Year |
Citation |
Score |
2002 |
Ip K, Nigam S, Lee KP, Baik KH, Chung GY, MacMillan MF, Ren F, Pearton SJ. Effects of Ar inductively coupled plasma exposure on 4H-SiC Schottky rectifiers Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20: 2299. DOI: 10.1116/1.1518971 |
0.513 |
|
2002 |
Lee KP, Pearton SJ, Overberg ME, Abernathy CR, Wilson RG, Chu SNG, Theodoropolou N, Hebard AF, Zavada JM. Magnetic effects of direct ion implantation of Mn and Fe into p-GaN Journal of Electronic Materials. 31: 411-415. DOI: 10.1007/S11664-002-0093-8 |
0.31 |
|
2001 |
Theodoropoulou N, Lee KP, Overberg ME, Chu SN, Hebard AF, Abernathy CR, Pearton SJ, Wilson RG. Nanoscale magnetic regions formed in GaN implanted with Mn. Journal of Nanoscience and Nanotechnology. 1: 101-6. PMID 12914038 DOI: 10.1166/Jnn.2001.004 |
0.302 |
|
2001 |
Luo B, Kim J, Mehandru R, Ren F, Lee KP, Pearton S, Polyakov A, Smirnov N, Govorkov A, Kozhukhova E, Osinsky A, Norris P. Electrical Properties of n-GaN/p-SiC and n-AlGaN/p-SiC Heterojunction Diodes Mrs Proceedings. 693. DOI: 10.1557/Proc-693-I11.17.1 |
0.347 |
|
2001 |
Monier C, Ren F, Han J, Chang P, Shul RJ, Lee K, Zhang A, Baca AG, Pearton S. Simulation of npn and pnp AlGaN/GaN heterojunction bipolar transistors performances: limiting factors and optimum design Ieee Transactions On Electron Devices. 48: 427-432. DOI: 10.1109/16.906431 |
0.384 |
|
2001 |
Zhan AP, Dang GT, Ren F, Cho H, Lee K, Pearton SJ, Chyi J, Nee T-, Chuo C-. Comparison of GaN p-i-n and Schottky rectifier performance Ieee Transactions On Electron Devices. 48: 407-411. DOI: 10.1109/16.906427 |
0.408 |
|
2001 |
Kent D, Lee K, Zhang A, Luo B, Overberg M, Abernathy C, Ren F, Mackenzie K, Pearton S, Nakagawa Y. Electrical effects of N2 plasma exposure on dry-etch damage in p- and n-GaN Schottky diodes Solid-State Electronics. 45: 1837-1842. DOI: 10.1016/S0038-1101(01)00248-9 |
0.415 |
|
2001 |
Luo B, Ren F, Lee K, Pearton S, Wu C, Johnson D, Sasserath J. Comparison of the effects of H2 and D2 plasma exposure on GaAs MESFETs Solid-State Electronics. 45: 1625-1638. DOI: 10.1016/S0038-1101(01)00156-3 |
0.414 |
|
2001 |
Luo B, Ren F, Lee K, Pearton S, Wu C, Kopf R, Johnson D, Sasserah J. Comparison of the effects of H2 and D2 plasma exposure on AlGaAs/GaAs high electron mobility transistors Solid-State Electronics. 45: 1613-1624. DOI: 10.1016/S0038-1101(01)00155-1 |
0.458 |
|
2001 |
Kent D, Lee K, Zhang A, Luo B, Overberg M, Abernathy C, Ren F, Mackenzie K, Pearton S, Nakagawa Y. Effect of N2 plasma treatments on dry etch damage in n- and p-type GaN Solid-State Electronics. 45: 467-470. DOI: 10.1016/S0038-1101(01)00016-8 |
0.405 |
|
2000 |
Lee KP, Jung KB, Singh RK, Pearton SJ, Hobbs C, Tobin P. Comparison of plasma chemistries for dry etching of Ta2O5 Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 18: 1169-1172. DOI: 10.1116/1.582319 |
0.383 |
|
1999 |
Lee K, Cho H, Singh RK, Pearton SJ, Hobbs C, Tobin P. High Density Plasma Etching of Ta2O5-Selectivity to Si and Effect of UV Light Enhancement Mrs Proceedings. 606. DOI: 10.1557/Proc-606-257 |
0.399 |
|
1999 |
Lee K, Jung KB, Singh RK, Pearton SJ, Hobbs C, Tobin P. Inductively Coupled Plasma Etching of Ta2 O 5 Journal of the Electrochemical Society. 146: 3794-3798. DOI: 10.1149/1.1392552 |
0.364 |
|
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