L, Chou SY. Single hole quantum dot transistors in silicon Applied Physics Letters. 67: 2338-2340. DOI: 10.1063/1.114337 |
0.51 |
|
1995 |
Liu MY, Chou SY. Internal emission metal‐semiconductor‐metal photodetectors on Si and GaAs for 1.3 μm detection Applied Physics Letters. 66: 2673-2675. DOI: 10.1063/1.113121 |
0.331 |
|
1994 |
Chou SY, Wei M, Krauss PR, Fischer PB. Study of nanoscale magnetic structures fabricated using electron‐beam lithography and quantum magnetic disk Journal of Vacuum Science & Technology B. 12: 3695-3698. DOI: 10.1116/1.587642 |
0.339 |
|
1994 |
Krauss PR, Fischer PB, Chou SY. Fabrication of single‐domain magnetic pillar array of 35 nm diameter and 65 Gbits/in.2 density Journal of Vacuum Science & Technology B. 12: 3639-3642. DOI: 10.1116/1.587630 |
0.361 |
|
1994 |
Chou SY, Wei MS, Fischer PB. An ultra-high resolution single-domain magnetic force microscope tip fabricated using nanolithography Ieee Transactions On Magnetics. 30: 4485-4487. DOI: 10.1109/20.334126 |
0.368 |
|
1994 |
Wei MS, Chou SY. Size effects on switching field of isolated and interactive arrays of nanoscale single‐domain Ni bars fabricated using electron‐beam nanolithography Journal of Applied Physics. 76: 6679-6681. DOI: 10.1063/1.358166 |
0.357 |
|
1994 |
Chou SY, Wei MS, Krauss PR, Fischer PB. Single‐domain magnetic pillar array of 35 nm diameter and 65 Gbits/in.2 density for ultrahigh density quantum magnetic storage Journal of Applied Physics. 76: 6673-6675. DOI: 10.1063/1.358164 |
0.349 |
|
1994 |
Liu MY, Chen E, Chou SY. 140-GHz metal-semiconductor-metal photodetectors on silicon-on-insulator substrate with a scaled active layer Applied Physics Letters. 65: 887-888. DOI: 10.1063/1.112190 |
0.372 |
|
1993 |
Fischer PB, Dai K, Chen E, Chou SY. 10 nm Si pillars fabricated using electron‐beam lithography, reactive ion etching, and HF etching Journal of Vacuum Science & Technology B. 11: 2524-2527. DOI: 10.1116/1.586659 |
0.413 |
|
1993 |
Fischer PB, Wei MS, Chou SY. ultrahigh resolution magnetic force microscope tip fabricated using electron beam lithography Journal of Vacuum Science & Technology B. 11: 2570-2573. DOI: 10.1116/1.586626 |
0.356 |
|
1993 |
Chou SY, Wang Y. Planar double gate quantum wire transistor Applied Physics Letters. 63: 788-790. DOI: 10.1063/1.109908 |
0.318 |
|
1993 |
Alexandrou S, Wang CC, Hsiang TY, Liu MY, Chou SY. A 75 GHz silicon metal‐semiconductor‐metal Schottky photodiode Applied Physics Letters. 62: 2507-2509. DOI: 10.1063/1.109337 |
0.382 |
|
1993 |
Fischer PB, Chou SY. 10 nm electron beam lithography and sub-50 nm overlay using a modified scanning electron microscope Applied Physics Letters. 62: 2989-2991. DOI: 10.1063/1.109166 |
0.388 |
|
1993 |
Fischer PB, Chou SY. Sub-50 nm high aspect-ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching Applied Physics Letters. 62: 1414-1416. DOI: 10.1063/1.108696 |
0.398 |
|
1993 |
Fischer PB, Chou SY. RIE of sub-50 nm high aspect-ratio pillars, ridges, and trenches in silicon and silicon-germanium Microelectronic Engineering. 21: 311-314. DOI: 10.1016/0167-9317(93)90080-O |
0.397 |
|
1993 |
Fischer PB, Chou SY. High resolution electron beam lithography and high accuracy overlay using a modified SEM Microelectronic Engineering. 21: 141-144. DOI: 10.1016/0167-9317(93)90043-5 |
0.392 |
|
1992 |
Liu MY, Chou SY, Hsiang TY, Alexandrou S, Sobolewski R. Nanoscale metal-semiconductor-metal photodetectors with subpicosecond response time fabricated using electron beam lithography Journal of Vacuum Science & Technology B. 10: 2932-2935. DOI: 10.1116/1.586338 |
0.322 |
|
1992 |
Wang Y, Chou SY. Engineering sub‐50 nm quantum effect devices and single‐electron transistors using electron‐beam lithography Journal of Vacuum Science & Technology B. 10: 2962-2965. DOI: 10.1116/1.585952 |
0.37 |
|
1992 |
Chou SY, Liu MY. Nanoscale tera-hertz metal-semiconductor-metal photodetectors Ieee Journal of Quantum Electronics. 28: 2358-2368. DOI: 10.1109/3.159542 |
0.353 |
|
1992 |
Liu Y, Khalil W, Fischer PB, Chou SY, Hsiang TY, Alexandrou S, Sobolewski R. VIB-1 Nanoscale Ultrafast Metal-Semiconductor-Metal Photodetectors Ieee Transactions On Electron Devices. 39: 2674-2675. DOI: 10.1109/16.163548 |
0.314 |
|
1992 |
Chou SY, Liu Y, Carruthers TF. 32 GHz metal-semiconductor-metal photodetectors on crystalline silicon Applied Physics Letters. 61: 1760-1762. DOI: 10.1063/1.108418 |
0.373 |
|
1992 |
