Year |
Citation |
Score |
2017 |
Birol SZ, Fucucuoglu R, Cadirci S, Sayi-Yazgan A, Trabzon L. Investigation on the effects of variable shear stress on monocyte cell morphology Micro & Nano Letters. 12: 881-885. DOI: 10.1049/Mnl.2017.0432 |
0.317 |
|
2016 |
Zuvin M, Mansur N, Birol SZ, Trabzon L, Sayı Yazgan A. Human breast cancer cell enrichment by Dean flow driven microfluidic channels Microsystem Technologies. 22: 645-652. DOI: 10.1007/S00542-015-2425-7 |
0.321 |
|
2015 |
Baysal G, Önder S, Göcek I, Trabzon L, Kizil H, Kök FN, Kayaoʇlu BK. Design and fabrication of a new nonwoven-textile based platform for biosensor construction Sensors and Actuators, B: Chemical. 208: 475-484. DOI: 10.1016/J.Snb.2014.11.042 |
0.314 |
|
2014 |
Kizil H, Pehlivaner MO, Trabzon L. Surface plasma characterization of polyimide films for flexible electronics Advanced Materials Research. 970: 132-135. DOI: 10.4028/Www.Scientific.Net/Amr.970.132 |
0.326 |
|
2014 |
Ghalehbeygi OT, Trabzon L, Francis L, Kizil H. Fabrication method of MEMS based Clamped-Clamped resonant magnetometer Advanced Materials Research. 970: 106-110. DOI: 10.4028/Www.Scientific.Net/Amr.970.106 |
0.335 |
|
2014 |
Baysal G, Neşe Kök F, Trabzon L, Kizil H, Göcek I, Kayaoǧlu BK. Microfluidic nonwoven-based device as a potential biosensor for sweat analysis Applied Mechanics and Materials. 490: 274-279. DOI: 10.4028/Www.Scientific.Net/Amm.490-491.274 |
0.31 |
|
2014 |
Baysal G, Önder S, Göcek İ, Trabzon L, Kızıl H, Kök FN, Kayaoğlu BK. Microfluidic device on a nonwoven fabric: A potential biosensor for lactate detection Textile Research Journal. 84: 1729-1741. DOI: 10.1177/0040517514528565 |
0.3 |
|
2008 |
Arslan E, Iğdil MC, Yazici H, Tamerler C, Bermek H, Trabzon L. Mechanical properties and biocompatibility of plasma-nitrided laser-cut 316L cardiovascular stents. Journal of Materials Science. Materials in Medicine. 19: 2079-86. PMID 17968502 DOI: 10.1007/S10856-007-3302-4 |
0.333 |
|
2006 |
Trabzon L, Iǧdil MC. On the materials properties of thin film plasma-nitrided austenitic stainless steel Surface and Coatings Technology. 200: 4195-4200. DOI: 10.1016/J.Surfcoat.2004.12.012 |
0.311 |
|
2003 |
Trabzon L, Awadelkarim OO. Changes in material properties of low-k interlayer dielectric polymers induced by exposure to plasmas Microelectronic Engineering. 65: 463-477. DOI: 10.1016/S0167-9317(03)00165-5 |
0.617 |
|
2001 |
Suliman SA, Gallogunta N, Trabzon L, Hao J, Dolny G, Ridley R, Grebs T, Benjamin J, Kocon C, Zeng J, Knoedler CM, Horn M, Awadelkarim OO, Fonash SJ, Ruzyllo J. The impact of trench geometry and processing on the performance and reliability of low voltage power UMOSFETs Annual Proceedings - Reliability Physics (Symposium). 308-314. DOI: 10.1109/RELPHY.2001.922920 |
0.661 |
|
2001 |
Trabzon L, Awadelkarim OO. The degradation of MOSFETs induced by the via etching of interlayer low-k polymers Proceedings of the International Conference On Microelectronics, Icm. 2001: 103-106. DOI: 10.1109/ICM.2001.997498 |
0.614 |
|
2001 |
Suliman SA, Gollagunta N, Trabzon L, Hao J, Ridley RS, Knoedler CM, Dolny GM, Awadelkarim OO, Fonash SJ. The dependence of UMOSFET characteristics and reliability on geometry and processing Semiconductor Science and Technology. 16: 447-454. DOI: 10.1088/0268-1242/16/6/305 |
0.671 |
|
2001 |
Dolny G, Gollagunta N, Suliman S, Trabzon L, Horn M, Awadelkarim OO, Fonash SJ, Knoedler CM, Hao J, Ridley R, Kocon C, Grebs T, Zeng J. Characterization of gate oxide degradation mechanisms in trench-gated power MOSFETS using the charge-pumping technique Ieee International Symposium On Power Semiconductor Devices and Ics (Ispsd). 431-434. |
0.623 |
|
2001 |
Suliman SA, Gallogunta N, Trabzon L, Hao J, Dolny G, Ridley R, Grebs T, Benjamin J, Kocon C, Zeng J, Knoedler CM, Horn M, Awadelkarim OO, Fonash SJ, Ruzyllo J. The impact of trench geometry and processing on the performance and reliability of low voltage power UMOSFETs Annual Proceedings - Reliability Physics (Symposium). 308-314. |
0.441 |
|
2000 |
Trabzon L, Awadelkarim OO. Damage to sub-half-micron metal-oxide-silicon field-effect transistors from plasma processing of low-k polymer interlayer dielectrics Semiconductor Science and Technology. 15: 309-314. DOI: 10.1088/0268-1242/15/4/301 |
0.683 |
|
1999 |
Trabzon L, Awadelkarim OO, Werking J. Dependence of the performance and reliability of n-metal-oxide-silicon field effect transistors on interlayer dielectric processing Journal of Vacuum Science & Technology B. 17: 2216-2221. DOI: 10.1116/1.590896 |
0.687 |
|
1999 |
Trabzon L. Dependence of the performance and reliability of n-metal-oxide-silicon field effect transistors on interlayer dielectric processing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 2216-2221. |
0.466 |
|
1998 |
Trabzon L, Awadelkarim OO, Werking J. The effects of interlayer dielectric deposition and processing on the reliability of N-channel transistors Solid-State Electronics. 42: 2031-2037. DOI: 10.1016/S0038-1101(98)00175-0 |
0.664 |
|
1998 |
Trabzon L, Awadelkarim OO. Damage to n-mOSFETs from electrical stress relationship to processing damage and impact on device reliability Microelectronics Reliability. 38: 651-657. DOI: 10.1016/S0026-2714(97)00194-7 |
0.667 |
|
1997 |
Trabzon L, Awadelkarim OO. Electrical-stress simulation of plasma-damage to submicron metal-oxide-silicon field-effect transistors: Comparison between direct current and alternating current stresses Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 15: 692-696. DOI: 10.1116/1.580803 |
0.671 |
|
1997 |
Trabzon L, Awadelkarim OO, Werking J, Bersuker G, Chan YD. Comparison between direct current and sinusoidal current stressing of gate oxides and oxide/silicon interfaces in metal-oxide-silicon field-effect transistors Journal of Applied Physics. 81: 1575-1580. DOI: 10.1063/1.363892 |
0.684 |
|
1996 |
Trabzon L, Awadelkarim OO, Werking J, Bersuker G, Chan YD. Sinusoidal AC stressing of thin-gate oxides and oxide/silicon interfaces in 0.5-μm n-MOSFET's Ieee Electron Device Letters. 17: 569-571. DOI: 10.1109/55.545773 |
0.666 |
|
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