Chou SY, Liu Y, Fischer PB. Tera‐hertz GaAs metal‐semiconductor‐metal photodetectors with 25 nm finger spacing and finger width Applied Physics Letters. 61: 477-479. DOI: 10.1063/1.107862 |
0.368 |
|
1992 |
Chou SY, Liu Y, Khalil W, Hsiang TY, Alexandrou S. Ultrafast nanoscale metal‐semiconductor‐metal photodetectors on bulk and low‐temperature grown GaAs Applied Physics Letters. 61: 819-821. DOI: 10.1063/1.107755 |
0.369 |
|
1992 |
Chou SY, Gordon AE. Steps and spikes in current-voltage characteristics of oxide/ microcrystallite-silicon/oxide diodes Applied Physics Letters. 60: 1827-1829. DOI: 10.1063/1.107177 |
0.305 |
|
1991 |
Chou SY, Liu Y, Fischer PB. Fabrication of sub-50 nm finger spacing and width high-speed metal-semiconductor-metal photodetectors using high-resolution electron beam lithography and molecular beam epitaxy Journal of Vacuum Science & Technology B. 9: 2920-2924. DOI: 10.1116/1.585626 |
0.356 |
|
1991 |
Chang Y, Chou SY, Kramer J, Sigmon TW, Marshall AF, Weiner KH. Fabrication of patterned Gex/Si1−x/Si layers by pulsed laser induced epitaxy Applied Physics Letters. 58: 2150-2152. DOI: 10.1063/1.104989 |
0.333 |
|
1990 |
Maluf NI, Chou SY, Pease RFW. Selective tungsten filling of sub‐0.25 μm trenches for the fabrication of scaled contacts and x‐ray masks Journal of Vacuum Science & Technology B. 8: 568-569. DOI: 10.1116/1.585011 |
0.39 |
|
1990 |
Chou SY, Fischer PB. Double 15‐nm‐wide metal gates 10 nm apart and 70 nm thick on GaAs Journal of Vacuum Science & Technology B. 8: 1919-1922. DOI: 10.1116/1.584874 |
0.388 |
|
1990 |
Chang Y, Chou SY, Sigmon TW, Marshall AF, Weiner KH. Formation of InxGa1−xAs/GaAs heteroepitaxial layers using a pulsed laser driven rapid melt‐solidification process Applied Physics Letters. 56: 1844-1846. DOI: 10.1063/1.103065 |
0.325 |
|
1990 |
Allee DR, Chou SY, Harris JS, Pease RFW. Resonant tunneling of 1-dimensional electrons across an array of 3-dimensionally confined potential wells Superlattices and Microstructures. 7: 131-134. DOI: 10.1016/0749-6036(90)90125-Q |
0.391 |
|
1989 |
Maluf NI, Chou SY, McVittie JP, Kuan SWJ, Allee DR, Pease RFW. Effects of chromium on the reactive ion etching of steep‐walled trenches in silicon Journal of Vacuum Science & Technology B. 7: 1497-1501. DOI: 10.1116/1.584520 |
0.338 |
|
1989 |
Chou SY, Allee DR, Pease RFW, Harris JS. IVB-7 Quantum Interference Devices Fabricated Using Molecular-Beam Epitaxy and Ultra-High-Resolution Electron-Beam Lithography Ieee Transactions On Electron Devices. 36: 2617-2618. DOI: 10.1109/16.43733 |
0.345 |
|
1989 |
Chou SY, Allee DR, Pease RFW, Harris JS. Observation of electron resonant tunneling in a lateral dual-gate resonant tunneling field-effect transistor Applied Physics Letters. 55: 176-178. DOI: 10.1063/1.102113 |
0.357 |
|
1988 |
Chou SY, Maluf NI, Pease RFW. High‐resolution and high‐fidelity x‐ray mask structure employing embedded absorbers Journal of Vacuum Science & Technology B. 6: 2202-2206. DOI: 10.1116/1.584082 |
0.363 |
|
1988 |
Chou SY, Harris JS, Pease RFW. Lateral resonant tunneling field‐effect transistor Applied Physics Letters. 52: 1982-1984. DOI: 10.1063/1.99656 |
0.314 |
|
1988 |
Chou S, Wolak E, Harris J, Pease R. A lateral resonant tunneling FET Superlattices and Microstructures. 4: 181-186. DOI: 10.1016/0749-6036(88)90032-8 |
0.313 |
|
1987 |
Chou SY, Antoniadis DA, Smith HI. Application of the Shubnikov-de Haas oscillations in the characterization of Si MOSFET's and GaAs MODFET's Ieee Transactions On Electron Devices. 34: 883-889. DOI: 10.1109/T-Ed.1987.23011 |
0.516 |
|
1987 |
Chou SY, Antoniadis DA, Smith HI, Kastner MA. Conductance fluctuations in ultra-short-channel Si MOSFETS Solid State Communications. 61: 571-572. DOI: 10.1016/0038-1098(87)90172-4 |
0.502 |
|
1986 |
Chou SY. Sub-100-nm channel-length transistors fabricated using x-ray lithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 4: 253. DOI: 10.1116/1.583451 |
0.39 |
|
1985 |
Chou SY. X-ray lithography for sub-100-nm-channel-length transistors using masks fabricated with conventional photolithography, anisotropic etching, and oblique shadowing Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 3: 1587. DOI: 10.1116/1.582943 |
0.388 |
|
1985 |
Chou SY, Antoniadis DA, Smith HI. Observation of electron velocity overshoot in sub-100-nm-channel MOSFET's in Silicon Ieee Electron Device Letters. 6: 665-667. DOI: 10.1109/Edl.1985.26267 |
0.513 |
|
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